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1. 发明授权

KR101949306B1 플라즈마 세정용 전극 조립체 有权
公开(公告)号：KR101949306B1
公开(公告)日：2019-02-18
申请号：KR1020170155643
申请日：2017-11-21
申请人： 주식회사제4기한국
发明人： 백태일 , 박윤철
IPC分类号： H01J37/32

2. 发明公开

KR1020160091151A 공기조화기용 전기집진장치 有权
标题翻译：电动除尘器收集装置
公开(公告)号：KR1020160091151A
公开(公告)日：2016-08-02
申请号：KR1020150011438
申请日：2015-01-23
申请人： 주식회사제4기한국
发明人： 백태일 , 박윤철
IPC分类号： B03C3/36 , B03C3/34 , B03C3/32
CPC分类号： B03C3/32 , B03C3/34 , B03C3/36 , B03C3/363
摘要： 본발명의일 실시예에의하면, 전기집진장치는, 일측에형성되는유입구와, 타측에형성되는토출구와, 상기유입구및 상기토출구와연통되며상기유입구로유입된공기가상기토출구로토출되기위한통로를제공하는내부통로를가지는하우징; 상기내부통로에설치되어다수의전자를방출하여상기내부통로의공기중의먼지입자를음(-) 극성으로대전가능한제1하전부; 상기내부통로에설치되며, 상기제1하전부와상기토출구사이에배치되어다수의전자를방출하여상기내부통로의공기중의먼지입자를음(-) 극성으로대전가능한제2하전부; 그리고상기내부통로에설치되며, 상기제2하전부와상기토출구사이에배치되어상기대전된먼지입자를포집가능한집진부;를포함할수 있다.
摘要翻译：根据本发明实施例的电动除尘装置包括：壳体，其一侧形成有入口，在其相对侧上形成有出口，以及与入口和出口连通的内部通道作为引入入口的空气通过其排出到出口的通道; 第一电荷单元，其安装在所述内部通道中并且发射多个电子以允许内部通道的空气中的灰尘颗粒以负极性充电; 安装在内部通道中的第二充电单元布置在第一充电单元和排出孔之间，并且发射多个电子以允许内部通道的空气中的灰尘颗粒以负极性充电; 并且安装在内部通道中的集尘单元布置在第二充电单元和排出孔之间，并且可以收集带电的灰尘颗粒。

3. 发明公开

KR1020150137882A 플라즈마 유기 중합체 박막 및 그 제조방법 无效
标题翻译：等离子体有机聚合物及其制备方法
公开(公告)号：KR1020150137882A
公开(公告)日：2015-12-09
申请号：KR1020140066509
申请日：2014-05-30
申请人： 주식회사제4기한국
发明人： 백태일 , 박남선 , 박현화
IPC分类号： C23C16/50 , C23C16/32
CPC分类号： C23C16/32 , C23C16/50
摘要： 본발명은플라즈마유기중합체박막및 그제조방법에관한것으로, 보다상세하게는탄화수소, 또는탄화수소및 할로-탄화수소혼합가스와같은유기물질을전구체로이용하여플라즈마장치를통해기판표면등에증착함으로써접합강도및 내부식성등의물성이현저히향상된플라즈마유기중합체박막및 그제조방법에관한것이다.
摘要翻译：等离子体有机聚合物膜及其制造方法技术领域本发明涉及等离子体有机聚合物膜及其制造方法，更具体地，涉及一种等离子体有机聚合物膜及其制造方法，其通过沉积来显着改善诸如结合强度，耐腐蚀性等性能通过使用诸如烃或烃和卤代烃的混合气体的有机材料作为前体，通过等离子体装置在基板表面上的等离子体有机聚合物膜。

4. 发明公开

KR1020130131937A 플라즈마 처리장치 有权
标题翻译：等离子体加工设备
公开(公告)号：KR1020130131937A
公开(公告)日：2013-12-04
申请号：KR1020120055918
申请日：2012-05-25
申请人： 주식회사제4기한국
发明人： 백태일 , 박남선 , 노진명
IPC分类号： H05H1/34 , H05K3/00
摘要： The present invention relates to a plasma processing apparatus for removing water or foreign materials remained inside a via hole or adhered to the surface of a processed object like a printed circuit board comprising: a first housing (11) for providing a first space (S1); a second housing (13) for providing a second space (S2) and providing a processing space (S) having the volume as much as the first and second spaces are added by being laid in the first housing (11) like a cover; a housing opening and closing means; a first electrode (19) fixated inside the first housing (11); a second electrode (25) fixated inside the second housing (13); a processed object settler (33); a power supply unit; a cooling unit (9); and a vacuum forming unit (5); wherein the first and second electrodes (19, 25) have a multi-layered structure. The processed object is uniformly processed one by one in a short time.
摘要翻译：本发明涉及一种等离子体处理装置，用于除去残留在通孔内或附着在诸如印刷电路板的加工对象表面上的水或异物，其包括：第一壳体（11），用于提供第一空间（S1） ; 第二壳体（13），用于提供第二空间（S2）并且提供处理空间（S），所述处理空间（S）具有如同盖子那样被放置在所述第一壳体（11）中，所述体积与所述第一和第二空间一样多; 壳体开闭装置; 固定在所述第一壳体（11）内的第一电极（19）; 固定在所述第二壳体（13）内的第二电极（25）; 加工对象沉降器（33）; 电源单元; 冷却单元（9）; 和真空成形单元（5）。其中所述第一和第二电极（19,25）具有多层结构。经过处理的物体在短时间内逐一加工。

5. 发明公开

KR1020100096427A 플라즈마 처리장치의 ＰＣＢ 이송장치 有权
标题翻译：等离子清洗装置的PCB传输装置
公开(公告)号：KR1020100096427A
公开(公告)日：2010-09-02
申请号：KR1020090015303
申请日：2009-02-24
申请人： 주식회사제4기한국
发明人： 백태일 , 박남선 , 박윤철 , 노진명 , 권기석 , 이배진 , 장석이
IPC分类号： H01L21/677 , H01L21/3065 , H01L21/302
CPC分类号： H01L21/67144 , H01L21/67721 , H01L21/67754 , H01L21/6838 , H01L21/68707 , H05K13/0408
摘要： PURPOSE: A PCB transfer device of a plasma processing device is provided to prevent the damage or contamination of a PCB which has a plasma-processed surface by transferring the PCB without a hitch and friction with a vertically moving cylinder and a horizontally moving cylinder. CONSTITUTION: A loading part(1) is formed in one side and transfers a PCB. An electrode part processes the surface of the transferred PCB with plasma gas. An extraction part exports the PCB which has the processed surface. A PCB picker(4) is fixed to a rail which is installed on a fixed plate and transfers the PCB by attaching or detaching the PCB. The plate loads the PCB. A horizontally moving cylinder(8,8') horizontally transfers the plate. A vertically moving cylinder vertically transfers the plate.
摘要翻译：目的：提供等离子体处理装置的PCB传送装置，以通过传输PCB而不会与垂直移动的圆筒和水平移动的圆筒摩擦，从而防止具有等离子体处理表面的PCB的损坏或污染。构成：装载部件（1）形成在一侧并传送PCB。电极部分用等离子体气体处理转移的PCB的表面。提取部分输出具有加工表面的PCB。 PCB拾取器（4）固定在轨道上，该轨道安装在固定板上，并通过安装或拆卸PCB来传送PCB。板装载PCB。水平移动的气缸（8,8'）水平地移动板。垂直移动的圆柱体垂直转移板。

6. 发明授权

KR100902119B1 대기압 플라즈마 처리에 의한 합성섬유직물의편면발수처리방법. 有权
标题翻译：通过大气等离子体处理的合成纤维织物的一面防水涂层
公开(公告)号：KR100902119B1
公开(公告)日：2009-06-09
申请号：KR1020070095765
申请日：2007-09-20
申请人： 다이텍연구원 , 주식회사제4기한국
发明人： 박성민 , 김지연 , 권일준 , 송병갑 , 김종원 , 백태일 , 정재준 , 구강 , 최종덕 , 박성동
IPC分类号： D06M10/04 , D06M11/26
摘要： 본 발명은 대기압 플라즈마 처리에 의한 합성섬유직물의 편면발수처리방법에 관한 것으로서, 본 발명에 의해 발수 처리된 합성섬유 직물에 대기압 플라즈마를 처리함으로써 내구성 있는 편면발수 가공을 함과 동시에 후가공인 코팅작업을 하는 경우에 코팅접착성 개선을 할 수 있다.
편면발수, 대기압플라즈마, 코팅접착성

7. 发明授权

KR100454424B1 바이오필터와 마이크로웨이브를 이용한 고효율 유해가스정화장치 및 그 정화방법 失效
标题翻译：保留所有权利。
公开(公告)号：KR100454424B1
公开(公告)日：2004-10-26
申请号：KR1020010035643
申请日：2001-06-22
申请人： 주식회사제4기한국
发明人： 백태일 , 박윤철
IPC分类号： B01D53/75
摘要： PURPOSE: A treatment method of hazardous gas using bio filter and microwave is provided, and an apparatus therefor is also provided to purify high concentration hazardous gases emitted from various industries in high efficiency. CONSTITUTION: The equipment comprises first and second bio filters(16, 20) which decompose hazardous gases including SOx, NOx and VOCs by organic decomposition into less hazardous gases; a condition controller (C) which maintains the optimal growth condition of microorganisms in bio filters; a first gas purifier(40) which coverts the less hazardous gases from bio filters into hazardous constituents and innocuous constituents by inorganic decomposition using high frequency microwave; a second purifier(50) which decomposes gas supplied from the first purifier again by high frequency microwave and catalyst; a vacuum pump(60) which is installed at the lower part of the second purifier for discharge of purified gas.
摘要翻译：目的：提供一种使用生物过滤器和微波的有害气体处理方法，并且还提供了一种用于高效率地净化各行业排放的高浓度有害气体的装置。组成：该设备包括第一和第二生物过滤器（16,20），其通过有机分解将包括SOx，NOx和VOC的有害气体分解成危险较小的气体; （C），其维持微生物在生物过滤器中的最佳生长条件; 第一气体净化器（40），其使用高频微波通过无机分解将来自生物过滤器的危害较小的气体转化为危险成分和无害成分; 第二净化器（50），其通过高频微波和催化剂再次分解从第一净化器供应的气体; 安装在第二净化器下部的真空泵（60），用于排出净化气体。

8. 发明授权

KR100417338B1 칩 실장시 플라즈마를 이용한 표면세정 및 개질방법 有权
标题翻译： 칩실장시플라즈마를이용한표면세정및개질방칩
公开(公告)号：KR100417338B1
公开(公告)日：2004-02-05
申请号：KR1020000074044
申请日：2000-12-07
申请人： 주식회사제4기한국
发明人： 박윤철
IPC分类号： H01L21/304
摘要： PURPOSE: A method for cleansing and improving a chip surface using a plasma in a locating chip is provided to improve a through-put and the quality by simply and easily cleansing or improving a lot of the chip surfaces at a time. CONSTITUTION: A cleansing preparation step is firstly performed by locating chips on stands(20) in a vacuum chamber(10). The inner of the vacuum chamber(10) is secondly vacuumed using a vacuum equipment. A plasma is thirdly generated in the vacuum chamber(10) by supplying a high voltage to an electrode(30) through a power supplier(40). The plasma is fourthly stabilized by providing a reactive gas to the inner of the vacuum chamber(10). At this time, the reactive gas is composed of an inert gas, an oxidizing gas, a deoxidizing gas, or the mixed gas one another according to the property of the surfaces of the chips. Then, the chips accurately cleansed and surface-improved through the processing steps are lastly located.
摘要翻译：目的：提供一种在定位芯片中使用等离子体清洁和改善芯片表面的方法，以通过简单和容易地清洁或改善大量芯片表面来提高吞吐量和质量。构成：清洁准备步骤首先通过将切屑定位在真空室（10）中的支架（20）上进行。其次利用真空设备将真空室（10）的内部抽真空。通过电源（40）向电极（30）提供高电压，在真空室（10）中第三次产生等离子体。通过向真空室（10）的内部提供反应气体来第四次稳定等离子体。此时，根据芯片表面的性质，反应气体由惰性气体，氧化气体，脱氧气体或混合气体构成。然后，通过处理步骤精确清洁和表面改善的芯片最后定位。

9. 发明公开

KR1020030011026A 자동 진공 금형 열처리 장치 失效
标题翻译：在真空下自动加热处理设备的设备
公开(公告)号：KR1020030011026A
公开(公告)日：2003-02-06
申请号：KR1020020066033
申请日：2002-10-29
申请人： 주식회사제4기한국
发明人： 백태일
IPC分类号： C21D1/74
摘要： PURPOSE: An automatic vacuum heat treating equipment is provided to enable automation of heat treatment and maximize heat treatment efficiency by performing heating and cooling in a heat treatment furnace at the same time. CONSTITUTION: The equipment for automatically heat treating dies under vacuum comprises an impeller(120) which is installed on the inner surface of one side of a furnace body(100) in which vacuum is maintained, rotated by a driving motor fixed on the outer surface of the furnace body(100), and formed inside a refrigerant gas guiding tank(160) divided by a partition wall(162); a reaction tank(200) which is separated from the impeller(120), and in which a space is formed, wherein first and second outlets(212,222) are formed on both sides of the space the inside of which is empty and sealed; a first baffle(210) which is connected to a cylinder means to selectively open or close the first outlet(212) and movably installed at the side adjacent to the first outlet(212); second baffle(220) which is fixed to the reaction tank(200) adjacently to the second outlet(222); a sliding door(224) which is installed so that the sliding door(224) is moved back and forth by the cylinder means to be connected to the reaction tank(200) and the refrigerant gas guiding tank(160); injection pipes(300) which are installed parallel to each other to connect between the reaction tank(200) and the refrigerant gas guiding tank(160), arranged so that a circulating refrigerant gas is concentrically injected onto a material to be treated (S) that is rested inside the reaction tank(200), and on the outer circumferential surface of which a heater is integrally formed; and a plurality of cooling pipes (P) which are arranged between the outer circumferential surface of the reaction tank(200) and the inner wall surface of the furnace body(100).
摘要翻译：目的：提供一种自动真空热处理设备，通过在热处理炉中同时进行加热和冷却，实现热处理自动化和最大限度地提高热处理效率。构成：用于在真空下自动热处理模具的设备包括：叶轮（120），其安装在炉体（100）的一侧的内表面上，在其内保持真空，通过固定在外表面上的驱动马达旋转并且形成在由分隔壁（162）分割的制冷剂气体引导箱（160）的内部; 与叶轮（120）分离并且形成有空间的反应罐（200），其中第一和第二出口（212,222）形成在空间的两侧，其内部是空的并被密封; 第一挡板（210），其连接到气缸装置以选择性地打开或关闭第一出口（212）并且可移动地安装在邻近第一出口（212）的一侧; 第二挡板（220），其与所述第二出口（222）相邻地固定到所述反应罐（200）; 滑动门（224），其安装成使得滑动门（224）由气缸装置前后移动以连接到反应罐（200）和制冷剂气体引导箱（160）; 喷射管（300），它们彼此平行地安装以连接在反应罐（200）和制冷剂气体引导箱（160）之间，其布置成使循环的制冷剂气体同心地注入待处理材料（S）其被放置在反应罐（200）内，并且其外周面上一体形成加热器; 以及设置在反应罐（200）的外周面与炉体（100）的内壁面之间的多个冷却管（P）。

10. 发明公开

KR1020020044836A 대기압 플라즈마를 이용한 정밀세정과 표면개질방법 및 그장치 有权
标题翻译：使用大气等离子体进行精细清洗和表面改性的方法和装置
公开(公告)号：KR1020020044836A
公开(公告)日：2002-06-19
申请号：KR1020000074046
申请日：2000-12-07
申请人： 주식회사제4기한국
发明人： 박윤철 , 임덕규
IPC分类号： H01L21/304
摘要： PURPOSE: A method and an apparatus for fine cleaning and surface modification using atmosphere plasma are provided to clean and modify a surface by using plasma discharge. CONSTITUTION: A base plate(12) is supported by a multitude of support portion(10). A couple of guide roll(14) is installed at both ends of the base plate(12). A conveyer belt(16) is wound around the guide rolls(14). A support beam(20) is buried between lower support portions(10) of the base plate(12). A drive motor(22) is fixed to a center portion of the support beam(20). A drive roll(24) is fixed to a drive motor(22). An inverter(26) is installed to the drive motor(22). An anode electrodes(40) is fixed to a center portion of an upper surface of the base plate(12). A barrier rib(32) is formed at an upper portion of the anode electrode(40). A power supply(60) is fixed to an upper portion of the barrier rib(32). A reaction room(30) is formed by the barrier rib(32). A cathode electrode(50) is formed at an upper portion of the reaction room(30). The power supply(60) is connected with the anode electrode(40) and the cathode ray tube(50).
摘要翻译：目的：提供使用气氛等离子体进行精细清洗和表面改性的方法和设备，以通过使用等离子体放电来清洁和修饰表面。构成：基板（12）由多个支撑部分（10）支撑。一对引导辊（14）安装在基板（12）的两端。输送带（16）绕引导辊（14）缠绕。支撑梁（20）被埋在基板（12）的下支撑部分（10）之间。驱动马达（22）固定到支撑梁（20）的中心部分。驱动辊（24）固定在驱动马达（22）上。逆变器（26）安装在驱动马达（22）上。阳极电极（40）固定在基板（12）的上表面的中心部分。在阳极电极（40）的上部形成隔壁（32）。电源（60）固定在障壁（32）的上部。反应室（30）由隔壁（32）形成。在反应室（30）的上部形成有阴极电极（50）。电源（60）与阳极电极（40）和阴极射线管（50）连接。

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