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    • 4. 发明授权
    • Display device and method of manufacturing the display device
    • 显示装置及其制造方法
    • US08958138B2
    • 2015-02-17
    • US13483095
    • 2012-05-30
    • Hidekazu NittaMakoto OhkuraTakuo KaitohKatsumi Matsumoto
    • Hidekazu NittaMakoto OhkuraTakuo KaitohKatsumi Matsumoto
    • G02B26/02G02B26/08B81B3/00
    • G02B26/085B81B3/0072B81B2201/045B81C2201/0167
    • In a movable shutter-system display device, a movable shutter includes an amorphous silicon film material which has a low residual stress and thus is stable. A display device includes a display panel comprising a first substrate and a second substrate. The display panel includes a plurality of pixels; each of the plurality of pixels includes a movable shutter including amorphous silicon and a driving circuit for driving the movable shutter; and the amorphous silicon included in the movable shutter is formed of at least two amorphous silicon films, and where any two amorphous silicon films adjacent to each other among the at least two amorphous silicon films are a first amorphous silicon film and a second amorphous silicon film stacked on the first amorphous silicon film, the first amorphous silicon film and the second amorphous silicon film have different characteristic values.
    • 在可移动快门系统显示装置中,可移动遮板包括具有低残余应力并因此是稳定的非晶硅膜材料。 显示装置包括:显示面板,包括第一基板和第二基板。 显示面板包括多个像素; 所述多个像素中的每一个包括可移动快门,其包括非晶硅和用于驱动所述活动快门的驱动电路; 并且包括在可移动快门中的非晶硅由至少两个非晶硅膜形成,并且其中在所述至少两个非晶硅膜中彼此相邻的两个非晶硅膜是第一非晶硅膜和第二非晶硅膜 堆叠在第一非晶硅膜上,第一非晶硅膜和第二非晶硅膜具有不同的特性值。
    • 6. 发明申请
    • DISPLAY DEVICE AND METHOD OF MANUFACTURING THE DISPLAY DEVICE
    • 显示装置和制造显示装置的方法
    • US20120307334A1
    • 2012-12-06
    • US13483095
    • 2012-05-30
    • Hidekazu NITTAMakoto OhkuraTakuo KaitohKatsumi Matsumoto
    • Hidekazu NITTAMakoto OhkuraTakuo KaitohKatsumi Matsumoto
    • G02B26/02H01L33/08
    • G02B26/085B81B3/0072B81B2201/045B81C2201/0167
    • In a movable shutter-system display device, a movable shutter includes an amorphous silicon film material which has a low residual stress and thus is stable. A display device includes a display panel comprising a first substrate and a second substrate. The display panel includes a plurality of pixels; each of the plurality of pixels includes a movable shutter including amorphous silicon and a driving circuit for driving the movable shutter; and the amorphous silicon included in the movable shutter is formed of at least two amorphous silicon films, and where any two amorphous silicon films adjacent to each other among the at least two amorphous silicon films are a first amorphous silicon film and a second amorphous silicon film stacked on the first amorphous silicon film, the first amorphous silicon film and the second amorphous silicon film have different characteristic values.
    • 在可移动快门系统显示装置中,可移动遮板包括具有低残余应力并因此是稳定的非晶硅膜材料。 显示装置包括:显示面板,包括第一基板和第二基板。 显示面板包括多个像素; 所述多个像素中的每一个包括可移动快门,其包括非晶硅和用于驱动所述活动快门的驱动电路; 并且包括在可移动快门中的非晶硅由至少两个非晶硅膜形成,并且其中在至少两个非晶硅膜中彼此相邻的两个非晶硅膜是第一非晶硅膜和第二非晶硅膜 堆叠在第一非晶硅膜上,第一非晶硅膜和第二非晶硅膜具有不同的特性值。
    • 10. 发明申请
    • DISPLAY DEVICE
    • 显示设备
    • US20120300279A1
    • 2012-11-29
    • US13478158
    • 2012-05-23
    • Takahiko MUNEYOSHIHidekazu NITTA
    • Takahiko MUNEYOSHIHidekazu NITTA
    • G02B26/02
    • G02B26/04G02B26/023G09G3/346
    • The display device includes: an insulating substrate section that is a substrate having an insulation property; a thin film transistor section in which a thin film transistor is formed in each pixel on the insulating substrate section; a shutter mechanism section that is electrically driven by the thin film transistor of the thin film transistor section so as to control light transmission of each pixel. The shutter mechanism section has a mechanical layer that is a structural portion and a conductive layer that is formed on the mechanical layer. Both of the mechanical layer and the conductive layer are fixed in direct contact with the conductive portion formed on the thin film transistor section.
    • 显示装置包括:作为具有绝缘性的基板的绝缘基板部; 薄膜晶体管部分,其中在绝缘基板部分上的每个像素中形成薄膜晶体管; 由薄膜晶体管部分的薄膜晶体管电驱动以控制每个像素的透光的快门机构部分。 快门机构部分具有作为结构部分的机械层和形成在机械层上的导电层。 机械层和导电层都与形成在薄膜晶体管部分上的导电部分直接接触地固定。