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1. 发明授权

US07738940B2 Medical image recording system 有权
标题翻译：医学影像记录系统
公开(公告)号：US07738940B2
公开(公告)日：2010-06-15
申请号：US10830803
申请日：2004-04-23
申请人： Hideyuki Shoji , Mutsumi Ohshima , Yoshitaka Miyoshi , Tomohiko Oda , Nobuyasu Ito , Tadao Eto , Toshiro Ijichi , Katsuyoshi Ishibashi , Masashi Kikkawa , Kazutaka Nakatsuchi
发明人： Hideyuki Shoji , Mutsumi Ohshima , Yoshitaka Miyoshi , Tomohiko Oda , Nobuyasu Ito , Tadao Eto , Toshiro Ijichi , Katsuyoshi Ishibashi , Masashi Kikkawa , Kazutaka Nakatsuchi
IPC分类号： A61B5/05
CPC分类号： G06F19/321 , A61B1/042 , G01N23/04 , G06F19/00 , G06Q50/24
摘要： A medical image recording system easily obtains information of a device, etc. used at the time of an examination without conscious effort on operator's part, and records image information and the device information, which are obtained at the time of the examination, by making a 1-to-1 association between them. The system comprises at least an image information obtaining unit obtaining an observation image at the time of an examination for a medical treatment, a device information obtaining unit obtaining information of a device used at the time of the examination, and a recording unit recording information composing of the image information obtained by the image information obtaining unit and the device information obtained by the device information obtaining unit, as one associated information.
摘要翻译：医疗图像记录系统容易地获得在检查时使用的装置等的信息，而不需要对操作者的部分进行意识的努力，并记录在检查时获得的图像信息和装置信息，它们之间的1对1关联。该系统至少包括获取医疗检查时的观察图像的图像信息获取单元，获取检查时使用的装置的信息的装置信息获取单元和记录单元记录信息由图像信息获取单元获得的图像信息和由设备信息获取单元获得的设备信息作为一个关联信息。

2. 发明授权

US07667592B2 Operation system and method of notifying system operation information of same 有权
标题翻译：通知系统操作信息的操作系统和方法
公开(公告)号：US07667592B2
公开(公告)日：2010-02-23
申请号：US11811798
申请日：2007-06-12
申请人： Masahide Ohyama , Hideyuki Shoji , Sumihiro Uchimura , Masanori Gocho , Takashi Mihori , Shinji Hatta , Mitsumasa Okada , Makoto Inaba , Masakazu Gotanda , Yoshitaka Honda
发明人： Masahide Ohyama , Hideyuki Shoji , Sumihiro Uchimura , Masanori Gocho , Takashi Mihori , Shinji Hatta , Mitsumasa Okada , Makoto Inaba , Masakazu Gotanda , Yoshitaka Honda
IPC分类号： G08B1/08 , G08B13/14 , A61B1/04
CPC分类号： A61B1/045 , A61B17/00234 , A61B17/320092 , A61B18/1402 , A61B18/1445 , A61B34/10 , A61B90/90 , A61B90/98 , A61B2017/00199 , A61B2017/00221 , A61B2018/00988 , A61B2018/1407 , A61B2018/1422 , G06F19/00 , G06F19/321 , G06F19/3481 , G16H40/63
摘要： A treatment instrument output data analysis section includes a probe ID extraction section, an output waveform extraction section, a data analysis section and an analysis result output section. The analysis result output section of the treatment instrument output data analysis section can display on a centralized display panel a synthetic image made by synthesizing a frame image stored in an image storage section of an endoscopic camera apparatus and an analysis result analyzed by the data analysis section.
摘要翻译：治疗仪器输出数据分析部分包括探针ID提取部分，输出波形提取部分，数据分析部分和分析结果输出部分。处理仪器输出数据分析部分的分析结果输出部分可以在集中显示面板上显示通过合成存储在内窥镜照相机装置的图像存储部分中的帧图像和由数据分析部分析的分析结果而形成的合成图像。

3. 发明授权

US5853602A Method of dry etching for patterning refractory metal layer improved in etching rate, anisotropy and selectivity to silicon oxide 失效
$Method of dry etching for patterning refractory metal layer improved in etching rate, anisotropy and selectivity to silicon oxide$
标题翻译：用于图案化难熔金属层的干蚀刻方法提高了蚀刻速率，各向异性和对氧化硅的选择性
公开(公告)号：US5853602A
公开(公告)日：1998-12-29
申请号：US799883
申请日：1997-02-13
申请人： Hideyuki Shoji
发明人： Hideyuki Shoji
IPC分类号： C23F4/00 , H01L21/28 , H01L21/302 , H01L21/3065 , H01L21/3205 , H01L21/3213 , H01L23/52 , C23F1/12
CPC分类号： H01L21/32136 , Y10S438/963
摘要： A refractory metal layer on a silicon oxide layer is exposed to gaseous etchant containing SF.sub.6, Cl.sub.2 and CO so as to be patterned; F radical and Cl radical effectively etch the refractory metal, and a reaction product of CO gas does not allow the dry etching to sidewardly proceed so that the dry etching achieves good anisotropy, a large etching rate and a large selectivity to silicon oxide.
摘要翻译：将氧化硅层上的难熔金属层暴露于含有SF6，Cl2和CO的气态蚀刻剂上以进行图案化; F自由基和Cl基团有效地蚀刻难熔金属，并且CO气体的反应产物不允许干蚀刻侧向进行，使得干蚀刻实现良好的各向异性，大的蚀刻速率和对氧化硅的大选择性。

4. 发明授权

US5196928A Endoscope system for simultaneously displaying two endoscopic images on a shared monitor 失效
标题翻译：内窥镜系统，用于在共享监视器上同时显示两个内窥镜图像
公开(公告)号：US5196928A
公开(公告)日：1993-03-23
申请号：US828744
申请日：1992-01-31
申请人： Isamu Karasawa , Yasuyuki Kaneko , Masahiko Hamano , Kazufumi Takamizawa , Matsumi Oshima , Hideyuki Shoji , Ken-ya Inomata , Atsushi Amano , Toshiaki Nishikori , Akira Osawa
发明人： Isamu Karasawa , Yasuyuki Kaneko , Masahiko Hamano , Kazufumi Takamizawa , Matsumi Oshima , Hideyuki Shoji , Ken-ya Inomata , Atsushi Amano , Toshiaki Nishikori , Akira Osawa
IPC分类号： A61B1/04 , G02B23/24 , G02B23/26 , G06T7/00
CPC分类号： A61B1/0005 , A61B1/04
摘要： An endoscope system comprises first and second endoscopes each of which includes an elongated insertion tube and an imaging device, a light source for supplying illumination light to the endoscopes, a function for processing a signal originating from one of the imaging devices, and a video processor which mixes the signal with at least a signal sent from an external input terminal and outputs a given video signal corresponding to the first and second endoscopic images. The video signal provided by the video processor is output to a shared monitor, thus displaying two endoscopic images simultaneously.
摘要翻译：一种内窥镜系统，包括第一和第二内窥镜，每个内窥镜包括细长的插入管和成像装置，用于向内窥镜提供照明光的光源，用于处理来自成像装置中的一个的信号的功能，以及视频处理器其将信号与至少从外部输入端子发送的信号混合并输出与第一和第二内窥镜图像相对应的给定视频信号。由视频处理器提供的视频信号被输出到共享监视器，从而同时显示两个内窥镜图像。

5. 发明授权

US6143125A Apparatus and method for dry etching 失效
标题翻译：用于干蚀刻的设备和方法
公开(公告)号：US6143125A
公开(公告)日：2000-11-07
申请号：US924282
申请日：1997-09-05
申请人： Hideyuki Shoji
发明人： Hideyuki Shoji
IPC分类号： H01L21/302 , H01J37/32 , H01L21/3065 , H01L21/311 , C23C16/00
CPC分类号： H01J37/32963 , H01J37/32559 , H01L21/31116 , H01J2237/022 , H01J2237/2001
摘要： There is provided an apparatus for carrying out dry etching, including (a) an etching chamber, (b) a pair of electrodes disposed in the etching chamber in facing relation, an object to be etched being placed on one of the electrodes, (c) a plate mounted on the other of the electrodes, the plate being formed with a plurality through-holes, and (d) a pair of enclosures each mounted on each of the electrodes and extending towards the opponent to define a spatial space therebetween in which plasma is generated by introducing a reactive gas thereinto through the through-holes. The enclosures are designed to have a gap therebetween. Both the plate and the enclosures are made of material other than aluminum. The reactive gas is composed only of CF.sub.4. Since nothing other than the object is exposed to plasma, it is possible to prevent generation of particles.
摘要翻译：提供了一种用于进行干法蚀刻的装置，包括：（a）蚀刻室，（b）以蚀刻室的方式设置的一对电极，待蚀刻的物体放置在一个电极上（c ）安装在另一个电极上的板，所述板形成有多个通孔，以及（d）一对壳体，每个壳体安装在每个电极上并朝着对手延伸以限定其间的空间空间，其中通过将反应性气体引入到通孔中而产生等离子体。外壳设计成在它们之间具有间隙。板和外壳均由铝以外的材料制成。反应气体仅由CF4组成。由于除了对象之外的任何物体都暴露于等离子体，因此可以防止颗粒的产生。

6. 发明授权

US5928965A Method for dry-etching of silicon substrate 失效
标题翻译：硅衬底的干蚀刻方法
公开(公告)号：US5928965A
公开(公告)日：1999-07-27
申请号：US909263
申请日：1997-08-11
申请人： Hideyuki Shoji , Takakazu Kusuki
发明人： Hideyuki Shoji , Takakazu Kusuki
IPC分类号： C23F4/00 , H01L21/302 , H01L21/3065 , H01L21/308 , H01L21/76 , H01L21/00
CPC分类号： H01L21/3065 , H01L21/3086
摘要： A method for dry-etching a silicon substrate by the use of a mask selectively formed on the silicon substrate, in which method a reaction product of dry etching is deposited, during dry etching, in a uniform thickness on the side wall of each groove formed in the silicon substrate by dry etching. In the inventive method, etching is conducted by using, as an etching gas, a mixed gas containing Cl.sub.2, HBr, O.sub.2 and He or a mixed gas contained Cl.sub.2, HBr and CO, under the conditions of an etching pressure of 0.02-0.05 Torr, a RF power density of 1.01-1.64 W/cm.sup.2 and a substrate temperature of 40-50.degree. C. With this method, the tapered sectional shape of each groove formed in the silicon substrate can be controlled easily and etching can be conducted at high reproducibility.
摘要翻译：通过使用在硅衬底上选择性地形成的掩模（其中沉积有干蚀刻的反应产物）在干蚀刻中以均匀的厚度在形成的每个凹槽的侧壁上的厚度均匀地蚀刻硅衬底的方法在硅衬底中通过干蚀刻。在本发明的方法中，在蚀刻压力为0.02-0.05乇的条件下，使用含有Cl 2，HBr，O 2和He的混合气体或包含Cl 2，HBr和CO的混合气体作为蚀刻气体进行蚀刻，RF功率密度为1.01-1.64W / cm 2，基板温度为40〜50℃。通过这种方法，可以容易地控制形成在硅基板中的各槽的锥形截面形状，并且可以在高温下进行蚀刻重现性。

7. 发明授权

US5858874A Method of fabricating semiconductor device having step of forming plug in contact hole 失效
标题翻译：制造具有在接触孔中形成插头的步骤的半导体器件的方法
公开(公告)号：US5858874A
公开(公告)日：1999-01-12
申请号：US831597
申请日：1997-04-10
申请人： Hideyuki Shoji
发明人： Hideyuki Shoji
IPC分类号： H01L21/28 , H01L21/3205 , H01L21/768 , H01L23/52 , H01L23/522 , H01L21/4763
CPC分类号： H01L21/76877 , H01L23/5226 , H01L2924/0002
摘要： A method of fabricating a semiconductor device includes the steps of forming an inter-layer insulating film, forming a contact hole in the inter-layer insulating film, forming a thin conductive film filling the contact hole and covering the inter-layer insulating film, and forming a contact plug filling the contact hole by etching the thin conductive film and thus exposing the surface of the inter-layer insulating film. The etching is conducted such that, from the time when a surface of the inter-layer insulating film is about to be exposed, the thin conductive film and the inter-layer insulating film are etched under substantially the same etching speed. Plug loss in the contact hole is suppressed so that wiring breakage in the contact hole can be prevented.
摘要翻译：制造半导体器件的方法包括以下步骤：形成层间绝缘膜，在层间绝缘膜中形成接触孔，形成填充接触孔并覆盖层间绝缘膜的薄导电膜，以及通过蚀刻薄导电膜形成接触孔，从而暴露层间绝缘膜的表面。进行蚀刻，使得从层间绝缘膜的表面即将暴露出来的时刻，以基本上相同的蚀刻速度蚀刻薄导电膜和层间绝缘膜。抑制接触孔中的插头损耗，能够防止接触孔中的接线断线。

8. 发明授权

US5622528A Endoscope examination system for processing endoscope picture image 失效
标题翻译：用于内窥镜图像处理的内窥镜检查系统
公开(公告)号：US5622528A
公开(公告)日：1997-04-22
申请号：US347223
申请日：1994-11-23
申请人： Masahiko Hamano , Yasuyuki Kaneko , Atsushi Amano , Kazufumi Takamizawa , Hideyuki Shoji , Toshiaki Nishikori , Mutsumi Oshima , Ken-ya Inomata
发明人： Masahiko Hamano , Yasuyuki Kaneko , Atsushi Amano , Kazufumi Takamizawa , Hideyuki Shoji , Toshiaki Nishikori , Mutsumi Oshima , Ken-ya Inomata
IPC分类号： A61B1/00 , A61B1/04 , A61B5/00 , G02B23/24 , G06F3/14 , G06F13/00 , H04N5/225 , H04N5/765 , H04N7/18 , A61B1/045
CPC分类号： G06F3/14 , H04N7/18 , G06F3/1423 , H04N2005/2255 , H04N5/765
摘要： An endoscope examination system of the present invention consisting of a centralized controlling apparatus, a plurality of auxiliary functioning apparatuses and a plurality of workstations. The centralized controlling apparatus comprises a computer which controls each of the auxiliary apparatuses or the like and a switching apparatus which controls a changeover of picture image information transmitted to the auxiliary functioning apparatuses. The plurality of auxiliary functioning apparatuses comprise a computer which exchanges control information with the computer of the centralized controlling apparatus and with the workstations, a switching apparatus which exchanges picture image information with the switching apparatus of the centralized controlling apparatus and with the workstations, and a VTR which records the picture image information. The workstations are provided with a computer which exchanges control information with the computer of the auxiliary functioning apparatuses or of the centralized controlling apparatus and a switching apparatus which exchanges picture image information with the switching apparatus of the auxiliary functioning apparatuses or of the centralized controlling apparatus.
摘要翻译：一种由集中控制装置，多个辅助功能装置和多个工作站组成的本发明的内窥镜检查系统。集中控制装置包括控制每个辅助装置等的计算机和控制向辅助功能装置发送的图像信息的切换的切换装置。多个辅助功能装置包括与集中控制装置的计算机和工作站交换控制信息的计算机，与集中控制装置和工作站的切换装置交换图像信息的切换装置，以及记录图像信息的VTR。工作站设置有与辅助功能装置的计算机或集中控制装置交换控制信息的计算机，以及与辅助功能装置或集中控制装置的切换装置交换图像信息的切换装置。

9. 发明授权

US4634953A Electronic equipment with solar cell 失效
标题翻译：带太阳能电池的电子设备
公开(公告)号：US4634953A
公开(公告)日：1987-01-06
申请号：US724528
申请日：1985-04-18
申请人： Hideyuki Shoji , Kazufumi Usui
发明人： Hideyuki Shoji , Kazufumi Usui
IPC分类号： G04C10/02 , H02J9/00
CPC分类号： G04C10/02 , Y10S136/293 , Y10T307/615
摘要： An output voltage of a solar cell is supplied to a voltage converter. The voltage converter converts the input voltage into a predetermined voltage, and supplies it to a capacitor. The capacitor is charged by the output current of the voltage converter. The capacitor has a relatively large capacitance. A second voltage converter converts an input voltage from the capacitor into a voltage which is lower than the charged voltage of the capacitor and higher than a minimum operating voltage of a load. The load performs a predetermined operation using the output voltage of the second voltage converter.
摘要翻译：太阳能电池的输出电压被提供给电压转换器。电压转换器将输入电压转换成预定电压，并将其提供给电容器。电容器由电压转换器的输出电流充电。电容器具有相对较大的电容。第二电压转换器将来自电容器的输入电压转换成低于电容器的充电电压并高于负载的最小工作电压的电压。负载使用第二电压转换器的输出电压来执行预定的操作。

10. 发明授权

US4616262A Method and apparatus for forming a combined image signal 失效
标题翻译：用于形成组合图像信号的方法和装置
公开(公告)号：US4616262A
公开(公告)日：1986-10-07
申请号：US551100
申请日：1983-11-14
申请人： Wataru Toriumi , Hideyuki Shoji , Yoshihiko Inoue , Soji Shiba , Yasuhiko Ushio
发明人： Wataru Toriumi , Hideyuki Shoji , Yoshihiko Inoue , Soji Shiba , Yasuhiko Ushio
IPC分类号： H04N5/262 , H04N5/22
CPC分类号： H04N5/2622
摘要： A process and an apparatus for forming a combined image signal from a plurality of image signals representative of a plurality of images to be combined are disclosed. One of the image signals representative of one of the neighboring images with respect to its image density within a predetermined distance from an interface between said neighboring images is modified so that the image density is gradually varied from the predetermined distance toward the interface at a desired rate of variation.
摘要翻译：公开了一种用于从表示要组合的多个图像的多个图像信号形成组合图像信号的处理和装置。相对于其相邻图像之间的界面的预定距离内的图像浓度的代表相邻图像之一的图像信号中的一个被修改，使得图像浓度以期望的速率从预定距离朝向界面逐渐变化的变化。

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