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1. 发明申请

US20050260519A1 Dissolution inhibitors in photoresist compositions for microlithography 有权
标题翻译：用于微光刻的光致抗蚀剂组合物中的溶解抑制剂
公开(公告)号：US20050260519A1
公开(公告)日：2005-11-24
申请号：US10380990
申请日：2001-10-12
申请人： Larry Berger , Jerald Feldman , Viacheslav Petrov , Frank Schadt III , Andrew Feiring , Fredrick Zumsteg Jr.
发明人： Larry Berger , Jerald Feldman , Viacheslav Petrov , Frank Schadt III , Andrew Feiring , Fredrick Zumsteg Jr.
IPC分类号： G03F7/039 , G03F7/004 , G03F7/038 , G03F7/20 , G03F7/30 , H01L21/027
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0395 , Y10S430/106 , Y10S430/108
摘要： The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(Rf)(Rf′)OR wherein Rf and Rf′ are the same or different fluoroalkyl groups of from one to about ten carbon atoms or taken together are (CF2)a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 μm at a wavelength of 157 nm.
摘要翻译：本发明涉及包含聚合物粘合剂的光致抗蚀剂组合物; 光活性成分; 和至少一种溶解抑制剂，其包含链烷烃或环烷烃化合物，其含有至少一个具有结构-C（R f）一个或多个碳原子的相同或不同的氟代烷基或一起为（CF 2 N 2）

2. 发明申请

US20060166129A1 Fluorinated polymers useful as photoresists, and processes for microlithography 失效
标题翻译：用作光致抗蚀剂的氟化聚合物，以及微光刻法
公开(公告)号：US20060166129A1
公开(公告)日：2006-07-27
申请号：US10523490
申请日：2003-08-19
申请人： Andrew Feiring , Frank Schadt III , William Farnham , Jerald Feldman
发明人： Andrew Feiring , Frank Schadt III , William Farnham , Jerald Feldman
IPC分类号： C08F16/24
CPC分类号： C08F232/00 , C08F8/12 , C08F214/18 , C08F214/26 , C08F220/24 , C08F220/26 , C08F232/08 , C08F2800/20 , G03F7/0046 , G03F7/0395
摘要： This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or esterified hydroxyl groups, and optionally other repeat units, typically derived from an acrylate. These polymers have high transparency at short wavelengths such as 193 nm and 157 nm, and provide good plasma etch resistance and adhesive properties. Also provided are photoresist compositions and substrates coated therewith.
摘要翻译：本发明提供了含有至少一种氟化烯烃的重复单元和衍生自至少一种具有羟基或酯化羟基的多环烯属不饱和单体的重复单元的含氟共聚物，以及任选的其它重复单元，通常衍生自丙烯酸酯。这些聚合物在短波长如193nm和157nm处具有高透明度，并且提供良好的等离子体耐蚀刻性和粘合性。还提供了光刻胶组合物和其上涂覆的基材。

3. 发明授权

US08026333B2 Protected air-activated organotin catalysts for polyurethane synthesis and processes therefore 有权
标题翻译：因此，用于聚氨酯合成和保护的空气活化有机锡催化剂
公开(公告)号：US08026333B2
公开(公告)日：2011-09-27
申请号：US11639083
申请日：2006-12-13
申请人： Jerald Feldman , Stephan J. McLain , Robert John Barsotti , James William O'Neil
发明人： Jerald Feldman , Stephan J. McLain , Robert John Barsotti , James William O'Neil
IPC分类号： C08G18/24 , C08L75/04 , C09D175/04
CPC分类号： C08G18/792 , C08G18/242 , C08G18/244 , C08G18/341 , C08G18/718 , H05K3/285
摘要： This invention relates to a protected organotin-based catalyst system for polyurethane synthesis that is useful in coatings applications. The catalyst has a formula according to; R1aR2bR3cSn[CH(OX)R4]d, wherein R1, R2, and R3 are the same or different and represent an optionally substituted hydrocarbyl, aromatic, alkoxide, amide, halide or stannyl group, R4 represents an optionally substituted hydrocarbyl or optionally substituted aryl group. a, b, and c are independently 0, 1, 2, or 3; d is 1, 2 or 3; and a+b+c+d=4; and X is an acid-labile or moisture-labile protecting group. When a coating mixture comprising the catalyst is sprayed and/or applied to a substrate as a thin film in air, the catalyst is activated. For solvent-based refinish systems comprising hydroxyl and isocyanate species at high solids levels, the catalyst system therefore provides extended viscosity stability, i.e., pot life.
摘要翻译：本发明涉及用于聚氨酯合成的受保护的有机锡基催化剂体系，其可用于涂料应用。催化剂具有下式： R1aR2bR3cSn [CH（OX）R4] d，其中R1，R2和R3相同或不同，表示任选取代的烃基，芳族，醇盐，酰胺，卤化物或甲锡烷基，R4表示任选取代的烃基或任选取代的芳基组。 a，b和c独立地为0,1,2或3; d为1,2或3; 和a + b + c + d = 4; X是酸不稳定或潮湿不稳定的保护基。当包含催化剂的涂料混合物在空气中作为薄膜喷涂和/或施加到基材上时，催化剂被活化。对于含有高固体含量的羟基和异氰酸酯物质的基于溶剂的修补体系，催化剂体系因此提供了延长的粘度稳定性，即适用期。

4. 发明申请

US20110092076A1 APPARATUS AND METHOD OF VAPOR COATING IN AN ELECTRONIC DEVICE 审中-公开
标题翻译：电子设备中蒸汽涂层的装置和方法
公开(公告)号：US20110092076A1
公开(公告)日：2011-04-21
申请号：US12993202
申请日：2009-05-19
申请人： Charles D. Lang , James Daniel Tremel , Paul Anthony Sant , Stephen Sorich , David K. Flattery , Gary A. Johansson , Jerald Feldman , Steven Dale Ittel , George Simpson
发明人： Charles D. Lang , James Daniel Tremel , Paul Anthony Sant , Stephen Sorich , David K. Flattery , Gary A. Johansson , Jerald Feldman , Steven Dale Ittel , George Simpson
IPC分类号： H01L21/02 , C23C16/00
CPC分类号： G03F7/167 , B05D1/60 , C23C14/22 , C23C14/228 , H01L51/001 , H01L51/56
摘要： An apparatus and method for vapor phase deposition of a reactive surface area (RSA) material onto a substrate of an electronic device. The vapor phase deposition is conducted at ambient pressures in air, and provides capture of residual vapor to minimize environmental release of RSA and other constituents used in the processing.
摘要翻译：将反应性表面积（RSA）材料气相沉积到电子器件的衬底上的装置和方法。气相沉积在空气中在环境压力下进行，并提供残余蒸气的捕获，以最小化RSA和处理中使用的其它成分的环境释放。

5. 发明申请

US20090197006A1 Protected Air-Activated Organotin Catalysts for Polyurethane Synthesis and Processes Therefore 审中-公开
标题翻译：因此，保护性空气活化有机锡催化剂用于聚氨酯合成和工艺
公开(公告)号：US20090197006A1
公开(公告)日：2009-08-06
申请号：US12085248
申请日：2006-12-18
申请人： Jerald Feldman , Stephan James McLain , Robert John Barsotti , James William O'Neil
发明人： Jerald Feldman , Stephan James McLain , Robert John Barsotti , James William O'Neil
IPC分类号： B05D1/04 , C08G18/24 , C09D175/04 , B05D1/02 , B05D1/28 , B05D1/18
CPC分类号： C08G18/792 , C08G18/242 , C08G18/244 , C08G18/341 , C08G18/718 , H05K3/285
摘要： This invention relates to a protected organotin-based catalyst system for polyurethane synthesis that is useful in coatings applications. The catalyst has low activity in the absence of oxygen. When a coating mixture comprising the catalyst is sprayed and/or applied to a substrate as a thin film in air, the catalyst is activated. For solvent-based refinish systems comprising hydroxyl and isocyanate species at high solids levels, the catalyst system therefore provides extended viscosity stability, i.e., pot life.
摘要翻译：本发明涉及用于聚氨酯合成的受保护的有机锡基催化剂体系，其可用于涂料应用。催化剂在不存在氧的情况下具有低活性。当包含催化剂的涂料混合物在空气中作为薄膜喷涂和/或施加到基材上时，催化剂被活化。对于含有高固体含量的羟基和异氰酸酯物质的基于溶剂的修补体系，催化剂体系因此提供了延长的粘度稳定性，即适用期。

6. 发明授权

US07041764B2 Copolymerization of olefins 有权
公开(公告)号：US07041764B2
公开(公告)日：2006-05-09
申请号：US10919181
申请日：2004-08-16
申请人： Alison Margaret Anne Bennett , Jerald Feldman , Elizabeth Forrester McCord
发明人： Alison Margaret Anne Bennett , Jerald Feldman , Elizabeth Forrester McCord
IPC分类号： C08F210/16 , C08F4/80 , C08F4/70
CPC分类号： C08F10/00 , C08F210/16 , C08F210/14 , C08F2500/04 , C08F2500/02 , C08F2500/10 , C08F4/7042
摘要： Ethylene and/or propylene, and α-olefins may be copolymerized by contacting then with certain iron or cobalt complexes of selected 2,6-pyridinecarboxaldehydebis(imines) and 2,6-diacylpyridinebis(imines). The polymers produced, some of which are novel, are useful as molding resins.

7. 发明授权

US06803432B2 Copolymerization of olefins 有权
标题翻译：烯烃的共聚合
公开(公告)号：US06803432B2
公开(公告)日：2004-10-12
申请号：US10251041
申请日：2002-09-20
申请人： Alison Margaret Anne Bennett , Jerald Feldman
发明人： Alison Margaret Anne Bennett , Jerald Feldman
IPC分类号： C08F4602
CPC分类号： C08F10/00 , C08F210/16 , C08F210/14 , C08F2500/04 , C08F2500/02 , C08F2500/10 , C08F4/7042
摘要： Ethylene and/or propylene, and &agr;-olefins may be copolymerized by contacting then with certain iron or cobalt complexes of selected 2,6-pyridinecarboxaldehydebis(imines) and 2,6-diacylpyridinebis(imines). The polymers produced, some of which are novel, are useful as molding resins.
摘要翻译：乙烯和/或丙烯和α-烯烃可以通过与选定的2,6-吡啶甲醛二（亚胺）和2,6-二酰基吡啶双（亚胺）的某些铁或钴络合物接触而共聚。所生产的聚合物，其中一些是新颖的，可用作模制树脂。

8. 发明授权

US06593058B1 Photoresists, polymers and processes for microlithography 有权
标题翻译：光刻胶，聚合物和微光刻工艺
公开(公告)号：US06593058B1
公开(公告)日：2003-07-15
申请号：US09806096
申请日：2001-03-23
申请人： Andrew Edward Feiring , Jerald Feldman
发明人： Andrew Edward Feiring , Jerald Feldman
IPC分类号： G03C173
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/039 , G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresist comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one coralently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.
摘要翻译：公开了在极端的，远的和近的紫外线下的微光刻的光致抗蚀剂和相关的工艺。在一些实施方案中，光致抗蚀剂包含（a）包含衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的，并且至少一种烯属不饱和化合物含有至少一个氟原子共价连接到烯属不饱和碳原子上; 和（b）至少一种光活性组分。在其它实施方案中，光致抗蚀剂包含含有共聚物的含氟共聚物，该共聚物包含衍生自至少一种具有至少一个选自氟原子，全氟烷基和全氟烷氧基的原子或基团的多环烯属不饱和化合物的重复单元，其特征在于所述至少一个原子或基团共价连接到环结构中包含的碳原子，并且通过至少一个正确连接的碳原子与烯属不饱和化合物的每个烯属不饱和碳原子分离。光致抗蚀剂在极端/远紫外线以及近紫外线，高等离子体蚀刻电阻方面具有高透明度，并且可用于极端，远紫外（UV）区域，特别是在波长<= 365nm处的微光刻。还公开了新的含氟共聚物。

9. 发明授权

US6002034A Bis(arylimino)acenaphthene nickel(II) complexes 失效
标题翻译：双（芳基亚氨基）苊镍（II）络合物
公开(公告)号：US6002034A
公开(公告)日：1999-12-14
申请号：US172367
申请日：1998-10-14
申请人： Stephan James McLain , Jerald Feldman
发明人： Stephan James McLain , Jerald Feldman
IPC分类号： C07C251/20 , C07F15/04 , C08F4/70 , C08F10/00 , C08F32/08 , C08F297/08 , C07F15/02 , C07C249/00
CPC分类号： C08F32/08 , C07C251/20 , C07F15/045 , C08F10/00 , C08F297/08 , C07C2103/20 , C08F110/14
摘要： Certain olefins such as ethylene, .alpha.-olefins and cyclopentene can be polymerized by using catalyst system containing a nickel or palladium .alpha.-diimine complex, a metal containing hydrocarbylation compound, and a selected Lewis acid, or a catalyst system containing certain nickel[II] or palladium[II] compounds, an .alpha.-diimine, a metal containing hydrocarbylation compound, and optionally a selected Lewis acid. The process advantageously produces polyolefins useful for molding resins, films, elastomers and other uses.
摘要翻译：某些烯烃如乙烯，α-烯烃和环戊烯可以通过使用含有镍或钯的α-二亚胺络合物，含有金属的烃基化合物和选择的路易斯酸的催化剂体系或含有某些镍[II] 或钯[II]化合物，α-二亚胺，含金属的烃基化合物和任选的选择的路易斯酸。该方法有利地产生可用于模制树脂，薄膜，弹性体和其它用途的聚烯烃。

10. 发明授权

US07108953B2 Dissolution inhibitors in photoresist compositions for microlithography 有权
标题翻译：用于微光刻的光致抗蚀剂组合物中的溶解抑制剂
公开(公告)号：US07108953B2
公开(公告)日：2006-09-19
申请号：US10380990
申请日：2001-10-12
申请人： Larry L. Berger , Jerald Feldman , Viacheslav Alexandrovich Petrov , Frank L. Schadt, III , Andrew E. Feiring , Fredrick Claus Zumsteg, Jr.
发明人： Larry L. Berger , Jerald Feldman , Viacheslav Alexandrovich Petrov , Frank L. Schadt, III , Andrew E. Feiring , Fredrick Claus Zumsteg, Jr.
IPC分类号： G03C1/73 , G03C1/76 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0395 , Y10S430/106 , Y10S430/108
摘要： The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(Rf)(Rf′)OR wherein Rf and Rf′ are the same or different fluoroalkyl groups of from one or taken together are (CF2)a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 μm at a wavelength of 157 nm.
摘要翻译：本发明涉及包含聚合物粘合剂的光致抗蚀剂组合物; 光活性成分; 和至少一种溶解抑制剂，其包含链烷烃或环烷烃化合物，其含有至少一个具有结构-C（R f）另一方面，一个或多个氟烷基是相同或不同的氟代烷基，或一起为（CF 2） >其中a为2至约10的整数，R为氢原子或酸不稳定保护基。通常，溶解抑制剂在157nm的波长下的吸收系数小于约4.0μm。

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