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    • 1. 发明专利
    • MEASURING APPARATUS
    • JPH1194787A
    • 1999-04-09
    • JP21737498
    • 1998-07-31
    • ERA PATENTS LTDUNIV CRANFIELD
    • ROJIYAA DEIBITSUDO TEITSUZUUERJIYON REIMENTO NIKORUZU
    • G01B7/02G01L1/20G01M5/00G01N3/32G01N27/20
    • PROBLEM TO BE SOLVED: To monitor the development of a crack in a wide range of a direction, by measuring the impedances of two extended electrodes constituted so as to pass a current to a resistance layer and the impedance of the resistance layer, and measuring the size of the crack in a processed article or a test piece from the measured values. SOLUTION: Curved electrodes or bus bars 2 are formed on the resistance layer 1 formed on a dielectric substrate 3. A detector is mounted on a processed article or a Lest piece. In the development of the crack of the processed article or the test piece, a crack is generated in the dielectric substrate 3 and the resistance layer 1 in the same pattern as the crack pattern of the processed article or the test piece. When the crack is generated in the resistance layer, the resistance layer 1 is reduced in its cross area to be increased in its resistance. Voltage is dropped between two bus bars 2 by the impedance of the resistance layer 1 and this voltage drop corresponds to the impedance of the resistance layer 1. The voltage drop has the linearity corresponding to a crack size by the curving ratio of the bus bars 2, and is made substantially regardless of a crack developing direction.
    • 3. 发明申请
    • PRODUCTION OF FINE POINTS ON A SUBSTRATE
    • 在基材上生产细点
    • WO1993005530A1
    • 1993-03-18
    • PCT/GB1992001596
    • 1992-09-01
    • ERA PATENTS LTD.HOWARD, Pippa
    • ERA PATENTS LTD.
    • H01J37/317
    • H01J37/3178H01J9/025
    • A method of forming a fine point or spike or array of fine points or spikes on a substrate (5) in which an electron beam (6) is focussed onto the substrate (5) at each point that a fine point or spike is required. The substrate (5) is positioned within a low pressure atmosphere, the atmosphere containing a precursor of the material for example a hydrocarbon or organo-metallic gas which forms the fine point or spike. The focussed electron beam (6) causes the deposition of material onto the substrate (5) to form the fine point or spike. An array of such fine points or spikes can be used as a field-emitter cathode surface in vacuum electronics.
    • 在基板(5)上形成精细点或尖峰或尖晶石或精细阵列的方法,其中电子束(6)在需要微小点或尖峰的每个点聚焦到基板(5)上。 基材(5)位于低压气氛中,该气氛含有形成细微点或尖峰的材料的前体例如烃或有机金属气体。 聚焦的电子束(6)导致材料沉积到衬底(5)上以形成细微点或尖峰。 这样的精细点或尖峰的阵列可以用作真空电子器件中的场致发射极阴极表面。