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1. 发明申请

WO2012148848A2 METHOD AND SYSTEM FOR HYBRID RETICLE INSPECTION 审中-公开
标题翻译：混合物检验方法与系统
公开(公告)号：WO2012148848A2
公开(公告)日：2012-11-01
申请号：PCT/US2012/034665
申请日：2012-04-23
申请人： KLA-TENCOR CORPORATION , HESS, Carl , MILLER, John, D. , XUE, Shan , LOPRESTI, Patrick
发明人： HESS, Carl , MILLER, John, D. , XUE, Shan , LOPRESTI, Patrick
IPC分类号： G06T7/40
CPC分类号： G01N21/95607 , G01N21/94 , G01N2021/95676
摘要： A semiconductor inspection apparatus performs a hybrid inspection process including cell-to-cell inspection, die-to-die inspection and die-to-golden or die-to- database inspection. The apparatus creates a golden image of a reticle complimentary to portions of the reticle that can be inspected by cell-to-cell inspection or die-to-die inspection. Alternatively, the apparatus creates a reduced database complimentary to portions of the reticle that can be inspected by cell-to- cell inspection or die-to-die inspection.
摘要翻译：半导体检查装置进行包括电池到电池检查，管芯到管芯检查和金属到金属或管芯到数据库检查的混合检查过程。该装置产生与通过电池到电池检查或模 - 模检查可以检查的掩模版的部分互补的掩模版的金色图像。或者，该装置产生与通过电池到电池检查或管芯到管芯检查可以检查的掩模版的部分互补的减少的数据库。

2. 发明申请

WO2010005700A3 METHOD FOR DETECTION OF OVERSIZED SUB-RESOLUTION ASSIST FEATURES 审中-公开
标题翻译：用于检测超分辨率分析辅助特征的方法
公开(公告)号：WO2010005700A3
公开(公告)日：2010-03-04
申请号：PCT/US2009047357
申请日：2009-06-15
申请人： KLA TENCOR CORP , HESS CARL E , XIONG YALIN
发明人： HESS CARL E , XIONG YALIN
IPC分类号： H01L21/66 , H01L21/027
CPC分类号： G03F1/84 , G03F1/36
摘要： Disclosed are methods and apparatus for inspecting a sub-resolution assist features (SRAF) on a reticle. A test flux measurement for a boundary area that encompasses a width and a length portion of a test SRAF is determined, and at least one reference flux measurement for one or more boundary areas of one or more reference SRAF's is determined. The test flux measurement is compared with the reference flux measurements. The comparison is used to then determine whether the test SRAF is undersized or oversized. If the test SRAF is determined to be oversized, it may then be determined whether the test SRAF is defective based on the comparison using a first threshold.
摘要翻译：公开了用于检查掩模版上的分解度辅助特征（SRAF）的方法和装置。确定包含测试SRAF的宽度和长度部分的边界区域的测试磁通量测量，并且确定一个或多个参考SRAF的一个或多个边界区域的至少一个参考通量测量。将测试磁通量测量与参考通量测量值进行比较。比较用于确定测试SRAF是否尺寸过小或过大。如果测试SRAF被确定为过大，则可以基于使用第一阈值的比较来确定测试SRAF是否有缺陷。

3. 发明申请

WO2009152046A1 SYSTEMS AND METHODS FOR DETECTING DESIGN AND PROCESS DEFECTS ON A WAFER, REVIEWING DEFECTS ON A WAFER, SELECTING ONE OR MORE FEATURES WITHIN A DESIGN FOR USE AS PROCESS MONITORING FEATURES, OR SOME COMBINATION THEREOF 审中-公开
标题翻译：用于检测设计和过程缺陷的系统和方法，检查波形上的缺陷，在设计中选择一个或多个特征，以用作过程监控功能或其一些组合
公开(公告)号：WO2009152046A1
公开(公告)日：2009-12-17
申请号：PCT/US2009/046379
申请日：2009-06-05
申请人： KLA-TENCOR CORPORATION , FOUQUET, Christophe , SAIDIN, Zain , EDELSTEIN, Sergio , NANJANGUD, Savitha , HESS, Carl
发明人： FOUQUET, Christophe , SAIDIN, Zain , EDELSTEIN, Sergio , NANJANGUD, Savitha , HESS, Carl
IPC分类号： H01L21/66
CPC分类号： G06T7/0006 , G01N21/956 , G03F7/705 , G06F17/5081 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Various systems and methods for detecting design and process defects on a wafer, reviewing defects on a wafer, selecting one or more features within a design for use as process monitoring features, or some combination thereof are provided.
摘要翻译：提供用于检测晶片上的设计和工艺缺陷的各种系统和方法，检查晶片上的缺陷，选择设计中的一个或多个特征以用作过程监控特征或其某些组合。

4. 发明申请

WO2008003084A3 COMPUTER-IMPLEMENTED METHODS AND SYSTEMS FOR DETERMINING DIFFERENT PROCESS WINDOWS FOR A WAFER PRINTING PROCESS FOR DIFFERENT RETICLE DESIGNS 审中-公开
标题翻译：计算机实现的方法和系统，用于确定用于不同设计设计的晶片打印过程的不同工艺窗口
公开(公告)号：WO2008003084A3
公开(公告)日：2008-02-21
申请号：PCT/US2007072515
申请日：2007-06-29
申请人： KLA TENCOR TECH CORP , VERMA GAURAV , SU BO , VOLK WILLIAM , LEHON HAROLD , HESS CARL
发明人： VERMA GAURAV , SU BO , VOLK WILLIAM , LEHON HAROLD , HESS CARL
IPC分类号： G01N21/88 , G06K9/00
CPC分类号： G03F1/84
摘要： Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.
摘要翻译：提供了计算机实现的方法和系统，用于为不同的标线设计确定用于晶片印刷工艺的不同处理窗口。一种方法包括生成模拟图像，其说明如何以晶片印刷工艺的一个或多个参数的不同值来在晶片上印刷每个不同的标线设计。该方法还包括使用模拟图像来检测每个不同标线设计中的缺陷。此外，该方法包括基于检测步骤的结果为每个不同的标线设计确定晶片印刷过程的处理窗口。

5. 发明申请

WO2005073807A1 COMPUTER-IMPLEMENTED METHODS FOR DETECTING DEFECTS IN RETICLE DESIGN DATA 审中-公开
标题翻译：用于检测设计数据中缺陷的计算机实现方法
公开(公告)号：WO2005073807A1
公开(公告)日：2005-08-11
申请号：PCT/US2005/002955
申请日：2005-01-31
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , SAIDIN, Zain, K. , XIONG, Yalin , GLASSER, Lance , HESS, Carl , PREIL, Moshe, E.
发明人： SAIDIN, Zain, K. , XIONG, Yalin , GLASSER, Lance , HESS, Carl , PREIL, Moshe, E.
IPC分类号： G03F1/00
CPC分类号： G03F1/84 , G03F1/36 , G03F7/70433 , G03F7/70441 , G03F7/705 , G03F7/70533 , G03F7/70616 , G03F7/7065 , G03F7/70666 , G06Q30/0206
摘要： Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.
摘要翻译：提供了用于检测标线设计数据缺陷的计算机实现方法。一种方法包括生成第一模拟图像，其示出如何使用标线制造工艺将掩模版设计数据印刷在掩模版上。该方法还包括使用第一模拟图像产生第二模拟图像。第二模拟图像示出了在晶片印刷过程的一个或多个参数的不同值下如何将掩模版印刷在晶片上。该方法还包括使用第二模拟图像检测掩模版设计数据中的缺陷。除了确定作为不同值的函数的第二模拟图像的特性的变化率之外，另一种方法包括上述生成步骤。该方法还包括基于变化率检测掩模版设计数据中的缺陷。

6. 发明申请

WO2005057438A2 METHODS FOR SIMULATING RETICLE LAYOUT DATA, INSPECTING RETICLE LAYOUT DATA, AND GENERATING A PROCESS FOR INSPECTING RETICLE LAYOUT DATA 审中-公开
标题翻译：用于模拟实体布局数据的方法，检查布图数据，以及生成用于检查布图数据的过程
公开(公告)号：WO2005057438A2
公开(公告)日：2005-06-23
申请号：PCT/US2004/040733
申请日：2004-12-06
申请人： KLA-TENCOR TECHNOLOGIES CORP. , HESS, Carl , XIONG, Yalin
发明人： HESS, Carl , XIONG, Yalin
IPC分类号： G06F17/50
CPC分类号： G03F1/84 , G03F1/36
摘要： Various computer-implemented methods are provided. One method for generating a process for inspecting reticle layout data includes identifying a first region in the reticle layout data. A printability of the first region is more sensitive to changes in process parameters than a printability of a second region in the reticle layout data. The method also includes assigning one or more inspection parameters to the first region and the second region such that the first region will be inspected during the process with a higher sensitivity than the second region. Another method includes inspecting the first region with a higher sensitivity than the second region. An additional method includes simulating how the reticle layout data will print. Simulation of the first and second regions is performed with one or more different simulation parameters such that the first region is simulated with a higher fidelity than the second region.
摘要翻译：提供了各种计算机实现的方法。用于生成用于检查标线布局数据的处理的一种方法包括识别标线布局数据中的第一区域。第一区域的可印刷性对于工艺参数的改变比在标线布局数据中的第二区域的可印刷性更敏感。该方法还包括将一个或多个检查参数分配给第一区域和第二区域，使得在处理期间将以比第二区域更高的灵敏度对第一区域进行检查。另一种方法包括以比第二区域更高的灵敏度检查第一区域。另外一种方法包括模拟标线布局数据如何打印。利用一个或多个不同的模拟参数来执行第一和第二区域的模拟，使得以比第二区域更高的保真度来模拟第一区域。

7. 发明申请

WO2012148854A1 DATABASE-DRIVEN CELL-TO-CELL RETICLE INSPECTION 审中-公开
标题翻译：数据库驱动细胞细胞检测
公开(公告)号：WO2012148854A1
公开(公告)日：2012-11-01
申请号：PCT/US2012/034681
申请日：2012-04-23
申请人： KLA-TENCOR CORPORATION , HESS, Carl , MILLER, John, D. , RUI-FANG, Shi , GUAN, Chun
发明人： HESS, Carl , MILLER, John, D. , RUI-FANG, Shi , GUAN, Chun
IPC分类号： G06K9/00
CPC分类号： G06F17/50 , G01N21/9501 , G01N21/95607
摘要： A semiconductor inspection apparatus identifies regions of a reticle or semiconductor wafer appropriate for cell-to-cell inspection by analyzing a semiconductor design database. Appropriate regions can be identified in a region map for use by offline inspection tools.
摘要翻译：半导体检查装置通过分析半导体设计数据库来识别适用于细胞间细胞检查的掩模版或半导体晶片的区域。可以在区域图中识别合适的区域以供离线检查工具使用。

8. 发明申请

WO2012051245A3 FOCUS OFFSET CONTAMINATION INSPECTION 审中-公开
标题翻译：焦点偏移污染检查
公开(公告)号：WO2012051245A3
公开(公告)日：2012-06-21
申请号：PCT/US2011055891
申请日：2011-10-12
申请人： KLA TENCOR CORP , HESS CARL E
发明人： HESS CARL E
IPC分类号： G01N21/94 , H01L21/66
CPC分类号： G01N21/94 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： A system and method for detecting defects on a reticle is disclosed. The method may comprise determining a best focus setting for imaging the reticle; obtaining a first image of the reticle, the first image obtained at the best focus setting plus a predetermined offset; obtaining a second image of the reticle, the second image obtained at the best focus setting minus the predetermined offset; generating a differential image, the differential image representing a difference between the first image and the second image; and identifying a defect on the reticle based on the differential image. The method in accordance with the present disclosure may also be utilized for detecting defects on at least a portion of the reticle.
摘要翻译：公开了用于检测光罩上的缺陷的系统和方法。该方法可以包括确定用于对掩模版进行成像的最佳焦点设置; 获得所述掩模版的第一图像，所述第一图像在所述最佳焦点设置处获得，加上预定的偏移量; 获得所述标线的第二图像，所述第二图像在最佳聚焦设置减去所述预定偏移后获得; 产生差分图像，所述差分图像表示所述第一图像和所述第二图像之间的差异; 以及基于差分图像来识别掩模版上的缺陷。根据本公开的方法也可以用于检测至少一部分光罩上的缺陷。

9. 发明申请

WO2008003084A2 COMPUTER-IMPLEMENTED METHODS AND SYSTEMS FOR DETERMINING DIFFERENT PROCESS WINDOWS FOR A WAFER PRINTING PROCESS FOR DIFFERENT RETICLE DESIGNS 审中-公开
标题翻译：用于确定不同过程窗口的计算机实现方法和系统，用于不同设计的WAFER打印过程
公开(公告)号：WO2008003084A2
公开(公告)日：2008-01-03
申请号：PCT/US2007/072515
申请日：2007-06-29
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , VERMA, Gaurav , SU, Bo , VOLK, William , LEHON, Harold , HESS, Carl
发明人： VERMA, Gaurav , SU, Bo , VOLK, William , LEHON, Harold , HESS, Carl
IPC分类号： G06F19/00
CPC分类号： G03F1/84
摘要： Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.
摘要翻译：提供了用于确定用于不同掩模版设计的晶片印刷工艺的不同工艺窗口的计算机实现的方法和系统。一种方法包括产生模拟图像，其示出了在晶片印刷过程的一个或多个参数的不同值下每个不同的标线设计将如何印刷在晶片上。该方法还包括使用模拟图像检测每个不同标线设计中的缺陷。此外，该方法包括基于检测步骤的结果确定用于每个不同掩模版设计的晶片印刷处理的处理窗口。

10. 发明申请

WO2005057438A3 FLAGGING RETICLE LAYOUT DATA 审中-公开
标题翻译：标记文本布局数据
公开(公告)号：WO2005057438A3
公开(公告)日：2006-02-23
申请号：PCT/US2004040733
申请日：2004-12-06
申请人： KLA TENCOR TECH CORP , HESS CARL , XIONG YALIN
发明人： HESS CARL , XIONG YALIN
IPC分类号： G06F17/50 , G03F1/00 , G03F1/14
CPC分类号： G03F1/84 , G03F1/36
摘要： Various computer-implemented methods are provided. One method for generating a process for inspecting reticle layout data includes identifying a first region in the reticle layout data. A printability of the first region is more sensitive to changes in process parameters than a printability of a second region in the reticle layout data. The method also includes assigning one or more inspection parameters to the first region and the second region such that the first region will be inspected during the process with a higher sensitivity than the second region. Another method includes inspecting the first region with a higher sensitivity than the second region. An additional method includes simulating how the reticle layout data will print. Simulation of the first and second regions is performed with one or more different simulation parameters such that the first region is simulated with a higher fidelity than the second region.
摘要翻译：提供了各种计算机实现的方法。用于生成用于检查标线布局数据的处理的一种方法包括识别标线布局数据中的第一区域。第一区域的可印刷性对于工艺参数的改变比在标线布局数据中的第二区域的可印刷性更敏感。该方法还包括将一个或多个检查参数分配给第一区域和第二区域，使得在处理期间将以比第二区域更高的灵敏度对第一区域进行检查。另一种方法包括以比第二区域更高的灵敏度检查第一区域。另外一种方法包括模拟标线布局数据如何打印。利用一个或多个不同的模拟参数来执行第一和第二区域的模拟，使得以比第二区域更高的保真度来模拟第一区域。

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