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1. 发明申请

WO2010010034A1 OPTICAL ELEMENT MOUNT FOR LITHOGRAPHIC APPARATUS 审中-公开
标题翻译：光学元件的光学元件安装
公开(公告)号：WO2010010034A1
公开(公告)日：2010-01-28
申请号：PCT/EP2009/059131
申请日：2009-07-16
申请人： ASML NETHERLANDS B.V. , TEGENBOSCH, Henricus, Gerardus , STRUYCKEN, Alexander, Matthijs , KLEIJN, Jacob , BEERENS, Ruud, Antonius, Catharina, Maria , VANDERHALLEN, Ivo
发明人： TEGENBOSCH, Henricus, Gerardus , STRUYCKEN, Alexander, Matthijs , KLEIJN, Jacob , BEERENS, Ruud, Antonius, Catharina, Maria , VANDERHALLEN, Ivo
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70175 , G03F7/70783 , G03F7/70825
摘要： A mount configured to mount an optical element (1) in a module (70, 170) for a lithographic apparatus. The mount includes a plurality of resilient members (12) constructed and arranged to circumferentially support the optical element (1). Each resilient member (2) includes a plurality of resilient subsections that (4', 4'', 4''') are configured to engage the optical element (1) around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.
摘要翻译：一种安装件，被配置为将光学元件（1）安装在用于光刻设备的模块（70,170）中。该安装件包括构造和布置成周向支撑光学元件（1）的多个弹性构件（12）。每个弹性构件（2）包括多个弹性部分，其中（4'，4“，4”'）被构造成围绕其周边接合光学元件（1）。每个弹性子部分被配置成独立于另一个弹性子部分。

2. 发明申请

WO2012013451A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2012013451A1
公开(公告)日：2012-02-02
申请号：PCT/EP2011/061206
申请日：2011-07-04
申请人： ASML NETHERLANDS B.V. , TU EINDHOVEN , SORAMA , AANGENENT, Wouter , VERMEULEN, Johannes , BEERENS, Ruud , SCHOLTE, Rick , LOPEZ ARTEAGA, Ines
发明人： AANGENENT, Wouter , VERMEULEN, Johannes , BEERENS, Ruud , SCHOLTE, Rick , LOPEZ ARTEAGA, Ines
IPC分类号： G03F7/20 , G01H3/00
CPC分类号： G03F7/70775 , G03F7/70866 , G03F7/709
摘要： A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a sensor array positioned and arranged to detect an acoustic wave from a movable part of the lithographic apparatus, a controller, the controller having a controller input connected to the sensor array so as to receive a sensor array output signal, and a controller output connected to at least one actuator arranged to act on the movable part, the controller being arranged to: calculate a movement of the movable part from the sensor array output signal, and drive via the controller output the at least one actuator in response to the calculated movement.
摘要翻译：光刻设备包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 传感器阵列，其被布置成检测来自所述光刻设备的可移动部分的声波;控制器，所述控制器具有连接到所述传感器阵列的控制器输入，以便接收传感器阵列输出信号;以及控制器输出，连接到至少一个致动器被布置成作用在所述可移动部件上，所述控制器被布置成：根据所述传感器阵列输出信号计算所述可移动部件的运动，并且响应于所计算的运动，经由所述控制器驱动所述至少一个致动器。

3. 发明申请

WO2013029879A1 LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：平面设备，设置平面设备的方法和设备制造方法
公开(公告)号：WO2013029879A1
公开(公告)日：2013-03-07
申请号：PCT/EP2012/064452
申请日：2012-07-24
申请人： ASML NETHERLANDS B.V. , BLEEKER, Arno , LOOPSTRA, Erik , VAN DER SCHOOT, Harmen , PHILIPS, Danny , BEERENS, Ruud
发明人： BLEEKER, Arno , LOOPSTRA, Erik , VAN DER SCHOOT, Harmen , PHILIPS, Danny , BEERENS, Ruud
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F7/7005 , G03F7/70275 , G03F7/70291 , G03F7/70308 , G03F7/70391 , G03F7/704 , G03F7/70825
摘要： A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.
摘要翻译：一种具有可编程图案形成装置和投影系统的光刻设备。可编程图案形成装置被配置为提供多个辐射束。投影系统具有配置成将多个辐射束投影到基板上的透镜组阵列。投影系统还包括对应于透镜组阵列的透镜组的光路中的焦点调节器。焦点调节器具有基本上为零光功率的光学元件。

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