专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08652762B2 Organic graded spin on BARC compositions for high NA lithography 有权
标题翻译：用于高NA光刻的BARC组合物上的有机分级纺丝
公开(公告)号：US08652762B2
公开(公告)日：2014-02-18
申请号：US13423838
申请日：2012-03-19
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
IPC分类号： H01L21/312 , H01L29/02 , G03F7/38
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

2. 发明申请

US20120245304A1 CYCLIC CARBONYL COMPOUNDS WITH PENDANT CARBONATE GROUPS, PREPARATIONS THEREOF, AND POLYMERS THEREFROM 有权
公开(公告)号：US20120245304A1
公开(公告)日：2012-09-27
申请号：US13491847
申请日：2012-06-08
申请人： Masaki Fujiwara , James L. Hedrick , Daniel P. Sanders , Manabu Yasumoto
发明人： Masaki Fujiwara , James L. Hedrick , Daniel P. Sanders , Manabu Yasumoto
IPC分类号： C08G63/91
CPC分类号： C07D319/04 , C07D317/36 , C08G64/0233 , C08G64/30 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.

3. 发明授权

US08226838B2 Method of forming polymer features by directed self-assembly of block copolymers 有权
标题翻译：通过嵌段共聚物的定向自组装形成聚合物特征的方法
公开(公告)号：US08226838B2
公开(公告)日：2012-07-24
申请号：US12061693
申请日：2008-04-03
申请人： Joy Cheng , William D. Hinsberg , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders
发明人： Joy Cheng , William D. Hinsberg , Ho-Cheol Kim , Charles T. Rettner , Daniel P. Sanders
IPC分类号： C03C15/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.
摘要翻译：公开了形成聚合物结构的方法，包括：将包含至少一种嵌段共聚物的嵌段共聚物组合物溶液施加到其上具有化学图案的中性衬底上，所述化学图案包括化学上不同的交替的钉扎和中性区域，并且具有第一空间频率由衬底上沿着给定方向的成套组钉扎和中性区域的数量给出; 以及通过根据下面的化学图案横向分离块而形成嵌段共聚物的结构域，其中嵌段共聚物组合物的至少一个结构域对于钉扎区域具有亲和力，其中横跨化学图案延伸的结构是所述结构具有由给定方向上的至少是第一空间频率的两倍的畴的重复集合的数量给出的统一的第二空间频率。

4. 发明申请

US20120178891A1 POLYMERS BEARING PENDANT PENTAFLUOROPHENYL ESTER GROUPS, AND METHODS OF SYNTHESIS AND FUNCTIONALIZATION THEREOF 有权
标题翻译：聚酯树脂，其合成及其功能化方法
公开(公告)号：US20120178891A1
公开(公告)日：2012-07-12
申请号：US13414803
申请日：2012-03-08
申请人： Masaki Fujiwara , James L. Hedrick , Alshakim Nelson , Daniel P. Sanders , Yoshiharu Terui , Manabu Yasumoto
发明人： Masaki Fujiwara , James L. Hedrick , Alshakim Nelson , Daniel P. Sanders , Yoshiharu Terui , Manabu Yasumoto
IPC分类号： C08F124/00 , C08G64/00
CPC分类号： C08G64/1633 , C07D319/06 , C08G63/08 , C08G63/64 , C08G64/0233 , C08G64/0241 , C08G64/025 , C08G64/38 , C08G64/42 , C08G2261/126 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
摘要翻译：公开了一种制备包含活性五氟苯基酯基团的环状羰基化合物的一锅法。环状羰基化合物可以通过开环方法聚合以形成包含包含侧链五氟苯酯基的重复单元的ROP聚合物。使用合适的亲核试剂，可以在开环聚合前后选择性地将五氟苯基酯基团转变成多种其它官能团。

5. 发明授权

US08178700B2 Method of preparing cyclic carbonates, cyclic carbamates, cyclic ureas, cyclic thiocarbonates, cyclic thiocarbamates, and cyclic dithiocarbonates 失效
标题翻译：环状碳酸酯，环状氨基甲酸酯，环状脲，环状硫代碳酸酯，环状硫代氨基甲酸酯和环状二硫代碳酸酯的制备方法
公开(公告)号：US08178700B2
公开(公告)日：2012-05-15
申请号：US12434766
申请日：2009-05-04
申请人： James L. Hedrick , Alshakim Nelson , Daniel P. Sanders
发明人： James L. Hedrick , Alshakim Nelson , Daniel P. Sanders
IPC分类号： C07D265/10 , C07D323/04 , C07D239/10 , C07D319/06
CPC分类号： C07D319/06 , C07D239/10 , C07D265/10 , C07D327/06 , C07D339/08 , Y02P20/582
摘要： A method of preparing a cyclic monomer, comprising: forming a first mixture comprising a precursor compound, bis(pentafluorophenyl) carbonate, and a catalyst; wherein the precursor compound has a structure comprising a) two or more carbons, and b) two functional groups selected from the group consisting of primary amine, secondary amine, thiol group, hydroxyl group, and combinations thereof; and agitating the first mixture at a temperature effective to form a second mixture comprising the cyclic monomer, the cyclic monomer selected from the group consisting of a cyclic carbonate, a cyclic carbamate, a cyclic urea, a cyclic thiocarbonate, a cyclic thiocarbamate, and a cyclic dithiocarbonate.
摘要翻译：一种制备环状单体的方法，包括：形成包含前体化合物，双（五氟苯基）碳酸酯和催化剂的第一混合物; 其中所述前体化合物具有包含a）两个或更多个碳的结构，和b）选自伯胺，仲胺，硫醇基，羟基及其组合的两个官能团; 并在有效形成包含环状单体的第二混合物的温度下搅拌第一混合物，所述环状单体选自环状碳酸酯，环状氨基甲酸酯，环状脲，环状硫代碳酸酯，环状硫代氨基甲酸酯，和环状二硫代碳酸酯。

6. 发明申请

US20120103935A1 METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES 有权
标题翻译：改善自组装聚合物特征的方法
公开(公告)号：US20120103935A1
公开(公告)日：2012-05-03
申请号：US12913835
申请日：2010-10-28
申请人： Joy Cheng , Hayato Namai , Daniel P. Sanders
发明人： Joy Cheng , Hayato Namai , Daniel P. Sanders
IPC分类号： B05D3/10
CPC分类号： B81C1/00031 , B81C2201/0149 , H01L21/0271 , H01L21/0337 , H01L21/0338
摘要： A method for processing a structure. The structure is formed and includes a substrate, a substructure having a sidewall and disposed on the substrate, a first polymer structure disposed on the substrate, and a second polymer structure disposed on the substrate such that the first polymer structure is disposed between the sidewall and the second polymer structure. An aspect ratio of the first polymer structure, the second polymer structure, or both is reduced in a reducing step. One polymer structure (i.e., the first polymer structure or the second polymer structure) is selectively removed from the structure such that a remaining polymer structure (i.e., the second polymer structure or the first polymer structure) remains disposed on the external surface of the substrate after the one polymer structure has been selectively removed, wherein the aspect ratio of the remaining polymer structure was reduced in the reducing step.
摘要翻译：一种处理结构的方法。该结构被形成并且包括衬底，具有侧壁并设置在衬底上的子结构，设置在衬底上的第一聚合物结构和设置在衬底上的第二聚合物结构，使得第一聚合物结构设置在侧壁和第二聚合物结构。在还原步骤中，第一聚合物结构，第二聚合物结构或两者的纵横比减小。从结构中选择性地除去一种聚合物结构（即，第一聚合物结构或第二聚合物结构），使得剩余的聚合物结构（即，第二聚合物结构或第一聚合物结构）保留在基材的外表面上在选择性去除一种聚合物结构之后，在还原步骤中其余聚合物结构的纵横比降低。

7. 发明申请

US20110269917A1 CYCLIC CARBONYL COMPOUNDS WITH PENDANT CARBONATE GROUPS, PREPARATIONS THEREOF, AND POLYMERS THEREFROM 失效
标题翻译：具有碳酸钙组的循环碳化合物，其制备方法及其聚合物
公开(公告)号：US20110269917A1
公开(公告)日：2011-11-03
申请号：US12770877
申请日：2010-04-30
申请人： Masaki Fujiwara , James L. Hedrick , Daniel P. Sanders , Manabu Yasumoto
发明人： Masaki Fujiwara , James L. Hedrick , Daniel P. Sanders , Manabu Yasumoto
IPC分类号： C08G64/00 , C07D317/24 , C08L69/00 , C07D319/06
CPC分类号： C07D319/04 , C07D317/36 , C08G64/0233 , C08G64/30 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
摘要翻译：公开了一种制备包含活性五氟苯基碳酸酯基团的环状羰基化合物的一锅法。环状羰基化合物可以通过开环方法聚合以形成包含包含侧链五氟苯基碳酸酯基团的重复单元的ROP聚合物。使用合适的亲核试剂，可以在开环聚合之前或之后将五氟苯基五氟苯基碳酸酯基团选择性地转化成多种其它官能团。

8. 发明授权

US07951524B2 Self-topcoating photoresist for photolithography 有权
标题翻译：用于光刻的自表面光刻胶
公开(公告)号：US07951524B2
公开(公告)日：2011-05-31
申请号：US12023108
申请日：2008-01-31
申请人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Trung , Gregory M. Wallraff
发明人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Trung , Gregory M. Wallraff
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/38
CPC分类号： G03F7/2041 , C08F220/22 , G03F7/0046 , G03F7/0397 , G03F7/11 , Y10S430/108 , Y10S430/111
摘要： Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
摘要翻译：光刻胶添加剂聚合物和光致抗蚀剂制剂，可用于浸没式光刻，而不使用额外的面漆。抗蚀剂组合物包括光致抗蚀剂聚合物，至少一种光致酸产生剂，溶剂; 和光致抗蚀剂添加剂聚合物。还有一种使用包括光致抗蚀剂添加剂聚合物的光致抗蚀剂制剂的方法。

9. 发明申请

US20100297847A1 Method of forming sub-lithographic features using directed self-assembly of polymers 有权
标题翻译：使用聚合物的定向自组装形成亚光刻特征的方法
公开(公告)号：US20100297847A1
公开(公告)日：2010-11-25
申请号：US12470760
申请日：2009-05-22
申请人： Joy Cheng , Kafai Lai , Wai-Kin Li , Young-Hye Na , Charles Rettner , Daniel P. Sanders , Da Yang
发明人： Joy Cheng , Kafai Lai , Wai-Kin Li , Young-Hye Na , Charles Rettner , Daniel P. Sanders , Da Yang
IPC分类号： H01L21/465
CPC分类号： H01L21/76816 , B81B2203/0353 , B81B2207/07 , B81C1/00031 , B81C2201/0149 , B81C2201/0198 , G03F7/40 , H01L21/0337 , H01L21/31144 , Y10S438/947
摘要： Methods involving the self-assembly of block copolymers are described herein, in which by beginning with openings (in one or more substrates) that have a targeted CD (critical dimension), holes are formed, in either regular arrays or arbitrary arrangements. Significantly, the percentage variation in the average diameter of the formed holes is less than the percentage variation of the average diameter of the initial openings. The formed holes (or vias) can be transferred into the underlying substrate(s), and these holes may then be backfilled with material, such as a metallic conductor. Preferred aspects of the invention enable the creation of vias with tighter pitch and better CD uniformity, even at sub-22 nm technology nodes.
摘要翻译：本文描述了涉及嵌段共聚物的自组装的方法，其中从具有目标CD（临界尺寸）的开口（在一个或多个衬底中）开始，以规则阵列或任意布置形成孔。显着地，形成的孔的平均直径的百分比变化小于初始开口的平均直径的变化百分比。形成的孔（或通孔）可以被转移到下面的基底中，然后这些孔可以用诸如金属导体的材料回填。本发明的优选方面能够创建具有更紧的间距和更好的CD均匀性的通孔，即使在22nm以下的技术节点处。

10. 发明授权

US07816069B2 Graded spin-on organic antireflective coating for photolithography 有权
标题翻译：梯度旋涂有机抗反射涂层用于光刻
公开(公告)号：US07816069B2
公开(公告)日：2010-10-19
申请号：US11473338
申请日：2006-06-23
申请人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
发明人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
IPC分类号： G03F7/11 , G03C1/00 , C08L29/04 , C08L27/12
CPC分类号： G03F7/091 , Y10S438/952
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式