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1. 发明授权

US09259805B2 Mask for evaporation, and method and apparatus for manufacturing the same 有权
标题翻译：用于蒸发的掩模，及其制造方法和装置
公开(公告)号：US09259805B2
公开(公告)日：2016-02-16
申请号：US12964706
申请日：2010-12-09
申请人： Joon-Hyung Kim , Young-Geun Cho , Eui-Shin Shin , Jong-Heon Kim , Seung-Ho Choi , Cheol-Lae Roh , Chang-Mog Jo , Jae-Seok Park
发明人： Joon-Hyung Kim , Young-Geun Cho , Eui-Shin Shin , Jong-Heon Kim , Seung-Ho Choi , Cheol-Lae Roh , Chang-Mog Jo , Jae-Seok Park
IPC分类号： B32B37/04 , B05C11/11 , B23K26/30 , B23K26/03 , B23K26/06 , H01L51/00
CPC分类号： B23K26/402 , B23K26/032 , B23K26/066 , B23K26/0661 , B23K26/702 , B23K2103/50 , H01L51/0011
摘要： Provided is a mask for an evaporation apparatus, which includes a first division mask and a second division mask. The first and second division masks are directly bonded to each other by welding, thereby forming welding portion between the first and the second division masks. A method and apparatus for manufacturing a mask for evaporation are also provided. The division masks according to the embodiment do not use subframes, and are directly bonded to one another by welding, so that a shadow effect does not occur. The apparatus for manufacturing a mask for evaporation includes a work stage, a clamp fixing a first division mask and a second division mask to the work stage, and a laser welding part welding the first division mask to the second division mask. The apparatus may further include a first roller leading the laser welding part and a second roller following the laser welding part.
摘要翻译：提供了一种用于蒸发装置的掩模，其包括第一分隔掩模和第二分隔掩模。第一和第二分割掩模通过焊接直接接合，从而在第一和第二分隔掩模之间形成焊接部分。还提供了用于制造用于蒸发的掩模的方法和装置。根据本实施例的分割掩模不使用子帧，并且通过焊接直接接合，从而不发生阴影效应。用于制造用于蒸发的掩模的装置包括工作台，将第一分区掩模固定到工作台的夹具和将第一分隔掩模焊接到第二分隔掩模的激光焊接部。该装置还可以包括引导激光焊接部的第一辊和跟随激光焊接部的第二辊。

2. 发明申请

US20110165327A1 THIN FILM DEPOSITION APPARATUS 审中-公开
标题翻译：薄膜沉积装置
公开(公告)号：US20110165327A1
公开(公告)日：2011-07-07
申请号：US12979656
申请日：2010-12-28
申请人： Hyun-Sook PARK , Chang-Mog JO , Hee-Cheol KANG , Yun-Mi LEE , Un-Cheol SUNG , Yong-Sun CHOI , Jong-Heon KIM , Jae-Kwang RYU
发明人： Hyun-Sook PARK , Chang-Mog JO , Hee-Cheol KANG , Yun-Mi LEE , Un-Cheol SUNG , Yong-Sun CHOI , Jong-Heon KIM , Jae-Kwang RYU
IPC分类号： C23C16/44 , C23C16/04
CPC分类号： C23C14/24 , C23C14/042 , H01L51/001
摘要： A thin film deposition apparatus that can be simply applied to produce large-sized display devices on a mass scale and that improves manufacturing yield. The thin film deposition apparatus includes a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in a second direction that is perpendicular to the first direction. A deposition is performed while the substrate or the thin film deposition apparatus moves relative to each other in the first direction, and the deposition source, the deposition source nozzle unit, and the patterning slit sheet are formed integrally with each other.
摘要翻译：一种薄膜沉积装置，其可以简单地应用于大规模生产大尺寸显示装置并且提高制造产量。薄膜沉积装置包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及与沉积源喷嘴单元相对设置并包括沿垂直于第一方向的第二方向布置的多个图案化狭缝的图案化缝隙片。当基板或薄膜沉积装置在第一方向上相对移动时进行沉积，并且沉积源，沉积源喷嘴单元和图案化缝隙片彼此一体地形成。

3. 发明申请

US20110139365A1 MASK FOR EVAPORATION, AND METHOD AND APPARATUS FOR MANUFACTURING THE SAME 有权
标题翻译：用于蒸发的掩模，以及用于制造其的方法和装置
公开(公告)号：US20110139365A1
公开(公告)日：2011-06-16
申请号：US12964706
申请日：2010-12-09
申请人： Joon-Hyung Kim , Young-Geun Cho , Eui-Shin Shin , Jong-Heon Kim , Seung-Ho Choi , Cheol-Lae Roh , Chang-Mog Jo , Jae-Seok Park
发明人： Joon-Hyung Kim , Young-Geun Cho , Eui-Shin Shin , Jong-Heon Kim , Seung-Ho Choi , Cheol-Lae Roh , Chang-Mog Jo , Jae-Seok Park
IPC分类号： B32B37/04 , B05C11/11
CPC分类号： B23K26/402 , B23K26/032 , B23K26/066 , B23K26/0661 , B23K26/702 , B23K2103/50 , H01L51/0011
摘要： Provided is a mask for an evaporation apparatus, which includes a first division mask and a second division mask. The first and second division masks are directly bonded to each other by welding, thereby forming welding portion between the first and the second division masks. A method and apparatus for manufacturing a mask for evaporation are also provided. The division masks according to the embodiment do not use subframes, and are directly bonded to one another by welding, so that a shadow effect does not occur. The apparatus for manufacturing a mask for evaporation includes a work stage, a clamp fixing a first division mask and a second division mask to the work stage, and a laser welding part welding the first division mask to the second division mask. The apparatus may further include a first roller leading the laser welding part and a second roller following the laser welding part.
摘要翻译：提供了一种用于蒸发装置的掩模，其包括第一分隔掩模和第二分隔掩模。第一和第二分割掩模通过焊接直接接合，从而在第一和第二分隔掩模之间形成焊接部分。还提供了用于制造用于蒸发的掩模的方法和装置。根据本实施例的分割掩模不使用子帧，并且通过焊接直接接合，从而不发生阴影效应。用于制造用于蒸发的掩模的装置包括工作台，将第一分区掩模固定到工作台的夹具和将第一分隔掩模焊接到第二分隔掩模的激光焊接部。该装置还可以包括引导激光焊接部的第一辊和跟随激光焊接部的第二辊。

4. 发明授权

US08859325B2 Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method 有权
标题翻译：薄膜沉积装置，使用该装置的有机发光显示装置的制造方法以及使用该方法制造的有机发光显示装置
公开(公告)号：US08859325B2
公开(公告)日：2014-10-14
申请号：US12987569
申请日：2011-01-10
申请人： Yun-Mi Lee , Sang-Soo Kim , Chang Mog Jo , Hyun-Sook Park
发明人： Yun-Mi Lee , Sang-Soo Kim , Chang Mog Jo , Hyun-Sook Park
IPC分类号： H01L51/40 , H01L51/00 , C23C14/24 , C23C14/56 , C23C14/04 , H01L51/56
CPC分类号： H01L51/001 , C23C14/042 , C23C14/243 , C23C14/568 , H01L51/0011 , H01L51/56
摘要： A thin film deposition apparatus, a method of manufacturing an organic light-emitting display device by using the thin film deposition apparatus, and an organic light-emitting display device manufactured by using the method. The thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits having different lengths arranged in the first direction; and a barrier plate assembly disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, and including a plurality of barrier plates that partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces, wherein the thin film deposition apparatus is separated from the substrate by a predetermined distance, and the thin film deposition apparatus and the substrate are movable relative to each other.
摘要翻译：薄膜沉积装置，使用薄膜沉积装置制造有机发光显示装置的方法以及使用该方法制造的有机发光显示装置。薄膜沉积设备包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 图案化缝隙片，与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的具有不同长度的多个图案化缝隙; 以及阻挡板组件，其在所述第一方向上设置在所述沉积源喷嘴单元和所述图案化缝隙片之间，并且包括将所述沉积源喷嘴单元和所述图案化缝隙片之间的空间分隔成多个子区域的多个阻挡板，沉积空间，其中所述薄膜沉积设备与所述基板分离预定距离，并且所述薄膜沉积设备和所述基板可相对于彼此移动。

5. 发明申请

US20120103253A1 ORGANIC LAYER DEPOSITION APPARATUS 有权
标题翻译：有机层沉积装置
公开(公告)号：US20120103253A1
公开(公告)日：2012-05-03
申请号：US13244391
申请日：2011-09-24
申请人： Hyun-Sook Park , Chang-Mog Jo , Yun-Mi Lee , Seok-Rak Chang
发明人： Hyun-Sook Park , Chang-Mog Jo , Yun-Mi Lee , Seok-Rak Chang
IPC分类号： B05B15/04
CPC分类号： H01L21/67173 , B05D1/60 , C23C14/042 , C23C14/12 , H01L21/67207 , H01L51/0005
摘要： An organic layer deposition apparatus capable of reducing or minimizing shifting of a pattern, caused when a patterning slit sheet sags.
摘要翻译：一种有机层沉积装置，其能够减少或最小化图案狭缝片下垂时产生的图案的移动。

6. 发明申请

US20110220022A1 THIN FILM DEPOSITION APPARATUS 有权
标题翻译：薄膜沉积装置
公开(公告)号：US20110220022A1
公开(公告)日：2011-09-15
申请号：US13014225
申请日：2011-01-26
申请人： Jong-Won HONG , Seok-Rak Chang , Chang-Mog Jo , Young-Mook Choi , Jae-Kwang Ryu
发明人： Jong-Won HONG , Seok-Rak Chang , Chang-Mog Jo , Young-Mook Choi , Jae-Kwang Ryu
IPC分类号： B05C11/00 , B05B1/28 , B05C11/11
CPC分类号： C23C16/52 , C23C14/042 , C23C14/243 , C23C14/54 , C23C14/568 , C23C16/042 , H01L51/5253 , H01L51/56
摘要： A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.
摘要翻译：薄膜沉积设备包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 图案化缝隙片，与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 位置检测构件，其检测所述基板与所述图案化缝隙片的相对位置; 以及对准控制部件，其通过使用由所述位置检测部件检测出的所述基板的相对位置来控制所述图案化狭缝片材与所述基板的相对位置，其中所述薄膜沉积设备和所述基板彼此分离，薄膜沉积设备和基板相对于彼此移动。

7. 发明申请

US20110088622A1 THIN FILM DEPOSITION APPARATUS 有权
标题翻译：薄膜沉积装置
公开(公告)号：US20110088622A1
公开(公告)日：2011-04-21
申请号：US12907396
申请日：2010-10-19
申请人： Yong-Sup Choi , Kang-Il Lee , Chang Mog Jo
发明人： Yong-Sup Choi , Kang-Il Lee , Chang Mog Jo
IPC分类号： C23C16/04
CPC分类号： H01L21/02107 , C23C14/04 , C23C14/044 , C23C14/12 , C23C14/24 , C23C14/243 , C23C14/564 , C23C16/04 , C23C16/042 , C23C16/448 , C23C16/4485 , C23C16/45563
摘要： A thin film deposition apparatus can be simply applied to produce large-sized display devices on a mass scale and improves manufacturing yield. The thin film deposition apparatus for forming a thin film on a substrate includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; wherein each of the patterning slits includes a plurality of sub-slits.
摘要翻译：薄膜沉积装置可以简单地应用于大规模生产大尺寸显示装置并提高制造成品率。用于在基板上形成薄膜的薄膜沉积装置包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及图案化缝隙片，与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 其中每个图案化缝隙包括多个子狭缝。

8. 发明授权

US09450140B2 Thin film deposition apparatus and method of manufacturing organic light-emitting display apparatus using the same 有权
标题翻译：薄膜沉积装置及使用其的有机发光显示装置的制造方法
公开(公告)号：US09450140B2
公开(公告)日：2016-09-20
申请号：US12869830
申请日：2010-08-27
申请人： Chang-Mog Jo , Jong-Heon Kim , Yong-Sup Choi , Sang-Soo Kim , Hee-Cheol Kang , Young-Mook Choi
发明人： Chang-Mog Jo , Jong-Heon Kim , Yong-Sup Choi , Sang-Soo Kim , Hee-Cheol Kang , Young-Mook Choi
IPC分类号： B05D5/06 , C23C16/00 , B05D1/32 , H01L21/00 , H01L33/00 , C23C14/04 , C23C14/12 , C23C14/24 , C23C14/56 , H01L21/67 , H01L21/683 , H01L51/00 , H01L51/56 , H01L27/32
CPC分类号： H01L33/005 , C23C14/042 , C23C14/12 , C23C14/243 , C23C14/246 , C23C14/568 , H01L21/67173 , H01L21/67225 , H01L21/67236 , H01L21/6831 , H01L27/3211 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： A thin film deposition apparatus used to manufacture large substrates on a mass scale and that allows high-definition patterning, and a method of manufacturing an organic light-emitting display apparatus using the same, the apparatus includes a loading unit fixing a substrate onto an electrostatic chuck; a deposition unit including a chamber maintained in a vacuum state and a thin film deposition assembly disposed in the chamber, separated from the substrate by a predetermined distance, to deposit a thin film on the substrate fixed on the electrostatic chuck; an unloading unit separating the substrate on which a deposition process is completed, from the electrostatic chuck; a first circulation unit sequentially moving the electrostatic chuck on which the substrate is fixed, to the loading unit, the deposition unit, and the unloading unit; and a second circulation unit returning the electrostatic chuck separated from the substrate to the loading unit from the unloading unit, wherein the first circulation unit passes through the chamber when passing through the deposition unit.
摘要翻译：一种薄膜沉积装置，用于大规模制造大型基板并允许高分辨率图案化，以及制造使用其的有机发光显示装置的方法，该装置包括将基板固定在静电上的装载单元卡盘沉积单元，其包括保持在真空状态的室和设置在所述室中的薄膜沉积组件，其与所述基板隔开预定距离，以在固定在所述静电卡盘上的所述基板上沉积薄膜; 从所述静电卡盘将分离完成了沉积处理的基板的卸载单元; 顺序地将固定有基板的静电卡盘移动到加载单元，沉积单元和卸载单元的第一循环单元; 以及第二循环单元，其将从所述基板分离的所述静电卡盘从所述卸载单元返回到所述装载单元，其中所述第一循环单元在通过所述沉积单元时通过所述室。

9. 发明申请

US20130298829A1 THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS USING THE SAME 审中-公开
标题翻译：薄膜沉积装置及使用其制造有机发光显示装置的方法
公开(公告)号：US20130298829A1
公开(公告)日：2013-11-14
申请号：US13943221
申请日：2013-07-16
申请人： Chang-Mog Jo , Jong-Heon Kim , Yong-Sup Choi , Sang-Soo Kim , Hee-Cheol Kang , Young-Mook Choi
发明人： Chang-Mog Jo , Jong-Heon Kim , Yong-Sup Choi , Sang-Soo Kim , Hee-Cheol Kang , Young-Mook Choi
IPC分类号： H01L33/00
CPC分类号： H01L33/005 , C23C14/042 , C23C14/12 , C23C14/243 , C23C14/246 , C23C14/568 , H01L21/67173 , H01L21/67225 , H01L21/67236 , H01L21/6831 , H01L27/3211 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： A thin film deposition apparatus used to manufacture large substrates on a mass scale and that allows high-definition patterning, and a method of manufacturing an organic light-emitting display apparatus using the same, the apparatus inclues a loading unit fixing a substrate onto an electrostatic chuck; a deposition unit including a chamber maintained in a vacuum state and a thin film deposition assembly disposed in the chamber, separated from the substrate by a predetermined distance, to deposit a thin film on the substrate fixed on the electrostatic chuck; an unloading unit separating the substrate on which a deposition process is completed, from the electrostatic chuck; a first circulation unit sequentially moving the electrostatic chuck on which the substrate is fixed, to the loading unit, the deposition unit, and the unloading unit; and a second circulation unit returning the electrostatic chuck separated from the substrate to the loading unit from the unloading unit, wherein the first circulation unit passes through the chamber when passing through the deposition unit.
摘要翻译：一种薄膜沉积装置，用于大规模制造大型基板并允许高分辨率图案化，以及制造使用其的有机发光显示装置的方法，该装置包括将基板固定在静电上的装载单元卡盘沉积单元，其包括保持在真空状态的室和设置在所述室中的薄膜沉积组件，其与所述基板隔开预定距离，以在固定在所述静电卡盘上的所述基板上沉积薄膜; 从所述静电卡盘将分离完成了沉积处理的基板的卸载单元; 顺序地将固定有基板的静电卡盘移动到加载单元，沉积单元和卸载单元的第一循环单元; 以及第二循环单元，将从所述基板分离的所述静电卡盘从所述卸载单元返回到所述装载单元，其中，所述第一循环单元在通过所述沉积单元时通过所述室。

10. 发明申请

US20120009328A1 THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE SAME 审中-公开
标题翻译：薄膜沉积装置及使用其制造有机发光显示装置的方法
公开(公告)号：US20120009328A1
公开(公告)日：2012-01-12
申请号：US13178472
申请日：2011-07-07
申请人： Jae-Kwang Ryu , Chang-Mog Jo , Hee-Cheol Kang
发明人： Jae-Kwang Ryu , Chang-Mog Jo , Hee-Cheol Kang
IPC分类号： C23C16/52 , B05D5/06 , B05C11/00
CPC分类号： C23C14/042 , C23C14/54 , C23C14/56 , H01L51/56
摘要： A thin film deposition apparatus that may be precisely aligned with a substrate during a deposition process, and a method of manufacturing an organic light-emitting display device using the thin film deposition apparatus.
摘要翻译：可以在沉积工艺期间精确地与衬底对准的薄膜沉积设备，以及使用该薄膜沉积设备制造有机发光显示器件的方法。

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