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    • 2. 发明申请
    • PROCESS FOR PRODUCING SPUTTERING TARGET
    • 生产喷射目标的方法
    • WO1996036746A1
    • 1996-11-21
    • PCT/JP1996001312
    • 1996-05-17
    • ASAHI GLASS COMPANY LTD.NAKAGAMA, SusumuHIGETA, MasaoHAYASHI, Atsushi
    • ASAHI GLASS COMPANY LTD.
    • C23C14/34
    • C23C14/3414
    • A process for producing uniform and high-density composite sputtering targets composed of a high-melting substance and a low-melting metal, which comprises molding a mixture of a powder of a high-melting substance having a melting point of 900 DEG C or above with a powder of a low-melting metal having a melting point of 700 DEG C or below at a temperature below the melting point of the metal under heat and pressure. This process if freed from the problem of the conventional production processes comprising melting, hot pressing or atmospheric pressure sintering such that it has been impossible to produce uniform and high-density composite sputtering targets because of the compositional change due to different melting points of the components and the exudation of the low-melting metal as a result of melting thereof.
    • 一种由高熔点物质和低熔点金属组成的均匀高密度复合溅射靶的制造方法,其特征在于,将熔点为900℃以上的高熔点物质的粉末混合成型 在低于金属熔点的温度下,在热和压力下,熔点为700℃以下的低熔点金属粉末。 该方法如果免于常规生产方法的问题,包括熔融,热压或大气压力烧结,使得由于组分的不同熔点导致的组成变化不可能产生均匀和高密度的复合溅射靶 以及由于熔融而使低熔点金属渗出。
    • 3. 发明申请
    • TARGET, PROCESS FOR PRODUCTION THEREOF, AND METHOD OF FORMING HIGHLY REFRACTIVE FILM
    • 目标,其生产方法和形成高折射膜的方法
    • WO1997008359A1
    • 1997-03-06
    • PCT/JP1996000767
    • 1996-03-25
    • ASAHI GLASS COMPANY LTD.KIDA, OtojiroMITSUI, AkiraSUZUKI, EriOSAKI, HisashiHAYASHI, Atsushi
    • ASAHI GLASS COMPANY LTD.
    • C23C14/34
    • C23C14/083C23C4/02C23C4/11C23C14/3414
    • A target to be used in forming a transparent thin oxide film having a high refractive index by direct-current sputtering and a method of forming the film by using the target. Although it has been a practice to form a highly refractive film by direct-current sputtering wherein a metallic target is sputtered in an oxygenic atmosphere, this method is problematic owing to the extremely low speed of film formation. An alternative method therefor comprises using oxide ceramics as the target, but this method is also problematic in that the ceramics are nonconductive and hence direct-current sputtering is difficult. The invention method enables a highly refractive film to be produced rapidly by direct-current sputtering by using a target mainly comprising a metal oxide, MOx, wherein oxygen is contained in a stoichiometrically insufficient quantity and M represents at least one metal selected among Ti, Nb, Ta, Mo, W, Zr and Hf.
    • 用于通过直流溅射形成具有高折射率的透明薄氧化膜的目标以及通过使用靶材形成膜的方法。 尽管通过直接溅射形成高折射膜已成为实践,其中金属靶在氧气氛中溅射,但是由于成膜速度极低,所以该方法是有问题的。 其替代方法包括使用氧化物陶瓷作为靶,但是该方法的问题在于陶瓷是非导电的,因此直接溅射是困难的。 本发明方法能够通过使用主要包含金属氧化物MOx的靶,通过直接溅射快速制备高折射膜,其中氧以化学计量不足量包含氧,M表示选自Ti,Nb中的至少一种金属 ,Ta,Mo,W,Zr和Hf。