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    • 9. 发明申请
    • PATTERN TRANSFER WITH SELF-SIMILAR SACRIFICIAL MASK LAYER AND VECTOR MAGNETIC FIELD SENSOR
    • 具有自相似掩模层和矢量磁场传感器的图案转移
    • US20080088984A1
    • 2008-04-17
    • US11952667
    • 2007-12-07
    • Axel Hoffmann
    • Axel Hoffmann
    • G11B5/127
    • B82Y25/00B82Y10/00G11B5/3906G11B2005/3996
    • A method is provided for producing a lithographic pattern using a mask that includes the same materials as the material to be etched, allowing the pattern to be transferred and the etch mask to be removed in one step. In accordance with features of the invention, the method includes building up of a layer or layers of material of specific thickness on top of a substrate so that temporal control of an etching process allows formation of the desired pattern. Different exchange bias directions can be established by the use of shape anisotropy for the exchange biased component of a spin valve device. This enables several different magnetic reference directions to be present on a single chip, which allows a more compact magnetic field sensor to be developed. In accordance with features of the invention, different field directions are established on one single chip by using shape anisotropy
    • 提供了一种使用包括与待蚀刻材料相同的材料的掩模来产生光刻图案的方法,允许图案被转印并且蚀刻掩模在一个步骤中被去除。 根据本发明的特征,该方法包括在衬底的顶部上建立特定厚度的一层或多层材料,使得蚀刻工艺的时间控制允许形成所需图案。 可以通过使用自旋阀装置的交换偏压分量的形状各向异性来建立不同的交换偏压方向。 这使得能够在单个芯片上存在几个不同的磁参考方向,这允许开发更紧凑的磁场传感器。 根据本发明的特征,通过使用形状各向异性,在单个芯片上建立不同的场方向
    • 10. 发明授权
    • Pattern transfer with self-similar sacrificial mask layer and vector magnetic field sensor
    • 模式转移与自相似的牺牲掩模层和矢量磁场传感器
    • US07323113B2
    • 2008-01-29
    • US10980507
    • 2004-11-03
    • Axel Hoffmann
    • Axel Hoffmann
    • B44C1/22
    • B82Y25/00B82Y10/00G11B5/3906G11B2005/3996
    • A method is provided for producing a lithographic pattern using a mask that includes the same materials as the material to be etched, allowing the pattern to be transferred and the etch mask to be removed in one step. In accordance with features of the invention, the method includes building up of a layer or layers of material of specific thickness on top of a substrate so that temporal control of an etching process allows formation of the desired pattern. Different exchange bias directions can be established by the use of shape anisotropy for the exchange biased component of a spin valve device. This enables several different magnetic reference directions to be present on a single chip, which allows a more compact magnetic field sensor to be developed. In accordance with features of the invention, different field directions are established on one single chip by using shape anisotropy.
    • 提供了一种使用包括与待蚀刻材料相同的材料的掩模来产生光刻图案的方法,允许图案被转印并且蚀刻掩模在一个步骤中被去除。 根据本发明的特征,该方法包括在衬底的顶部上建立特定厚度的一层或多层材料,使得蚀刻工艺的时间控制允许形成所需图案。 可以通过使用自旋阀装置的交换偏压分量的形状各向异性来建立不同的交换偏压方向。 这使得能够在单个芯片上存在几个不同的磁参考方向,这允许开发更紧凑的磁场传感器。 根据本发明的特征,通过使用形状各向异性,在单个芯片上建立不同的场方向。