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1. 发明授权

US08030632B2 Controlling angle of incidence of multiple-beam optical metrology tools 有权
标题翻译：控制多光束光学测量工具的入射角
公开(公告)号：US08030632B2
公开(公告)日：2011-10-04
申请号：US12414637
申请日：2009-03-30
申请人： Adam Norton , Xinkang Tian
发明人： Adam Norton , Xinkang Tian
IPC分类号： G01J4/00
CPC分类号： G01J1/02 , G01J1/0242 , G01J1/04 , G01J1/0411 , G01J1/0414 , G01J1/08 , G01N21/4788
摘要： Provided is a method of controlling multiple beams directed to a structure in a workpiece, the method comprising generating a first illumination beam with a first light source and a second illumination beam with a second light source, projecting the first and second illumination beams onto a separate illumination secondary mirror, reflecting the first and second illumination beams onto an illumination primary mirror, the reflected first and second illumination beams projected onto the structure at a first and second angle of incidence respectively, the reflected first and second illumination beams generating a first and second detection beams respectively. The separate illumination secondary mirror is positioned relative to the illumination primary mirror so as make the first angle of incidence substantially the same or close to a calculated optimum first angle of incidence and make the second angle of incidence substantially the same or close to a calculated optimum second angle of incidence. The first and second detection beams are diffracted off the structure at the corresponding angle of incidence to a detection primary mirror, reflected onto a separate secondary detection mirror and other optical components on the detection path, and onto spectroscopic detectors.
摘要翻译：提供了一种控制指向工件中的结构的多个光束的方法，该方法包括利用第一光源生成具有第一光源的第一照明光束和具有第二光源的第二照明光束，将第一和第二照明光束投射到单独的分别将第一和第二照明光束反射到照明主反射镜上，反射的第一和第二照明光束分别以第一和第二入射角投射到结构上，反射的第一和第二照明光束产生第一和第二照明光束检测光束。分离的照明次级反射镜相对于照明主反射镜定位，使得第一入射角基本上相同或接近于计算出的最佳第一入射角，并使第二入射角基本上相同或接近于计算的最佳第二个入射角。第一和第二检测光束以与检测主反射镜相对应的入射角度从结构衍射，反射到检测路径上的单独的次级检测镜和其它光学部件上，并被分布在光谱检测器上。

2. 发明申请

US20050225767A1 Aperture to reduce sensitivity to sample tilt in small spotsize reflectometers 失效
标题翻译：光圈以减小小点状反射计中样品倾斜的灵敏度
公开(公告)号：US20050225767A1
公开(公告)日：2005-10-13
申请号：US10820903
申请日：2004-04-08
申请人： Adam Norton
发明人： Adam Norton
IPC分类号： G01N21/55 , G01N21/88 , G01N21/95
CPC分类号： G01N21/8806 , G01N21/55 , G01N21/9501 , G01N2201/0642
摘要： An aperture for reducing tilt sensitivity in normal incidence optical metrology is formed to include one or more holes. The aperture is positioned to partially occlude one-half of the pupil of a normal incidence objective. A probe beam is projected to fill the pupil of the objective. The portion of the incident probe beam that passes through the aperture is reduced in cross-sectional profile. As a result, after reflection by the sample, that portion of the probe beam underfills the non-occluded portion of the pupil. The portion of the incident probe beam that passes through the non-occluded portion of the pupil overfills the occluded pupil upon reflect by the sample. The combination of underfilling and overfilling reduces the sensitivity of the objective to tilting of the sample.
摘要翻译：形成用于降低正常入射光学测量中的倾斜灵敏度的孔，以包括一个或多个孔。孔径定位成部分地遮挡法向入射物镜的瞳孔的一半。投影探测光束以填充物镜的光瞳。穿过孔的入射探针光束的部分在横截面轮廓上减小。结果，在样品反射之后，探测光束的该部分底部填充瞳孔的未遮挡部分。入射探测光束穿过瞳孔的未遮挡部分的部分，在被样品反射时，超过填充的瞳孔。填充和过度填充的组合降低了物镜倾斜样品的灵敏度。

3. 发明授权

US08030631B2 Apparatus for controlling angle of incidence of multiple illumination beams 有权
标题翻译：用于控制多个照明光束的入射角的装置
公开(公告)号：US08030631B2
公开(公告)日：2011-10-04
申请号：US12413945
申请日：2009-03-30
申请人： Adam Norton , Xinkang Tian
发明人： Adam Norton , Xinkang Tian
IPC分类号： G01J4/00
CPC分类号： G01J1/04 , G01J1/02 , G01J1/0242 , G01J1/0411 , G01J1/0414 , G01J1/08 , G01N21/4788
摘要： Provided is an apparatus for projecting multiple beams to a structure on a workpiece comprising a first light source generating a first illumination beam and a second light source generating a second illumination beam, an illumination primary mirror configured to reflect the first illumination beam onto the structure of the workpiece at a first angle of incidence, generating a first detection beam, and configured to reflect the second illumination beam onto the workpiece at a second angle of incidence, generating a second detection beam, a separate illumination secondary mirror positioned relative to the illumination primary mirror so as make the first angle of incidence substantially the same or close to a calculated optimum first angle of incidence and make the second angle of incidence substantially the same or close to a calculated optimum second angle of incidence. The first and second detection beams are diffracted off the structure at the corresponding angle of incidence to a detection primary mirror, reflected onto a separate secondary detection mirror and other optical components on the detection path, and onto spectroscopic detectors.
摘要翻译：提供了一种用于将多个光束投影到工件上的结构的装置，包括产生第一照明光束的第一光源和产生第二照明光束的第二光源，照明主反射镜被配置为将第一照明光束反射到所述工件以第一入射角产生第一检测光束，并且被配置为以第二入射角将所述第二照明光束反射到所述工件上，产生第二检测光束，相对于所述照明原色物体定位的分离的照明次级反射镜使得第一入射角基本上相同或接近于计算的最佳第一入射角，并使第二入射角基本上相同或接近于计算出的最佳第二入射角。第一和第二检测光束以与检测主反射镜相对应的入射角度从结构衍射，反射到分离的二次检测镜和检测路径上的其它光学部件上，并分布在光谱检测器上。

4. 发明授权

US07924422B2 Calibration method for optical metrology 有权
标题翻译：光学测量的校准方法
公开(公告)号：US07924422B2
公开(公告)日：2011-04-12
申请号：US12369947
申请日：2009-02-12
申请人： Fred Stanke , Adam Norton , Holger Tuitje
发明人： Fred Stanke , Adam Norton , Holger Tuitje
IPC分类号： G01J3/28
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0205 , G01J3/0224 , G01J3/0297 , G01J3/28 , G01J3/2803 , G01J2003/1828 , G01N21/274
摘要： A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.
摘要翻译：公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器，其中在区域关节处的光散射减小。订单分选过滤器包括沉积在下面的光学透明层，或者在分级过滤器区域的薄膜过滤器堆叠的顶部，其中调整光学透明层的厚度，使得在光区域接头在邻近区域接头的区域中基本相等。还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法，其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

5. 发明申请

US20100202055A1 DIFFRACTION ORDER SORTING FILTER FOR OPTICAL METROLOGY 有权
标题翻译： DIFFRACTION ORDER SORTING SORTING FILTER FOR OPTIM METROLOGY
公开(公告)号：US20100202055A1
公开(公告)日：2010-08-12
申请号：US12369905
申请日：2009-02-12
申请人： Adam NORTON , Holger Tuitje , Fred Stanke
发明人： Adam NORTON , Holger Tuitje , Fred Stanke
IPC分类号： G02B27/44 , G02B27/42
CPC分类号： G01J3/28 , G01B2210/56 , G01J3/02 , G01J3/0229 , G01J3/0297 , G01J3/18 , G02B5/28 , G02B2207/117
摘要： A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.
摘要翻译：公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器，其中在区域关节处的光散射减小。订单分选过滤器包括沉积在下面的光学透明层，或者在分级过滤器区域的薄膜过滤器堆叠的顶部，其中调整光学透明层的厚度，使得在光区域接头在邻近区域接头的区域中基本相等。还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法，其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

6. 发明申请

US20100085576A1 AUTO FOCUS OF A WORKPIECE USING TWO OR MORE FOCUS PARAMETERS 有权
标题翻译：使用两个或更多聚焦参数的工件的自动聚焦
公开(公告)号：US20100085576A1
公开(公告)日：2010-04-08
申请号：US12247867
申请日：2008-10-08
申请人： ADAM NORTON , Xinkang Tian
发明人： ADAM NORTON , Xinkang Tian
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/211 , G01N21/47 , G01N21/55 , G03F9/7026
摘要： Provided is a method for focusing a workpiece in the Z-axis for optical metrology. The auto focusing subsystem includes a focus detector having a tilt angle, a capture range, and a plurality of sensors. A processor coupled to the focus detector is configured to utilize the plurality of focus signals measured using the focus detector to determine two or more focus parameters. The two or more focus parameters and calibration data are used to determine an initial position of the workpiece and to generate instructions to move the workpiece to a best focus position.
摘要翻译：提供了一种用于将工件聚焦在Z轴上用于光学测量的方法。自动聚焦子系统包括具有倾斜角度，捕获范围和多个传感器的聚焦检测器。耦合到焦点检测器的处理器被配置为利用使用焦点检测器测量的多个聚焦信号来确定两个或更多个聚焦参数。使用两个或更多个焦点参数和校准数据来确定工件的初始位置并产生用于将工件移动到最佳对焦位置的指令。

7. 发明授权

US07660696B1 Apparatus for auto focusing a workpiece using two or more focus parameters 有权
标题翻译：用于使用两个或多个聚焦参数自动对焦工件的设备
公开(公告)号：US07660696B1
公开(公告)日：2010-02-09
申请号：US12248015
申请日：2008-10-08
申请人： Adam Norton , Xinkang Tian , Manuel Madriaga
发明人： Adam Norton , Xinkang Tian , Manuel Madriaga
IPC分类号： G06F19/00 , G01N21/00 , H01L21/66
CPC分类号： G01N21/956 , G01N21/9501 , G02B5/18 , G02B27/40
摘要： Provided is an apparatus for auto focusing a workpiece for optical metrology measurements using an optical metrology system. The auto focusing subsystem includes a focus detector having a tilt angle, a capture range, and a plurality of sensors. A processor coupled to the focus detector is configured to utilize the plurality of focus signals measured using the focus detector to determine two or more focus parameters. The two or more focus parameters and calibration data are used to determine an initial position of the workpiece and to generate instructions to move the workpiece to a best focus position. A diffraction signal is measured off a structure on the workpiece using the optical metrology system to determine at least one profile parameter of the structure. The at least one profile parameter is used to modify at least one process variable or equipment setting of a semiconductor fabrication cluster.
摘要翻译：提供了一种用于使用光学测量系统自动聚焦工件用于光学测量测量的装置。自动聚焦子系统包括具有倾斜角度，捕获范围和多个传感器的聚焦检测器。耦合到焦点检测器的处理器被配置为利用使用焦点检测器测量的多个聚焦信号来确定两个或更多个聚焦参数。使用两个或更多个焦点参数和校准数据来确定工件的初始位置并产生用于将工件移动到最佳对焦位置的指令。使用光学测量系统从工件上的结构测量衍射信号，以确定结构的至少一个轮廓参数。所述至少一个轮廓参数用于修改半导体制造集群的至少一个过程变量或设备设置。

8. 发明申请

US20080088840A1 HYPERSPECTRAL IMAGING SYSTEMS 有权
标题翻译：超高速成像系统
公开(公告)号：US20080088840A1
公开(公告)日：2008-04-17
申请号：US11758986
申请日：2007-06-06
申请人： Andrew Bodkin , Andrew Sheinis , Adam Norton
发明人： Andrew Bodkin , Andrew Sheinis , Adam Norton
IPC分类号： G01J3/28
CPC分类号： G01J3/02 , G01J3/0205 , G01J3/0208 , G01J3/021 , G01J3/0229 , G01J3/0235 , G01J3/0256 , G01J3/0262 , G01J3/0286 , G01J3/0294 , G01J3/14 , G01J3/2803 , G01J3/2823 , G01J3/36 , G01J5/061 , G02B3/0056 , G02B3/08 , G02B5/045 , G02B26/0883 , G02B27/1066 , G02B27/123 , G02B27/143
摘要： Hyperspectral imaging systems that may be used for imaging objects in three-dimensions with no moving parts are disclosed. A lenslet array and/or a pinhole array may be used to reimage and divide the field of view into multiple channels. The multiple channels are dispersed into multiple spectral signatures and observed on a two-dimensional focal plane array in real time. The entire hyperspectral datacube is collected simultaneously.
摘要翻译：公开了可用于三维成像对象的高光谱成像系统，没有移动部件。可以使用小透镜阵列和/或针孔阵列来重新成像并将视野划分成多个通道。将多个通道分散到多个光谱特征中，并在二维焦平面阵列上实时观察。同时收集整个高光谱数据库。

9. 发明申请

US20060072109A1 Hyperspectral imaging systems 审中-公开
标题翻译：高光谱成像系统
公开(公告)号：US20060072109A1
公开(公告)日：2006-04-06
申请号：US11220016
申请日：2005-09-06
申请人： Andrew Bodkin , Andrew Sheinis , Adam Norton
发明人： Andrew Bodkin , Andrew Sheinis , Adam Norton
IPC分类号： G01J3/28
CPC分类号： G01J3/02 , G01J3/0205 , G01J3/0208 , G01J3/021 , G01J3/0229 , G01J3/0235 , G01J3/0256 , G01J3/0262 , G01J3/0286 , G01J3/0294 , G01J3/14 , G01J3/2803 , G01J3/2823 , G01J3/36 , G01J5/061 , G02B3/0056 , G02B3/08 , G02B5/045 , G02B26/0883 , G02B27/1066 , G02B27/123 , G02B27/143
摘要： Hyperspectral imaging systems that may be used for imaging objects in three-dimensions with no moving parts are disclosed. A lenslet array and/or a pinhole array may be used to reimage and divide the field of view into multiple channels. The multiple channels are dispersed into multiple spectral signatures and observed on a two-dimensional focal plane array in real time. The entire hyperspectral datacube is collected simultaneously.
摘要翻译：公开了可用于三维成像对象的高光谱成像系统，没有移动部件。可以使用小透镜阵列和/或针孔阵列来重新成像并将视野划分成多个通道。将多个通道分散到多个光谱特征中，并在二维焦平面阵列上实时观察。同时收集整个高光谱数据库。

10. 发明申请

US20050270524A1 Broadband wavelength selective filter 有权
标题翻译：宽带波长选择滤波器
公开(公告)号：US20050270524A1
公开(公告)日：2005-12-08
申请号：US11096448
申请日：2005-04-01
申请人： David Wang , James Hendrix , Adam Norton
发明人： David Wang , James Hendrix , Adam Norton
IPC分类号： G01J3/02 , G01J3/10 , G01J3/12 , G01J3/14 , G01J3/18 , G01J3/28 , G01N21/47 , G01N21/55 , G01N21/95 , G01N21/956
CPC分类号： G01N21/55 , G01J3/02 , G01J3/0229 , G01J3/14 , G01J3/18 , G01J2003/1213 , G01J2003/1282 , G01N21/4788 , G01N21/9501 , G01N21/956
摘要： An optical filter for the selective attenuation of specific wavelengths of light includes at least one spectrally dispersive element, such as a diffraction grating or prism, in combination with an optical filter. A dispersive element separates broadband light into a constituent wavelength spread in angle space. An optical filter, or filter array, can block and/or attenuate specific wavelengths or wavelength ranges of interest while the light is angularly dispersed. A second dispersive element can recombine this filtered, separated wavelength fan of light into a coaxial broadband beam having a smoother intensity profile than the unfiltered beam.
摘要翻译：用于特定波长的光的选择性衰减的滤光器包括与滤光器组合的至少一个光谱色散元件，例如衍射光栅或棱镜。分散元件将宽带光分成在角度空间中扩散的构成波长。光学滤波器或滤波器阵列可以在光被角度地分散时阻挡和/或衰减特定的波长或波长范围。第二分散元件可以将该经过滤波的分离的波长风扇重新组合成具有比未滤波光束更平滑的强度分布的同轴宽带光束。

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