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1. 发明授权

US08032348B2 System and method for using first-principles simulation to facilitate a semiconductor manufacturing process 有权
标题翻译：使用第一原理模拟以促进半导体制造过程的系统和方法
公开(公告)号：US08032348B2
公开(公告)日：2011-10-04
申请号：US10673138
申请日：2003-09-30
申请人： Andrej S. Mitrovic , Eric J. Strang
发明人： Andrej S. Mitrovic , Eric J. Strang
IPC分类号： G06F17/50 , G06G7/48 , G06F19/00 , H01L21/00
CPC分类号： G06F17/5009 , G06F2217/16
摘要： A method, system and computer readable medium for facilitating a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the semiconductor processing tool and inputting a first principles physical model relating to the semiconductor processing tool. First principles simulation is then performed using the input data and the physical model to provide a first principles simulation result, and the first principles simulation result is used to facilitate the process performed by the semiconductor processing tool.
摘要翻译：一种用于促进由半导体处理工具执行的处理的方法，系统和计算机可读介质。该方法包括输入与半导体处理工具执行的处理有关的数据，并输入与半导体处理工具相关的第一原理物理模型。然后使用输入数据和物理模型执行第一原理模拟以提供第一原理模拟结果，并且第一原理模拟结果用于促进由半导体处理工具执行的处理。

2. 发明授权

US07353141B2 Method and system for monitoring component consumption 失效
标题翻译：用于监控组件消耗的方法和系统
公开(公告)号：US07353141B2
公开(公告)日：2008-04-01
申请号：US11736789
申请日：2007-04-18
申请人： Andrej S. Mitrovic , Eric J. Strang
发明人： Andrej S. Mitrovic , Eric J. Strang
IPC分类号： G01N21/88
CPC分类号： G01B11/0683 , H01J37/32935 , H01J37/32963
摘要： A method for monitoring consumption of a component, including the steps of emitting a radiation beam onto a first area of the component and detecting a portion of the radiation beam that is refracted by the component. A radiation level signal is generated based at least on a strength of the detected portion of the radiation beam, and a thickness of the component is determined based on the radiation level signal. The thickness of the component is compared to a predetermined thickness value, and a status signal is generated when the comparing step determines that the thickness of the component is substantially equal to or below the predetermined thickness value. When the comparing step determines that the thickness of the component is greater than the predetermined thickness value, the component is exposed to a process that can erode at least a portion of the component.
摘要翻译：一种用于监视部件的消耗的方法，包括以下步骤：将辐射束发射到部件的第一区域上，并检测被部件折射的辐射束的一部分。至少基于辐射束的被检测部分的强度产生辐射水平信号，并且基于辐射水平信号确定分量的厚度。将部件的厚度与预定的厚度值进行比较，并且当比较步骤确定部件的厚度基本上等于或低于预定厚度值时，产生状态信号。当比较步骤确定组件的厚度大于预定厚度值时，组件暴露于可能侵蚀部件的至少一部分的过程。

3. 发明授权

US06962664B2 Controlled method for segmented electrode apparatus and method for plasma processing 失效
标题翻译：分段电极装置的控制方法和等离子体处理方法
公开(公告)号：US06962664B2
公开(公告)日：2005-11-08
申请号：US10357434
申请日：2003-02-04
申请人： Andrej S. Mitrovic
发明人： Andrej S. Mitrovic
IPC分类号： C23C16/44 , H01J37/32 , H01L21/205 , H01L21/3065 , H01L21/00
CPC分类号： H01J37/32082 , H01J37/32532 , H01J37/32568
摘要： An electrode assembly (50) and an associated plasma reactor system (10) and related methods for a variety of plasma processing applications. The electrode assembly provides control of a plasma density profile (202) within an interior region (30) of a plasma reactor chamber (20). The electrode assembly includes an upper electrode (54) having a lower surface (54L), an upper surface (54U) and an outer edge (54E). The lower surface of the upper electrode faces interior region of the plasma chamber housing the plasma (200), and thus interfaces with the plasma. The electrode assembly further includes a segmented electrode (60) arranged proximate to and preferably substantially parallel with the upper surface of the upper electrode. The segmented electrode comprises two or more separated electrode segments (62a, 62b, . . . 62n), each having an upper and lower surface. Each electrode segment is spaced apart from the upper electrode upper surface by a corresponding controlled gap (Ga, Gb, . . . Gn). The electrode assembly may further include one or more actuators (110) attached to one or more electrode segments at the upper surface of the one or more electrode segments. The actuators allow for movement of the one or more electrode segments to adjust one or more of the controlled gaps. The adjustable controlled gaps allow for controlling the shape of the plasma density profile within the interior region of the chamber, thereby allowing for a desired plasma process result.
摘要翻译：电极组件（50）和相关联的等离子体反应器系统（10）以及用于各种等离子体处理应用的相关方法。电极组件提供对等离子体反应器室（20）的内部区域（30）内的等离子体密度分布（202）的控制。电极组件包括具有下表面（54L），上表面（54U）和外边缘（54E）的上电极（54）。上电极的下表面面对容纳等离子体（200）的等离子体室的内部区域，从而与等离子体接合。电极组件还包括分段电极（60），其布置成与上电极的上表面接近且优选地基本平行。分段电极包括两个或更多个分离的电极段（62a，62b，...，62n），每个具有上表面和下表面。每个电极段与上电极上表面间隔相应的可控间隙（Ga，Gb ...，Gn）。电极组件还可以包括附接到一个或多个电极段的上表面处的一个或多个电极段的一个或多个致动器（110）。致动器允许一个或多个电极段的运动来调节一个或多个受控间隙。可调控制的间隙允许控制室内部区域内的等离子体密度分布的形状，从而允许所需的等离子体处理结果。

4. 发明授权

US06958484B2 Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy 失效
标题翻译：用于2-d空间分辨光学发射和吸收光谱的方法和装置
公开(公告)号：US06958484B2
公开(公告)日：2005-10-25
申请号：US10432713
申请日：2001-11-28
申请人： Andrej S. Mitrovic
发明人： Andrej S. Mitrovic
IPC分类号： G01N21/27 , G01J3/443 , G01J5/48 , G01N21/71 , H01J37/32 , H05H1/00 , G01N21/86
CPC分类号： G01N21/71 , G01J3/443 , H01J37/32935 , H01J37/32972
摘要： A multi-point detection method and system for analyzing a composition within an examination area. The system simultaneously acquires multi-dimensional distributions (e.g., two- or three-dimensional distributions) of plasma optical emissions at at least two wavelengths. Such diagnostics are useful for real-time spatially-resolved measurements of plasma electron temperature distributions and/or chemical species concentrations within a plasma processing chamber (50). Generally, the system analyzes/diagnoses the measurement of line-of-sight light emission or absorption in the plasma.
摘要翻译：一种用于分析检查区域内的组成的多点检测方法和系统。该系统同时在至少两个波长处获取等离子体光发射的多维分布（例如，二维或三维分布）。这种诊断对于等离子体处理室（50）内的等离子体电子温度分布和/或化学物质浓度的实时空间分辨测量是有用的。通常，系统分析/诊断等离子体中视线光发射或吸收的测量。

5. 发明授权

US06824363B2 Linear inductive plasma pump for process reactors 失效
标题翻译：用于工艺反应器的线性电感等离子泵
公开(公告)号：US06824363B2
公开(公告)日：2004-11-30
申请号：US10325828
申请日：2002-12-23
申请人： Andrej S. Mitrovic , Wayne L. Johnson
发明人： Andrej S. Mitrovic , Wayne L. Johnson
IPC分类号： F04B5702
CPC分类号： F04B17/00 , F04B35/00 , H01J37/32834 , H05H1/54
摘要： A plasma pump, a plasma processing system and method to pump particles from a first region containing a plasma to a second region at a higher pressure is provided. The plasma pump and the plasma processing system each include a magnetic field producing member disposed within a passageway defined by an inner wall and an outer wall. The magnetic field producing member produces an alternating magnetic field that extends generally transverse to the passageway. An electric field producing member is disposed outside of the passageway and produces an electric field in a direction generally transverse to the passageway and generally transverse to the magnetic field. In one preferred embodiment, the passageway extends vertically and in another preferred embodiment, the passageway extends horizontally.
摘要翻译：提供了一种等离子体泵，等离子体处理系统以及从包含等离子体的第一区域将颗粒泵送到第二区域的方法。等离子体泵和等离子体处理系统各自包括设置在由内壁和外壁限定的通道内的磁场产生部件。磁场产生构件产生大致横向于通道延伸的交变磁场。电场产生构件设置在通道的外部，并且沿大致横向于通道的方向产生电场，并且大致横向于磁场。在一个优选实施例中，通道垂直延伸，在另一优选实施例中，通道水平延伸。

6. 发明授权

US06812646B2 Method and device for attenuating harmonics in semiconductor plasma processing systems 失效
标题翻译：用于衰减半导体等离子体处理系统中的谐波的方法和装置
公开(公告)号：US06812646B2
公开(公告)日：2004-11-02
申请号：US10218036
申请日：2002-08-14
申请人： Thomas H. Windhorn , Andrej S. Mitrovic , Wayne L. Johnson
发明人： Thomas H. Windhorn , Andrej S. Mitrovic , Wayne L. Johnson
IPC分类号： H01J724
CPC分类号： H01J37/32174 , H01J37/32082
摘要： A system and method for maintaining a plasma in a plasma region, by supplying RF power at a fundamental frequency to the plasma region together with a gas in order to create an RF electromagnetic field which interacts with the gas to create a plasma that contains electromagnetic energy components at frequencies that are harmonics of the fundamental frequency. The components at frequencies that are harmonics of the fundamental frequency are removed from the plasma by placing a body of an RF absorber material in energy receiving communication with the plasma, the body having a frequency dependent attenuation characteristic such that the body attenuates electrical energy at frequencies higher than the fundamental frequency more strongly than energy at the fundamental frequency.
摘要翻译：一种用于通过将基本频率的RF功率与气体一起提供给等离子体区域的等离子体区域中的等离子体来维持等离子体的系统和方法，以便产生与气体相互作用以产生包含电磁能的等离子体的RF电磁场频率为基频谐波的分量。通过将RF吸收材料的主体放置在与等离子体的能量接收通信中，从而将等离子体的谐波频率的分量从等离子体中去除，该体具有频率依赖的衰减特性，使得该体衰减频率处的电能比基频的能量高于基频。

7. 发明授权

US06729850B2 Applied plasma duct system 失效
标题翻译：等离子体管道系统
公开(公告)号：US06729850B2
公开(公告)日：2004-05-04
申请号：US10283358
申请日：2002-10-30
申请人： Raphael A. Dandl , Bill H. Quon , Samuel S Antley , Andrej S. Mitrovic , Wayne L. Johnson
发明人： Raphael A. Dandl , Bill H. Quon , Samuel S Antley , Andrej S. Mitrovic , Wayne L. Johnson
IPC分类号： H05H100
CPC分类号： H01J37/32623 , H01J37/3266 , H05H1/54
摘要： A plasma vacuum pump including an array of permanent magnets, one or more plasma conduits or ducts, components for accelerating plasma ions through these conduits, and supporting structures that together comprise at least one applied plasma duct system (APDS) cell. The APDS cell permits large volumes of particles and plasma to flow rapidly in a preferred direction while constricting the flow of neutral particles in the reverse direction. A plasma pump utilizing APDS technology is intended to permit a large throughput of ionized gas at the intermediate pressures of interest in the plasma-enhanced processing industry, compressing this gas to a pressure at which blower-type pumps can be used efficiently to exhaust the spent processing gas at atmospheric pressure.
摘要翻译：包括永磁体阵列，一个或多个等离子体导管或管道的等离子体真空泵，用于通过这些导管加速等离子体离子的部件，以及一起包括至少一个施加的等离子体管道系统（APDS））的支撑结构。 APDS细胞允许大体积的颗粒和等离子体在优选的方向上快速流动，同时在相反方向上收缩中性粒子的流动。使用APDS技术的等离子泵旨在允许在等离子体增强加工工业中感兴趣的中压下的大量电离气体压缩，将该气体压缩到可以有效地利用鼓风机型泵来排出废气的压力在大气压下处理气体。

8. 发明授权

US07233878B2 Method and system for monitoring component consumption 有权
标题翻译：用于监控组件消耗的方法和系统
公开(公告)号：US07233878B2
公开(公告)日：2007-06-19
申请号：US10767347
申请日：2004-01-30
申请人： Andrej S. Mitrovic , Eric J. Strang
发明人： Andrej S. Mitrovic , Eric J. Strang
IPC分类号： G01N21/88
CPC分类号： G01B11/0683 , H01J37/32935 , H01J37/32963
摘要： A method for monitoring consumption of a component, including the steps of emitting a radiation beam onto a first area of the component and detecting a portion of the radiation beam that is refracted by the component. A radiation level signal is generated based at least on a strength of the detected portion of the radiation beam, and a thickness of the component is determined based on the radiation level signal. The thickness of the component is compared to a predetermined thickness value, and a status signal is generated when the comparing step determines that the thickness of the component is substantially equal to or below the predetermined thickness value. When the comparing step determines that the thickness of the component is greater than the predetermined thickness value, the component is exposed to a process that can erode at least a portion of the component.
摘要翻译：一种用于监视部件的消耗的方法，包括以下步骤：将辐射束发射到部件的第一区域上，并检测被部件折射的辐射束的一部分。至少基于辐射束的被检测部分的强度产生辐射水平信号，并且基于辐射水平信号确定分量的厚度。将部件的厚度与预定的厚度值进行比较，并且当比较步骤确定部件的厚度基本上等于或低于预定厚度值时，产生状态信号。当比较步骤确定组件的厚度大于预定厚度值时，组件暴露于可能侵蚀部件的至少一部分的过程。

9. 发明授权

US08050900B2 System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process 有权
标题翻译：用于使用第一原理模拟的系统和方法来提供便于半导体制造过程的虚拟传感器
公开(公告)号：US08050900B2
公开(公告)日：2011-11-01
申请号：US10673583
申请日：2003-09-30
申请人： Andrej S. Mitrovic , Eric J. Strang
发明人： Andrej S. Mitrovic , Eric J. Strang
IPC分类号： G06F17/50 , G06F19/00 , G06G7/48 , H01L21/00
CPC分类号： G06F17/5018 , G06F2217/10 , G06F2217/12 , G06F2217/80 , H01L22/20 , H01L2924/0002 , Y02P90/265 , H01L2924/00
摘要： A method, system, and computer readable medium for facilitating a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the semiconductor processing tool, and inputting a first principles physical model relating to the semiconductor processing tool. First principles simulation is performed using the input data and the physical model to provide a virtual sensor measurement relating to the process performed by the semiconductor processing tool, and the virtual sensor measurement is used to facilitate the process performed by the semiconductor processing tool.
摘要翻译：一种用于促进由半导体处理工具执行的处理的方法，系统和计算机可读介质。该方法包括输入与半导体处理工具执行的处理相关的数据，以及输入与半导体处理工具相关的第一原理物理模型。使用输入数据和物理模型执行第一原理模拟，以提供与由半导体处理工具执行的处理相关的虚拟传感器测量，并且虚拟传感器测量用于促进由半导体处理工具执行的处理。

10. 发明授权

US08014991B2 System and method for using first-principles simulation to characterize a semiconductor manufacturing process 有权
标题翻译：使用第一原理模拟来表征半导体制造工艺的系统和方法
公开(公告)号：US08014991B2
公开(公告)日：2011-09-06
申请号：US10673501
申请日：2003-09-30
申请人： Andrej S. Mitrovic , Eric J. Strang
发明人： Andrej S. Mitrovic , Eric J. Strang
IPC分类号： G06F17/50 , G06F19/00 , G06G7/48 , H01L21/00
CPC分类号： G06F17/5018 , G06F2217/10 , G06F2217/12 , G06F2217/80 , H01L22/20 , H01L2924/0002 , Y02P90/265 , H01L2924/00
摘要： A method, system and computer readable medium for facilitating a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the semiconductor processing tool, and inputting a first principles physical model relating to the semiconductor processing tool. First principles simulation is then performed using the input data and the physical model to provide a simulation result for the process performed by the semiconductor processing tool, and the simulation result is used as part of a data set that characterizes the process performed by the semiconductor processing tool.
摘要翻译：一种用于促进由半导体处理工具执行的处理的方法，系统和计算机可读介质。该方法包括输入与半导体处理工具执行的处理相关的数据，以及输入与半导体处理工具相关的第一原理物理模型。然后使用输入数据和物理模型执行第一原理模拟，以提供由半导体处理工具执行的处理的仿真结果，并且将模拟结果用作表征由半导体处理执行的处理的数据集的一部分工具。

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