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    • 5. 发明申请
    • TWISTED KALEIDO
    • 扭曲的KALEIDO
    • WO2018017650A1
    • 2018-01-25
    • PCT/US2017/042731
    • 2017-07-19
    • APPLIED MATERIALS, INC.
    • MARKLE, DavidTHOMAS, Timothy N.
    • G03F7/20
    • G03F7/70191G02B6/0005G02B6/04G02B6/102G03B21/008G03B21/208G03F7/70075
    • Implementations disclosed herein generally relate to a light pipe, or kaleido, for homogenizing light such that the light is uniform once the light exits the light pipe. By reflecting the light inside the light pipe, light uniformity is increased. In one implementation, a light pipe for an image projection apparatus is provided. The light pipe comprises an elongated rectangular body having a refractive index that provides total internal reflection within the elongated rectangular body. The elongated rectangular body has an input face for accepting light into the elongated rectangular body. The input face disposed substantially orthogonal to a longitudinal axis of the elongated rectangular body. The elongated rectangular body has an output face for releasing light from the elongated rectangular body. The output face is disposed substantially orthogonal to the longitudinal axis. The elongated rectangular body has a twist along the longitudinal axis.
    • 本文公开的实施方式总体上涉及用于使光均匀化以使得一旦光离开光导管时光均匀的光管或万花筒。 通过在光管内部反射光,光均匀性增加。 在一个实施方式中,提供了一种用于图像投影设备的光导管。 光管包括具有在细长矩形主体内提供全内反射的折射率的细长矩形主体。 细长矩形主体具有用于将光接收到细长矩形主体中的输入面。 输入面基本上正交于细长矩形主体的纵向轴线设置。 细长矩形主体具有用于释放细长矩形主体的光的输出面。 输出面基本上垂直于纵向轴线设置。 细长的矩形主体沿着纵向轴线扭曲。
    • 6. 发明申请
    • METHOD AND APPARATUS FOR SURFACE NANOPARTICLE MEASUREMENT
    • 用于表面纳米颗粒测量的方法和设备
    • WO2017095585A1
    • 2017-06-08
    • PCT/US2016/060238
    • 2016-11-03
    • APPLIED MATERIALS, INC.
    • NOWAK, Thomas
    • G01N15/00
    • B08B5/02B08B15/04G01N1/2205G01N15/0618G01N2015/1062G01N2015/1486
    • Embodiments described herein generally relate to a particle collection apparatus and probe head for the collection of particles on process tool components. In one embodiment, a particle collection apparatus for counting particles present on a processing tool component is disclosed herein. The particle collection apparatus includes a particle collector. The particle collector is configured to scan a processing tool component and collect particles collected from the processing tool component. The particle collector includes a body and a probe head coupled to the body. The probe head has a probe body and a controlled spacing element. The controlled spacing element is coupled to the probe body and is configured to form a uniform manifold between the probe body and the processing tool component.
    • 这里描述的实施例总体上涉及用于在处理工具部件上收集颗粒的颗粒收集装置和探头。 在一个实施例中,本文公开了用于计数处理工具部件上存在的颗粒的颗粒收集设备。 颗粒收集装置包括颗粒收集器。 粒子收集器被配置为扫描处理工具组件并收集从处理工具组件收集的粒子。 颗粒收集器包括主体和耦合到主体的探头。 探头具有探头体和受控间隔元件。 受控的间隔元件联接到探针主体并且构造成在探针主体和处理工具部件之间形成均匀的歧管。
    • 9. 发明申请
    • CONFIGURABLE PRESSURE DESIGN FOR MULTIZONE CHEMICAL MECHANICAL PLANARIZATION POLISHING HEAD
    • 多机化学机械平面抛光头配置压力设计
    • WO2015199815A1
    • 2015-12-30
    • PCT/US2015/029034
    • 2015-05-04
    • APPLIED MATERIALS, INC.
    • OH, JeonghoonZUNIGA, Steven, M.NAGENGAST, AndrewHSU, Samuel, Chu-ChiangDANDAVATE, Gautam, Shashank
    • H01L21/304
    • B24B37/107B24B37/11B24B37/30
    • A polishing head for chemical mechanical planarization is provided. The polishing head includes a housing and a flexible membrane secured to the housing. At least a first, second, and third pressurizable chamber are disposed in the housing and each chamber contacts the flexible membrane. A first pressure delivery channel couples to the first chamber. A second pressure delivery channel couples to the third chamber. A first pressure feed line couples the first pressure delivery channel to the second chamber. A second pressure feed line couples the second pressure delivery channel to the second chamber. A first manually movable plug interfaces with the first pressure feed line to allow or block pressure from the first pressure delivery channel to the second chamber. A second manually movable plug interfaces with the second pressure feed line to allow or block pressure from the first pressure delivery channel to the second chamber.
    • 提供了用于化学机械平面化的抛光头。 抛光头包括壳体和固定到壳体的柔性膜。 至少第一,第二和第三可加压室设置在壳体中,并且每个室接触柔性膜。 第一压力输送通道联接到第一室。 第二压力输送通道连接到第三室。 第一压力供给管线将第一压力输送通道连接到第二室。 第二压力供给管线将第二压力输送通道连接到第二室。 第一可手动插头与第一压力进料管线接合,以允许或阻止来自第一压力输送通道到第二室的压力。 第二可手动插头与第二压力进料管线接合,以允许或阻止来自第一压力输送通道到第二室的压力。