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    • 4. 发明授权
    • Method for activating P-type semiconductor layer
    • 激活P型半导体层的方法
    • US07368369B2
    • 2008-05-06
    • US11049981
    • 2005-02-04
    • Bor-Jen WuNae-Guann YihYuan-Hsiao Chang
    • Bor-Jen WuNae-Guann YihYuan-Hsiao Chang
    • H01L21/322H01L21/04H01L21/302H01L21/31
    • H01L21/3228H01L21/0237H01L21/0254H01L21/02579
    • A method for activating the P-type semiconductor layer of a semiconductor device is disclosed in this present invention. The above-mentioned method can activate the impurities in the P-type semiconductor layer of a semiconductor device by plasma. The plasma comprises a gas source including a VI Group compound element. The performance of the semiconductor device activated by plasma according to this invention is similar to the performance of the semiconductor device activated by heat in the prior art. Therefore, this invention can provide a method, other then heat, for activating the P-type semiconductor layer of a semiconductor device. Moreover, in this invention, during the activating process by plasma, the layers other than P-type semiconductor layer will not be affected by plasma. That is, the activating process according to this invention will not cause any side-reactions in the layers other than the P-type semiconductor layer of a semiconductor device. Thus, this invention discloses an efficient method for activating a P-type semiconductor layer of a semiconductor structure by plasma instead of heat.
    • 在本发明中公开了一种用于激活半导体器件的P型半导体层的方法。 上述方法可以通过等离子体激活半导体器件的P型半导体层中的杂质。 等离子体包括包含VI族化合物元素的气体源。 根据本发明的由等离子体激活的半导体器件的性能类似于现有技术中由热激活的半导体器件的性能。 因此,本发明可以提供用于激活半导体器件的P型半导体层的方法,然后再加热。 此外,在本发明中,在通过等离子体的激活处理中,P型半导体层以外的层不受等离子体的影响。 也就是说,根据本发明的活化方法不会在半导体器件的P型半导体层以外的层中引起任何副反应。 因此,本发明公开了一种通过等离子体代替热来激活半导体结构的P型半导体层的有效方法。
    • 5. 发明授权
    • Electrode structure for a light-emitting element
    • 用于发光元件的电极结构
    • US06963167B2
    • 2005-11-08
    • US10733408
    • 2003-12-12
    • Bor-Jen WuMei-Hui WuYuan-Hsiao ChangChien-An Chen
    • Bor-Jen WuMei-Hui WuYuan-Hsiao ChangChien-An Chen
    • H01J1/62H01L33/38H05B33/02
    • H01L33/38H01L33/20
    • An electrode structure for a light-emitting element includes a first electrode and a second electrode. The first electrode has a plurality of first fingers paralleling with each other, a first connective part, and at least a first contact part. Each first finger has a first end and a second end. Pluralities of first ends connect to the first connective part. The first contact part interposes between any first end and the first connective part. The second electrode has a plurality of second fingers paralleling with each other, a second connective part, and at least a second contact part. Each second finger has a third end and a fourth end, and any second finger is between and parallels to any two first fingers. Pluralities of third ends connect to the second connective part. The second contact part interposes between any third end and the second connective part. The second electrode defines a plurality of hexagonal units among a plurality of second ends. Each hexagonal unit shares its four sides to its adjacent hexagonal units, and the four sides include two of the second fingers and the second connective part. Each second end extends to the center of each hexagonal unit.
    • 用于发光元件的电极结构包括第一电极和第二电极。 第一电极具有彼此并联的多个第一指状物,第一连接部分和至少第一接触部分。 每个第一手指具有第一端和第二端。 多个第一端连接到第一连接部分。 第一接触部分插入在任何第一端和第一连接部分之间。 第二电极具有彼此并联的多个第二指状物,第二连接部分和至少第二接触部分。 每个第二手指具有第三端和第四端,并且任何第二手指位于并平行于任何两个第一手指之间。 多个第三端连接到第二连接部分。 第二接触部分插入任何第三端和第二连接部分之间。 第二电极在多个第二端中限定多个六边形单元。 每个六边形单元将其四个侧面共享到其相邻的六边形单元,并且四边包括两个第二指状物和第二结合部分。 每个第二端延伸到每个六边形单元的中心。
    • 10. 发明申请
    • Method for manufacturing gallium nitride light emitting diode devices
    • 制造氮化镓发光二极管器件的方法
    • US20070292978A1
    • 2007-12-20
    • US11490050
    • 2006-07-21
    • Li-Shei YehBor-Jen WuChien-An ChenHsiao-Ping Chiu
    • Li-Shei YehBor-Jen WuChien-An ChenHsiao-Ping Chiu
    • H01L21/00
    • H01L33/0079H01L33/62H01L2924/0002H01L2924/00
    • A method for manufacturing GaN LED devices is disclosed herein. First, a LED epitaxial layer is formed on a provisional substrate. Part of the LED epitaxial layer is removed to form a plurality of LED epitaxial areas. Then, a first transparent conductive layer, a metal reflective layer, and a first metal bonding layer are sequentially formed on the plurality of LED epitaxial areas and then part of the first transparent conductive layer, the metal reflective layer, and the first metal bonding layer are removed. Next, a permanent substrate is provided. At least a metal layer and a second metal bonding layer are formed on the permanent substrate. Then, part of at least the metal layer and the second metal bonding layer are removed. Next, the provisional substrate is bonded to the permanent substrate by aligned wafer bonding method. Then, the provisional substrate is removed to expose a surface of the LED epitaxial layer and then an n-type electrode is formed on the surface. Next, the permanent substrate is cut to form a plurality of LED devices.
    • 本文公开了一种用于制造GaN LED器件的方法。 首先,在临时衬底上形成LED外延层。 LED外延层的一部分被去除以形成多个LED外延区域。 然后,在多个LED外延区域依次形成第一透明导电层,金属反射层和第一金属接合层,然后将第一透明导电层,金属反射层和第一金属接合层 被删除。 接下来,提供永久性基板。 至少在永久性基板上形成金属层和第二金属结合层。 然后,去除至少金属层和第二金属结合层的一部分。 接下来,通过对准的晶片接合方法将临时衬底结合到永久衬底。 然后,除去临时衬底以露出LED外延层的表面,然后在表面上形成n型电极。 接下来,切割永久性基板以形成多个LED器件。