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81. 发明授权

US06192897B1 Apparatus and method for in-situ cleaning of resist outgassing windows 有权
标题翻译：抗蚀剂除气窗的原位清洗装置及方法
公开(公告)号：US06192897B1
公开(公告)日：2001-02-27
申请号：US09238210
申请日：1999-01-27
申请人： Leonard E. Klebanoff , Steven J. Haney
发明人： Leonard E. Klebanoff , Steven J. Haney
IPC分类号： B08B700
CPC分类号： B08B7/00 , Y10S134/902
摘要： An apparatus and method for in-situ cleaning of resist outgassing windows. The apparatus includes a chamber located in a structure, with the chamber having an outgassing window to be cleaned positioned in alignment with a slot in the chamber, whereby radiation energy passes through the window, the chamber, and the slot onto a resist-coated wafer mounted in the structure. The chamber is connected to a gas supply and the structure is connected to a vacuum pump. Within the chamber are two cylindrical sector electrodes and a filament is electrically connected to one sector electrode and a power supply. In a first cleaning method the sector electrodes are maintained at the same voltage, the filament is unheated, the chamber is filled with argon (Ar) gas under pressure, and the window is maintained at a zero voltage, whereby Ar ions are accelerated onto the window surface, sputtering away carbon deposits that build up as a result of resist outgassing. A second cleaning method is similar except oxygen gas (O2) is admitted to the chamber instead of Ar. These two methods can be carried out during lithographic operation. A third method, carried out during a maintenance period, involves admitting CO2 into the chamber, heating the filament to a point of thermionic emission, the sector electrodes are at different voltages, excited CO2 gas molecules are created which impact the carbon contamination on the window, and gasify it, producing CO gaseous products that are pumped away.
摘要翻译：一种用于原位清洁抗蚀剂除气窗的设备和方法。该装置包括位于结构中的腔室，其中腔室具有待清洁的除气窗口，其定位成与腔室中的槽对准，由此辐射能量通过窗口，腔室和狭缝穿过抗蚀剂涂覆的晶片安装在结构中。该室连接到气体源，该结构连接到真空泵。室内有两个圆柱形扇形电极，灯丝与一个扇形电极和一个电源电连接。在第一清洁方法中，扇形电极被保持在相同的电压，灯丝未被加热，在压力下充满氩（Ar）气体，并且窗口保持在零电压，由此Ar离子被加速到窗口表面，溅射由于抗蚀剂除气而积聚的碳沉积物。除了氧气（O2）进入腔室而不是Ar之外，第二种清洁方法是类似的。这两种方法可以在光刻操作过程中进行。在维护期间进行的第三种方法是将二氧化碳进入腔室，将灯丝加热到热电子发射点，扇形电极处于不同的电压，产生激发的CO2气体分子，影响窗口上的碳污染，并将其气化，产生被抽出的CO气体产物。

82. 发明授权

US06168671A Rear scrub dual drive means for a sugar beet harvester 失效
标题翻译：用于甜菜收获机的后刷双驱动装置
公开(公告)号：US06168671A
公开(公告)日：2001-01-02
申请号：US09189729
申请日：1998-11-10
申请人： Gary G. Peterson , Michael T. Sprenger , Adam R. Menze , Travis W. Giffey
发明人： Gary G. Peterson , Michael T. Sprenger , Adam R. Menze , Travis W. Giffey
IPC分类号： B08B700
CPC分类号： A01D17/101
摘要： A rear scrub dual drive for a sugar beet harvester includes functionally-independent first and second variable speed actuators connected to respective first and second drive shafts of a rear scrub and further includes a fluid supply member, pump, and flow control members for energizing the actuators and controlling the speeds at which they can operate to effectively vary the relative speeds of first and second conveyors which are driven by the respective first and second actuators and which are used to scrub and move the harvested sugar beets. The ability to quickly and conveniently change the speeds of the conveyors on the go without replacing and remounting any parts on the rear scrub on the go allows the user to better match the conditions the user may be presented with while harvesting sugar beets.
摘要翻译：一种用于甜菜收割机的后洗涤双驱动器包括连接到后擦洗器的相应的第一和第二驱动轴的功能上独立的第一和第二可变速度致动器，并且还包括流体供应构件，泵和用于激励致动器的流量控制构件并且控制它们可以操作的速度以有效地改变由相应的第一和第二致动器驱动并用于擦洗和移动收获的甜菜的第一和第二输送机的相对速度。随时随地更换传送带的速度，无需更换和重新安装后部擦洗物上的任何部件即可快速方便地更改使用者在收获甜菜时更好地匹配用户可能呈现的条件。

83. 发明授权

US06830627B1 Copper cleaning compositions, processes and products derived therefrom 失效
标题翻译：铜清洗组合物，由其衍生的工艺和产品
公开(公告)号：US06830627B1
公开(公告)日：2004-12-14
申请号：US09274935
申请日：1999-03-23
申请人： Kathleen L. Covert , John M. Lauffer , Peter A. Moschak
发明人： Kathleen L. Covert , John M. Lauffer , Peter A. Moschak
IPC分类号： B08B700
CPC分类号： C11D7/10 , C11D7/08 , C11D7/16 , C11D11/0047 , C23F1/18 , C23G1/103 , H05K1/167 , H05K3/383 , H05K2203/0796
摘要： The present invention is a persulfate microetchant composition especially useful for removing impurities from copper surfaces during fabrication of microelectronic packages. The microetchant formulation is characterized by its ability to selectively clean copper in the presence of nickel, nickel-phosphorous and noble metal alloys therefrom. Furthermore, no deleterious galvanic etching occurs in this microetchant-substrate system so that substantially no undercutting of the copper occurs. The combination of high selectivity and no undercutting allows for a simplification of the microelectronic fabrication process and significant improvements in the design features of the microelectronic package, in particular higher density circuits. The persulfate microetchant composition is stabilized with acid and phosphate salts to provide a process that is stable, fast acting, environmentally acceptable, has high capacity, and can be performed at room temperature. A preferred etchant composition is 100 gm/liter sodium persulfate, 3 volume % phosphoric acid and 0.058 molar sodium phosphate dibasic.
摘要翻译：本发明是一种特别适用于在制造微电子封装期间从铜表面去除杂质的过硫酸盐微蚀剂组合物。微蚀剂制剂的特征在于其在镍，镍 - 磷和贵金属合金存在下选择性地清洗铜的能力。此外，在该微蚀刻 - 衬底系统中不会发生有害的电偶蚀刻，因此基本上不会发生铜的底切。高选择性和无底切的组合允许微电子制造工艺的简化和微电子封装，特别是较高密度电路的设计特征的显着改进。过硫酸盐微提取剂组合物用酸和磷酸盐稳定，以提供稳定，快速作用，环境可接受，具有高容量的方法，并且可以在室温下进行。优选的蚀刻剂组合物为100g /升过硫酸钠，3体积％磷酸和0.058摩尔磷酸氢二钠。

84. 发明授权

US06805753B2 Method to separate silicone seal by thermal degradation 失效
公开(公告)号：US06805753B2
公开(公告)日：2004-10-19
申请号：US10686056
申请日：2003-10-14
申请人： Karen Cary , Michael Schulz , Tom Dooley
发明人： Karen Cary , Michael Schulz , Tom Dooley
IPC分类号： B08B700
CPC分类号： F23G5/0276 , H05B3/74
摘要： A method for removing silicone sealant from glass-ceramic surfaces is provided. The method includes heating the sealant to a temperature greater than 325 degrees Celsius so that it thermally degrades and then, mechanically removing the sealant from the glass-ceramic surface. A method of salvaging a glass-ceramic cooking surface from a cooktop including silicone sealant between a cooktop frame and the glass-ceramic cooking surface is also provided. If a defect is detected in the cooktop during manufacturing or distribution, the entire cooktop is heated to a predetermined temperature to allow the silicone sealant to be easily removed without using a knife or other potentially damaging devices. Once the silicone sealant is removed, the glass-ceramic cooking surface may be reused to produce another cooktop assembly.

85. 发明授权

US06796313B2 Methods of cleaning vaporization surfaces 失效
标题翻译：清洁蒸发表面的方法
公开(公告)号：US06796313B2
公开(公告)日：2004-09-28
申请号：US09935465
申请日：2001-08-21
申请人： Eugene P. Marsh
发明人： Eugene P. Marsh
IPC分类号： B08B700
CPC分类号： B05D1/62 , C23C16/4405 , C23C16/4481 , Y10S438/905
摘要： In one aspect, the invention encompasses a method of utilizing a vaporization surface as an electrode to form a plasma within a vapor forming device. In another aspect, the invention encompasses a method of chemical vapor deposition. A vaporization surface is provided and heated. At least one material is flowed past the heated surface to vaporize the material. A deposit forms on the vaporization surface during the vaporization. The vaporization surface is then utilized as an electrode to form a plasma, and at least a portion of the deposit is removed with the plasma.
摘要翻译：一方面，本发明包括利用汽化表面作为电极在蒸汽形成装置内形成等离子体的方法。另一方面，本发明包括化学气相沉积的方法。提供蒸发表面并加热。至少一种材料流过加热表面以蒸发材料。在蒸发期间在蒸发表面上形成沉积物。然后将汽化表面用作电极以形成等离子体，并且用等离子体去除沉积物的至少一部分。

86. 发明授权

US06776171B2 Cleaning of semiconductor wafers by contaminate encapsulation 失效
公开(公告)号：US06776171B2
公开(公告)日：2004-08-17
申请号：US09892954
申请日：2001-06-27
申请人： Nicole S. Carpenter , Joseph R. Drennan , Alison K. Easton , Casey J. Grant , Andrew S. Hoadley , Kenneth F. McAvey, Jr. , Joel M. Sharrow , William A. Syverson , Kenneth H. Yao
发明人： Nicole S. Carpenter , Joseph R. Drennan , Alison K. Easton , Casey J. Grant , Andrew S. Hoadley , Kenneth F. McAvey, Jr. , Joel M. Sharrow , William A. Syverson , Kenneth H. Yao
IPC分类号： B08B700
CPC分类号： B08B7/0014
摘要： An apparatus and method are provided for removing contaminate particulate matter from substrate surfaces such as semiconductor wafers. The method and apparatus use a material, preferably a liquid curable polymer, which is applied as a sacrificial coating to the surface of a substrate containing contaminate particulate matter thereon. An energy source is used to dislodge the contaminate particulate matter from the surface of the wafer into the sacrificial coating so that the particles are partially or fully encapsulated and suspended in the sacrificial coating. The sacrificial coating is then removed. The coating is preferably formed into a film to facilitate removal of the coating by pulling (stripping) the film providing a cleaner substrate surface.

87. 发明授权

US06769439B2 Plasma cleaning method and placement area protector used in the method 有权
标题翻译：方法中使用的等离子体清洁方法和放置区域保护器
公开(公告)号：US06769439B2
公开(公告)日：2004-08-03
申请号：US09874325
申请日：2001-06-06
申请人： Takahiro Tamura
发明人： Takahiro Tamura
IPC分类号： B08B700
CPC分类号： H01L21/67069 , C23C16/4405 , H01J37/32082 , H01J37/32862 , Y10T428/21
摘要： In a vacuum processing system used in a semiconductor device manufacturing process, a plate-shaped placement area protector made of a dielectric material having a surface of dimensions and shape matching those of a surface of a substrate or an area for substrate placement in a surface of a substrate stage in place of the substrate. An etching gas is introduced into a vacuum vessel by a gas introduction mechanism and predetermined high-frequency electromagnetic wave power is applied to the substrate stage from a stage high-frequency electromagnetic wave power source. Plasma is formed in the proximity of the surface of the substrate stage by the applied high-frequency electromagnetic wave power, and a deposited film on the surface of the substrate stage is removed with the plasma. The placement area protector has the same electrical properties as the deposited film.
摘要翻译：在半导体器件制造工艺中使用的真空处理系统中，由电介质材料制成的板状放置区域保护器，其表面的尺寸和形状与基板的表面或基板的表面的面积相匹配，衬底台代替衬底。通过气体引入机构将蚀刻气体引入真空容器中，并且从级高频电磁波电源将预定的高频电磁波功率施加到衬底台。通过施加的高频电磁波功率在衬底台的表面附近形成等离子体，并且用等离子体去除衬底载台的表面上的沉积膜。放置区域保护膜具有与沉积膜相同的电性能。

88. 发明授权

US06743299B1 Method of cleaning infant feeding bottles 失效
标题翻译：婴儿奶瓶清洁方法
公开(公告)号：US06743299B1
公开(公告)日：2004-06-01
申请号：US10463169
申请日：2003-06-17
申请人： Tony M. Barton , Ilene Cousin
发明人： Tony M. Barton , Ilene Cousin
IPC分类号： B08B700
CPC分类号： B08B9/08
摘要： A method of cleaning articles, such as infant feeding bottles is disclosed. The method provides for the use of alkali metal chloride, more particularly sodium chloride. The salt is deposited into the article to be cleaned, then water is added, and then the article is shaken to cause the crystalline substance to contact the interior walls of the container, thereby cleaning and sanitizing the interior of the article.
摘要翻译：公开了一种清洁物品的方法，例如婴儿喂养瓶。该方法提供使用碱金属氯化物，特别是氯化钠。将盐沉积到待清洁的物品中，然后加入水，然后摇动物品以使结晶物质接触容器的内壁，从而清洁和消毒物品的内部。

89. 发明授权

US06698438B2 Dishwasher fine filter assembly with helical flow path 有权
标题翻译：洗碗机精细过滤器组件具有螺旋流动路径
公开(公告)号：US06698438B2
公开(公告)日：2004-03-02
申请号：US09742529
申请日：2000-12-22
申请人： Arjan Johannes Hegeman , David V. Helmlinger
发明人： Arjan Johannes Hegeman , David V. Helmlinger
IPC分类号： B08B700
CPC分类号： A47L15/4208 , A47L15/4204 , A47L15/4206 , A47L15/4225
摘要： A fine filter assembly for a dishwasher includes a filter body having a soil accumulation trough. The soil accumulation trough defines a substantially helical flow path between a fine filter inlet and an outlet. A natural flow path is therefore provided to efficiently clean fine the filter assembly with downwardly directed fluid jets generated by a lower spray arm assembly. Soil is directed to a fine filter drain tube with relative ease, thereby facilitating use of more efficient use of a drain pump inlet as a soil collection chamber during wash cycles.
摘要翻译：用于洗碗机的精细过滤器组件包括具有土壤积聚槽的过滤体。土壤积聚槽限定精细过滤器入口和出口之间的基本上螺旋状的流动路径。因此，提供自然流动路径以通过由下部喷射臂组件产生的向下指向的流体射流来有效地清洁过滤器组件的细微。土壤相对容易地被引导到精细的过滤器排水管，从而有助于在洗涤循环期间更有效地使用排水泵入口作为污泥收集室。

90. 发明授权

US06676762B2 Method for cleaning a finished and polished surface of a metal automotive wheel 失效
标题翻译：用于清洁金属汽车轮的成品抛光表面的方法
公开(公告)号：US06676762B2
公开(公告)日：2004-01-13
申请号：US09761090
申请日：2001-01-15
申请人： Lawrence T. Drzal , Richard L. Schalek
发明人： Lawrence T. Drzal , Richard L. Schalek
IPC分类号： B08B700
CPC分类号： B05D3/062 , B05D3/044 , B05D2202/00 , B08B7/0057 , Y10S134/902
摘要： A method using irradiation of substrates (12) with ultra violet light to remove a surface contaminant is described. The light can be pulsed or continuous. The treated surfaces are more paintable and bondable.
摘要翻译：描述了使用紫外光照射基板（12）以去除表面污染物的方法。光可以是脉冲或连续的。经处理的表面更可涂漆和粘合。

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