专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2008046603A Process control monitor for interferometric modulator 审中-公开
标题翻译：干涉仪调制器的过程控制监视器
公开(公告)号：JP2008046603A
公开(公告)日：2008-02-28
申请号：JP2007150880
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00 , G02B26/08 , G09F9/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a process control monitor for interferometric modulators for reasons that errors can occur during the manufacturing of MEMS devices, that detecting the errors and the source of the errors can present a problem in the quality control and optimization of MEMS devices, and that accordingly there is a need for structures and methods for monitoring manufacturing processes and their results. SOLUTION: Process control monitors 100, 102, 104 are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device 108. Analysis of the process control monitors 100, 102, 104 can provide information regarding properties of the MEMS device 108 and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device 108. In some embodiments, analysis of the process control monitors 100, 102, 104 may utilize optical measurements. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了在MEMS器件制造过程中发生错误的原因提供干涉式调制器的过程控制监视器，检测误差和误差源可能会导致质量控制和优化中的问题的MEMS器件，因此，需要用于监测制造工艺及其结果的结构和方法。公开了使用用于制造MEMS器件108的至少一些相同工艺步骤生产的过程控制监视器100,102,104。过程控制监视器100,102,104的分析可以提供关于 MEMS器件108的特性以及器件中的部件或子部件。该信息可用于识别处理中的错误或优化MEMS器件108.在一些实施例中，过程控制监视器100,102,104的分析可以利用光学测量。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2008026877A Process control monitor for interferometric modulator 有权
标题翻译：干涉仪调制器的过程控制监视器
公开(公告)号：JP2008026877A
公开(公告)日：2008-02-07
申请号：JP2007150868
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00 , G02B26/02 , B81C1/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide process control monitors for interferometric modulators. SOLUTION: Process control monitors 100, 102 and 104 are manufactured by using at least some of the same process steps as those used to manufacture an MEMS device 108. Analysis of the process control monitors 100, 102 and 104 can provide information regarding properties of the MEMS device 108 and components or subcomponents in the device. The information can be used to identify errors in processing or to optimize the MEMS device 108. In some embodiments, analysis of the process control monitors 100, 102 and 104 can utilize optical measurement values. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供干涉式调制器的过程控制监视器。解决方案：过程控制监视器100,102和104通过使用至少一些与制造MEMS器件108相同的处理步骤来制造。过程控制监视器100,102和104的分析可以提供关于 MEMS器件108的特性以及器件中的部件或子部件。该信息可用于识别处理中的错误或优化MEMS器件108.在一些实施例中，过程控制监视器100,102和104的分析可以利用光学测量值。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2007301719A Process control monitor regarding interferometric modulator 有权
标题翻译：关于干涉仪调制器的过程控制监视器
公开(公告)号：JP2007301719A
公开(公告)日：2007-11-22
申请号：JP2007150861
申请日：2007-06-06
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , GALLY BRIAN J
IPC分类号： B81C99/00
CPC分类号： B81C99/004 , B81B2201/042 , G01N21/55 , G01N21/9501 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To provide a process control monitor regarding an interferometric modulator. SOLUTION: Process control monitors 100, 102 and 104 manufactured by using at least a part of the same process step as that used for manufacturing a MEMS device 108 are disclosed. By analyzing the process control monitors 100, 102 and 104, information on properties of the MEMS device 108 and components or sub components in the device 108 can be provided. The information can be used to identify an error in processing or optimize the MEMS device 108. In some embodiments, optical measured values can be used in the analysis of the process control monitors 100, 102 and 104. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供关于干涉式调制器的过程控制监视器。解决方案：公开了通过使用与用于制造MEMS器件108的工艺步骤相同的工艺步骤的至少一部分制造的工艺控制监视器100,102和104。通过分析过程控制监视器100,102和104，可以提供关于MEMS设备108的属性和设备108中的组件或子组件的信息。该信息可用于识别处理或优化MEMS器件108中的错误。在一些实施例中，光学测量值可用于过程控制监视器100,102和104的分析。（C） 2008年，日本特许厅和INPIT

4. 发明专利

JP2006113559A Apparatus and method for reducing perceived color shift 有权
标题翻译：减少感知色差的装置和方法
公开(公告)号：JP2006113559A
公开(公告)日：2006-04-27
申请号：JP2005260607
申请日：2005-09-08
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： GALLY BRIAN J , KOTHARI MANISH
IPC分类号： G02B26/00 , G09F9/00 , G09F9/30 , G09G3/34
CPC分类号： G02B26/001 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method for reducing a perceived color shift. SOLUTION: An apparatus and a method for reducing perceived color shift as a function of a viewing angle is disclosed. One embodiment is a display device that includes a color light modulator and a color filter. The filter is configured to filter wavelengths of light that would be perceived as color shifted light when reflected by the modulator at an off-axis viewing angle. Another embodiment includes a color light modulator and a color light source configured to provide light having a spectral content that lacks the wavelengths that would be perceived as color shifted light by a view of the display at an off-axis viewing angle. Another embodiment is a method of making such display devices. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种减少感知色移的装置和方法。公开了一种用于减少感知色移作为视角的函数的装置和方法。一个实施例是包括彩色调制器和滤色器的显示装置。滤光器被配置为滤除在离轴观察角度被调制器反射时被感知为偏移光的光的波长。另一个实施例包括彩色光调制器和彩色光源，其被配置为提供具有光谱含量的光，所述光谱内容缺乏通过视轴处于离轴视角的显示器的视觉而被感知为偏移光的波长。另一实施例是制造这种显示装置的方法。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2006099113A Method and device for manipulating color in display 审中-公开
标题翻译：用于在显示器中操作颜色的方法和装置
公开(公告)号：JP2006099113A
公开(公告)日：2006-04-13
申请号：JP2005276235
申请日：2005-09-22
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： GALLY BRIAN J , CUMMINGS WILLIAM J
IPC分类号： G02B26/00 , B81B3/00
CPC分类号： G02B26/001 , G09G3/3466 , H04M1/73 , H04W52/027 , Y02D70/00 , Y02D70/1222 , Y02D70/142 , Y02D70/144 , Y02D70/164 , Y02D70/26 , Y10T29/49002
摘要： PROBLEM TO BE SOLVED: To provide a method for manipulating color and a structure of a display device in a display by a microelectromechanical system (MEMS) interferometric modulator. SOLUTION: In one embodiment, a display comprises interferometric display elements formed to have spectral responses that produce white light. In another embodiment, the produced white light is interferingly produced that is characterized by a standardized white point. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过微机电系统（MEMS）干涉式调制器来操纵显示器中的显示装置的颜色和结构的方法。解决方案：在一个实施例中，显示器包括形成为具有产生白光的光谱响应的干涉式显示元件。在另一个实施例中，所产生的白光被干涉地产生，其特征在于标准化的白点。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2006099107A System and method for display device with end-of-life phenomenon 审中-公开
标题翻译：用终端寿命显示设备的系统和方法
公开(公告)号：JP2006099107A
公开(公告)日：2006-04-13
申请号：JP2005266997
申请日：2005-09-14
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： PALMATEER LAUREN
IPC分类号： G02B26/08 , G09G3/20 , G09G3/34
CPC分类号： G09G3/3466 , G02B26/001 , G02B26/0841 , G09G2300/06 , G09G2320/04 , G09G2330/04
摘要： PROBLEM TO BE SOLVED: To provide systems and methods of displaying an end-of-life image on an electronic display on a MEMS display device. SOLUTION: An end-of-life image 104 is displayed on a MEMS display device in the presence of sufficient water vapor and without continued operation of the display. The image can be displayed in response to user input, in response to detection of a predefined level of water vapor within the display package, according to a prestored lifetime of the device, or according to a natural expiration of the lifetime of the display device and package. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供在MEMS显示装置上的电子显示器上显示寿命终止图像的系统和方法。解决方案：在存在足够的水蒸汽并且不继续操作显示器的情况下，在MEMS显示装置上显示寿命终止图像104。响应于用户输入，响应于根据设备的预存的寿命或者根据显示设备的寿命的自然过期来检测显示包内的预定水平的水蒸汽，可以显示图像，以及包。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006099103A System and method for multi-level brightness in interferometric modulation 有权
标题翻译：用于多层次亮度的系统和方法在干涉式调制中的应用
公开(公告)号：JP2006099103A
公开(公告)日：2006-04-13
申请号：JP2005265332
申请日：2005-09-13
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CHUI CLARENCE
IPC分类号： G09F9/30 , G02B26/08
CPC分类号： G02B26/001 , G09G3/2011 , G09G3/207 , G09G3/2074 , G09G3/3466 , G09G2300/0439 , Y10S385/901
摘要： PROBLEM TO BE SOLVED: To provide a display having a plurality of reflective display elements.
SOLUTION: In one embodiment, the display elements comprise at least one electrode having a plurality of active areas. In one embodiment, at least two of the sizes of the active areas are different from each other. For example, they are non-uniform in size. Interferometric modulators have a plurality of states, wherein selected ones of the interferometric modulators are configured to be actuated dependently upon differing electrostatic forces in the interferometric modulators. Electrostatic forces in the interferometric modulators are different at least in part due to variations in the sizes of the active areas of the electrode.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供具有多个反射显示元件的显示器。解决方案：在一个实施例中，显示元件包括具有多个有效区域的至少一个电极。在一个实施例中，活动区域中的至少两个尺寸彼此不同。例如，它们的尺寸不均匀。干涉式调制器具有多个状态，其中所选择的干涉式调制器被配置为依赖于干涉式调制器中的不同静电力而被致动。干涉式调制器中的静电力至少部分地由于电极的有源区域的尺寸的变化而不同。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2006099069A System and method for protecting microelectromechanical system array using structurally reinforced back-plate 审中-公开
标题翻译：使用结构强化后板保护微电子系统系统的系统和方法
公开(公告)号：JP2006099069A
公开(公告)日：2006-04-13
申请号：JP2005235798
申请日：2005-08-16
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： GALLY BRIAN J , PALMATEER LAUREN , CUMMINGS WILLIAM J
IPC分类号： G02B26/08 , B81B3/00 , B81B7/04
CPC分类号： B81B3/007 , B81B7/0058 , B81C2203/0163 , G02B26/001
摘要： PROBLEM TO BE SOLVED: To protect microelectromechanical systems from damage by increasing rigidity of a back-plate. SOLUTION: The packaged device includes a substrate 101, an interferometric modulation display array 111 formed on the substrate 101, and a back-plate. The back-plate is placed over the display array 111 with a gap 124 between the back-plate and the display array. The device further includes reinforcing structures which are integrated with the back-plate. The reinforcing structures add stiffness to the back-plate. The back-plate may have a thickness varying along an edge thereof. A driving space is processed by drying, sealing, gas filling, etc., for the purpose of preventing interference of the operation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过增加背板的刚度来保护微机电系统免受损坏。解决方案：封装器件包括衬底101，形成在衬底101上的干涉式调制显示阵列111和背板。背板被放置在显示器阵列111上，在背板和显示器阵列之间具有间隙124。该装置还包括与后板一体化的加强结构。加强结构增加了背板的刚度。背板可以具有沿其边缘变化的厚度。为了防止操作的干扰，驱动空间通过干燥，密封，充气等进行处理。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2006099061A System and method of reducing color shift in display 有权
标题翻译：减少彩色显示的系统和方法
公开(公告)号：JP2006099061A
公开(公告)日：2006-04-13
申请号：JP2005226115
申请日：2005-08-04
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： SAMPSELL JEFFREY B
IPC分类号： G02B26/02
CPC分类号： G02B26/001
摘要： PROBLEM TO BE SOLVED: To reduce color shift that may be seen as the viewing angle or light ange changes in a display using MEMS (Microelectromechanical systems). SOLUTION: In an interferometric modulator display 100, a light source 102 transmits light from a range of locations that include, for example, locations 104 or 106. The interferometric modulator display 100 includes an array of interferometric light modulators 110a, 110b, and 110c. The display 100 may include thousands or millions of modulators. Each of the light modulators 110a, 110b, and 110c includes a pair of mirrors 112 and 114. The mirrors 112 and 114 are positioned substantially parallel to each other and are spaced apart at a distance 116 so as to define an optical cavity therebetween. The color of light that is reflected from the optical cavity is at least partly determined by the distance 116. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了减少在使用MEMS（微机电系统）的显示器中视角或光线发生变化时可能会看到的色偏。解决方案：在干涉式调制器显示器100中，光源102透射来自包括例如位置104或106的一系列位置的光。干涉式调制器显示器100包括干涉式光调制器110a，110b，和110c。显示器100可以包括数千或数百万个调制器。光调制器110a，110b和110c中的每一个包括一对反射镜112和114.反射镜112和114基本上彼此平行地定位并且在距离116处间隔开，以便在它们之间限定光腔。从光腔反射的光的颜色至少部分地由距离116决定。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2006099055A Portable type etching chamber 审中-公开
标题翻译：便携式蚀刻室
公开(公告)号：JP2006099055A
公开(公告)日：2006-04-13
申请号：JP2005218128
申请日：2005-07-28
申请人： Idc Llc , アイディーシー、エルエルシー
发明人： CUMMINGS WILLIAM J , ARBUCKLE BRIAN W , FLOYD PHILIP D
IPC分类号： G02B26/08 , B81C99/00
CPC分类号： H01L21/67069
摘要： PROBLEM TO BE SOLVED: To provide a system and method for a portable type etching chamber, and a method for using them, especially a method for etching a microelectromechanical (MEMS) system substrate like an optical interferometric modulator substrate. SOLUTION: An etching chamber is constituted so as to support the MEMS substrate inside the chamber. The etching chamber is constituted so as to be moved to an etching station containing a steam or gas phase etching agent source, a purge gas source and/or a vacuum source and to be attached thereto. The portable etching chamber facilitate a process for etching the MEMS substrate held therein. For example, the MEMS substrate in such an etching chamber can be etched by connecting the chamber to the etching station and exposing the MEMS substrate to an etching agent for etching the MEMS substrate. The substrate can be conveyed to/from the etching station inside the portable type etching chamber. In a preferred embodiment, the MEMS substrate is an optical interferometric modulator, and the etching agent is XFe 2 . COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供便携式蚀刻室的系统和方法及其使用方法，特别是用于蚀刻诸如光学干涉式调制器基板的微机电（MEMS）系统基板的方法。解决方案：蚀刻室被构造成在室内支撑MEMS基板。蚀刻室被构造成移动到包含蒸汽或气相蚀刻剂源，吹扫气体源和/或真空源并附接到其的蚀刻站。便携式蚀刻室促进蚀刻保持在其中的MEMS基板的工艺。例如，可以通过将腔室连接到蚀刻站并将MEMS衬底暴露于用于蚀刻MEMS衬底的蚀刻剂来蚀刻这种蚀刻室中的MEMS衬底。衬底可以被输送到便携式蚀刻室内的蚀刻工位。在优选实施例中，MEMS衬底是光学干涉式调制器，并且蚀刻剂是XFe 2 。版权所有（C）2006，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式