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1. 发明授权

US08518723B2 Method of fabricating semiconductor integrated circuit device 有权
标题翻译：制造半导体集成电路器件的方法
公开(公告)号：US08518723B2
公开(公告)日：2013-08-27
申请号：US12591534
申请日：2009-11-23
申请人： Chong-Kwang Chang , Hong-Jae Shin , Nae-In Lee , Kwang-Hyeon Baik , Seung-Il Bok , Hyo-Jeong Kim
发明人： Chong-Kwang Chang , Hong-Jae Shin , Nae-In Lee , Kwang-Hyeon Baik , Seung-Il Bok , Hyo-Jeong Kim
IPC分类号： H01L21/302
CPC分类号： H01L21/0337
摘要： A method of fabricating a semiconductor integrated circuit device, including providing a semiconductor substrate, sequentially forming an etching target layer and a hard mask layer on the semiconductor substrate, forming first etch masks on the hard mask layer, the first etch masks including a plurality of first line patterns spaced apart from one another at a first pitch and extending in a first direction, forming first hard mask patterns by etching the hard mask layer using the first etch masks, forming second etch masks on the first hard mask patterns, the second etch masks including a plurality of second line patterns spaced apart from one another at a second pitch and extending in a second direction different from the first direction, forming second hard mask patterns by etching the first hard mask patterns using the second etch masks, forming spacers on sidewalls of the second hard mask patterns, and patterning the etching target layer using the second hard mask patterns having the spacers.
摘要翻译：一种制造半导体集成电路器件的方法，包括提供半导体衬底，在半导体衬底上依次形成蚀刻目标层和硬掩模层，在硬掩模层上形成第一蚀刻掩模，第一蚀刻掩模包括多个第一线图案以第一间距彼此间隔开并且沿第一方向延伸，通过使用第一蚀刻掩模蚀刻硬掩模层来形成第一硬掩模图案，在第一硬掩模图案上形成第二蚀刻掩模，第二蚀刻掩模，包括以第二间距彼此间隔开并且沿与第一方向不同的第二方向延伸的多个第二线图案，通过使用第二蚀刻掩模蚀刻第一硬掩模图案形成第二硬掩模图案，在第第二硬掩模图案的侧壁，以及使用具有t的第二硬掩模图案来图案化蚀刻目标层他的间隔。

2. 发明申请

US20110318275A1 MULTIFUNCTIONAL CONTRAST AGENT USING BIOCOMPATIBLE POLYMER AND PREPARATION METHOD 审中-公开
标题翻译：多功能对比剂使用生物聚合物和制备方法
公开(公告)号：US20110318275A1
公开(公告)日：2011-12-29
申请号：US13255074
申请日：2009-09-28
申请人： Sun Hang Cho , Byung Cheol Shin , Soon Hong Yuk , Ha Soo Seong , Byung Jin Kim , Hyo Jeong Kim , Youn Woong Choi , Byung Gu Min , Dae Chul Ha
发明人： Sun Hang Cho , Byung Cheol Shin , Soon Hong Yuk , Ha Soo Seong , Byung Jin Kim , Hyo Jeong Kim , Youn Woong Choi , Byung Gu Min , Dae Chul Ha
IPC分类号： A61K49/14 , C07K11/00 , A61K31/704 , A61K31/337 , B32B5/16 , A61K31/138 , A61K9/00 , A61K49/00 , A61K49/18 , A61P35/00 , C07K14/00 , A61K33/24
CPC分类号： A61K49/0032 , A61K49/0043 , A61K49/0054 , A61K49/12 , Y10T428/2982
摘要： The present invention relates to a biocompatible contrast agent and a method of its preparation. More particularly, the present invention relates to a multifunctional contrast agent manufactured by prepairing a novel polysuccinimide-based polymer by introducing an alkanolamine group to the main group of the polysuccinimide in addition to a biocompatible hydrophilic group, which improves bioavailability, and a hydrophobic group, which enables to maintain the form of stable nanoparticles during the formation of nano particles for a long period of time and to encapsulate a hydrophobic anticancer agent.
摘要翻译：本发明涉及一种生物相容性造影剂及其制备方法。更具体地说，本发明涉及一种多功能造影剂，其是通过将生物相容性亲水基团除了提高生物利用度之外，通过将链烷醇胺基引入聚琥珀酰亚胺的主要基团中而制备新的聚琥珀酰亚胺类聚合物，这使得能够在长时间形成纳米颗粒期间保持稳定的纳米颗粒的形式并且包封疏水性抗癌剂。

3. 发明申请

US20100212833A1 Apparatus for Etching Edge of Wafer 有权
标题翻译：用于蚀刻晶片边缘的设备
公开(公告)号：US20100212833A1
公开(公告)日：2010-08-26
申请号：US12710801
申请日：2010-02-23
申请人： Chong-Kwang Chang , Oh-Sang Cho , In-Keun Lee , Hyo-Jeong Kim
发明人： Chong-Kwang Chang , Oh-Sang Cho , In-Keun Lee , Hyo-Jeong Kim
IPC分类号： H01L21/306 , H01L21/3065
CPC分类号： H01L21/67069 , H01J37/32642 , H01L21/02087
摘要： An apparatus for etching an edge of a wafer includes a chamber, a chuck disposed inside the chamber upon which the wafer is disposed, a plate spaced apart from the wafer and disposed above the wafer, and an edge ring formed along the edge of the wafer and combined with an outer periphery of the plate, wherein the edge ring comprises a ring base spaced a distance apart from the wafer to form a parallel plane with respect to the wafer, and a first ring protrusion protruding from the ring base to insulate the edge of the wafer from a central region of the wafer.
摘要翻译：用于蚀刻晶片边缘的装置包括：室，设置在其上设置晶片的室内的卡盘，与晶片间隔开并设置在晶片上方的板，以及沿着晶片边缘形成的边缘环并且与所述板的外周边结合，其中所述边缘环包括与所述晶片隔开一段距离的环形基座，以形成相对于所述晶片的平行平面;以及第一环形突起，其从所述环形基部突出以使所述边缘的晶片从晶片的中心区域。

4. 发明申请

US20140096787A1 MASCARA 审中-公开
标题翻译：马卡拉
公开(公告)号：US20140096787A1
公开(公告)日：2014-04-10
申请号：US14124241
申请日：2011-10-19
申请人： Hyo Jeong Kim
发明人： Hyo Jeong Kim
IPC分类号： A45D34/04
CPC分类号： A45D34/045 , A45D40/261 , A45D40/265 , A46B5/0091 , A46B2200/1053
摘要： The present invention relates to a mascara having a rotatable contact brush. According to the present design, comprised are: a container main body in which a mascara liquid is stored; a handle which is coupled to an opening side of the container main body so as to be sealable; and a coating member, which is extendedly formed on one side of the handle, is inserted into the container main body when the container main body and the handle are coupled, and which is provided with a brush that is rotatably provided at an end portion of a brush rod for selectively performing one effect from volumizing, curling, lengthening, and cleaning, while rotating when coating the eyelashes with the mascara liquid, thereby enhancing volume, curling, lengthening, and cleaning by means of the rotation of the brush when coating the eyelashes with the mascara liquid.
摘要翻译：本发明涉及具有可旋转接触刷的睫毛膏。根据本设计，包括：储存睫毛液的容器主体; 手柄，其联接到容器主体的开口侧以便可密封; 并且当容器主体和手柄联接时，延伸地形成在手柄的一侧上的涂覆部件被插入到容器主体中，并且设置有可旋转地设置在容器主体的端部用于在用睫毛液涂覆睫毛的同时旋转时选择性地进行一次效果的刷棒，从而通过刷涂时的刷子的旋转来增加体积，卷曲，延长和清洁睫毛与睫毛膏液体。

5. 发明申请

US20080046323A1 METHOD OF MANAGING ADVERTISERS AND SYSTEM FOR EXECUTING THE METHOD 有权
标题翻译：管理广告者的方法和执行方法的系统
公开(公告)号：US20080046323A1
公开(公告)日：2008-02-21
申请号：US11838779
申请日：2007-08-14
申请人： Hyo Jeong KIM , In Won Jang
发明人： Hyo Jeong KIM , In Won Jang
IPC分类号： G06Q30/00
CPC分类号： G06Q30/02 , G06Q30/0241 , G06Q30/0242 , G06Q30/0245 , G06Q30/0273 , G06Q30/0277
摘要： A method of managing an advertiser and a system for executing the method are provided. The method of managing the advertiser selectively includes: calculating a master index based on contribution performance data and activity performance data of the advertiser; and assigning a grade of the advertiser depending on the master index.
摘要翻译：提供了一种管理广告商的方法和用于执行该方法的系统。管理广告者的方法选择性地包括：基于广告主的贡献性能数据和活动性能数据来计算主索引; 并根据主索引分配广告客户的成绩。

6. 发明申请

US20080166656A1 Positive Photoresist Composition 有权
标题翻译：正光致抗蚀剂组成
公开(公告)号：US20080166656A1
公开(公告)日：2008-07-10
申请号：US11884185
申请日：2005-12-21
申请人： Bong-Seok Moon , Hyo-Jeong Kim , Jin-Gon Kim , Yang-Hyun Yoo , Min-Ji Kim , Mi-Kyeong Jeong , Kwon-Yil Yoo , Nak-Chil Jung , Seon-Ho Kim
发明人： Bong-Seok Moon , Hyo-Jeong Kim , Jin-Gon Kim , Yang-Hyun Yoo , Min-Ji Kim , Mi-Kyeong Jeong , Kwon-Yil Yoo , Nak-Chil Jung , Seon-Ho Kim
IPC分类号： G03F7/004
CPC分类号： G03F7/0233 , G03F7/0751 , G03F7/40 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an organic solvent. The positive photoresist composition according to the present invention may be useful to form a pattern for an organic insulator of a liquid crystal display, metal patterning, a bump, hole drilling and UV overcoat since it has good basic physical properties such as UV transmittance, film retention, pattern stability, chemical resistance and so on, as well as an excellent heat resistance.
摘要翻译：公开了用于液晶显示器的正性光致抗蚀剂组合物。本发明的正性光致抗蚀剂组合物包含3〜50重量％的具有一定结构的粘合剂树脂，2〜40重量％的光活性化合物和10〜94重量％的有机溶剂。根据本发明的正性光致抗蚀剂组合物可用于形成液晶显示器，金属图案化，凸块，孔钻和UV外涂层的有机绝缘体的图案，因为它具有良好的基本物理性能，例如UV透射率，膜保留，图案稳定性，耐化学性等，以及优异的耐热性。

7. 发明申请

US20110234521A1 METHOD FOR PROVIDING MANUAL OF PORTABLE TERMINAL 审中-公开
标题翻译：提供便携式终端手册的方法
公开(公告)号：US20110234521A1
公开(公告)日：2011-09-29
申请号：US13051409
申请日：2011-03-18
申请人： Hyo-Jeong KIM , Young-Min RYU , Jong-Hwa KIM
发明人： Hyo-Jeong KIM , Young-Min RYU , Jong-Hwa KIM
IPC分类号： G06F3/041 , G09G5/00
CPC分类号： H04M1/72525 , H04M2250/56
摘要： A method for providing a manual of a portable terminal is provided. The method includes requesting a manual of the portable terminal and outputting the manual in the form of a moving image at the request for the manual.
摘要翻译：提供了一种用于提供便携式终端的手册的方法。该方法包括在请求手册时请求便携式终端的手册并以运动图像的形式输出手册。

8. 发明授权

US08349126B2 Apparatus for etching edge of wafer 有权
标题翻译：用于蚀刻晶片边缘的设备
公开(公告)号：US08349126B2
公开(公告)日：2013-01-08
申请号：US12710801
申请日：2010-02-23
申请人： Chong-Kwang Chang , Oh-Sang Cho , In-Keun Lee , Hyo-Jeong Kim
发明人： Chong-Kwang Chang , Oh-Sang Cho , In-Keun Lee , Hyo-Jeong Kim
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67069 , H01J37/32642 , H01L21/02087
摘要： An apparatus for etching an edge of a wafer includes a chamber, a chuck disposed inside the chamber upon which the wafer is disposed, a plate spaced apart from the wafer and disposed above the wafer, and an edge ring formed along the edge of the wafer and combined with an outer periphery of the plate, wherein the edge ring comprises a ring base spaced a distance apart from the wafer to form a parallel plane with respect to the wafer, and a first ring protrusion protruding from the ring base to insulate the edge of the wafer from a central region of the wafer.
摘要翻译：用于蚀刻晶片边缘的装置包括：室，设置在其上设置晶片的室内的卡盘，与晶片间隔开并设置在晶片上方的板，以及沿着晶片边缘形成的边缘环并且与所述板的外周边结合，其中所述边缘环包括与所述晶片隔开一段距离的环形基座，以形成相对于所述晶片的平行平面;以及第一环形突起，其从所述环形基座突出以使所述边缘的晶片从晶片的中心区域。

9. 发明授权

US07987114B2 Method of managing advertisers and system for executing the method 有权
标题翻译：管理广告客户的方法和执行该方法的系统
公开(公告)号：US07987114B2
公开(公告)日：2011-07-26
申请号：US11838779
申请日：2007-08-14
申请人： Hyo Jeong Kim , In Won Jang
发明人： Hyo Jeong Kim , In Won Jang
IPC分类号： G07B15/02
CPC分类号： G06Q30/02 , G06Q30/0241 , G06Q30/0242 , G06Q30/0245 , G06Q30/0273 , G06Q30/0277
摘要： A method of managing an advertiser and a system for executing the method are provided. The method of managing the advertiser selectively includes: calculating a master index based on contribution performance data and activity performance data of the advertiser; and assigning a grade of the advertiser depending on the master index.
摘要翻译：提供了一种管理广告商的方法和用于执行该方法的系统。管理广告者的方法选择性地包括：基于广告主的贡献性能数据和活动性能数据来计算主索引; 并根据主索引分配广告客户的成绩。

10. 发明申请

US20100136790A1 Method of fabricating semiconductor integrated circuit device 有权
标题翻译：制造半导体集成电路器件的方法
公开(公告)号：US20100136790A1
公开(公告)日：2010-06-03
申请号：US12591534
申请日：2009-11-23
申请人： Chong-Kwang Chang , Hong-Jae Shin , Nae-In Lee , Kwang-Hyeon Baik , Seung-Il Bok , Hyo-Jeong Kim
发明人： Chong-Kwang Chang , Hong-Jae Shin , Nae-In Lee , Kwang-Hyeon Baik , Seung-Il Bok , Hyo-Jeong Kim
IPC分类号： H01L21/302
CPC分类号： H01L21/0337
摘要： A method of fabricating a semiconductor integrated circuit device, including providing a semiconductor substrate, sequentially forming an etching target layer and a hard mask layer on the semiconductor substrate, forming first etch masks on the hard mask layer, the first etch masks including a plurality of first line patterns spaced apart from one another at a first pitch and extending in a first direction, forming first hard mask patterns by etching the hard mask layer using the first etch masks, forming second etch masks on the first hard mask patterns, the second etch masks including a plurality of second line patterns spaced apart from one another at a second pitch and extending in a second direction different from the first direction, forming second hard mask patterns by etching the first hard mask patterns using the second etch masks, forming spacers on sidewalls of the second hard mask patterns, and patterning the etching target layer using the second hard mask patterns having the spacers.
摘要翻译：一种制造半导体集成电路器件的方法，包括提供半导体衬底，在半导体衬底上依次形成蚀刻目标层和硬掩模层，在硬掩模层上形成第一蚀刻掩模，第一蚀刻掩模包括多个第一线图案以第一间距彼此间隔开并且沿第一方向延伸，通过使用第一蚀刻掩模蚀刻硬掩模层形成第一硬掩模图案，在第一硬掩模图案上形成第二蚀刻掩模，第二蚀刻掩模，包括以第二间距彼此间隔开并且沿与第一方向不同的第二方向延伸的多个第二线图案，通过使用第二蚀刻掩模蚀刻第一硬掩模图案形成第二硬掩模图案，在第第二硬掩模图案的侧壁，以及使用具有t的第二硬掩模图案来图案化蚀刻目标层他的间隔。

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