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    • 2. 发明申请
    • APPARATUS AND METHOD FOR GROWING SILICON CARBIDE SINGLE CRYSTAL
    • 用于生产碳化硅单晶的装置和方法
    • WO2013002539A2
    • 2013-01-03
    • PCT/KR2012/005045
    • 2012-06-26
    • SK INNOVATION CO.,LTD.KIM, Young SholBAE, Sun HyukHONG, Sung Wan
    • KIM, Young SholBAE, Sun HyukHONG, Sung Wan
    • C30B9/06C30B29/36
    • Provided are an apparatus and a method for growing a silicon carbide single crystal by solution growth. The apparatus for growing a silicon carbide single crystal includes: a reaction chamber that is in a predetermined pressure state; a crucible that is provided in the reaction chamber, includes silicon (Si) or silicon carbide (SiC) powders or a mixture thereof charged therein, includes a silicon carbide seed provided at an upper portion of an inner side thereof and growing a silicon carbide and a seed connection bar extended from the silicon carbide seed, and is made of a graphite material; and a heating element that heats the crucible. An inner portion of the crucible is provided with at least one protrusion jaws, at least some or all of which are formed along an inner peripheral surface of the crucible, wherein the protrusion jaw is made of the graphite material.
    • 提供了一种通过溶液生长生长碳化硅单晶的装置和方法。 用于生长碳化硅单晶的装置包括:处于预定压力状态的反应室; 设置在反应室中的坩埚包括硅(Si)或碳化硅(SiC)粉末或其中填充的混合物,包括在其内侧的上部设置的碳化硅晶粒并生长碳化硅, 从碳化硅种子延伸的种子连接杆,并由石墨材料制成; 以及加热坩埚的加热元件。 坩埚的内部具有至少一个突出爪,其至少一部分或全部沿着坩埚的内周面形成,其中突出爪由石墨材料制成。
    • 5. 发明申请
    • APPARATUS AND METHOD FOR GROWING SILICON CARBIDE SINGLE CRYSTAL
    • 用于生产碳化硅单晶的装置和方法
    • WO2013002540A2
    • 2013-01-03
    • PCT/KR2012/005048
    • 2012-06-26
    • SK INNOVATION CO.,LTD.KIM, Young SholBAE, Sun HyukHONG, Sung Wan
    • KIM, Young SholBAE, Sun HyukHONG, Sung Wan
    • C30B15/02C30B17/00C30B29/36
    • Provided are an apparatus and a method for growing a silicon carbide single crystal by solution growth. The apparatus for growing a silicon carbide single crystal includes: a reaction chamber that is in a predetermined pressure state; a crucible that is provided in the reaction chamber, includes silicon (Si) or silicon carbide (SiC) powders or a mixture thereof charged therein, includes a silicon carbide seed provided at an upper portion of an inner side thereof and growing a silicon carbide and a seed connection bar extended from the silicon carbide seed, and is made of a graphite material; and a heating element that heats the crucible. An inner portion of the crucible is provided with a cylindrical assisting tool having a plurality of pores formed at least at a side thereof and made of the graphite material.
    • 提供了一种通过溶液生长生长碳化硅单晶的装置和方法。 用于生长碳化硅单晶的装置包括:处于预定压力状态的反应室; 设置在反应室中的坩埚包括硅(Si)或碳化硅(SiC)粉末或其中填充的混合物,包括在其内侧的上部设置的碳化硅晶粒并生长碳化硅, 从碳化硅种子延伸的种子连接杆,并由石墨材料制成; 以及加热坩埚的加热元件。 坩埚的内部设置有圆柱形辅助工具,其具有至少在其一侧形成并由石墨材料制成的多个孔。
    • 7. 发明申请
    • APPARATUS AND METHOD FOR GROWING SILICON CARBIDE SINGLE CRYSTAL
    • 用于生长碳化硅单晶的装置和方法
    • WO2013002539A3
    • 2013-03-14
    • PCT/KR2012005045
    • 2012-06-26
    • SK INNOVATION CO LTDKIM YOUNG SHOLBAE SUN HYUKHONG SUNG WAN
    • KIM YOUNG SHOLBAE SUN HYUKHONG SUNG WAN
    • C30B29/36C30B11/00C30B23/00
    • C30B9/06C30B29/36
    • Provided are an apparatus and a method for growing a silicon carbide single crystal by solution growth. The apparatus for growing a silicon carbide single crystal includes: a reaction chamber that is in a predetermined pressure state; a crucible that is provided in the reaction chamber, includes silicon (Si) or silicon carbide (SiC) powders or a mixture thereof charged therein, includes a silicon carbide seed provided at an upper portion of an inner side thereof and growing a silicon carbide and a seed connection bar extended from the silicon carbide seed, and is made of a graphite material; and a heating element that heats the crucible. An inner portion of the crucible is provided with at least one protrusion jaws, at least some or all of which are formed along an inner peripheral surface of the crucible, wherein the protrusion jaw is made of the graphite material.
    • 提供了一种通过溶液生长生长碳化硅单晶的设备和方法。 用于生长碳化硅单晶的设备包括:处于预定压力状态的反应室; 设置在反应室中的坩埚包括填充在其中的硅(Si)或碳化硅(SiC)粉末或其混合物,包括设置在其内侧上部的碳化硅籽晶并生长碳化硅,以及 从碳化硅种子延伸并由石墨材料制成的种子连接棒; 和加热坩埚的加热元件。 坩埚的内部设置有至少一个突起颚,其中至少一些或全部沿坩埚的内周表面形成,其中突起颚由石墨材料制成。