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1. 发明授权

US08658341B2 Pattern reversal film forming composition and method of forming reversed pattern 有权
标题翻译：图案反转成膜组合物和形成反转图案的方法
公开(公告)号：US08658341B2
公开(公告)日：2014-02-25
申请号：US13266034
申请日：2010-04-21
申请人： Daisuke Maruyama , Hiroaki Yaguchi , Yasushi Sakaida
发明人： Daisuke Maruyama , Hiroaki Yaguchi , Yasushi Sakaida
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/075 , G03F7/11
CPC分类号： G03F7/40
摘要： There is provided to a pattern reversal film forming composition that is capable of forming a pattern reversal film which is not mixed with a resist pattern formed on a substrate, and that is only capable of forming a pattern reversal film advantageously covering the pattern, but also irrespective of whether the resist pattern is coarse or fine, capable of forming a planar film excellent in temporal stability on the pattern. A pattern reversal film forming composition including a polysiloxane, an additive and an organic solvent, characterized in that the polysiloxane is a product of a hydrolysis and/or condensation reaction of a silane compound containing a tetraalkoxysilane of Si(OR1)4 and an alkoxysilane of XnSi(OR2)4-n, and the tetraalkoxysilane is used in a ratio of 1 to 50% by mole based on the number of moles of the whole silane compound; and a pattern reversal film and a method of forming a reversed pattern in which the composition is used.
摘要翻译：提供了能够形成图案反转膜的图案反转膜形成组合物，其不与形成在基底上的抗蚀剂图案混合，并且仅能够形成有利地覆盖图案的图案反转膜，而且无论抗蚀剂图案是粗糙还是微细，都能够形成在图案上的时间稳定性优异的平面膜。一种包含聚硅氧烷，添加剂和有机溶剂的图案反转膜形成组合物，其特征在于所述聚硅氧烷是含有Si（OR 1）4的四烷氧基硅烷和含有Si（OR 1）4）的烷氧基硅烷的硅烷化合物的水解和/或缩合反应的产物， XnSi（OR2）4-n，四烷氧基硅烷的用量相对于全部硅烷化合物的摩尔数为1〜50摩尔％和图案反转膜以及形成其中使用组合物的反转图案的方法。

2. 发明授权

US09165781B2 Composition for forming pattern reversal film and method for forming reversal pattern 有权
标题翻译：用于形成图案反转膜的组合物和形成反转图案的方法
公开(公告)号：US09165781B2
公开(公告)日：2015-10-20
申请号：US14008820
申请日：2012-02-24
申请人： Yasushi Sakaida , Hiroaki Yaguchi
发明人： Yasushi Sakaida , Hiroaki Yaguchi
IPC分类号： H01L21/311 , H01L21/308 , C08G77/20 , C09D183/06 , H01L21/033 , G03F7/075 , G03F7/40 , C08K5/09
CPC分类号： H01L21/3081 , C08G77/20 , C08K5/09 , C09D183/06 , G03F7/0752 , G03F7/405 , H01L21/0337 , Y02P20/582
摘要： There is provided a silicon-containing composition for forming a pattern reversal film that can be reworked by an organic solvent that is normally used for the removal of resist patterns. A composition for forming a pattern reversal film, characterized by comprising: polysiloxane; an additive; and an organic solvent, wherein the polysiloxane has a structural unit of Formula (1) and a structural unit of Formula (2): (where R1 is a C1-8 alkyl group), and (where R2 is an acryloyloxy group or a methacryloyloxy group; and n is an integer of 2 to 4), and the additive is an organic acid having at least two of a carboxy group and/or a hydroxy group; and a pattern reversal film and a method for forming a reversal pattern by use of the composition.
摘要翻译：提供一种用于形成图案反转膜的含硅组合物，其可以通过通常用于除去抗蚀剂图案的有机溶剂进行再加工。一种用于形成图案反转膜的组合物，其特征在于包括：聚硅氧烷; 添加剂和有机溶剂，其中所述聚硅氧烷具有式（1）的结构单元和式（2）的结构单元：（其中R 1是C 1-8烷基）和（其中R 2是丙烯酰氧基或甲基丙烯酰氧基基团; n为2〜4的整数），添加剂为具有羧基和/或羟基中的至少2个的有机酸; 和图案反转膜以及通过使用该组合物形成反转图案的方法。

3. 发明申请

US20140017896A1 COMPOSITION FOR FORMING PATTERN REVERSAL FILM AND METHOD FOR FORMING REVERSAL PATTERN 有权
标题翻译：用于形成图案反转膜的组合物和形成反向图案的方法
公开(公告)号：US20140017896A1
公开(公告)日：2014-01-16
申请号：US14008820
申请日：2012-02-24
申请人： Yasushi Sakaida , Hiroaki Yaguchi
发明人： Yasushi Sakaida , Hiroaki Yaguchi
IPC分类号： H01L21/308
CPC分类号： H01L21/3081 , C08G77/20 , C08K5/09 , C09D183/06 , G03F7/0752 , G03F7/405 , H01L21/0337 , Y02P20/582
摘要： There is provided a silicon-containing composition for forming a pattern reversal film that can be reworked by an organic solvent that is normally used for the removal of resist patterns. A composition for forming a pattern reversal film, characterized by comprising: polysiloxane; an additive; and an organic solvent, wherein the polysiloxane has a structural unit of Formula (1) and a structural unit of Formula (2): (where R1 is a C1-8 alkyl group), and (where R2 is an acryloyloxy group or a methacryloyloxy group; and n is an integer of 2 to 4), and the additive is an organic acid having at least two of a carboxy group and/or a hydroxy group; and a pattern reversal film and a method for forming a reversal pattern by use of the composition.
摘要翻译：提供一种用于形成图案反转膜的含硅组合物，其可以通过通常用于除去抗蚀剂图案的有机溶剂进行再加工。一种用于形成图案反转膜的组合物，其特征在于包括：聚硅氧烷; 添加剂和有机溶剂，其中所述聚硅氧烷具有式（1）的结构单元和式（2）的结构单元：（其中R 1是C 1-8烷基）和（其中R 2是丙烯酰氧基或甲基丙烯酰氧基基团; n为2〜4的整数），添加剂为具有羧基和/或羟基中的至少2个的有机酸; 和图案反转膜以及通过使用该组合物形成反转图案的方法。

4. 发明申请

US20120045899A1 PATTERN REVERSAL FILM FORMING COMPOSITION AND METHOD OF FORMING REVERSED PATTERN 有权
标题翻译：形成反转膜的图案反转膜和形成反转图案的方法
公开(公告)号：US20120045899A1
公开(公告)日：2012-02-23
申请号：US13266034
申请日：2010-04-21
申请人： Daisuke Maruyama , Hiroaki Yaguchi , Yasushi Sakaida
发明人： Daisuke Maruyama , Hiroaki Yaguchi , Yasushi Sakaida
IPC分类号： H01L21/311 , B05D5/00 , B05D3/02 , C09D183/04
CPC分类号： G03F7/40
摘要： There is provided to a pattern reversal film forming composition that is capable of forming a pattern reversal film which is not mixed with a resist pattern formed on a substrate, and that is only capable of forming a pattern reversal film advantageously covering the pattern, but also irrespective of whether the resist pattern is coarse or fine, capable of forming a planar film excellent in temporal stability on the pattern. A pattern reversal film forming composition including a polysiloxane, an additive and an organic solvent, characterized in that the polysiloxane is a product of a hydrolysis and/or condensation reaction of a silane compound containing a tetraalkoxysilane of Si(OR1)4 and an alkoxysilane of XnSi(OR2)4-n, and the tetraalkoxysilane is used in a ratio of 1 to 50% by mole based on the number of moles of the whole silane compound; and a pattern reversal film and a method of forming a reversed pattern in which the composition is used.
摘要翻译：提供了能够形成图案反转膜的图案反转膜形成组合物，其不与形成在基底上的抗蚀剂图案混合，并且仅能够形成有利地覆盖图案的图案反转膜，而且无论抗蚀剂图案是粗糙还是微细，都能够形成在图案上的时间稳定性优异的平面膜。一种包含聚硅氧烷，添加剂和有机溶剂的图案反转膜形成组合物，其特征在于所述聚硅氧烷是含有Si（OR 1）4的四烷氧基硅烷和含有Si（OR 1）4）的烷氧基硅烷的硅烷化合物的水解和/或缩合反应的产物， XnSi（OR2）4-n，四烷氧基硅烷的用量相对于全部硅烷化合物的摩尔数为1〜50摩尔％和图案反转膜以及形成其中使用组合物的反转图案的方法。

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