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    • 3. 发明授权
    • Method of fabricating a hinge
    • 制造铰链的方法
    • US07674392B2
    • 2010-03-09
    • US11557110
    • 2006-11-07
    • Hsien-Lung Ho
    • Hsien-Lung Ho
    • C03C15/00
    • B81C1/00142
    • The present invention provides a method of fabricating a hinge. First, a wafer is provided, and a hinge region and at least two through regions are defined on the wafer. The wafer in the hinge region is partially removed from a bottom surface of the wafer. Subsequently, the wafer in the through regions is completely removed from a top surface of the wafer, and the hinge is formed. Thereafter, a wafer level test is performed on the hinge of the wafer. Next, an etching process is performed to adjust the shape of the hinge. According to the method of the present invention, the thickness of the hinge is no longer limited by the thickness of the wafer, and the hinge can accept the wafer level test.
    • 本发明提供一种制造铰链的方法。 首先,提供晶片,并且在晶片上限定铰链区域和至少两个贯通区域。 铰链区域中的晶片从晶片的底表面部分地移除。 随后,贯通区域中的晶片从晶片的顶表面完全去除,形成铰链。 此后,对晶片的铰链进行晶片级测试。 接下来,进行蚀刻处理以调节铰链的形状。 根据本发明的方法,铰链的厚度不再受到晶片的厚度的限制,铰链可以接受晶圆级测试。
    • 4. 发明申请
    • TORSIONAL MEMS DEVICE
    • 扭转MEMS器件
    • US20100002285A1
    • 2010-01-07
    • US12202312
    • 2008-08-31
    • Long-Sun HuangHsien-Lung Ho
    • Long-Sun HuangHsien-Lung Ho
    • G02B26/00
    • G02B26/0833
    • A torsional MEMS device is disclosed. The torsional MEMS device includes a support structure, a platform, and at least two hinges, which connects the platform to the support structure. The platform has an active area and a non-active area. A plurality of sacrificial elements is disposed in the non-active area. If the resonant frequency of the torsional MEMS device is less than a predetermined standard resonant frequency of the torsional MEMS device, at least one sacrificial element is removed to reduce the total mass of the torsional MEMS device, and so as to increase the resonant frequency of the torsional MEMS device.
    • 公开了一种扭转MEMS装置。 扭转MEMS装置包括支撑结构,平台和至少两个铰链,其将平台连接到支撑结构。 该平台具有活动区域和非活动区域。 多个牺牲元件设置在非有效区域中。 如果扭转MEMS器件的谐振频率小于扭转MEMS器件的预定标准谐振频率,则去除至少一个牺牲元件以减小扭转MEMS器件的总质量,并且为了增加谐振频率 扭转MEMS器件。
    • 7. 发明申请
    • MICROMINIATURIZED PROJECTION MODULE FOR PROJECTING IMAGE ONTO OBJECT
    • 用于投影图像到对象的微型投影模块
    • US20110164223A1
    • 2011-07-07
    • US12652801
    • 2010-01-06
    • Chung-I ChiangHung-Yi LinHsien-Lung Ho
    • Chung-I ChiangHung-Yi LinHsien-Lung Ho
    • G03B21/28
    • G03B37/04G03B21/005H04N9/3129H04N9/3147
    • A microminiaturized projection module for projecting an image onto an object is disclosed in the present invention. The module includes a number of light units each for providing red, green, and blue beams; an image processing unit for receiving the image, dividing the image into n×m image signals, and transforming each of the image signals into a modulating signal and a direction signal, where n and in are integrals not less than 2, respectively; a number of modulation units for modulating the beams from one light unit according to the modulating signal received from the image processing unit and sending out the modulated beams simultaneously; and an array of n×m mirrors for projecting the modulated beams to form the image onto the object according to the direction signal received from the image processing unit. The invention has advantages that can reduce modulation speed, undergo slight shock and be free from raster pinch effect.
    • 在本发明中公开了一种用于将图像投影到物体上的微型投影模块。 该模块包括多个用于提供红色,绿色和蓝色光束的光单元; 图像处理单元,用于接收图像,将图像划分成n×m个图像信号,并将每个图像信号变换成分别为n和in的调制信号和方向信号,其中n和in分别为不小于2的积分; 多个调制单元,用于根据从图像处理单元接收的调制信号调制来自一个光单元的波束,并同时发出调制波束; 以及n×m个反射镜的阵列,用于根据从图像处理单元接收的方向信号投影调制的光束以将图像形成到对象上。 本发明具有可以降低调制速度,经受轻微冲击并且不受光栅夹紧效应的优点。
    • 9. 发明授权
    • Method of fabricating a diaphragm of a capacitive microphone device
    • 制造电容式麦克风装置的隔膜的方法
    • US07258806B1
    • 2007-08-21
    • US11426017
    • 2006-06-23
    • Hsien-Lung Ho
    • Hsien-Lung Ho
    • C23F1/00H01L21/00
    • H04R19/04
    • A method of fabricating a diaphragm of a capacitive microphone device. First, a substrate is provided, and a dielectric layer on a first surface of the substrate is formed. Than, a plurality of silicon spacers are formed on a surface of the dielectric layer, and a diaphragm layer is formed on a surface of the silicon spacers and the surface of the dielectric layer. Subsequently, a planarization layer is formed on the diaphragm layer, and a second surface of the substrate is etched to form a plurality of openings corresponding to the diaphragm layer disposed on the surface of the dielectric layer. Thereafter, the dielectric layer exposed through the openings is removed, and planarization layer is removed.
    • 一种制造电容式麦克风装置的隔膜的方法。 首先,提供基板,并且形成在基板的第一表面上的电介质层。 在电介质层的表面上形成多个硅隔离物,并且在硅间隔物的表面和电介质层的表面上形成隔膜层。 随后,在隔膜层上形成平坦化层,并且蚀刻基板的第二表面以形成与设置在电介质层表面上的隔膜层相对应的多个开口。 此后,除去通过开口露出的电介质层,去除平坦化层。