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    • 4. 发明申请
    • Cooking device
    • 烹饪设备
    • US20080105675A1
    • 2008-05-08
    • US11976352
    • 2007-10-24
    • Heung ChoiHyun Kim
    • Heung ChoiHyun Kim
    • H05B6/72
    • H05B6/745H05B6/74
    • A cooking device that cooks food and drink by using heat generation of a heater, or a heat source such as microwaves. A cooking device is provided in which the radiation of microwaves can be varied depending on load, such as cooking objects, when microwaves are used as a heat source. The cooking device includes a stirring shaft provided to rotate within a cooking chamber, a stirring shaft power source to rotate the stirring shaft, and a stirring vane coupled to the stirring shaft through a hinge unit and configured to rotate by a centrifugal force according to a rotation speed of the stirring shaft. The radiation of microwaves can be varied depending on a load such as a cooking object, and a cooking device having an optimized performance can be provided.
    • 通过使用加热器的发热或诸如微波的热源来烹饪食物和饮料的烹饪装置。 提供了一种烹饪装置,其中当使用微波作为热源时,微波的辐射可以根据诸如烹饪物体之类的负载而变化。 烹调装置包括设置成在烹饪室内旋转的搅拌轴,用于使搅拌轴旋转的搅拌轴动力源和通过铰链单元联接到搅拌轴的搅拌叶片,并且构造成通过离心力根据 搅拌轴的转速。 微波的辐射可以根据诸如烹饪物体的负载而变化,并且可以提供具有优化性能的烹饪装置。
    • 8. 发明授权
    • Air shower head of photolithography equipment for directing air towards a wafer stage
    • 用于将空气引向晶片台的光刻设备的空气喷头
    • US06522385B2
    • 2003-02-18
    • US09848284
    • 2001-05-04
    • Yo-Han AhnByung-Moo LeeHyun-Joon KimJai-Heung Choi
    • Yo-Han AhnByung-Moo LeeHyun-Joon KimJai-Heung Choi
    • G03B2752
    • G03F7/70908G03F7/70866G03F7/70933
    • An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the profile of the photoresist pattern. The air shower head is interposed between a lens system of the exposure device and a wafer stage, and has a hole in the middle thereof through which exposure light can pass to a wafer supported on the stage. The air shower head includes an upper frame defining a cavity open at the bottom thereof, and a porous bottom member covering the bottom of the upper frame. The porous member is mechanically secured to bottom ends of both the inner and outer side walls of the upper frame, i.e., without the use of chemical binders, to reduce the ability of the air shower head to serve as a source of contamination.
    • 光刻设备的曝光装置的空气喷头不含化学物质,否则会污染半导体晶片上的光致抗蚀剂层并降低光致抗蚀剂图案的轮廓。 空气喷头插入在曝光装置的透镜系统和晶片台之间,并且在其中间具有曝光光可以通过其到支撑在平台上的晶片的孔。 空气喷头包括限定在其底部开口的空腔的上框架和覆盖上框架的底部的多孔底部构件。 多孔构件机械地固定到上框架的内侧壁和外侧壁的底端,即不使用化学粘合剂,以降低空气淋浴头作为污染源的能力。
    • 10. 发明申请
    • LIGHT EMITTING DEVICE (LED), MANUFACTURING METHOD THEREOF, AND LED MODULE USING THE SAME
    • 发光装置(LED)及其制造方法及其使用的LED模块
    • US20130092962A1
    • 2013-04-18
    • US13655100
    • 2012-10-18
    • Ho Sun PaekHak Hwan KimIll Heung ChoiKyung Mi Moon
    • Ho Sun PaekHak Hwan KimIll Heung ChoiKyung Mi Moon
    • H01L33/08H01L33/62
    • H01L33/62H01L33/44H01L2224/16225
    • A light emitting device (LED), a manufacturing method thereof, and an LED module using the same. The LED may include a first semiconductor layer, an active layer, and a second semiconductor layer formed sequentially on a light-transmitting substrate, a first electrode formed in a region exposed by removing a part of the first semiconductor layer, a second electrode formed on the second semiconductor layer, a passivation layer formed on the first electrode and the second electrode to expose a region of the first electrode and a region of the second electrode, a first bump formed in a first region including the first electrode exposed through the passivation layer, and extended to another region of the second electrode on which the passivation layer is formed, and a second bump formed in a second region including the second electrode exposed through the passivation layer.
    • 发光装置(LED)及其制造方法以及使用其的LED模块。 LED可以包括在透光性基板上依次形成的第一半导体层,有源层和第二半导体层,形成在通过去除第一半导体层的一部分而露出的区域中的第一电极,形成在 所述第二半导体层,形成在所述第一电极和所述第二电极上以钝化所述第一电极的区域和所述第二电极的区域的钝化层,形成在包括通过所述钝化层暴露的所述第一电极的第一区域中的第一凸起 并且延伸到其上形成有钝化层的第二电极的另一区域,以及形成在包括通过钝化层暴露的第二电极的第二区域中的第二凸块。