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    • 4. 发明申请
    • Method of fabricating ridge type waveguide integrated semiconductor optical device
    • 脊型波导集成半导体光器件的制造方法
    • US20060104583A1
    • 2006-05-18
    • US11122998
    • 2005-05-06
    • Jong KimHyun KimKang KimOh KwonEun SimKwang Oh
    • Jong KimHyun KimKang KimOh KwonEun SimKwang Oh
    • G02B6/10
    • G02B6/136G02B6/122G02B2006/12097
    • Provided is a method of fabricating a ridge type waveguide integrated semiconductor optical device. The method includes: separating a substrate into an active waveguide region and a passive waveguide region and selectively epitaxial-growing an active layer and a passive layer in the active waveguide region and the passive waveguide region, respectively, such that the active layer and the passive layer are vertically aligned with each other; sequentially forming a capping layer and an electrode connection layer on the active layer and the passive layer; forming a first insulating layer pattern on a predetermined region of the electrode connection layer disposed in the active waveguide region and simultaneously, forming a second insulating layer pattern on a predetermined region of the electrode connection layer disposed in the passive waveguide region; forming a shallow ridge type active waveguide and a shallow ridge type passive waveguide by performing an etching process using the first and second insulating layer patterns as etch masks until the capping layer is etched to a predetermined depth; and forming a passivation pattern on the entire surface of the shallow ridge type active waveguide and forming a deep ridge type passive waveguide by performing an etching process using the second insulating layer pattern as an etch mask until the substrate is etched to a predetermined depth.
    • 提供了一种制造脊型波导集成半导体光学器件的方法。 该方法包括:将衬底分离成有源波导区域和无源波导区域,并分别在有源波导区域和无源波导区域中选择性地外延生长有源层和无源层,使得有源层和被动 层彼此垂直对准; 在有源层和被动层上依次形成覆盖层和电极连接层; 在设置在有源波导区域中的电极连接层的预定区域上形成第一绝缘层图案,并同时在布置在无源波导区域中的电极连接层的预定区域上形成第二绝缘层图案; 通过使用第一和第二绝缘层图案作为蚀刻掩模进行蚀刻处理,直到将覆盖层蚀刻到预定深度来形成浅脊型有源波导和浅脊型无源波导; 并且在浅脊型有源波导的整个表面上形成钝化图案,并通过使用第二绝缘层图案作为蚀刻掩模进行蚀刻处理形成深脊型无源波导,直到基板被蚀刻到预定深度。
    • 8. 发明申请
    • Parabolic waveguide-type collimating lens with tunable external cavity laser diode provided with the same
    • 具有可调谐外腔激光二极管的抛物面波导型准直透镜
    • US20070133650A1
    • 2007-06-14
    • US11654112
    • 2007-01-17
    • Hyun-Soo KimEun Sim
    • Hyun-Soo KimEun Sim
    • H01S3/08G02B6/34
    • H01S5/141G02B6/12004G02B6/1228G02B2006/12102G02B2006/12107G02B2006/12121H01S5/0071H01S5/026H01S5/0654H01S5/1014H01S5/143H01S5/2231
    • The present invention relates to a semiconductor based parabolic waveguide-type collimating lens and a monolithically integrated type tunable external cavity laser diode light source. The monolithically integrated type tunable external cavity laser diode light source includes a gain medium for generating a gain of an optical signal, a collimating lens for correcting an divergent light beam to a parallel light beam, a passive waveguide through which the parallel light beam travels, an optical deflector to change a traveling direction of the parallel light beam changing a refractive index of medium on a traveling path of the parallel light beam traveling through the slab waveguide in response to an external electric signal and a diffraction grating to diffract the parallel light beam passing through the optical deflector, wherein these are integrate into one substrate made of an InP-based semiconductor as well as a material such as a GaAs-based semiconductor, a Si-based semiconductor, LiNbO3-based semiconductor or the like.
    • 本发明涉及一种基于半导体的抛物面波导型准直透镜和单片集成型可调谐外腔激光二极管光源。 单片集成型可调谐外腔激光二极管光源包括用于产生光信号增益的增益介质,用于将发散光束校正为平行光束的准直透镜,平行光束通过该无源波导传播的无源波导, 光学偏转器,用于响应于外部电信号和衍射光栅,改变沿平行光束行进的平行光束的行进路径上的介质折射率的平行光束的行进方向,以衍射平行光束 通过光学偏转器,其中这些被集成到由基于InP的半导体制成的一个衬底中,以及诸如GaAs基半导体,Si基半导体,LiNbO 3基的材料 半导体等。
    • 10. 发明申请
    • Method for manufacturing semiconductor optical amplifier having planar buried heterostructure
    • 具有平面掩埋异质结构的半导体光放大器的制造方法
    • US20050084991A1
    • 2005-04-21
    • US10844321
    • 2004-05-13
    • Dong LeeEun SimKi KimMoon Park
    • Dong LeeEun SimKi KimMoon Park
    • H01S5/30H01L21/00H01S5/22H01S5/227H01S5/32H01S5/50
    • H01S5/5009H01S5/1014H01S5/2206H01S5/227H01S5/3213H01S2301/173H01S2301/18
    • Provided is a method for manufacturing a planar buried semiconductor optical amplifier in which a spot size converter with a double-core structure is integrated, comprising the steps of: after growing a lower cladding layer, a lower waveguide layer and an upper cladding layer on a substrate, patterning a portion of thickness of the lower cladding layer, the lower waveguide layer and the upper cladding layer through an etching process using a dielectric layer pattern to form a lower waveguide; growing a planarization layer on the etched portions of the lower cladding layer, the lower waveguide layer and the upper cladding layer to smooth a surface; after removing the dielectric layer pattern, growing a space layer, an upper waveguide layer and a first cladding layer on the overall upper surface; patterning the first cladding layer, the upper waveguide layer and the space layer through the etching process using the dielectric layer pattern to form an upper waveguide having a horizontal taper area; after growing a first current blocking layer on the etched portions of the first cladding layer, the upper waveguide layer and the space layer of the upper waveguide, growing a second current blocking layer on the exposed portion of the first current block layer excluding the dielectric layer pattern; and after removing the dielectric layer pattern, forming a second cladding layer on the overall upper surface, and forming an electrode on the second cladding layer and the substrate, respectively.
    • 提供一种制造平面埋入式半导体光放大器的方法,其中集成了具有双芯结构的光斑尺寸转换器,包括以下步骤:在下敷层,下波导层和上包层上生长 基板,通过使用电介质层图案的蚀刻工艺构图下包层,下波导层和上包层的厚度的一部分,以形成下波导; 在下包层,下波导层和上包层的蚀刻部分上生长平坦化层,以平滑表面; 在去除介电层图案之后,在整个上表面上生长空间层,上波导层和第一包层; 通过使用电介质层图案的蚀刻工艺图案化第一包层,上波导层和空间层,以形成具有水平锥面积的上波导; 在第一包层的蚀刻部分,上波导层和上波导的空间层上生长第一电流阻挡层之后,在除电介质层之外的第一电流块层的暴露部分上生长第二电流阻挡层 模式; 并且在去除介电层图案之后,在整个上表面上形成第二包层,并分别在第二包覆层和基板上形成电极。