专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2006309772A Method for optical design improvement using deterministically defined surface 审中-公开
标题翻译：使用确定性表面进行光学设计改进的方法
公开(公告)号：JP2006309772A
公开(公告)日：2006-11-09
申请号：JP2006126210
申请日：2006-04-28
申请人： Asml Holdings Nv , エイエスエムエルホールディングナムローゼフエンノートシャップ
发明人： HARNED NORA-JEAN , GONTIN RICHARD A , HARNED ROBERT D , LATYPOV AZAT M , STANISLAV SMIRNOV Y
IPC分类号： G06F17/50 , G02B15/00
CPC分类号： G02B27/0012
摘要： PROBLEM TO BE SOLVED: To provide a method for designing an optical surface.
SOLUTION: By this method, m optical surfaces are defined. Each successive the optical surfaces receives a wavefront from the previous optical surface. The wavefront aberration caused by each of the optical surfaces is calculated. Subsequently, change in each of the optical surfaces, required to compensate the wavefront aberration caused by each of the optical surfaces, is calculated. A desired optical profile for each of the m optical surfaces is determined according to the calculated change to each of the optical surfaces.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于设计光学表面的方法。
解决方案：通过这种方法，定义m个光学表面。每个连续的光学表面从先前的光学表面接收波前。计算由每个光学表面引起的波前像差。随后，计算每个光学表面的改变，以补偿由每个光学表面引起的波前像差。根据计算出的每个光学表面的变化来确定每个m个光学表面的期望的光学轮廓。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006261667A Lithography equipment and device, namely, integrated circuit, manufacturing method of flat panel display, and compensation method of cupping 审中-公开
标题翻译：平板电脑显示器的制造设备和装置，综合电路，平板显示器的制造方法及其补偿方法
公开(公告)号：JP2006261667A
公开(公告)日：2006-09-28
申请号：JP2006067063
申请日：2006-03-13
申请人： Asml Holdings Nv , Asml Netherlands Bv , Lsi Logic Corp , エイエスエムエルネザランドズベスローテンフエンノートシャップ , エイエスエムエルホールディングナムローゼフエンノートシャップ , エルエスアイロジックコーポレイション
发明人： TROOST KARS Z , BASELMANS JOHANNES JACOBUS MAT , BLEEKER ARNO JAN , MARKOYA LOUIS J , CALLAN NEAL , EIB NICHOLAS K
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a system which can change a pattern more quickly and at less cost compared with a mask base system.
SOLUTION: Wide range contrast can be attained in such a way that an inclination and location of individually controllable element are adjusted simultaneously. This can be used to compensate a cupping of the individually controllable element. Simultaneous adjustment of location and inclination of the individually controllable element can be attained by two electrodes capable of operating over a range of values.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种与掩模基础系统相比可以更快更便利地改变图案的系统。
解决方案：可以以同时调节独立可控元件的倾斜度和位置的方式获得宽范围的对比度。这可以用于补偿单独可控元件的拔罐。可以通过能够在一定范围内操作的两个电极来实现单独可控元件的位置和倾斜的同时调节。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2006301624A Multiple illumination source exposure apparatus 有权
标题翻译：多个照明源曝光装置
公开(公告)号：JP2006301624A
公开(公告)日：2006-11-02
申请号：JP2006103805
申请日：2006-04-05
申请人： Asml Holdings Nv , エイエスエムエルホールディングナムローゼフエンノートシャップ
发明人： HARNED ROBERT D , HARNED NORA-JEAN
IPC分类号： G03F7/20 , G02B21/06 , H01L21/027
CPC分类号： G03F7/7005 , G02B26/105 , Y10S359/90
摘要： PROBLEM TO BE SOLVED: To provide a system for combining outputs of multiple light sources.
SOLUTION: The system includes a plurality of light sources, and a rotatable fold mirror oriented at an angle so as to reflect beams from each of the light sources toward the same direction at various times during its rotation. A projection optical system directs the beams toward a substrate. The rotatable fold mirror can be mounted on an air bearing, a magnetic bearing, or a fluid bearing, and can be oriented at about 45 degrees relative to the vertical. An optional fold mirror for folding an optical axis of the system is mounted between the rotatable fold mirror and the projection optical system. The fold mirror can counter-rotate in synchronization with the rotatable fold mirror so as to keep the direction of the beams constant.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供用于组合多个光源的输出的系统。解决方案：该系统包括多个光源，以及可旋转的折叠镜，其以一定的角度定向，以便在其旋转期间的各个时间将来自每个光源的光束朝向相同的方向反射。投影光学系统将光束引向衬底。可旋转折叠镜可以安装在空气轴承，磁性轴承或流体轴承上，并且可相对于垂直方向定向成大约45度。用于折叠系统的光轴的可选折叠镜安装在可旋转折叠镜和投影光学系统之间。折叠镜可以与可旋转折叠镜同步地反转，以保持光束的方向恒定。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2006140449A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006140449A
公开(公告)日：2006-06-01
申请号：JP2005290623
申请日：2005-10-04
申请人： Asml Holdings Nv , Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ , エイエスエムエルホールディングナムローゼフエンノートシャップ
发明人： LIPSON MATTHEW , DIERICHS MARCEL MATHIJS T M , DONDERS SJOERD NICOLAAS LAMBER , MULKENS JOHANNES CATHARINUS H , STREEFKERK BOB , WILKLOW RONALD , DE JONGE ROEL
IPC分类号： H01L21/027 , G03F7/038
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which includes an immersion liquid having a refractive index higher than that of water and has no possibility of agglomeration of contained particles during operation.
SOLUTION: In a projection exposure type lithographic apparatus used as a stepper or a scanner, an aqueous solution of one or more alkali metal halides such as alkali metal fluoride, alkali metal chloride, and alkali metal bromide, is used as an immersion liquid having a refractive index higher than that of water. The refractive index is 1.5 or more.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻设备，其包括折射率高于水的浸液，并且在操作期间不具有所包含的颗粒的聚集的可能性。解决方案：在用作步进器或扫描仪的投影曝光型光刻设备中，使用一种或多种碱金属卤化物如碱金属氟化物，碱金属氯化物和碱金属溴化物的水溶液作为浸渍液体的折射率高于水的折射率。折射率为1.5以上。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2006309243A Light patterning device using tilting mirror in superpixel form 有权
标题翻译：使用倾斜反射镜在超级形式中的光图案设备
公开(公告)号：JP2006309243A
公开(公告)日：2006-11-09
申请号：JP2006123340
申请日：2006-04-27
申请人： Asml Holdings Nv , Asml Netherlands Bv , エイエスエムエルホールディングナムローゼフエンノートシャップ , エーエスエムエルネザーランズビー.ブイ.
发明人： BABA-ALI NABILA , BLEEKER ARNO JAN , TROOST KARS ZEGER
IPC分类号： G02B26/08 , B81B3/00 , B81B7/04 , G03F7/20 , H01L21/027 , H04N1/113
CPC分类号： G03F7/70291 , G02B26/0833 , G03F7/70283 , G03F7/70308 , G09G3/346 , H04N5/7458
摘要： PROBLEM TO BE SOLVED: To provide an optical patterning device and its method that improves luminance and phase modulation characteristics of an individually controllable element array. SOLUTION: A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength λ. An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other, and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种改善单独可控元件阵列的亮度和相位调制特性的光学图案形成装置及其方法。解决方案：光图案化系统包括提供具有一定波长λ的辐射束的照明系统。反射像素阵列对光束进行图案化，其中阵列包括至少具有逻辑耦合到第二倾斜镜的第一倾斜镜的像素。在一个实施例中，第一和第二倾斜镜是（i）基本上彼此相邻，以及（ii）通过第一反射镜位移使高度彼此偏移。包括将图案化的光束投影到目标上的投影系统。在替代实施例中，反射像素阵列包括具有彼此逻辑耦合的第一至第四倾斜镜的像素。第一至第四倾斜镜（i）分别通过第一到第四镜面位移而偏离参考平面，并且（ii）分别以基本上正方形的图案顺时针地布置。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2006165581A Uniformity correction for lithographic apparatus 有权
标题翻译：平面设备的均匀校正
公开(公告)号：JP2006165581A
公开(公告)日：2006-06-22
申请号：JP2005354272
申请日：2005-12-08
申请人： Asml Holdings Nv , エイエスエムエルホールディングナムローゼフエンノートシャップ
发明人： KREMER ALEXANDER , DIERICHS MARCEL MATHIJS T M , LOOPSTRA ERIK ROELOF
IPC分类号： H01L21/027 , G02B21/06 , G03F7/20
CPC分类号： G03F7/70083 , G03F7/70066 , G03F7/70558
摘要： PROBLEM TO BE SOLVED: To provide a uniformity correction module having movable blades which are at least partly immersed in a fluid and having a sufficiently small difference between a refractive index of each blade and a refractive index of the fluid to prevent a significant reflection and a refraction at a surface of each blade. SOLUTION: A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, includes a plurality of movable blades arranged along each longer side of the illumination slit and a chamber containing a fluid. Here, the movable blades are at least partly immersed in the fluid, and the difference between a refractive index of each blade and a refractive index of the fluid is sufficiently small to prevent the significant reflection and the refraction at a surface of each blade. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种均匀性校正模块，其具有至少部分地浸没在流体中并且具有足够小的每个叶片的折射率与流体的折射率之间的差异的可动叶片，以防止显着的在每个叶片的表面上的反射和折射。解决方案：用于提高具有两个长边和两个短边的矩形照明狭缝中的辐射分布的均匀性的均匀性校正模块包括沿照明狭缝的每个较长侧布置的多个可动刀片和包含流体这里，可动叶片至少部分地浸没在流体中，并且每个叶片的折射率与流体的折射率之间的差异足够小以防止在每个叶片的表面处的显着的反射和折射。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006148115A Pulse modulator, lithography equipment, and device manufacture method 有权
标题翻译：脉冲调制器，光刻设备和器件制造方法
公开(公告)号：JP2006148115A
公开(公告)日：2006-06-08
申请号：JP2005332328
申请日：2005-11-17
申请人： Asml Holdings Nv , Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ , エイエスエムエルホールディングナムローゼフエンノートシャップ
发明人： BOTMA HAKO , BRUEBACH JOERG , TRENTELMAN MARK , JOOBEUR ADEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： B23K26/0613 , B23K26/0622 , B23K26/066 , B23K26/067 , G03F7/7055
摘要： PROBLEM TO BE SOLVED: To provide a pulse modulator for reducing change to the property of an incident radiation ray beam. SOLUTION: There is provided a pulse modulator constituted such that the input pulse of radiation ray is received along a first optical axis and constituted such that one or more corresponding output pulses of the radiation ray are emitted along a second optical axis. The pulse modulator comprises a divider arranged along the first optical axis and constituted such that the input pulse is divided into a first pulse portion and a second pulse portion and the first pulse portion is conducted along the second optical axis, and first and second mirrors having a predetermined curvature radius, being arranged to face with each other with a predetermined separation space therebetween, and being constituted such that the second pulse portion is received and the second portion is turned along the second optical axis. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供用于减少对入射的辐射束的特性的变化的脉冲调制器。解决方案：提供一种脉冲调制器，其构成为使得沿着第一光轴接收辐射线的输入脉冲，并且构成为使得沿着第二光轴发射辐射线的一个或多个相应的输出脉冲。脉冲调制器包括沿着第一光轴布置的分频器，并且构成为使得输入脉冲被分成第一脉冲部分和第二脉冲部分，第一脉冲部分沿第二光轴传导，第一和第二反射镜具有预定的曲率半径被布置为彼此面对并具有预定的分隔空间，并且被构造成使得第二脉冲部分被接收并且第二部分沿着第二光轴转动。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2005183983A Diffraction grating patch structure, lithographic apparatus, method of testing, method of manufacturing device, and device manufactured by the method 有权
$Diffraction grating patch structure, lithographic apparatus, method of testing, method of manufacturing device, and device manufactured by the method$
标题翻译：衍射光栅配置结构，光刻设备，测试方法，制造方法及其制造方法
公开(公告)号：JP2005183983A
公开(公告)日：2005-07-07
申请号：JP2004365848
申请日：2004-12-17
申请人： Asml Holdings Nv , Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ , エイエスエムエルホールディングナムローゼフエンノートシャップ
发明人： POULTNEY SHERMAN , KOK HAICO V
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70516 , G03F7/70591
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method that can assess optical properties of an illumination system and a projection lens in a lithographic apparatus. SOLUTION: A first diffraction grating patch on one module is aligned with a first diffraction grating patch on another module. In a different configuration of the arrangement, a second diffraction grating patch on the one module is aligned with a second diffraction grating patch on the other module. The two configurations do not exist at the same time. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供可以评估光刻设备中的照明系统和投影透镜的光学特性的装置和方法。解决方案：一个模块上的第一个衍射光栅贴片与另一个模块上的第一个衍射光栅贴片对齐。在该布置的不同配置中，一个模块上的第二衍射光栅贴片与另一个模块上的第二衍射光栅贴片对准。这两种配置在同一时间不存在。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2005136387A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2005136387A
公开(公告)日：2005-05-26
申请号：JP2004273338
申请日：2004-09-21
申请人： Asml Holdings Nv , Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ , エイエスエムエルホールディングナムローゼフエンノートシャップ
发明人： BLEEKER ARNO JAN , FRANKEN DOMINICUS JACOBUS PETR , KOCHERSPERGER PETER C , TROOST KARS ZEGER
IPC分类号： G02B26/08 , G02B5/10 , G03F7/20 , H01L21/027
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： PROBLEM TO BE SOLVED: To provide a structure, in which one or more patterning arrays are provided so as to reduce the nonflatness of the patterning arrays in a lithographic apparatus.
SOLUTION: One or more programmable patterning arrays are mounted to a mounting plate via height-adjustable mounting structures so as to allow the flatness of the active surfaces of the patterning arrays to be controlled. The height-adjustable structures include an array of piezoelectric actuators or screws. Alternatively, the backsides of the patterning arrays are polished to optical flatness and are bonded to an optically flat surface of a rigid mounting body through crystal bonding.
COPYRIGHT: (C)2005,JPO&NCIPI

10. 发明专利

JP2006245572A Method and system of interpolating pixel gray tone with restrictions for rasterizing pattern 有权
标题翻译：像素灰色调用方法和系统，用于放大图案的限制
公开(公告)号：JP2006245572A
公开(公告)日：2006-09-14
申请号：JP2006049447
申请日：2006-02-27
申请人： Asml Holdings Nv , エイエスエムエルホールディングナムローゼフエンノートシャップ
发明人： BABA-ALI NABILA
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70291
摘要： PROBLEM TO BE SOLVED: To provide a method and a system of preparing data used in a patterning device. SOLUTION: A method includes a step of calculating a first gray tone set of a pixel set, the first gray tone set being, corresponding to the center of a pattern disposed in a first lattice position, and furthermore, includes a step of calculating a second gray tone set of the pixel set, the second gray tone set being, corresponding to the center of a pattern disposed in a second lattice position. A plurality of gray tone sets of the pixel set are linearly interpolated, with restrictions, from the first and second gray tones, the plurality of gray tone sets, corresponding to a pattern that has shifted by a continuous shift level between the first and second grid positions. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种制备在图案形成装置中使用的数据的方法和系统。解决方案：一种方法包括：计算像素组的第一灰度色调集合的步骤，所述第一灰度色调集合对应于以第一格子位置布置的图案的中心，并且还包括以下步骤：计算所述像素组的第二灰度色调集合，所述第二灰度色调集合对应于设置在第二格子位置的图案的中心。从第一和第二灰度色调，多个灰度色调集合中的像素组的多个灰度组合对应于在第一和第二格子之间已经移动了连续移位水平的图案而被线性内插位置。版权所有（C）2006，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式