会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明公开
    • 패턴화된 투명 도전성 필름의 제조 방법
    • 制作图形透明导电膜的方法
    • KR1020120053720A
    • 2012-05-29
    • KR1020100114987
    • 2010-11-18
    • 신화인터텍 주식회사안철흥
    • 최승규안철흥변상혁김동현이재규
    • H01B13/00H01B5/14
    • PURPOSE: A method of manufacturing a patterned transparent conductive film is provided to eliminate a series of exposure and development processes related to photoresist by excluding photoresist configuration. CONSTITUTION: A substrate and a mask mold are prepared(S110). A separate conductive transparent composition is prepared(S120). The mask mold is compressed on the substrate(S130). A pressurization device pressurizes the mask mold and the substrate to maintain a lower portion of the mask mold and the substrate to be completely attached closely. A transparent conductive film is formed by drying a coated conductive transparent composition(S150). The transparent conductive film is formed into a desired pattern on the substrate after the mask mold is eliminated(S160).
    • 目的:提供一种制造图案化透明导电膜的方法,以通过排除光致抗蚀剂构造来消除与光致抗蚀剂相关的一系列曝光和显影过程。 构成:制备基材和掩模模具(S110)。 制备单独的导电透明组合物(S120)。 掩模模具在基板上被压缩(S130)。 加压装置对掩模模具和基板加压,以保持掩模模具的下部和基板完全附着。 通过干燥涂覆的导电透明组合物形成透明导电膜(S150)。 在掩模模具消除之后,透明导电膜在基板上形成所需的图案(S160)。