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1. 发明申请

US20100124722A1 CONSTANT CURRENT MULTI-BEAM PATTERNING 有权
标题翻译：恒定电流多波束图案
公开(公告)号：US20100124722A1
公开(公告)日：2010-05-20
申请号：US12619071
申请日：2009-11-16
申请人： Heinrich Fragner , Elmar Platzgummer , Adrian Burli
发明人： Heinrich Fragner , Elmar Platzgummer , Adrian Burli
IPC分类号： G03F7/20
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , Y10S430/143
摘要： The invention relates to a method for forming a pattern on a substrate surface of a target by means of a beam of electrically charged particles in a number of exposure steps, where the beam is split into a patterned beam and there is a relative motion between the substrate and the pattern definition means. This results in an effective overall motion of the patterned particle beam over the substrate surface and exposition of image elements on the substrate surface in each exposure step, wherein the image elements on the target are exposed to the beamlets multiply, namely several times during a number of exposure steps according to a specific sequence. The sequence of exposure steps of the image elements is arranged in a non-linear manner according to a specific rule from one exposure step to the subsequent exposure step in order to reduce the current variations in the optical column of the multi-beam exposure apparatus during the exposure of the pattern.
摘要翻译：本发明涉及一种用于在多个曝光步骤中通过带电粒子束在靶的衬底表面上形成图案的方法，其中光束被分裂成图案化的束，并且在两者之间存在相对运动底物和图案定义方式。这导致图案化的粒子束在衬底表面上的有效的总体运动，并且在每个曝光步骤中在衬底表面上曝光图像元素，其中靶上的图像元素暴露于子束多次，即在数字期间多次的曝光步骤。根据从一个曝光步骤到随后的曝光步骤的特定规则，图像元素的曝光步骤的顺序以非线性方式排列，以便减少多光束曝光设备的光学列中的电流变化曝光的图案。

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