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    • 2. 发明授权
    • Edge bead removal/spin rinse dry (EBR/SRD) module
    • 边缘珠去除/旋转冲洗干燥(EBR / SRD)模块
    • US06516815B1
    • 2003-02-11
    • US09350212
    • 1999-07-09
    • Joe StevensDonald OlgadoAlex KoYeuk-Fai Edwin Mok
    • Joe StevensDonald OlgadoAlex KoYeuk-Fai Edwin Mok
    • B08B302
    • H01L21/6708Y10S134/902
    • The present invention provides an apparatus for etching a substrate, comprising: a container; a substrate support disposed in the container; a rotation actuator attached to the substrate support; and a fluid delivery assembly disposed in the container to deliver an etchant to a peripheral portion of a substrate disposed on the substrate support. Preferably, the substrate support comprises a vacuum chuck and the fluid delivery assembly comprises one or more nozzles. The invention also provide a method for etching a substrate, comprising: rotating a substrate positioned on a rotatable substrate support; and delivering an etchant to a peripheral portion of the substrate. Preferably, the substrate is rotated at between about 100 rpm and about 1000 rpm, and the etchant is delivered in a direction that is substantially tangent to the peripheral portion of the substrate at an incident angle between about 0 degrees and about 45 degrees from a surface of substrate.
    • 本发明提供了一种用于蚀刻基板的设备,包括:容器; 设置在所述容器中的基板支撑件; 附接到基板支撑件的旋转致动器; 以及设置在所述容器中以将蚀刻剂输送到设置在所述基板支撑件上的基板的周边部分的流体输送组件。 优选地,衬底支撑件包括真空卡盘,并且流体输送组件包括一个或多个喷嘴。 本发明还提供了一种用于蚀刻衬底的方法,包括:旋转位于可旋转衬底支架上的衬底; 以及向衬底的周边部分输送蚀刻剂。 优选地,基板在约100rpm和约1000rpm之间旋转,并且蚀刻剂沿着与基板的周边部分基本相切的方向以距离表面大约0度至大约45度的入射角度被输送 的底物。