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    • 3. 发明申请
    • Hydrogen supply system for fuel cell
    • 燃料电池用氢系统
    • US20100167155A1
    • 2010-07-01
    • US11999370
    • 2007-12-04
    • Sang Hyun KimHoon Hee LeeHyung Ki Kim
    • Sang Hyun KimHoon Hee LeeHyung Ki Kim
    • H01M8/24
    • H01M8/04201F17C5/06F17C11/005F17C2221/012H01M8/04089H01M8/04216Y02E60/321Y10T137/4673Y10T137/469
    • The present invention provides a hydrogen supply system for a fuel cell which can compensate for a change in temperature, caused by heat generated when a high pressure tank is charged and discharged with hydrogen, using a metal hydride (MH) tank providing high hydrogen storage density, mounted in the high pressure tank such that hydrogen is to be discharged from the MH tank when hydrogen is charged to the high pressure tank, and hydrogen is to be charged to the MH tank when hydrogen is discharged from the high pressure tank.For this, the present invention provides a hydrogen supply system for a fuel cell, including: a high pressure tank which is capable of storing hydrogen received from a hydrogen refueling station and includes a metal hydride (MH) tank capable of storing hydrogen, mounted therein; first and second solenoid valves provided at both ends of the high pressure tank; a buffer tank connected in parallel to the high pressure tank; and a fuel cell stack connected to the buffer tank so that hydrogen from the high pressure tank or the MH tank is supplied to the stack through the buffer tank, wherein the hydrogen is charged from the hydrogen refueling station to the high pressure tank and discharged from the high pressure tank through the first solenoid valve, the hydrogen is charged and discharged to and from the MH tank through the second solenoid valve, the hydrogen is discharged from the MH tank as the first and second solenoid valves are simultaneously opened when the hydrogen is charged to the high pressure tank, and the hydrogen discharged from the MH tank is stored in the buffer tank and then supplied to the fuel cell stack.
    • 本发明提供了一种用于燃料电池的氢气供应系统,其能够补偿当高压罐用氢气充放电时产生的热引起的温度变化,使用提供高储氢密度的金属氢化物(MH) 安装在高压罐中,以便当氢气被充入高压罐时氢从MH储存器中排出,当氢气从高压罐排出时,氢气将被充入MH储罐。 为此,本发明提供了一种用于燃料电池的氢气供应系统,包括:高压罐,其能够储存从加氢站接收的氢气,并且包括能够储存氢的金属氢化物(MH)罐,安装在其中 ; 设置在高压罐两端的第一和第二电磁阀; 与高压罐并联连接的缓冲罐; 以及连接到缓冲罐的燃料电池堆,使得来自高压罐或MH箱的氢气通过缓冲罐被供应到堆叠,其中氢气从加氢站被加载到高压罐并从 高压罐通过第一电磁阀,氢气通过第二电磁阀向MH箱充放电,当氢气为氢时,第一和第二电磁阀同时打开时氢从MH箱排出 充入高压罐,从MH箱排出的氢气储存在缓冲罐中,然后供给到燃料电池堆。
    • 4. 发明授权
    • Method for forming bit-line of semiconductor device
    • 形成半导体器件位线的方法
    • US07101783B2
    • 2006-09-05
    • US10879299
    • 2004-06-30
    • Hyung Ki Kim
    • Hyung Ki Kim
    • H01L21/4763
    • H01L21/32051H01L27/10888H01L27/10894
    • Disclosed is a method for forming a bit-line of a semiconductor device. In a line patterning process for forming a bit-line in a DRAM (Dynamic Random Access Memory) of a semiconductor device, a barrier metal layer and a tungsten layer are sequentially formed on an interlayer insulating film comprising a contact hole to fill the contact hole by a CVD (Chemical Vapor Deposition) method. Then, the barrier metal layer and the tungsten layer are removed until the interlayer insulating film is exposed, and a tungsten layer having small thickness is re-formed on the exposed interlayer insulating film by a PVD (physical Vapor Deposition) method. As a result, the bit-line area is reduced as much as the barrier metal layer removed from the upper portion of interlayer insulating film, thereby having low bit-line capacitance.
    • 公开了一种形成半导体器件的位线的方法。 在用于在半导体器件的DRAM(动态随机存取存储器)中形成位线的线图案化工艺中,阻挡金属层和钨层依次形成在包括接触孔的层间绝缘膜上以填充接触孔 通过CVD(化学气相沉积)法。 然后,去除阻挡金属层和钨层,直到层间绝缘膜露出,并且通过PVD(物理气相沉积)方法在暴露的层间绝缘膜上重新形成厚度小的钨层。 结果,位线区域与从层间绝缘膜的上部去除的阻挡金属层一样减少,从而具有低的位线电容。