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1. 发明授权

US08107073B2 Diffraction order sorting filter for optical metrology 有权
$Diffraction order sorting filter for optical metrology$
标题翻译：用于光学测量的衍射顺序分选滤波器
公开(公告)号：US08107073B2
公开(公告)日：2012-01-31
申请号：US12369905
申请日：2009-02-12
申请人： Adam Norton , Holger Tuitje , Fred Stanke
发明人： Adam Norton , Holger Tuitje , Fred Stanke
IPC分类号： G01J3/28 , G02B1/10
CPC分类号： G01J3/28 , G01B2210/56 , G01J3/02 , G01J3/0229 , G01J3/0297 , G01J3/18 , G02B5/28 , G02B2207/117
摘要： A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.
摘要翻译：公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器，其中在区域关节处的光散射减小。订单分选过滤器包括沉积在下面的光学透明层，或者在分级过滤器区域的薄膜过滤器堆叠的顶部，其中调整光学透明层的厚度，使得在光区域接头在邻近区域接头的区域中基本相等。还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法，其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

2. 发明申请

US20060164632A1 Method and apparatus for position-dependent optical metrology calibration 失效
公开(公告)号：US20060164632A1
公开(公告)日：2006-07-27
申请号：US11364312
申请日：2006-02-28
申请人： Abdurrahman Sezginer , Kenneth Johnson , Adam Norton , Holger Tuitje
发明人： Abdurrahman Sezginer , Kenneth Johnson , Adam Norton , Holger Tuitje
IPC分类号： G01N21/01
CPC分类号： G01N21/9501 , G01N21/274 , G01N21/278 , G01N21/93
摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

3. 发明授权

US5621220A Apparatus for evaluating measuring values 失效
标题翻译：用于评估测量值的装置
公开(公告)号：US5621220A
公开(公告)日：1997-04-15
申请号：US420953
申请日：1995-04-12
申请人： Rudolf Muehlenbein , Karlheinz Schaust , Holger Tuitje
发明人： Rudolf Muehlenbein , Karlheinz Schaust , Holger Tuitje
IPC分类号： G01N21/86 , G01N21/84
CPC分类号： G01N21/86
摘要： An apparatus evaluates measuring values from a laminar material, wherein the laminar material is moving in a single plane in a predetermined direction, the laminar material being moved also being under test. The apparatus comprises a measuring platform which is being moved traverse to a direction of movement of the laminar material. Further, the measuring platform is tiltable about an axis which is normal to a plane of the laminar material, an angle of tilt (a) being determined by a traversing velocity (v.sub.t) of the measuring platform and velocity (v.sub.b) of the predetermined direction of the laminar material. A plurality of separated sensors and radiation emitters are mounted on the measuring platform, and in conjunction with the angle of tilt cause, the measuring valves acquired from the different sensors to be from the same measuring spot of the laminar material.
摘要翻译：一种装置评估来自层状材料的测量值，其中层状材料沿着预定方向在单个平面中移动，被移动的层状材料也被测试。该装置包括测量平台，该测量平台正在移动到层状材料的运动方向。此外，测量平台可围绕垂直于层状材料的平面的轴线倾斜，倾斜角（+ E，acu a + EE）由测量平台的运行速度（vt）和速度（vt）确定 vb）层叠材料的预定方向。多个分离的传感器和辐射发射器安装在测量平台上，并且随着倾斜角度的原因，从不同传感器获取的测量阀来自层叠材料的相同测量点。

4. 发明申请

US20100201981A1 CALIBRATION METHOD FOR OPTICAL METROLOGY 有权
标题翻译：光学计量学校准方法
公开(公告)号：US20100201981A1
公开(公告)日：2010-08-12
申请号：US12369947
申请日：2009-02-12
申请人： Fred STANKE , Adam Norton , Holger Tuitje
发明人： Fred STANKE , Adam Norton , Holger Tuitje
IPC分类号： G01J3/28
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0205 , G01J3/0224 , G01J3/0297 , G01J3/28 , G01J3/2803 , G01J2003/1828 , G01N21/274
摘要： A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.
摘要翻译：公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器，其中在区域关节处的光散射减小。订单分选过滤器包括沉积在下面的光学透明层，或者在分级过滤器区域的薄膜过滤器堆叠的顶部，其中调整光学透明层的厚度，使得在光区域接头在邻近区域接头的区域中基本相等。还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法，其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

5. 发明授权

US07428044B2 Drift compensation for an optical metrology tool 有权
标题翻译：光学计量工具的漂移补偿
公开(公告)号：US07428044B2
公开(公告)日：2008-09-23
申请号：US11601038
申请日：2006-11-16
申请人： Vi Vuong , Yan Chen , Holger Tuitje
发明人： Vi Vuong , Yan Chen , Holger Tuitje
IPC分类号： G01J1/10
CPC分类号： G01B11/24 , G01B21/045 , G01N21/276 , G01N21/4788 , G01N21/93 , G01N21/956
摘要： Drift in an optical metrology tool is compensated for by obtaining a first measured diffraction signal and a second measured diffraction signal of a first calibration structure mounted on the optical metrology tool. The first and second measured diffraction signals were measured using the optical metrology tool. The second measured diffraction signal was measured later in time than the first measured diffraction signal. A first drift function is generated based on the difference between the first and second measured diffraction signals. A third measured diffraction signal is obtained of a first structure formed on a first wafer using the optical metrology tool. A first adjusted diffraction signal is generated by adjusting the third measured diffraction signal using the first drift function.
摘要翻译：通过获得安装在光学计量学工具上的第一校准结构的第一测量衍射信号和第二测量衍射信号来补偿光学测量工具中的漂移。使用光学测量工具测量第一和第二测量的衍射信号。时间上测量的第二测量的衍射信号比第一测量的衍射信号。基于第一和第二测量的衍射信号之间的差异产生第一漂移函数。使用光学测量工具获得在第一晶片上形成的第一结构的第三测量的衍射信号。通过使用第一漂移函数调整第三测量的衍射信号来产生第一调节的衍射信号。

6. 发明申请

US20060146321A1 Method and apparatus for position-dependent optical metrology calibration 有权
公开(公告)号：US20060146321A1
公开(公告)日：2006-07-06
申请号：US11364709
申请日：2006-02-28
申请人： Abdurrahman Sezginer , Kenneth Johnson , Adam Norton , Holger Tuitje
发明人： Abdurrahman Sezginer , Kenneth Johnson , Adam Norton , Holger Tuitje
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/274 , G01N21/278 , G01N21/93
摘要： A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

7. 发明授权

US07446888B2 Matching optical metrology tools using diffraction signals 失效
$Matching optical metrology tools using diffraction signals$
标题翻译：使用衍射信号匹配光学测量工具
公开(公告)号：US07446888B2
公开(公告)日：2008-11-04
申请号：US11438806
申请日：2006-05-22
申请人： Fred Stanke , Holger Tuitje , Shigeru Nagano
发明人： Fred Stanke , Holger Tuitje , Shigeru Nagano
IPC分类号： G01B11/14 , G01B11/00
CPC分类号： G01B11/24 , G03F7/70525 , G03F7/70625
摘要： Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of measured diffraction signals is obtained. The first set of measured diffraction signals was measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of measured diffraction signals is obtained. The second set of diffraction signals was measured using a second optical metrology tool from the fleet of optical metrology tools. A reference diffraction signal is obtained. A first transform is generated based on the first set of measured diffraction signals and the reference diffraction signal. A second transform is generated based on the second set of measured diffraction signals and the reference diffraction signal.
摘要翻译：光学计量工具中的光学计量工具可以使用变换进行匹配。特别地，获得第一组测量的衍射信号。使用来自光学计量学工具的第一光学计量工具测量第一组测量的衍射信号。获得第二组测量的衍射信号。第二组衍射信号使用来自光学计量学工具的第二光学测量工具来测量。得到参考衍射信号。基于第一组测量的衍射信号和参考衍射信号产生第一变换。基于第二组测量的衍射信号和参考衍射信号产生第二变换。

8. 发明授权

US07446887B2 Matching optical metrology tools using hypothetical profiles 失效
标题翻译：使用假设配置文件匹配光学计量工具
公开(公告)号：US07446887B2
公开(公告)日：2008-11-04
申请号：US11438776
申请日：2006-05-22
申请人： Fred Stanke , Holger Tuitje , Shigeru Nagano
发明人： Fred Stanke , Holger Tuitje , Shigeru Nagano
IPC分类号： G01B11/14 , G01B11/00
CPC分类号： G01B11/24 , G03F7/70525 , G03F7/70625
摘要： Optical metrology tools in a fleet of optical metrology tools can be matched using transforms. In particular, a first set of hypothetical profiles of one or more structures is obtained. The first set of hypothetical profiles was determined based on a first set of measured diffraction signals measured using a first optical metrology tool from the fleet of optical metrology tools. A second set of hypothetical profiles of the structure is obtained. The second set of hypothetical profiles was determined based on a second set of measured diffraction signals measured using a second optical metrology tool from the fleet of optical metrology tools. A reference profile is obtained. A first transform is generated based on the first set of hypothetical profiles and the reference profile. A second transform is generated based on the second set of hypothetical profiles and the reference profile. A first hypothetical profile is obtained, where the first hypothetical profile was determined using the first optical metrology tool. A second hypothetical profile is obtained, where the second hypothetical profile was determined using the second optical metrology tool. The first hypothetical profile is transformed into a first transformed hypothetical profile using the first transform. The second hypothetical profile is transformed into a second transformed hypothetical profile using the second transform.
摘要翻译：光学计量工具中的光学计量工具可以使用变换进行匹配。特别地，获得一个或多个结构的第一组假设曲线。基于使用来自光学计量学工具的第一光学测量工具测量的第一组测量的衍射信号来确定第一组假设剖面。获得了结构的第二组假设剖面。基于使用来自光学计量学工具的第二光学测量工具测量的第二组测量的衍射信号来确定第二组假设剖面。获得参考资料。基于第一组假设曲线和参考轮廓来生成第一变换。基于第二组假设曲线和参考轮廓来生成第二变换。获得第一假设曲线，其中使用第一光学测量工具确定第一假设曲线。获得第二假设曲线，其中使用第二光学测量工具确定第二假设曲线。使用第一变换将第一假设轮廓变换为第一变换假设轮廓。使用第二变换将第二假设轮廓变换为第二变换假设轮廓。

9. 发明申请

US20080117437A1 Drift compensation for an optical metrology tool 有权
公开(公告)号：US20080117437A1
公开(公告)日：2008-05-22
申请号：US11601038
申请日：2006-11-16
申请人： Vi Vuong , Yan Chen , Holger Tuitje
发明人： Vi Vuong , Yan Chen , Holger Tuitje
IPC分类号： G01B11/24 , G01J1/10
CPC分类号： G01B11/24 , G01B21/045 , G01N21/276 , G01N21/4788 , G01N21/93 , G01N21/956
摘要： Drift in an optical metrology tool is compensated for by obtaining a first measured diffraction signal and a second measured diffraction signal of a first calibration structure mounted on the optical metrology tool. The first and second measured diffraction signals were measured using the optical metrology tool. The second measured diffraction signal was measured later in time than the first measured diffraction signal. A first drift function is generated based on the difference between the first and second measured diffraction signals. A third measured diffraction signal is obtained of a first structure formed on a first wafer using the optical metrology tool. A first adjusted diffraction signal is generated by adjusting the third measured diffraction signal using the first drift function.

10. 发明申请

US20080117411A1 Matching optical metrology tools using spectra enhancement 失效
标题翻译：使用光谱增强匹配光学测量工具
公开(公告)号：US20080117411A1
公开(公告)日：2008-05-22
申请号：US11601351
申请日：2006-11-16
申请人： Vi Vuong , Yan Chen , Holger Tuitje
发明人： Vi Vuong , Yan Chen , Holger Tuitje
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/274 , G01N21/4788 , G01N21/93
摘要： Optical metrology tools are matched by obtaining a first set of measured diffraction signals, which was measured using a first optical metrology tool, and a second set of measured diffraction signals, which was measured using a second optical metrology tool. A first spectra-shift offset is generated based on the difference between the first set of measured diffraction signals and the second set of measured diffraction signals. A first noise weighting function for the first optical metrology tool is generated based on measured diffraction signals measured using the first optical metrology tool. A first measured diffraction signal measured using the first optical metrology tool is obtained. A first adjusted diffraction signal is generated by adjusting the first measured diffraction signal using the first spectra-shift offset and the first noise weighting function.
摘要翻译：通过获得使用第一光学测量工具测量的第一组测量的衍射信号和使用第二光学测量工具测量的第二组测量的衍射信号来匹配光学测量工具。基于第一组测量的衍射信号和第二组测量的衍射信号之间的差产生第一光谱偏移偏移。基于使用第一光学测量工具测量的测量的衍射信号，产生用于第一光学测量工具的第一噪声加权函数。获得使用第一光学测量工具测量的第一测量衍射信号。通过使用第一光谱移位偏移和第一噪声加权函数调整第一测量的衍射信号来产生第一调节的衍射信号。

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