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    • 1. 发明申请
    • PG-Gated Data Retention Technique for Reducing Leakage in Memory Cells
    • 用于减少记忆细胞渗漏的PG门控数据保留技术
    • US20080151673A1
    • 2008-06-26
    • US11615422
    • 2006-12-22
    • Farzan FallahBehnam AmelifardMassoud Pedram
    • Farzan FallahBehnam AmelifardMassoud Pedram
    • G11C5/14
    • G11C11/417
    • A method of forming a memory cell includes coupling a first transistor between a supply rail of a memory cell and a node operable to accept a supply voltage. The method further includes coupling a second transistor between a ground rail of the cell and a node operable to accept a ground. In one embodiment, the method includes forming the cell to accept selectively applied external voltages, wherein the external voltages are selected to minimize leakage current in the cell. In another embodiment, the method includes forming at least one of the first and the second transistors to have a channel width and/or a threshold voltage selected to minimize a total leakage current in the cell.
    • 形成存储单元的方法包括将存储单元的电源轨和可操作以接受电源电压的节点之间的第一晶体管耦合。 该方法还包括将第二晶体管耦合在电池的接地导轨和可操作以接受接地的节点之间。 在一个实施例中,该方法包括形成电池以接受选择性地施加的外部电压,其中选择外部电压以最小化电池中的泄漏电流。 在另一个实施例中,该方法包括形成第一和第二晶体管中的至少一个以具有选择的沟道宽度和/或阈值电压以最小化单元中的总泄漏电流。
    • 7. 发明授权
    • PG-gated data retention technique for reducing leakage in memory cells
    • 用于减少存储单元泄漏的PG门控数据保留技术
    • US07447101B2
    • 2008-11-04
    • US11615422
    • 2006-12-22
    • Farzan FallahBehnam AmelifardMassoud Pedram
    • Farzan FallahBehnam AmelifardMassoud Pedram
    • G11C5/14G11C11/00
    • G11C11/417
    • A method of forming a memory cell includes coupling a first transistor between a supply rail of a memory cell and a node operable to accept a supply voltage. The method further includes coupling a second transistor between a ground rail of the cell and a node operable to accept a ground. In one embodiment, the method includes forming the cell to accept selectively applied external voltages, wherein the external voltages are selected to minimize leakage current in the cell. In another embodiment, the method includes forming at least one of the first and the second transistors to have a channel width and/or a threshold voltage selected to minimize a total leakage current in the cell.
    • 形成存储单元的方法包括将存储单元的电源轨和可操作以接受电源电压的节点之间的第一晶体管耦合。 该方法还包括将第二晶体管耦合在电池的接地导轨和可操作以接受接地的节点之间。 在一个实施例中,该方法包括形成电池以接受选择性地施加的外部电压,其中选择外部电压以最小化电池中的泄漏电流。 在另一个实施例中,该方法包括形成第一和第二晶体管中的至少一个以具有选择的沟道宽度和/或阈值电压以最小化单元中的总泄漏电流。