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1. 发明授权

US07489441B2 Monocrystalline optical component with curved surface and multilayer coating 有权
标题翻译：具有曲面和多层涂层的单晶光学元件
公开(公告)号：US07489441B2
公开(公告)日：2009-02-10
申请号：US11130173
申请日：2005-05-17
申请人： Guenter Scheible, legal representative , Sigrid Scheible, legal representative , Harald Schink , Alexander Hirnet
发明人： Patrick Scheible
IPC分类号： C30B29/60
CPC分类号： G02B5/0833 , G02B1/02 , G02B1/113 , G02B3/00 , G02B5/0891 , G02B5/10 , Y10S117/902
摘要： An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength λ0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.
摘要翻译：光学部件具有基板，在其上形成限定光学部件的光轴的至少一个弯曲的基板表面，其中基板表面涂覆有在紫外区域中以设计波长λ0有活性的多层涂层，以及包括施加到基板表面的第一层，由第一介电材料制成，以及施加到由第二介电材料制成的第一层的至少一个第二层。衬底基本上由具有平行于光轴的平行晶体方向和垂直于弯曲衬底表面的边缘区域的边缘晶体方向的晶体材料组成。轴向平行晶体方向和边缘晶体方向之间的角度至少为17°，并且第一层具有基本上无纹理的层结构。由此可以避免由基板结构引起的多层涂层的光学性质的各向异性。

2. 发明授权

US07460206B2 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US07460206B2
公开(公告)日：2008-12-02
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Guenter Scheible, legal representative , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner
发明人： Patrick Scheible
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

3. 发明申请

US20050286827A1 Optical component with a curved surface and a multilayer coating 有权
标题翻译：具有弯曲表面和多层涂层的光学部件
公开(公告)号：US20050286827A1
公开(公告)日：2005-12-29
申请号：US11130173
申请日：2005-05-17
申请人： Patrick Scheible , Guenter Scheible , Sigrid Scheible , Harald Schink , Alexander Hirnet
发明人： Patrick Scheible , Guenter Scheible , Sigrid Scheible , Harald Schink , Alexander Hirnet
IPC分类号： G02B1/02 , G02B1/10 , G02B1/11 , G02B3/00 , G02B5/08 , G02B5/10 , G02F1/295
CPC分类号： G02B5/0833 , G02B1/02 , G02B1/113 , G02B3/00 , G02B5/0891 , G02B5/10 , Y10S117/902
摘要： An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength λ0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.
摘要翻译：光学部件具有基板，在该基板上形成限定光学部件的光轴的至少一个弯曲的基板表面，其中基板表面涂覆有多个涂层，该多层涂层在设计波长λ< 并且包括由第一介电材料制成的施加到基板表面的第一层和施加到由第二介电材料制成的第一层的至少一个第二层。衬底基本上由具有平行于光轴的平行晶体方向和垂直于弯曲衬底表面的边缘区域的边缘晶体方向的晶体材料组成。轴向平行晶体方向和边缘晶体方向之间的角度至少为17°，并且第一层具有基本上无纹理的层结构。由此可以避免由基板结构引起的多层涂层的光学性质的各向异性。

4. 发明授权

US08435726B2 Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus 有权
标题翻译：特别是用于微光刻投影曝光装置的光学元件和光学元件的处理方法
公开(公告)号：US08435726B2
公开(公告)日：2013-05-07
申请号：US12135781
申请日：2008-06-09
申请人： Alexandra Pazidis , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
发明人： Alexandra Pazidis , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
IPC分类号： G02B3/00
CPC分类号： G03F7/70958
摘要： A method of processing an optical element which has a substrate (110) and a layer system (120) applied to the substrate (110), wherein the layer system (120) in a starting condition has a plurality of volume defects (130), wherein the method includes at least partially filling at least one of the volume defects (130) with a filling material (140). Also disclosed is an associated method of manufacturing an optical element.
摘要翻译：一种处理光学元件的方法，所述光学元件具有施加到所述衬底（110）上的衬底（110）和层系统（120），其中处于起始状态的层系统（120）具有多个体积缺陷（130），其中所述方法包括用填充材料（140）至少部分地填充所述体积缺陷（130）中的至少一个。还公开了一种制造光学元件的相关方法。

5. 发明申请

US20080309905A1 METHOD OF PROCESSING AN OPTICAL ELEMENT AND AN OPTICAL ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：光学元件和光学元件的处理方法，特别是微晶投影曝光装置
公开(公告)号：US20080309905A1
公开(公告)日：2008-12-18
申请号：US12135781
申请日：2008-06-09
申请人： Alexandra PAZIDIS , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
发明人： Alexandra PAZIDIS , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
IPC分类号： G03B27/54 , G03F7/20 , B29D11/00
CPC分类号： G03F7/70958
摘要： A method of processing an optical element which has a substrate (110) and a layer system (120) applied to the substrate (110), wherein the layer system (120) in a starting condition has a plurality of volume defects (130), wherein the method includes at least partially filling at least one of the volume defects (130) with a filling material (140). Also disclosed is an associated method of manufacturing an optical element.
摘要翻译：一种处理光学元件的方法，所述光学元件具有施加到所述衬底（110）上的衬底（110）和层系统（120），其中处于起始状态的层系统（120）具有多个体积缺陷（130），其中所述方法包括用填充材料（140）至少部分地填充所述体积缺陷（130）中的至少一个。还公开了一种制造光学元件的相关方法。

6. 发明申请

US20080297745A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：投影平面图投影目标
公开(公告)号：US20080297745A1
公开(公告)日：2008-12-04
申请号：US12187152
申请日：2008-08-06
申请人： Karl-Stefan WEISSENRIEDER , Alexander HIRNET , Alexander PAZIDIS , Karl-Heinz SCHUSTER , Christoph ZACZEK , Michael LILL , Patrick SCHEIBLE , Guenter SCHEIBLE , Sigrid SCHEIBLE , Harald SCHINK , Markus BROTSACK , Ulrich LOERING , Toralf GRUNER
发明人： Karl-Stefan WEISSENRIEDER , Alexander HIRNET , Alexander PAZIDIS , Karl-Heinz SCHUSTER , Christoph ZACZEK , Michael LILL , Patrick SCHEIBLE , Guenter SCHEIBLE , Sigrid SCHEIBLE , Harald SCHINK , Markus BROTSACK , Ulrich LOERING , Toralf GRUNER
IPC分类号： G03B27/52 , G02B13/14 , B05D5/06
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

7. 发明申请

US20080291419A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

8. 发明申请

US20050225737A1 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US20050225737A1
公开(公告)日：2005-10-13
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

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