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    • 2. 发明授权
    • Beam scanning method and apparatus for ion implantation
    • 光束扫描方法和离子注入装置
    • US4421988A
    • 1983-12-20
    • US349742
    • 1982-02-18
    • David A. RobertsonNorman L. Turner
    • David A. RobertsonNorman L. Turner
    • H01J37/302H01J37/317H01L21/265G21K5/00H01J3/28
    • H01J37/3171H01J37/302
    • Method of and apparatus for scanning a charged particle beam over a semiconductor wafer in a prescribed pattern. A triangular waveform, including alternating positive and negative ramp portions of constant slope and controllable time durations, is applied to a horizontal deflection system and produces horizontal scanning of the beam. The time durations of the ramp portions determine the length of the horizontal scan lines and are controlled according to a predetermined sequence so as to provide the prescribed pattern. The triangular waveform is provided by an integrator which receives a square wave from a frequency source of controllable frequency. The predetermined sequence is stored in a read only memory which controls the frequency of the frequency source. At the completion of each ramp portion, a voltage applied to a vertical deflection system is incremented so as to step the beam vertically up or down.
    • 用于以规定图案在半导体晶片上扫描带电粒子束的方法和装置。 包括具有恒定斜率和可控持续时间的交替的正和负斜坡部分的三角波形被施加到水平偏转系统,并产生横梁的水平扫描。 斜坡部分的持续时间确定水平扫描线的长度,并根据预定的顺序进行控制,以便提供规定的图案。 三角波形由积分器提供,该积分器从可控频率的频率源接收方波。 预定序列存储在控制频率源的频率的只读存储器中。 在每个斜坡部分完成时,施加到垂直偏转系统的电压递增,以使波束垂直上升或下降。