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    • 2. 发明申请
    • X-RAY SOURCE PROVIDED WITH A LIQUID METAL TARGET
    • X射线源由液体金属靶提供
    • WO2003001556A1
    • 2003-01-03
    • PCT/IB2002/002374
    • 2002-06-20
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.PHILIPS CORPORATE INTELLECTUAL PROPERTY GMBHHARDING, GeoffreyDAVID, BerndECKART, Rainer, W.SCHLOMKA, Jens, P.
    • HARDING, GeoffreyDAVID, BerndECKART, Rainer, W.SCHLOMKA, Jens, P.
    • H01J35/08
    • H01J35/08H01J2235/082
    • The invention relates to an X-ray source which is provided with a liquid metal target (3) which flows through a system of ducts (6) and is conducted through a duct section (8) whose flow cross-section is reduced relative to that of the system of ducts. The X-ray source is characterized notably in that there is provided a pressure source (12, 13; 14; 16) for acting on the liquid metal target (3) in such a manner that in the operating condition of the X-ray source the pressure in the liquid metal target (3) at the area of the reduced flow cross-section equals essentially a selectable reference value (Ps) or remains essentially in a pressure range between selectable limit values (Ps1, Ps2) of the pressure. A comparatively small thickness of a window which is transparent to an electron beam can thus be realized in conjunction with a comparatively high flow speed, that is, without having to accept the risk of cavitations. The invention also relates to an X-ray apparatus provided with an X-ray source of this kind.
    • 本发明涉及一种具有液体金属靶(3)的X射线源,该液体金属靶(3)流过管道(6)的系统,并通过导管部分(8)传导,该管道部分(8)的流动横截面相对于 的管道系统。 X射线源的特征在于,提供了一个用于作用在液态金属靶(3)上的压力源(12,13; 14; 16),使得在X射线源的运行状态 在流动截面减小的区域中的液态金属靶(3)中的压力基本上等于可选择的参考值(Ps),或者基本上保持在压力的可选极限值(Ps1,Ps2)之间的压力范围内。 因此,与电子束透明的窗口相对较小的厚度可以结合较高的流速来实现,即不必接受空化的风险。 本发明还涉及具备这种X射线源的X射线装置。