专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20170084365A1 LASER-CONTROLLED OPTICAL TRANSCONDUCTANCE VARISTOR SYSTEM 有权
公开(公告)号：US20170084365A1
公开(公告)日：2017-03-23
申请号：US14642692
申请日：2015-03-09
申请人： Hoang T. Nguyen , Brent C. Stuart
发明人： Hoang T. Nguyen , Brent C. Stuart
IPC分类号： H01C7/00 , H01S5/323 , H01L31/16 , F21V8/00 , H01S5/06 , H01L31/09 , H01S5/42 , H01S5/00
CPC分类号： H01C7/00 , G02B6/0005 , H01L31/09 , H01L31/162 , H01S3/11 , H01S5/0085 , H01S5/0615 , H01S5/06213 , H01S5/32316 , H01S5/4031 , H01S5/423
摘要： An optical transconductance varistor system having a modulated radiation source configured to provide modulated stimulus, a wavelength converter operably connected to the modulated radiation source to produce a modulated stimulus having a predetermined wavelength, and a wide bandgap semiconductor photoconductive material in contact between two electrodes. The photoconductive material is operably coupled, such as by a beam transport module, to receive the modulated stimulus having the predetermined wavelength to control a current flowing through the photoconductive material when a voltage potential is present across the electrodes.

2. 发明授权

US11079543B1 Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency 有权
$Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency$
公开(公告)号：US11079543B1
公开(公告)日：2021-08-03
申请号：US13244033
申请日：2011-09-23
申请人： Jerald A. Britten , Cindy C. Larson , Hoang T. Nguyen
发明人： Jerald A. Britten , Cindy C. Larson , Hoang T. Nguyen
IPC分类号： G02B6/136 , B44C1/22
摘要： A method of fabricating a multilayer dielectric (MLD) diffraction grating by providing a multilayer stack having a grating layer, and anisotropically etching the grating layer to form grating lines having an initial lineheight, an initial linewidth, and an initial grating duty cycle, that are greater than a target lineheight, a target linewidth, and a target grating duty cycle, respectively. An isotropic wet etch solution is then used to etch back the grating lines to the target lineheight, the target linewidth, and the target grating duty cycle so as to minimize electric field intensities and maximize diffraction efficiency for a given set of MLD illumination conditions.

3. 发明授权

US5907436A Multilayer dielectric diffraction gratings 失效
$Multilayer dielectric diffraction gratings$
标题翻译：多层介质衍射光栅
公开(公告)号：US5907436A
公开(公告)日：1999-05-25
申请号：US536874
申请日：1995-09-29
申请人： Michael D. Perry , Jerald A. Britten , Hoang T. Nguyen , Robert Boyd , Bruce W. Shore
发明人： Michael D. Perry , Jerald A. Britten , Hoang T. Nguyen , Robert Boyd , Bruce W. Shore
IPC分类号： G02B5/18 , G03F7/00 , G02B1/10 , G03F9/00
CPC分类号： G03H1/0252 , G02B27/1086 , G02B5/1814 , G02B5/1857 , G02B5/1861 , G02B5/1866 , G03F7/001 , G03H1/0244
摘要： The design and fabrication of dielectric grating structures with high diffraction efficiency used in reflection or transmission is described. By forming a multilayer structure of alternating index dielectric materials and placing a grating structure on top of the multilayer, a diffraction grating of adjustable efficiency, and variable optical bandwidth can be obtained. Diffraction efficiency into the first order in reflection varying between 1 and 98 percent has been achieved by controlling the design of the multilayer and the depth, shape, and material comprising the grooves of the grating structure. Methods for fabricating these gratings without the use of ion etching techniques are described.
摘要翻译：描述了用于反射或透射的具有高衍射效率的介质光栅结构的设计和制造。通过形成交替折射率介电材料的多层结构并将光栅结构放置在多层的顶部上，可以获得可调效率的衍射光栅和可变的光带宽。通过控制多层的设计以及包括光栅结构的凹槽的深度，形状和材料，已经实现了在1至98％之间变化的反射一阶衍射效率。描述了不使用离子蚀刻技术制造这些光栅的方法。

4. 发明授权

US09704622B2 Laser-controlled optical transconductance varistor system 有权
公开(公告)号：US09704622B2
公开(公告)日：2017-07-11
申请号：US14642692
申请日：2015-03-09
申请人： Hoang T. Nguyen , Brent C. Stuart
发明人： Hoang T. Nguyen , Brent C. Stuart
IPC分类号： H01L31/08 , H01C7/00 , H01S5/42 , H01S5/323 , H01S5/00 , F21V8/00 , H01S5/06 , H01L31/09 , H01L31/16
CPC分类号： H01C7/00 , G02B6/0005 , H01L31/09 , H01L31/162 , H01S3/11 , H01S5/0085 , H01S5/0615 , H01S5/06213 , H01S5/32316 , H01S5/4031 , H01S5/423
摘要： An optical transconductance varistor system having a modulated radiation source configured to provide modulated stimulus, a wavelength converter operably connected to the modulated radiation source to produce a modulated stimulus having a predetermined wavelength, and a wide bandgap semiconductor photoconductive material in contact between two electrodes. The photoconductive material is operably coupled, such as by a beam transport module, to receive the modulated stimulus having the predetermined wavelength to control a current flowing through the photoconductive material when a voltage potential is present across the electrodes.

5. 发明申请

US20150187470A1 MULTI-SIDED OPTICAL WAVEGUIDE-FED PHOTOCONDUCTIVE SWITCHES 审中-公开
标题翻译：多平面光波导光电耦合开关
公开(公告)号：US20150187470A1
公开(公告)日：2015-07-02
申请号：US14656628
申请日：2015-03-12
申请人： Stephen E. Sampayan , Hoang T. Nguyen , Scott D. Nelson
发明人： Stephen E. Sampayan , Hoang T. Nguyen , Scott D. Nelson
IPC分类号： H01C7/10 , H01L31/0304 , G02B6/42 , H01L31/028 , H01L31/0296 , H01L31/0232 , H01L31/0312
CPC分类号： H01L31/02327 , G02B6/4295 , H01C7/10 , H01C7/1013 , H01L31/0224 , H01L31/02325 , H01L31/028 , H01L31/0296 , H01L31/03044 , H01L31/0312 , H01L31/08 , H01L31/09
摘要： A photoconductive switch and optical transconductance varistor having a photoconductive region e.g. a wide bandgap semiconductor material substrate between opposing electrodes. An optical waveguide is arranged to surround the photoconductive region for directing conduction-inducing radiation into the photoconductive region. And an optical diffusion element is arranged to diffuse/disperse the radiation prior to entering the optical waveguide and into the substrate, for uniformly illuminating the substrate for conduction.
摘要翻译：具有光电导区域的光导开关和光跨导变阻器相对电极之间的宽带隙半导体材料基板。光波导被布置成围绕光电导区域，用于将导电辐射引导到光电导区域中。并且光扩散元件布置成在进入光波导并进入衬底之前扩散/分散辐射，以均匀地照射衬底以进行导通。

6. 发明申请

US20080047584A1 Method for cleaning diffraction gratings 审中-公开
$Method for cleaning diffraction gratings$
标题翻译：衍射光栅的清洗方法
公开(公告)号：US20080047584A1
公开(公告)日：2008-02-28
申请号：US11895392
申请日：2007-08-23
申请人： Jerald A. Britten , Hoang T. Nguyen
发明人： Jerald A. Britten , Hoang T. Nguyen
IPC分类号： C23G1/02
CPC分类号： G02B27/0006 , G02B5/18
摘要： A method of cleaning a diffraction grating preferably includes exposing the grating surface to an aqueous base to remove an organic photoresist mask thereon; rinsing the grating surface with de-ionized water; oxidizing acid solution (such as Nanostrip™ or Nanostrip™ 2X) to remove metallic contaminants and residue organic compounds; rinsing the grating surface with de-ionized water; exposing the grating surface to an oxygen plasma ashing process using reactive oxygen species to oxidize and remove fluorinated hydrocarbon residue; exposing the grating surface again to an oxidizing acid solution to remove metallic contaminants and residue organic compounds; and rinsing the grating surface with de-ionized water.
摘要翻译：清洁衍射光栅的方法优选包括将光栅表面暴露于水性基底以在其上去除有机光致抗蚀剂掩模; 用去离子水冲洗光栅表面; 氧化酸溶液（例如Nanostrip TM或Nanostrip TM 2X）以除去金属污染物和残留的有机化合物; 用去离子水冲洗光栅表面; 将光栅表面暴露于氧等离子体灰化过程中，使用活性氧来氧化和除去氟化烃残基; 将光栅表面再次暴露于氧化酸溶液以除去金属污染物和残余物有机化合物; 并用去离子水冲洗光栅表面。

7. 发明授权

US06334229B1 Apparatus for cleaning edges of contaminated substrates 有权
标题翻译：用于清洁受污染基材边缘的设备
公开(公告)号：US06334229B1
公开(公告)日：2002-01-01
申请号：US09227272
申请日：1999-01-07
申请人： Mansour Moinpour , Hoang T. Nguyen , Mohsen Salek , Young C. Park , Tom Bramblett , John M. deLarios , Lynn S. Ryle , Donald E. Anderson , Wilbur C. Krusell
发明人： Mansour Moinpour , Hoang T. Nguyen , Mohsen Salek , Young C. Park , Tom Bramblett , John M. deLarios , Lynn S. Ryle , Donald E. Anderson , Wilbur C. Krusell
IPC分类号： B01B1102
CPC分类号： H01L21/67046 , B08B1/04 , G11B23/505 , H01L21/67028 , Y10S134/902
摘要： An apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
摘要翻译：描述了一种用于清洁基板边缘的装置。本发明提供了一种清洁机构，其基于晶片和清洁机构之间的接触点处的摩擦和/或切向速度差来清除晶片边缘的颗粒。

8. 发明授权

US06268586B1 Method and apparatus for improving the quality and efficiency of ultrashort-pulse laser machining 有权
标题翻译：提高超短脉冲激光加工质量和效率的方法和装置
公开(公告)号：US06268586B1
公开(公告)日：2001-07-31
申请号：US09302021
申请日：1999-04-29
申请人： Brent C. Stuart , Hoang T. Nguyen , Michael D. Perry
发明人： Brent C. Stuart , Hoang T. Nguyen , Michael D. Perry
IPC分类号： B23K2638
CPC分类号： B23K26/0624 , B23K26/382 , B23K26/384 , B23K26/40 , B23K2103/30 , B23K2103/36 , B23K2103/42 , B23K2103/50 , B23K2103/52
摘要： A method and apparatus for improving the quality and efficiency of machining of materials with laser pulse durations shorter than 100 picoseconds by orienting and maintaining the polarization of the laser light such that the electric field vector is perpendicular relative to the edges of the material being processed. Its use is any machining operation requiring remote delivery and/or high precision with minimal collateral dames.
摘要翻译：一种用于通过定向和保持激光的偏振使得电场矢量相对于被处理材料的边缘垂直来提高激光脉冲持续时间短于100皮秒的材料的加工质量和效率的方法和装置。其使用是需要远程传送和/或高精度的任何加工操作，最小的抵押品。

9. 发明授权

US5861066A Method and apparatus for cleaning edges of contaminated substrates 失效
标题翻译：清洁受污染基材边缘的方法和设备
公开(公告)号：US5861066A
公开(公告)日：1999-01-19
申请号：US640459
申请日：1996-05-01
申请人： Mansour Moinpour , Hoang T. Nguyen , Mohsen Salek , Young C. Park , Tom Bramblett , John M. deLarios , Lynn S. Ryle , Donald E. Anderson , Wilbur C. Krusell
发明人： Mansour Moinpour , Hoang T. Nguyen , Mohsen Salek , Young C. Park , Tom Bramblett , John M. deLarios , Lynn S. Ryle , Donald E. Anderson , Wilbur C. Krusell
IPC分类号： B08B1/04 , G11B23/50 , H01L21/00 , B08B7/00
CPC分类号： H01L21/67046 , B08B1/04 , H01L21/67028 , G11B23/505 , Y10S134/902
摘要： A method and apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
摘要翻译：描述了用于清洁基板边缘的方法和装置。本发明提供了一种清洁机构，其基于晶片和清洁机构之间的接触点处的摩擦和/或切向速度差来清除晶片边缘的颗粒。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式