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81. 发明授权

US1472640A Photoprinting mask 失效
标题翻译：照相面具
公开(公告)号：US1472640A
公开(公告)日：1923-10-30
申请号：US30537219
申请日：1919-06-19
申请人： DYE GLEN M
发明人： DYE GLEN M
IPC分类号： G03B27/28
CPC分类号： G03B27/28

82. 发明授权

US1430615A Adjustable photographic mask 失效
标题翻译：可调式摄影面膜
公开(公告)号：US1430615A
公开(公告)日：1922-10-03
申请号：US25900118
申请日：1918-10-21
申请人： HENRY BAUMGARTEL
发明人： HENRY BAUMGARTEL
IPC分类号： G03B27/28
CPC分类号： G03B27/28

83. 发明公开

KR1020060118517A 마이크로리소그라피 투사 조명 장치용 광학적 효과의 편광지연 시스템 无效
标题翻译：用于微晶投影照明装置的极化有效的延迟系统
公开(公告)号：KR1020060118517A
公开(公告)日：2006-11-23
申请号：KR1020067010415
申请日：2004-11-10
申请人： 칼 짜이스 에스엠테 게엠베하
发明人： 토트제크미카엘 , 엥키쉬비르기트 , 쉿쳐칼-하인즈
IPC分类号： G03F7/20 , G02B27/28 , G02B5/30 , G03B27/28
CPC分类号： G03F7/70566 , G02B5/1809 , G02B5/3083 , G02B27/286 , G03F7/70308
摘要： The invention relates to a delay system for converting an input beam cluster incident from an input side of the delay system to an output beam cluster which has a spatial distribution of polarization states across its cross-section that can be influenced by the delay system, said distribution differing from the spatial distribution of polarization states of the input beam cluster. The inventive delay system is configured as a reflecting delay system. An effective cross-section of the delay system has a plurality of delay areas of different delay effect. A mirror system of this type having a delay effect that varies depending on the location can be used to compensate for undesired variations of the polarization state across the cross-section of an input beam cluster and/or for adjusting certain initial polarization states, e.g. for adjusting radial or tangential polarization.
摘要翻译：本发明涉及一种延迟系统，用于将从延迟系统的输入侧入射的输入光束聚束转换成输出光束簇，该输出光束聚束具有跨越可延迟系统影响的横截面的偏振状态的空间分布，所述延迟系统分布与输入光束簇的偏振态的空间分布不同。本发明的延迟系统被配置为反射延迟系统。延迟系统的有效截面具有不同延迟效果的多个延迟区域。可以使用具有根据位置而变化的延迟效果的这种类型的镜子系统来补偿横跨输入束束的横截面的偏振状态的不希望的变化和/或用于调整某些初始极化状态，例如，用于调节径向或切向极化。

84. 发明公开

KR1020010007079A 분리가능하며 고정되어 있지 않은 광학 부품의 고정장치 无效
标题翻译：光学部件的可拆卸支架
公开(公告)号：KR1020010007079A
公开(公告)日：2001-01-26
申请号：KR1020000026326
申请日：2000-05-17
申请人： 라이카 카메라 악티엔게젤샤프트
发明人： 베스트스테판우베 , 슈나벨라이너
IPC分类号： G03B27/28
CPC分类号： G02B7/026 , G03B17/04 , G02B7/022 , G02B7/023
摘要： PURPOSE: An improved holder is provided having high performance by optimizing an intrinsic influence quantity with respect to the surer holding of optical components. CONSTITUTION: An angle of inclination of a chamfered surface (6) is set in a range of 40 to 500 and a boundary wall (11) of an insert groove (4) existing within the range of the optical components (2 and 3) is placed at a height of a chamfered edge facing a socket (1). The boundary wall (11) of the insert groove (4) existing in front of the optical components (2 and 3) is undercut at an angle of 10 to 15 deg., by which the depth of the insert groove (4) is made larger by 0.15 to 0.2 mm than the radius of an annular element (5). The free opening between the chamfered edge (10) existing on the optical components (2 and 3) and the front edge (12) of the undercut boundary wall (11) of the insert groove (4) is made equal to 0.8 times the diameter of the annular element (5).
摘要翻译：目的：通过优化相对于光学部件的保持器的固有影响量，提供了具有高性能的改进的保持器。构成：倒角面（6）的倾斜角度设定在40〜500的范围内，存在于光学部件（2和3）范围内的插入槽（4）的边界壁（11）为放置在面向插座（1）的倒角边缘的高度。存在于光学部件（2和3）前面的插入槽（4）的边界壁（11）以10至15度的角度进行底切，由此形成插入槽（4）的深度比环形元件（5）的半径大0.15〜0.2mm。存在于光学部件（2和3）上的倒角边缘（10）与插入槽（4）的底切边界壁（11）的前边缘（12）之间的自由开口等于直径的0.8倍的环形元件（5）。

85. 发明授权

US5005044A Automatic masking device 失效
标题翻译：自动遮蔽装置
公开(公告)号：US5005044A
公开(公告)日：1991-04-02
申请号：US410201
申请日：1989-09-21
申请人： Makoto Yahata , Fumihiko Nishida
发明人： Makoto Yahata , Fumihiko Nishida
IPC分类号： G03F7/20 , G03B27/28
CPC分类号： G03B27/28
摘要： A masking device employed for a composer and the like for forming a desired opening portion by covering a glass plate holding an original includes a pair of light intercepting devices for covering the glass plate from the front and rear and left and right directions. One end of each of the light intercepting devices includes a holding portion for holding an end portion of masking sheet for covering the glass plate and a member for defining an opening portion on the glass plate. The holding member and the opening portion defining member in the front and rear directions are provided spaced part from each other in the up and down directions, and the light intercepting device in the left and right directions are posed in an opening portion formed between the holding member and the opening portion defining member of the light intercepting device in the front and rear directions to define the opening portion in left and right directions.

86. 发明授权

US4063812A Projection printing system with an improved mask configuration 失效
标题翻译：具有改进掩模配置的投影打印系统
公开(公告)号：US4063812A
公开(公告)日：1977-12-20
申请号：US713948
申请日：1976-08-12
申请人： Gerard Abraham , Gaston Bergasse
发明人： Gerard Abraham , Gaston Bergasse
IPC分类号： G03B27/62 , G03F1/48 , G03F7/20 , G03B27/00 , G03B27/28
CPC分类号： G03F7/70983 , G03B27/6271 , G03F1/48 , G03F7/70866
摘要： In a projection printing system the pattern mask, whose image is projected onto a light sensitive layer, is encased in a glass sandwich so that any dirt particles on the surfaces of the sandwich are out of focus and are not printed in the light sensitive layer.
摘要翻译：在投影印刷系统中，其图像被投影到光敏层上的图案掩模被包裹在玻璃夹层中，使得夹层的表面上的任何污垢颗粒都不会聚焦，并且不会被印刷在光敏层中。

87. 发明授权

US4003654A Contact print test window 失效
标题翻译：联系打印测试窗口
公开(公告)号：US4003654A
公开(公告)日：1977-01-18
申请号：US582074
申请日：1975-05-30
申请人： William G. Smolen
发明人： William G. Smolen
IPC分类号： G03B27/58 , G03B27/28
CPC分类号： G03B27/582
摘要： A sheet of opaque material has a window therein and marks on the sheet indicating the positioning of an edge of a test print for placement over the window to expose different areas of the test print in succession.
摘要翻译：一片不透明材料在其中具有窗口，并且标记在纸上，指示测试印刷品的边缘的定位，以便放置在窗户上以连续地暴露测试印刷品的不同区域。

88. 发明授权

US3854344A Assembly adapted to be assembled from two separate driving bodies 失效
标题翻译：组件适应于从两个独立的驱动机构组装
公开(公告)号：US3854344A
公开(公告)日：1974-12-17
申请号：US41462373
申请日：1973-11-12
申请人： COPYER CO
发明人： KONNO M , ICHIKI M
IPC分类号： G03B27/28 , B41L23/20 , F16H7/06 , G03B27/00 , G03D15/02 , G03G15/00 , F16H7/00 , F16H57/00 , F16H57/02
CPC分类号： F16H7/06 , B41L23/20 , G03B27/00 , G03D15/027 , Y10T74/19614 , Y10T74/2186
摘要： An assembly is adapted to be assembled from a copying machine and drying machine. The copying machine has a chain belt driven by a drive source and a transmission sprocket meshing with the chain belt and the drying machine has a chain belt provided therein. When the drying machine is mechanically connected to the copying machine, the transmission sprocket is engaged with the chain belt of the drying machine to permit it to be driven by the drive source of the copying machine.
摘要翻译：组合件适于从复印机和干燥机组装。复印机具有由驱动源驱动的链带和与链带啮合的传动链轮，干燥机具有设置在其中的链带。当干燥机机械地连接到复印机时，传动链轮与干燥机的链带接合，以允许其由复印机的驱动源驱动。

89. 发明授权

US3771872A Mask and apparatus used for alignment purposes in photolithography 失效
标题翻译：用于光刻机中对准目的的掩模和设备
公开(公告)号：US3771872A
公开(公告)日：1973-11-13
申请号：US3771872D
申请日：1972-12-08
申请人： RANK ORGANISATION LTD
发明人： NIGHTINGALE E , CULLIS R
IPC分类号： G03B27/00 , C23F1/00 , G02B7/00 , G03B27/02 , G03F1/00 , G03F9/00 , H01L21/027 , G03B27/28
CPC分类号： G03F9/7076 , G03F1/42
摘要： A mask for use in photolithography and apparatus for using the mask, in which a pattern formed as opaque regions in a transparent mask or as transparent regions in an opaque mask are to be transferred to a photosensitive layer by exposing the photosensitive layer through the mask. Alternatively the photosensitive layer could be exposed to light reflected from the mask if the pattern were formed as variations in the reflectivity of the mask. In order that the mask can be accurately positioned with respect to the photosensitive layer they are both formed with fiducial marks and the fiducial mark on the mask is formed as a plurality of very small elements extending transverse the general line of the fiducial mark and so positioned that diffraction effects at the edges of the elements cooperate to provide a single dense image, that is a single bright image on a dark ground or a single dark image on a bright ground depending on whether the elements are opaque or transparent.
摘要翻译：用于光刻的掩模和用于使用掩模的掩模，其中在透明掩模中形成为不透明区域的图案或不透明掩模中的透明区域的图案通过将感光层曝光通过掩模而转印到感光层。或者，如果图案形成为掩模的反射率的变化，则感光层可以暴露于从掩模反射的光。为了使掩模能够相对于感光层精确地定位，它们都形成有基准标记，并且掩模上的基准标记形成为横向于基准标记的总线延伸的多个非常小的元件，并且如此定位在元件边缘处的衍射效应协同提供单个致密图像，即在黑暗地面上的单个亮色图像或亮地上的单个暗图像，取决于元件是不透明的还是透明的。

90. 发明授权

US3744904A Transparent photographic masks 失效
标题翻译：透明摄影面膜
公开(公告)号：US3744904A
公开(公告)日：1973-07-10
申请号：US3744904D
申请日：1970-06-11
申请人： GAF CORP
发明人： LOPREST F , BARR D
IPC分类号： G03C1/52 , G03F1/54 , G03B27/28
CPC分类号： G03F1/54 , G03C1/52
摘要： Photographic masks, suitable for reproduction in a photo-resist layer - by exposure of the latter to actinic light under the mask, and development of the photo-resist image - of the pattern of a microelectronic component or device, are made by exposure to light in accordance with an original (especially by contact exposure under a primary mask) containing the pattern to be reproduced, of light-sensitive material having a flat, rigid, dimensionally stable transparent base such as glass and a thin (e. g. 0.5 to 10 micron thick) transparent resin layer adhering to the base and containing, molecularly dispersed therein an azo coupling component and a light-sensitive diazonium compound, susceptible to decomposition on exposure to light and temporarily stabilized against coupling pending alkaline development, the diazonium compound and coupling component being uniformly distributed throughout the thickness of the resin layer, said light-sensitive material yielding on development with ammonia vapor, in the unexposed areas, an azo dye coloration transparent to visible light but opaque to ultraviolet light, while the decomposition products of the diazonium compound and azo coupling component in the light-exposed areas are transparent to ultraviolet as well as visible light. The light-sensitive materials are made by applying the sensitizing composition and resin to the base in the form of a solution in a volatile solvent, removing any excess e. g., by centrifugation, and drying to remove the solvent. The masks produced afford satisfactory resolution to 0.1 micron. They are used to reproduce the pattern in a photo-resist layer coated on a substrate such as a silicon wafer, as by contact exposure under the mask, development of the photo-resist, and suitable modifying treatment of the thereby exposed areas of the underlying substrate.
摘要翻译：适用于在光致抗蚀剂层中再现的照相掩模，通过曝光于光电子部件或器件，通过曝光于光掩模下面的光化光，以及显影微电子部件或器件的图案来形成光电子图像。包含具有平坦，刚性，尺寸稳定的透明基底（例如玻璃和薄）（例如0.5至10微米厚）的感光材料的原件（特别是通过初级掩模下的接触曝光））透明树脂层，并且分散地分散有偶氮偶联组分和光敏重氮化合物，其在暴露于光下易于分解并且在碱性显影下临时稳定以防偶联，重氮化合物和偶联组分均匀分布在树脂层的整个厚度上，所述感光材料用氨显影蒸气在未曝光区域中对可见光透明但对紫外线不透明的偶氮染料着色，而曝光区域中重氮化合物和偶氮偶合组分的分解产物对紫外线以及可见光是透明的。感光材料是通过将敏化组合物和树脂以挥发性溶剂中的溶液的形式施用于碱而制成的，除去任何过量的e。例如通过离心，并干燥除去溶剂。所生产的面膜提供令人满意的分辨率至0.1微米。它们用于在涂覆在诸如硅晶片的基底上的光致抗蚀剂层中再现图案，如通过掩模下的接触曝光，光刻胶的显影，以及对底层的曝光区域的适当改性处理基质。

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