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1. 发明申请

US20090148695A1 OPTICAL ELEMENT FOR X-RAY 审中-公开
标题翻译：用于X射线的光学元件
公开(公告)号：US20090148695A1
公开(公告)日：2009-06-11
申请号：US12326504
申请日：2008-12-02
申请人： Takayuki Miura , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Seiken Matsumoto , Kyoko Nagata , Shumpei Tatsumi , Shinji Fukui
发明人： Takayuki Miura , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Seiken Matsumoto , Kyoko Nagata , Shumpei Tatsumi , Shinji Fukui
IPC分类号： B32B5/00
CPC分类号： G21K1/062 , B82Y10/00 , G21K2201/067 , Y10T428/26
摘要： An optical element for X-ray includes a substrate, a first multilayer film having a reflection property with respect to light in a soft X-ray wavelength range, and a second multilayer film, disposed between the substrate and the first multilayer film, for reducing film stress of the first multilayer film. The second multilayer film has a periodic structure having a unit period film thickness which is 90% or more and less than 110% of a two or more integral multiple of 7 nm.
摘要翻译：用于X射线的光学元件包括基板，具有相对于软X射线波长范围内的光的反射特性的第一多层膜和设置在基板和第一多层膜之间的第二多层膜，用于还原第一层多层薄膜的薄膜应力。第二多层膜具有单位周期膜厚度为7nm以上2倍以上的整数倍的90％以上且小于110％的周期性结构。

2. 发明授权

US07041391B2 Method for forming thin films 失效
公开(公告)号：US07041391B2
公开(公告)日：2006-05-09
申请号：US10101412
申请日：2002-03-20
申请人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： B32B9/04
CPC分类号： C23C14/081 , C23C14/0057
摘要： The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms.The thin film of aluminum oxide according to the present invention has little optical absorption and high refractive index in the ultraviolet and vacuum ultraviolet regions.

3. 发明申请

US20090252977A1 MULTILAYER FILM REFLECTOR 审中-公开
标题翻译：多层膜反射器
公开(公告)号：US20090252977A1
公开(公告)日：2009-10-08
申请号：US12416544
申请日：2009-04-01
申请人： Seiken Matsumoto , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Takayuki Miura , Kyoko Nagata
发明人： Seiken Matsumoto , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Takayuki Miura , Kyoko Nagata
IPC分类号： B32B15/04
CPC分类号： B82Y10/00 , G02B5/0891 , G21K1/062 , G21K2201/067
摘要： A stress distribution resulting from variation in in-plane film quality of a stress relaxation layer and a reflective layer is eliminated. A reflective layer is stacked on a substrate via a stress relaxation layer. The stress relaxation layer has a stress relaxation portion having a uniform film thickness distribution to cancel the internal stress of the reflective layer, and a stress distribution eliminating portion with a film thickness distribution approximated to a second order even function. The stress is substantially proportional to the film thickness. Thus, formation of a given film thickness distribution allows the stress distribution to be controlled. However, changing the film thickness distribution based on a design value may degrade the optical characteristics. Thus, the film thickness distribution of the stress distribution eliminating portion, which serves to eliminate the stress distribution, is approximated to the second order even function. This enables aberration associated with the film thickness distribution to be reduced by adjusting an optical system.
摘要翻译：消除了由应力松弛层和反射层的面内膜质量的变化引起的应力分布。反射层通过应力松弛层堆叠在基板上。应力缓和层具有均匀的薄膜厚度分布的应力松弛部，以抵消反射层的内部应力，以及具有近似于二次偶次函数的膜厚分布的应力分布消除部。应力基本上与膜厚成正比。因此，形成给定的膜厚度分布允许控制应力分布。然而，基于设计值改变膜厚度分布可能降低光学特性。因此，用于消除应力分布的应力分布消除部分的膜厚度分布近似于二阶偶函数。通过调整光学系统，能够降低与膜厚分布有关的像差。

4. 发明授权

US07286637B2 Optical thin film and mirror using the same 失效
标题翻译：光学薄膜和镜面使用相同
公开(公告)号：US07286637B2
公开(公告)日：2007-10-23
申请号：US10546517
申请日：2004-09-07
申请人： Kyoko Imai , Kenji Ando , Hidehiro Kanazawa
发明人： Kyoko Imai , Kenji Ando , Hidehiro Kanazawa
IPC分类号： G21K1/06
CPC分类号： G21K1/062 , B82Y10/00 , G02B5/0891 , G02B5/283 , G03F7/70891 , G03F7/70958 , G03F7/70983 , G21K2201/065
摘要： To provide an optical thin film structure capable of efficiently dissipating heat in an optical thin film which is generated upon irradiating a surface of an X-ray mirror made up of the optical thin film with an X-ray. The optical thin film having an isotope purity higher than a natural isotope abundance ratio is formed on a mirror to increase heat conductivity of the optical thin film itself and quickly dissipate heat accumulated in the thin film to the outside of an optical system. Consequently, the mirror having high reflectively can be obtained, in which a fine structure of the optical thin film is by no means broken.
摘要翻译：提供能够在用X射线照射由该光学薄膜构成的X射线镜的表面上产生的光学薄膜中有效散发热的光学薄膜结构。在反射镜上形成具有高于天然同位素丰度比的同位素纯度的光学薄膜，以提高光学薄膜本身的导热性，并将薄膜中累积的热量迅速地散发到光学系统的外部。因此，可以获得高反射率的反射镜，其中光学薄膜的精细结构绝不破裂。

5. 发明授权

US06472087B1 Antireflection film, optical element with antireflection film, and production method of the antireflection film 有权
标题翻译：防反射膜，抗反射膜用光学元件及防反射膜的制造方法
公开(公告)号：US06472087B1
公开(公告)日：2002-10-29
申请号：US09189789
申请日：1998-11-12
申请人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： B32B900
CPC分类号： G02B1/115
摘要： In order to provide an antireflection film of a wide wavelength bandwidth excellent in environment resistance performance in the ultraviolet wavelength region, the antireflection film is constructed in four-layered, or five-layered, or six-layered structure, using Al2O3 for high-index layers and AlF3 or MgF2 for low-index layers. Vacuum evaporation, sputtering, or CVD is used for formation of the antireflection film.
摘要翻译：为了提供在紫外线波长区域具有优异的耐环境性能的宽波长带宽的抗反射膜，使用Al2O3用于高折射率的四层或五层或六层结构的抗反射膜层和AlF3或MgF2用于低折射率层。使用真空蒸发，溅射或CVD来形成抗反射膜。

6. 发明授权

US06458253B2 Thin film production process and optical device 失效
标题翻译：薄膜生产工艺及光学元件
公开(公告)号：US06458253B2
公开(公告)日：2002-10-01
申请号：US09804266
申请日：2001-03-13
申请人： Kenji Ando , Minoru Otani , Yasuyuki Suzuki , Toshiaki Shingu , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Minoru Otani , Yasuyuki Suzuki , Toshiaki Shingu , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： C23C1434
CPC分类号： C23C14/0057 , C23C14/0694
摘要： A process of producing a thin film is disclosed. The process comprises the steps of providing a vessel; placing a target such that a surface to be sputtered of the target surrounds a discharge space; placing a substrate on a side of an opening of the space such that the substrate faces an anode disposed so as to close another opening of the space surrounded by the target; supplying a sputtering gas and a fluorine-containing gas into the vessel; and supplying a dc power or a power obtained by superimposing pulses with reversing polarities on the dc power, between the target and the anode, wherein a discharge is induced in the discharge space to sputter the target, thereby forming a fluorine-containing thin film on the substrate.
摘要翻译：公开了一种生产薄膜的方法。该方法包括提供容器的步骤; 放置靶，使得要溅射的靶的表面围绕放电空间; 将基板放置在所述空间的开口的一侧，使得所述基板面向设置为闭合由所述目标包围的空间的另一开口的阳极; 向容器内供给溅射气体和含氟气体; 并且通过在目标和阳极之间的直流电力上叠加具有反向极性的脉冲而获得的直流电力或功率，其中在放电空间中引起放电以溅射靶，从而在上面形成含氟薄膜底物。

7. 发明授权

US07116473B2 Optical element with antireflection film 有权
标题翻译：带抗反射膜的光学元件
公开(公告)号：US07116473B2
公开(公告)日：2006-10-03
申请号：US11329135
申请日：2006-01-11
申请人： Hidehiro Kanazawa , Kenji Ando , Koji Teranishi
发明人： Hidehiro Kanazawa , Kenji Ando , Koji Teranishi
IPC分类号： F21V9/06 , G02B5/20 , F21V9/04 , G02B1/10
CPC分类号： G02B1/115
摘要： An antireflection film includes alternately deposited high-refractive-index layers and low-refractive-index layers. The refractive indexes and extinction coefficients of the layers are such that the antireflection film exhibits sufficient antireflection characteristics even if the geometrical thickness thereof is small. An optical element having the antireflection film on a substrate exhibits high transmittance and has excellent optical characteristics.
摘要翻译：抗反射膜包括交替沉积的高折射率层和低折射率层。这些层的折射率和消光系数使得即使其几何厚度小，抗反射膜也具有足够的抗反射特性。在基板上具有抗反射膜的光学元件显示高透射率并且具有优异的光学特性。

8. 发明申请

US20050219684A1 Antireflection film and optical element having the same 失效
公开(公告)号：US20050219684A1
公开(公告)日：2005-10-06
申请号：US11144641
申请日：2005-06-06
申请人： Hidehiro Kanazawa , Kenji Ando , Koji Teranishi
发明人： Hidehiro Kanazawa , Kenji Ando , Koji Teranishi
IPC分类号： G02B1/11 , B32B7/02 , G02B1/115 , G02B5/08
CPC分类号： G02B1/115
摘要： An antireflection film includes alternately deposited high-refractive-index layers and low-refractive-index layers. The refractive indexes and extinction coefficients of the layers are such that the antireflection film exhibits sufficient antireflection characteristics even if the geometrical thickness thereof is small. An optical element having the antireflection film on a substrate exhibits high transmittance and has excellent optical characteristics.

9. 发明申请

US20050117233A1 X-ray total reflection mirror and X-ray exposure apparatus 审中-公开
标题翻译： X射线全反射镜和X射线曝光装置
公开(公告)号：US20050117233A1
公开(公告)日：2005-06-02
申请号：US10990493
申请日：2004-11-18
申请人： Hidehiro Kanazawa , Kenji Ando , Kyoko Imai
发明人： Hidehiro Kanazawa , Kenji Ando , Kyoko Imai
IPC分类号： G21K1/06 , G02B5/08 , G02B5/10 , G02B7/18 , G03F7/20 , G21K5/02 , H01L21/027
CPC分类号： B82Y10/00 , G21K1/062
摘要： Multilayer film structure composed of at least one pair of layers including a first layer and a second layer, which are formed from different materials, and a protective layer provided thereon is formed so that the structure is optimized to have the same theoretical reflectance as that of a single-layer film structure at the same incident angle θ. Since the absorption of each layer is not significant, the actual reflectance of the X-ray total reflection mirror having the multilayer film structure is closer to the theoretical value as compared to that of the X-ray total reflection mirror having the single-layer film structure.
摘要翻译：形成由包括由不同材料形成的第一层和第二层的至少一对层和设置在其上的保护层组成的多层膜结构，使得该结构被优化以具有与在同一入射角θ处的单层膜结构。由于各层的吸收不明显，与具有单层膜的X射线全反射镜相比，具有多层膜结构的X射线全反射镜的实际反射率更接近于理论值结构体。

10. 发明授权

US06383346B2 Method for forming thin films 失效
标题翻译：薄膜形成方法
公开(公告)号：US06383346B2
公开(公告)日：2002-05-07
申请号：US08821435
申请日：1997-03-21
申请人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
发明人： Kenji Ando , Masaaki Matsushima , Minoru Otani , Yasuyuki Suzuki , Ryuji Biro , Hidehiro Kanazawa
IPC分类号： C23C1434
CPC分类号： C23C14/081 , C23C14/0057
摘要： The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms. The thin film of aluminum oxide according to the present invention has little optical absorption and high refractive index in the ultraviolet and vacuum ultraviolet regions.
摘要翻译：本发明提供了一种在含有氟原子的气体中溅射含有铝的靶材的氧化铝膜的形成方法。本发明的氧化铝薄膜在紫外线中几乎没有光吸收和高折射率和真空紫外线区域。

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