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    • 3. 发明授权
    • Magnetooptic device and its driving method
    • 磁光装置及其驱动方法
    • US5173955A
    • 1992-12-22
    • US658328
    • 1991-02-20
    • Masamichi YamanishiHitoshi Oda
    • Masamichi YamanishiHitoshi Oda
    • G02F1/095G11B11/105G11C7/00H01S5/026
    • G11C7/005G02F1/0955G11B11/10584G11B11/10589H01S5/026
    • There is provided a magnetooptic device including a substrate; a semiconductor layer having a quantum well structure formed on the substrate, in which the semiconductor layer is formed by alternately laminating a well layer and a barrier layer and at least the barrier layer in those layers contains magnetic ions; and electrodes to apply an electric field to the semiconductor layer. A light which was polarized in a predetermined direction is input to the semiconductor layer. A magnetic field is applied to the semiconductor layer. An electric field is applied to the semiconductor layer by the electrodes. The light which was transmitted in the semiconductor layer is extracted. A degree of leakage of a wave function of the carrier in the well layer into the barrier layer changes. An effective magnetic field which a carrier spin feels changes by an exchange interaction between the carrier spin and a magnetic moment associated with the magnetic ions. Thus, a degree of magnetooptic effect which is given to the transmission light changes. The degree of manetooptic effect can be controlled by the applied electric field. The magnetooptic device is preferably used as an optical modulator or an optical isolator in the field of optical communications or optical memories.
    • 提供了包括基板的磁光装置; 在衬底上形成有量子阱结构的半导体层,其中半导体层通过交替层叠阱层和阻挡层而形成,并且至少这些层中的势垒层包含磁离子; 以及向半导体层施加电场的电极。 沿预定方向极化的光被输入到半导体层。 对半导体层施加磁场。 通过电极将电场施加到半导体层。 提取在半导体层中透过的光。 阱层中的载流子的波函数的泄漏程度变化。 通过载流子自旋与与磁离子相关的磁矩之间的交换相互作用,载流子自旋感觉到的有效磁场变化。 因此,给予透射光的磁光效应程度改变。 电磁效应的程度可以通过施加的电场来控制。 磁光装置优选地用作光通信或光存储器领域中的光调制器或光隔离器。
    • 9. 发明授权
    • Electron beam apparatus and method of driving the same
    • 电子束装置及其驱动方法
    • US5866988A
    • 1999-02-02
    • US593426
    • 1996-01-29
    • Hitoshi Oda
    • Hitoshi Oda
    • G09G3/20G09G3/22G09G5/393H01J1/316H01J31/12G09G3/10
    • H01J1/316G09G3/22G09G2310/0267G09G2310/0275G09G2340/125G09G3/2011G09G3/2014G09G5/393H01J2329/00
    • An electron beam apparatus comprises an electron-emitting device, an anode separated from the electron-emitting device by a distance H (m), means for applying a voltage Vf (V) to the device, and means for applying a voltage Va (V) to the anode. The device has an electron-emitting region arranged between a lower potential side electroconductive thin film which is connected to a lower potential side electrode and a higher potential side electroconductive thin film which is connected to a higher potential side electrode. The device also has a film containing a semiconductor substance with a thickness not greater than 10 nm. The semiconductor-containing film extends on the higher potential side electroconductive thin film from the electron-emitting region toward the higher potential side electrode over a length L (m). The above Vf, Va, H and L satisfy the relationship L.gtoreq.(1/.pi.).multidot.(Vf/Va).multidot.H.
    • 电子束装置包括电子发射器件,从电子发射器件分离距离H(m)的阳极,用于向器件施加电压Vf(V)的装置,以及用于施加电压Va(V )到阳极。 该器件具有布置在连接到下电位侧电极的下电位侧导电薄膜和连接到较高电位侧电极的较高电位侧导电薄膜之间的电子发射区域。 该器件还具有含有厚度不大于10nm的半导体物质的膜。 含半导体的膜在高电位侧导电薄膜上从电子发射区延伸到高电位侧电极长度L(m)。 上述Vf,Va,H和L满足L> / =(1 / pi)×(Vf / Va)×H的关系。