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1. 发明专利

JP2017081645A １回で後の手間いらず袋审中-公开
公开(公告)号：JP2017081645A
公开(公告)日：2017-05-18
申请号：JP2015223460
申请日：2015-10-27
申请人：秀行山本 , Hideyuki Yamamoto , 秀行山本
发明人： YAMAMOTO HIDEYUKI
IPC分类号： B65D30/10 , B65F1/00 , B65F1/06
摘要：【課題】ごみ出しなどのごみ袋の毎回の取り付けの手間を省略する事を提供する。【解決手段】単一の袋(1)を複数枚入れ重ねた袋(2)に開け口取手(3)を取り付けた物を特長とする。【選択図】図1

2. 发明授权

US09219900B2 Determine video to play with audio 有权
标题翻译：确定视频播放音频
公开(公告)号：US09219900B2
公开(公告)日：2015-12-22
申请号：US14348982
申请日：2011-10-27
申请人： David Paul Billmaier , Jason Christopher Hall , Alexander Charles Barclay , John Max Kellum , Henry Hideyuki Yamamoto
发明人： David Paul Billmaier , Jason Christopher Hall , Alexander Charles Barclay , John Max Kellum , Henry Hideyuki Yamamoto
IPC分类号： H04N5/85 , H04N9/82 , H04N21/472 , H04N21/43 , H04N21/81
CPC分类号： H04N9/8211 , H04N21/4307 , H04N21/472 , H04N21/8106
摘要： Example embodiments disclosed herein relate to determining video to play based on audio. Videos associated with the audio are determined. One of the videos to play with the audio is determined based on analysis.
摘要翻译：本文公开的示例实施例涉及基于音频确定要播放的视频。确定与音频相关联的视频。根据分析确定播放音频的视频之一。

3. 发明授权

US09074378B2 Recyclable formwork 有权
标题翻译：可回收模板
公开(公告)号：US09074378B2
公开(公告)日：2015-07-07
申请号：US14236449
申请日：2012-08-03
申请人： Masahiro Hayasaki , Shigeyuki Nishijima , Hideyuki Yamamoto
发明人： Masahiro Hayasaki , Shigeyuki Nishijima , Hideyuki Yamamoto
IPC分类号： E04G9/05 , E04G9/10 , G01K1/14 , G01K1/02 , E04G9/06 , B28B17/00 , B28B7/42 , E04G9/02
CPC分类号： E04G9/05 , B28B7/42 , B28B17/0063 , E04G9/06 , E04G9/10 , E04G2009/028 , G01K1/024 , G01K1/143
摘要： A recyclable formwork can suitably detect temperature of concrete cast contacting with the formwork in a field without spoiling the other functions of the formwork. The recyclable formwork is provided with: a main unit (1) including a plurality of ribs (3) and (4); a case (7) being housed between the ribs (3) and (4), the case (7) being fixed on a non-contact surface (1a); and a circuit housed in the case (7). A through-hole (16) is opened at a position corresponding to where the case (7) is fixed, the through-hole (16) penetrating the main unit (1) from the non-contact surface (1a) to a contact surface (2). A sensor-housing case (17) is provided with a lower portion of the case (7), the sensor-housing case (17) being inserted into the through-hole (16), a bottom face of the sensor-housing case (17) facing concrete. And, a concrete temperature-detecting sensor (19) for detecting surface temperature of the concrete is housed in the sensor-housing case (17).
摘要翻译：可回收的模板可以适当地检测在一个领域与模板接触的混凝土浇铸温度，而不会破坏模板的其他功能。可回收模板设置有：包括多个肋（3）和（4）的主单元（1）; 壳体（7）容纳在所述肋（3）和（4）之间，所述壳体（7）固定在非接触表面（1a）上; 和容纳在壳体（7）中的电路。在与壳体（7）固定的位置对应的通孔（16）中，从非接触面（1a）穿过主体单元（1）的通孔（16）到接触面（2）。传感器外壳（17）设置有壳体（7）的下部，传感器外壳（17）插入通孔（16）中，传感器外壳的底面 17）面对混凝土。并且，用于检测混凝土的表面温度的混凝土温度检测传感器（19）容纳在传感器外壳（17）中。

4. 发明申请

US20140236704A1 INCENTIVIZED MEDIA DELIVERY BASED ON AN EXTERNAL FACTOR 审中-公开
标题翻译：基于外部因素的激励媒体交付
公开(公告)号：US20140236704A1
公开(公告)日：2014-08-21
申请号：US14351875
申请日：2011-10-27
申请人： Davod Paul Billmaier , Jason Christopher Hall , Alexander Charles Barclay , John Max Kellum , Henry Hideyuki Yamamoto
发明人： Davod Paul Billmaier , Jason Christopher Hall , Alexander Charles Barclay , John Max Kellum , Henry Hideyuki Yamamoto
IPC分类号： G06Q30/02
CPC分类号： G06Q30/0239 , G06Q30/0251 , G06Q50/01
摘要： Various example embodiments relate to incentivized media delivery. In example embodiments, a media delivery device has access to a plurality of media. The device may receive an external factor from each of a plurality of remote devices. In response, the device may select media from the media storage based on the received external factors, notify each remote device of the availability of the media, and provide an incentive for acquisition of the selected media.
摘要翻译：各种示例性实施例涉及激励媒体递送。在示例实施例中，媒体传送设备可以访问多个媒体。设备可以从多个远程设备中的每一个接收外部因素。作为响应，设备可以基于所接收的外部因素从媒体存储器中选择媒体，向每个远程设备通知媒体的可用性，并提供对所选媒体的获取的激励。

5. 发明申请

US20130323343A1 RECYCLABLE FORMWORK 有权
标题翻译：可循环的工作
公开(公告)号：US20130323343A1
公开(公告)日：2013-12-05
申请号：US13993467
申请日：2011-12-15
申请人： Masahiro Hayasaki , Shigeyuki Nishijima , Hideyuki Yamamoto
发明人： Masahiro Hayasaki , Shigeyuki Nishijima , Hideyuki Yamamoto
IPC分类号： E04G9/00
CPC分类号： E04G9/00 , E04G9/02 , E04G9/04 , E04G9/05 , E04G9/10 , E04G17/065 , E04G2009/028
摘要： There is disclosed to provide a recyclable formwork that can add the new function without spoiling the other functions of the recyclable formwork. The recyclable formwork includes: a main unit including a contact surface contacting with cast concrete, a non-contact surface being parallel and opposite to the contact surface, and a plurality of ribs outstanding from the non-contact surface to a side opposite to the non-contact surface and reinforcing the main unit; a case being housed between the plurality of ribs and being fixed on a side of the non-contact surface; and a circuit being stored in the case. A first highest point of the case at the side of the non-contact surface is not higher than a second highest point of upper ends of the plurality of the ribs.
摘要翻译：披露了提供可回收的模板，可以添加新功能，而不会破坏可回收模板的其他功能。可回收模板包括：主体，其包括与浇注混凝土接触的接触表面，与接触表面平行且相对的非接触表面，以及从非接触表面突出到与非接触表面相对的一侧的多个肋接触表面，加强主体; 壳体容纳在所述多个肋之间并固定在所述非接触表面的一侧; 并且存储在该壳体中的电路。在非接触表面侧的情况下的第一最高点不高于多个肋的上端的第二高点。

6. 发明申请

US20120115766A1 DEGREASING COMPOSITION AND PRODUCTION METHOD THEREOF 审中-公开
标题翻译：退火组合物及其生产方法
公开(公告)号：US20120115766A1
公开(公告)日：2012-05-10
申请号：US13375095
申请日：2010-05-31
申请人： Naruhiko Nojima , Yusaku Ishihara , Hideyuki Yamamoto
发明人： Naruhiko Nojima , Yusaku Ishihara , Hideyuki Yamamoto
IPC分类号： C23G1/28
CPC分类号： C23G1/14 , C11D3/201 , C11D7/06 , C11D7/14 , C11D7/261 , C11D7/5022
摘要： As a method for producing a degreasing composition in the form of a slurry, crystallization of the composition during low-temperature storage being suppressed and the composition being used for preparing a cleaning liquid having little environmental impact, provided is a method including a step of obtaining a slurry by mixing a first liquid and a powdery silicate having a particle diameter ranging from 0.2 mm to 10 mm, wherein the first liquid contains an alkaline component composed of at least one of sodium hydroxide and potassium hydroxide, an alcohol having three or fewer carbon atoms, and water; and the degreasing composition contains, with respect to the total composition, 10 mass % to 60 mass % of the alkaline component, 0.1 mass % to 5 mass % of the alcohol, 1 mass % to 50 mass % of the silicate, and 20 mass % to 50 mass % of water including hydration water of the silicate, and contains no chelating agent.
摘要翻译：作为浆料形式的脱脂组合物的制造方法，可以抑制低温保存时的组合物的结晶化和用于制备环境影响小的清洗液的组合物，是包括以下步骤的方法：通过混合第一液体和粒径范围为0.2mm至10mm的粉状硅酸盐的浆料，其中第一液体含有由氢氧化钠和氢氧化钾中的至少一种组成的碱性组分，具有三个或更少碳的醇原子和水; 脱脂组合物相对于总成分含有10质量％〜60质量％的碱成分，0.1质量％〜5质量％的醇，1质量％〜50质量％的硅酸盐和20质量％含水量为50〜50质量％的硅酸盐水合水，不含螯合剂。

7. 发明申请

US20100297783A1 Plasma Processing Method 审中-公开
标题翻译：等离子体处理方法
公开(公告)号：US20100297783A1
公开(公告)日：2010-11-25
申请号：US12849233
申请日：2010-08-03
申请人： Shoji IKUHARA , Daisuke Shiraishi , Hideyuki Yamamoto , Akira Kagoshima , Hiromichi Enami , Yosuke Karashima , Eiji Matsumoto
发明人： Shoji IKUHARA , Daisuke Shiraishi , Hideyuki Yamamoto , Akira Kagoshima , Hiromichi Enami , Yosuke Karashima , Eiji Matsumoto
IPC分类号： H01L21/302
CPC分类号： H01L21/67069 , H01J37/32935 , H01L21/67253
摘要： A method for performing a plasma process using a plasma processing apparatus which includes a vacuum process chamber, an exhaust device, a mass flow controller supplying a process gas, a stage electrode which receives and holds a workpiece by adsorption, a transfer device, and a high-frequency electrical source. The method includes a first step of performing the plasma process for the workpiece in the vacuum process chamber by a corresponding recipe of predetermined recipes, a second step of acquiring apparatus parameters showing the condition of the plasma processing apparatus when a specific recipe of the predetermined recipes is executed to diagnose whether the condition of the plasma processing apparatus is good or not based on the acquired apparatus parameters.
摘要翻译：一种使用等离子体处理装置进行等离子体处理的方法，所述等离子体处理装置包括真空处理室，排气装置，供给处理气体的质量流量控制器，通过吸附接收和保持工件的载物台电极，转印装置和高频电源。该方法包括：通过预定配方的相应配方对真空处理室中的工件进行等离子体处理的第一步骤;获取当预定配方的特定配方时显示等离子体处理装置的状态的装置参数的第二步骤被执行以基于所获取的装置参数来诊断等离子体处理装置的状况是否良好。

8. 发明授权

US07376479B2 Process monitoring device for sample processing apparatus and control method of sample processing apparatus 有权
标题翻译：样品处理装置的过程监控装置和样品处理装置的控制方法
公开(公告)号：US07376479B2
公开(公告)日：2008-05-20
申请号：US11645680
申请日：2006-12-27
申请人： Junichi Tanaka , Hiroyuki Kitsunai , Hideyuki Yamamoto , Shoji Ikuhara , Kazue Takahashi
发明人： Junichi Tanaka , Hiroyuki Kitsunai , Hideyuki Yamamoto , Shoji Ikuhara , Kazue Takahashi
IPC分类号： G06F19/00
CPC分类号： G05B21/02 , G05B19/41875 , G05B23/0221 , G05B2219/32053 , G05B2219/32182 , Y02P90/22
摘要： A plasma processing method for processing a sample by using plasma on a lot unit basis, including: detecting plural kinds of information as monitor data relating to a processing state of the sample, using a plurality of sensors; selecting a detection time range of the monitor data thus detected; converting the monitor data within the selected detection time range into a converted signal; predicting a pattern shape of the sample based on the converted signal; calculating a correction quantity of a processing parameter, for decreasing a deviation between the predicted pattern shape and a standard value; and converting the correction quantity of a processing parameter obtained by the calculating operation when a kind of a next sample of a next lot is different from the sample, thereby to use a converted correction quantity of the processing parameter for a processing of the next sample.
摘要翻译：一种等离子体处理方法，用于通过使用基于批量单位的等离子体处理样品，包括：使用多个传感器检测作为与样品的处理状态有关的监测数据的多种信息; 选择检测到的监视数据的检测时间范围; 将所选择的检测时间范围内的监视数据转换成转换信号; 基于转换的信号预测样本的图案形状; 计算处理参数的校正量，以减小预测图案形状与标准值之间的偏差; 并且当下一个批次的下一个样本的种类与样本不同时，转换通过计算操作获得的处理参数的校正量，从而使用用于下一个样本的处理的转换的处理参数的校正量。

9. 发明申请

US20070217118A1 Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus 失效
标题翻译：蚀刻装置，自偏压测定方法以及蚀刻装置的监视方法
公开(公告)号：US20070217118A1
公开(公告)日：2007-09-20
申请号：US11506791
申请日：2006-08-21
申请人： Shoji Ikuhara , Hideyuki Yamamoto , Daisuke Shiraishi , Akira Kagoshima
发明人： Shoji Ikuhara , Hideyuki Yamamoto , Daisuke Shiraishi , Akira Kagoshima
IPC分类号： H01T23/00
CPC分类号： H01L21/6833 , H02N13/00
摘要： The invention provides a means for estimating a self-bias voltage under arbitrary etching conditions via a simple procedure. The present invention provides a method for measuring self-bias voltage of an etching apparatus comprising an electrostatic chuck mechanism 1 and 10 for chucking a sample 2, a mechanism 13 and 14 for supplying cooling gas 12 to a rear surface of the sample 2 and controlling the pressure thereof, and a means for measuring the relative force of electrostatic chuck of the sample based on the rear surface pressure control status of the sample 2 being processed, wherein the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control of the sample 2 when high-frequency bias power is applied to the sample 2 being processed, and the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control status of the sample when high-frequency bias power is not applied to the sample being processed, and the self-bias voltage is estimated using the acquired forces of electrostatic chuck and the electrostatic chuck voltages corresponding to the two statuses.
摘要翻译：本发明提供了一种用于通过简单的过程在任意蚀刻条件下估计自偏压的装置。本发明提供了一种用于测量蚀刻装置的自偏压的方法，该蚀刻装置包括用于夹持样品2的静电卡盘机构1和10，用于将冷却气体12供应到样品2的后表面的机构13和14，并且控制其压力，以及用于根据正在处理的样品2的背面压力控制状态来测量样品的静电卡盘的相对力的装置，其中样品的静电卡盘的相对力和对应于当对待处理的样品2施加高频偏置功率时，基于样品2的背面压力控制获取静电卡盘的力，并且将样品的静电卡盘与静电卡盘电压的相对力对应于基于高频时样品的背面压力控制状态获取静电卡盘的力 y偏压功率不会被施加到正在处理的样品，并且使用所获取的静电卡盘的力和对应于两种状态的静电卡盘电压来估计自偏压。

10. 发明申请

US20070184562A1 Plasma Processing Method And Plasma Processing Apparatus 失效
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US20070184562A1
公开(公告)日：2007-08-09
申请号：US11696827
申请日：2007-04-05
申请人： Tetsuo ONO , Katsumi Setoguchi , Hideyuki Yamamoto
发明人： Tetsuo ONO , Katsumi Setoguchi , Hideyuki Yamamoto
IPC分类号： H01L21/00 , H01L21/302
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32623 , H01J37/32706 , H01J37/3299 , H01L21/32137 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： A plasma processing method for processing a sample by applying a high-frequency bias power periodically for each one period (T) which is divided along a time axis into a first sub-period (T1) for which feedback control of a CD gain is executed, a second sub-period (T2) for which feedback control of a select ratio is executed, and a third sub-period (T3) for which feedback control of both the CD gain and the select ratio are executed. The applied power is set at a large value in the first sub-period, and a duty ratio T1/T is controlled in accordance with the CD gain. A plurality of samples are processed with preset process conditions, and feedback control for each processing unit of the samples is executed in accordance with a processing state of each of the samples so that an average applied power over the one period (T) is constant.
摘要翻译：一种等离子体处理方法，用于通过对沿着时间轴分割的每个周期（T）周期性地施加高频偏置功率来对CD增益的反馈控制的第一子周期（T 1）为执行选择比率的反馈控制的第二子时段（T 2）和执行CD增益和选择比率的反馈控制的第三子时段（T 3）。所施加的功率在第一子周期中被设置为大的值，并且根据CD增益来控制占空比T 1 / T。以预设的处理条件处理多个样本，并且根据每个样本的处理状态执行样本的每个处理单元的反馈控制，使得在一个周期（T）的平均施加功率是恒定的。

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