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1. 发明申请

WO2008053271A1 DEPOSITION OF AMORPHOUS SILICON FILMS BY ELECTRON CYCLOTRON RESONANCE 审中-公开
标题翻译：通过电子循环谐振沉积非晶硅膜
公开(公告)号：WO2008053271A1
公开(公告)日：2008-05-08
申请号：PCT/IB2006/003960
申请日：2006-11-14
申请人： DOW CORNING CORPORATION , ECOLE POLYTECHNIQUE , ROCA I CABARROCAS, Pere , BULKIN, Pavel , DAINEKA, Dmitri , DAO, Thien Hai , LEEMPOEL, Patrick , DESCAMPS, Pierre , KERVYN DE MEERENDRE, Thibault
发明人： ROCA I CABARROCAS, Pere , BULKIN, Pavel , DAINEKA, Dmitri , DAO, Thien Hai , LEEMPOEL, Patrick , DESCAMPS, Pierre , KERVYN DE MEERENDRE, Thibault
IPC分类号： C23C16/24 , C23C16/511 , H01J37/32
CPC分类号： C23C16/511 , C23C16/24 , H01J37/32192 , H01J37/32678
摘要： A method is described for forming a film of amorphous silicon (a-Si:H) on a substrate by deposition from a plasma. The substrate is placed in an enclosure, a film precursor gas is introduced into the enclosure, and unreacted and dissociated gas is extracted from the enclosure so as to provide a low pressure in the enclosure. Microwave energy is introduced into the gas within the enclosure to produce a plasma therein by distributed electron cyclotron resonance (DECR) and cause material to be deposited from the plasma on the substrate. The substrate is held during deposition at a temperature in the range 200-600°C, preferably 225-350°C and a bias voltage is applied to the substrate at a level to give rise to a sheath potential in the range -30 to -105V, preferably using a source of RF power in the range of 50-250 mW/cm2 of the area of the substrate holder.
摘要翻译：描述了通过从等离子体沉积而在衬底上形成非晶硅膜（a-Si：H）的方法。将基板放置在外壳中，将膜前体气体引入外壳中，并且从外壳中提取未反应和解离的气体，以便在外壳中提供低压。将微波能量引入外壳内的气体中，通过分布式电子回旋共振（DECR）在其中产生等离子体，并使材料从衬底上的等离子体沉积。衬底在沉积期间在200-600℃，优选225-350℃的温度下保持，并且将偏置电压施加到衬底上，以产生在-30至 - 105V，优选地使用在衬底保持器的面积的50-250mW / cm 2的范围内的RF功率的源。

2. 发明申请

WO2007023350A1 METHOD AND APPARATUS FOR CREATING A PLASMA 审中-公开
标题翻译：用于创建等离子体的方法和装置
公开(公告)号：WO2007023350A1
公开(公告)日：2007-03-01
申请号：PCT/IB2006/002253
申请日：2006-08-21
申请人： DOW CORNING CORPORATION , DESCAMPS, Pierre , LEEMPOEL, Patrick
发明人： DESCAMPS, Pierre , LEEMPOEL, Patrick
IPC分类号： H05H1/46 , H01J37/32
CPC分类号： H01J37/3266 , H01J37/32192 , H05H1/46
摘要： An apparatus is provided for producing a plasma for a work surface, for example to deposit material thereon. The apparatus comprises an enclosure which contains an ionizable gas, a plurality of plasma excitation devices each of which is arranged to enable microwaves to travel from a first end thereof to a second end and radiate therefrom into the gas, and means for generating a magnetic field in the gas. A source of microwaves feeds microwaves to the first ends of the excitation devices. In use, regions exist within the said gas where the direction of the electric vector of the microwaves is non-parallel to the lines of the magnetic field, and the magnetic field has value B, and the microwaves have a frequency f such as to substantially satisfy the relationship: B = πmf D e where m and e are the mass and charge respectively of an electron.
摘要翻译：提供了一种用于产生用于工作表面的等离子体的装置，例如在其上沉积材料。该装置包括包含可电离气体的外壳，多个等离子体激励装置，每个等离子体激发装置被布置成使得微波从其第一端行进到第二端并从其辐射到气体中;以及用于产生磁场的装置在气中。微波源将微波馈送到激发装置的第一端。在使用中，在所述气体中存在区域，其中微波的电矢量的方向与磁场的线不平行，并且磁场具有值B，并且微波具有频率f，例如基本上满足关系：B = pmf D e其中m和e分别是电子的质量和电荷。

3. 发明申请

WO2007065954A1 THERMOELECTRIC DEVICE 审中-公开
标题翻译：热电装置
公开(公告)号：WO2007065954A1
公开(公告)日：2007-06-14
申请号：PCT/EP2006/069500
申请日：2006-12-08
申请人： CORNING SAS , L'ECOLE NATIONALE SUPERIEURE D'INGENIEURS DE CAEN , MARQUES, Paulo Jorge , DANNOUX, Thierry Luc Alain , GOUPIL, Christophe
发明人： MARQUES, Paulo Jorge , DANNOUX, Thierry Luc Alain , GOUPIL, Christophe
IPC分类号： H01L35/32 , H01L35/34
CPC分类号： H01L35/34 , H01L35/32
摘要： A thermoelectric device is provided which comprises a plurality of elements of a thermoelectric material, which are preferably either all of n-type material or all p-type. In this preferred device, each element has a first end region for exposure to a first temperature, and a second end region for exposure to a second temperature, with the temperature gradient being in the same direction in each of the elements, so each element develops a voltage between its end regions in the same direction. The first end regions of the elements are mounted on a substrate, but the second end regions of the elements are at least substantially free to move with respect to one another. The elements are connected electrically in series, so that the series connection produces a net voltage, the electrical connections being designed to produce only a small amount of heat conduction.
摘要翻译：提供了一种热电装置，其包括热电材料的多个元件，其优选地是n型材料或全部是p型。在该优选装置中，每个元件具有用于暴露于第一温度的第一端部区域和用于暴露于第二温度的第二端部区域，其中温度梯度在每个元件中沿相同的方向，因此每个元件产生其端部区域之间的电压在相同方向。元件的第一端部区域安装在基板上，但是元件的第二端部区域至少基本上相对于彼此自由移动。这些元件串联电连接，使得串联连接产生净电压，电连接被设计成仅产生少量的热传导。

4. 发明授权

EP1917843B1 METHOD AND APPARATUS FOR CREATING A PLASMA 有权
标题翻译：方法和装置等离子教育
公开(公告)号：EP1917843B1
公开(公告)日：2013-05-29
申请号：EP06795279.6
申请日：2006-08-21
申请人： Dow Corning Corporation
发明人： DESCAMPS, Pierre , LEEMPOEL, Patrick
IPC分类号： H05H1/46 , H01J37/32
CPC分类号： H01J37/3266 , H01J37/32192 , H05H1/46

5. 发明授权

EP1444171B1 METHODS AND APPARATUS FOR PULSED DOPING OR DRYING A SOOT PREFORM 有权
标题翻译： METHOD AND APPARATUS FOR脉冲掺杂或干燥烟炱预成形件的
公开(公告)号：EP1444171B1
公开(公告)日：2012-05-09
申请号：EP02766360.8
申请日：2002-09-24
申请人： Corning Incorporated
发明人： DAWES, Steven, B. , HAWTOF, Daniel, W. , MURTAGH, Michael, T. , ROSETTIE, John, S. , SCHERMERHORN, Andrew, P. , SPROUL, Merrill, F. , STONE, John, III , TANDON, Pushkar
IPC分类号： C03B37/014
CPC分类号： C03B37/01446 , C03B37/0146 , C03B2201/12 , C03B2201/20
摘要： A method of manufacturing an optical waveguide preform includes providing a first process gas atmosphere to a soot preform contained in a vessel. The first atmosphere is held in the vessel for a first reacting time sufficient to at least partially dope or dry the soot preform. The vessel is then at least partially refilled with a second doping or drying atmosphere. The second doping or drying atmosphere is held in the vessel for a second reacting time sufficient to further dope or dry the soot preform.

6. 发明授权

EP1958228B1 METHOD OF MAKING A GLASS ENVELOPE 有权
标题翻译：用于生产玻璃容器
公开(公告)号：EP1958228B1
公开(公告)日：2012-05-02
申请号：EP06838743.0
申请日：2006-12-01
申请人： Corning Incorporated
发明人： BECKEN, Keith J , LOGUNOV, Stephan L
IPC分类号： H01L51/52 , B23K26/06 , C03C27/06
CPC分类号： H01L51/5246 , H01L51/56
摘要： A method of minimizing stress in an OLED device laser sealing process using an elongated laser beam. A laser beam having an intensity distribution which decreases as a function of distance from the longitudinal axis of the beam is passed- through a mask to create an elongated beam having a length- wise intensity distribution which decreases as a function of distance from the axis of the beam and a substantially constant width- wise intensity distribution. The elongated beam is traversed over a line of frit disposed between two substrates. The tails of the length- wise intensity distribution provide for a slow cool down of the frit as the beam traverses the line of frit.

7. 发明授权

EP1620157B1 GUIDE WIRE HAVING BENDING SEGMENT 失效转让
标题翻译：与段弯曲导丝
公开(公告)号：EP1620157B1
公开(公告)日：2011-11-16
申请号：EP04749610.4
申请日：2004-04-01
申请人： ETHICON ENDO-SURGERY, INC. , UCL Business PLC
发明人： BAKOS, Gregory, J. , GEE, Kevin, K. , TIERNEY, Scott, J. , SWAIN, Christopher, Paul , LONG, Gary, L.
IPC分类号： A61M25/00
CPC分类号： A61M25/00 , A61M25/09
摘要： A guide wire including a continuous, unitary wire having a first segment, a second segment, and a third segment is shown and described. The third segment has a bending moment of inertia less than the bending moment of inertia of the first and second segments. The guide wire can be used to advance a medical device within a body lumen.

8. 发明授权

EP2125645B1 REDUCTION OF OPTICAL FIBER CANE/PREFORM DEFORMATION DURING CONSOLIDATION 有权
标题翻译：整理过程中要避免纤维间酒吧/瓶坯SHAPE
公开(公告)号：EP2125645B1
公开(公告)日：2011-04-20
申请号：EP08725896.8
申请日：2008-02-21
申请人： Corning Incorporated
发明人： BALAKRISHNAN, Jitendra , KHANNA, Samir , ONUH, Chukwuemeka B , RANEY, Sonya M , TANDON, Pushkar
IPC分类号： C03B37/014 , C03B37/018
CPC分类号： C03B37/01853 , C03B37/0124 , C03B37/01453 , C03B37/01807 , C03B37/027 , C03B2201/04 , C03B2201/12 , C03B2201/20 , C03B2201/50 , C03B2203/22 , C03B2207/90
摘要： According to an embodiment of the invention a method of manufacturing optical fiber cane comprises the steps of: (i) providing a core rod manufactured of relatively low viscosity glass; (ii) depositing SiO2 based soot around the core rod to form a soot preform, the soot being of relatively high viscosity material such that the softening point of the low viscosity glass is at least 200°C lower than the viscosity of the high viscosity outer core region; and (iii) consolidating the soot of the soot perform by exposure to hot zone at temperatures of 1000°C-1600°C. The soot is consolidated by heating the outer portion of the soot perform at a relatively fast heating rate, the heating rate being sufficient to densify the soot, so as to render the densified material with enough rigidity to confine the heated core rod and to prevent the heated core rod from puddling.

9. 发明公开

EP2087502A1 METHOD AND APPARATUS FOR FORMING A FILM BY DEPOSITION FROM A PLASMA 有权
标题翻译：一种用于通过等离子体沉积形成非晶硅膜的方法
公开(公告)号：EP2087502A1
公开(公告)日：2009-08-12
申请号：EP07819350.5
申请日：2007-10-26
申请人： Dow Corning Corporation , Ecole Polytechnique
发明人： ROCA I CABARROCAS, Pere , BULKIN, Pavel , DAINEKA, Dmitri , LEEMPOEL, Patrick , DESCAMPS, Pierre , KERVYN DE MEERENDRE, Thibault
IPC分类号： H01J37/32
CPC分类号： H01J37/32678 , C23C16/24 , C23C16/511 , H01J37/32192 , H05H1/46
摘要： An apparatus is described for depositing a film on a substrate from a plasma. The apparatus comprises an enclosure, a plurality of plasma generator elements disposed within the enclosure, and means, also within the enclosure, for supporting the substrate. Each plasma generator element comprises a microwave antenna having an end from which microwaves are emitted, a magnet disposed in the region of the said antenna end and defining therewith an electron cyclotron resonance region in which a plasma can be generated, and a gas entry element having an outlet for a film precursor gas or a plasma gas. The outlet is arranged to direct gas towards a film deposition area situated beyond the magnet, as considered from the microwave antenna, the outlet being located in, or above, the hot electron confinement envelope.

10. 发明公开

EP2080216A1 METHOD FOR FORMING A FILM WITH A GRADED BANDGAP BY DEPOSITION OF AN AMORPHOUS MATERIAL FROM A PLASMA 有权
标题翻译：方法用于生产具有倾斜带距离层进行分离的无定形物质从等离子
公开(公告)号：EP2080216A1
公开(公告)日：2009-07-22
申请号：EP07819352.1
申请日：2007-10-26
申请人： Dow Corning Corporation , Ecole Polytechnique
发明人： ROCA I CABARROCAS, Pere , BULKIN, Pavel , DAINEKA, Dmitri , LEEMPOEL, Patrick , DESCAMPS, Pierre , KERVYN DE MEERENDRE, Thibault
IPC分类号： H01J37/32
CPC分类号： C23C16/45523 , C23C16/24 , C23C16/511 , H01J37/32192 , H01J37/32678 , H01L31/03762 , H01L31/065 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要： A method is described of forming a film of an amorphous material on a substrate by deposition from a plasma. The substrate is placed in an enclosure, a film precursor gas is introduced into the enclosure, and unreacted and dissociated gas is extracted from the enclosure so as to provide a low pressure therein. Microwave energy is introduced into the gas within the enclosure to produce a plasma therein by distributed electron cyclotron resonance (DECR) and cause material to be deposited from the plasma on the substrate. The said flow rate of the film precursor gas is altered during the course of deposition of material, so as to cause the bandgap to vary over the thickness of the deposited material.

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