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81. 发明授权

US5684565A Pattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure system 失效
标题翻译：图案检测方法，图案检测装置，使用其的投影曝光装置和曝光系统
公开(公告)号：US5684565A
公开(公告)日：1997-11-04
申请号：US304586
申请日：1994-09-12
申请人： Yoshitada Oshida , Hisafumi Iwata , Yasuhiro Yoshitake , Minoru Yoshida , Yukihiro Shibata
发明人： Yoshitada Oshida , Hisafumi Iwata , Yasuhiro Yoshitake , Minoru Yoshida , Yukihiro Shibata
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G03B27/72
CPC分类号： G03F9/7065
摘要： A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.
摘要翻译：公开了一种用于检测物体表面上的多个图案中的每一个的图案图像的方法和装置。从包括宽波长的光源或包括多个单波长的光源发射的光被施加到物体。该物体包括具有多个层的分层结构，其中物体的最上层的至少一部分是光学透明的。根据关于物体的分层结构和物体的材料的信息，从光源发射的光的光谱照度强度特性是变化的，以获得期望的光谱照度，并且每个图案的图案图像是基于从对象反射的光被检测为一维或二维图像。

82. 发明授权

US5302999A Illumination method, illumination apparatus and projection exposure apparatus 失效
标题翻译：照明方法，照明装置和投影曝光装置
公开(公告)号：US5302999A
公开(公告)日：1994-04-12
申请号：US9928
申请日：1993-01-27
申请人： Yoshitada Oshida , Tutomu Tawa , Yukihiro Shibata , Shigemi Ishii , Minori Noguchi , Tsuneo Terasawa , Makoto Murayama
发明人： Yoshitada Oshida , Tutomu Tawa , Yukihiro Shibata , Shigemi Ishii , Minori Noguchi , Tsuneo Terasawa , Makoto Murayama
IPC分类号： F21V8/00 , F21V13/12 , F21Y105/00 , G02B6/04 , G02B6/28 , G02B6/42 , G03B27/54 , G03F7/20 , G21K5/04 , G03B27/00
CPC分类号： G03F7/70058 , F21V13/12 , G02B6/0008 , G02B6/04 , G02B6/2808 , G02B6/4296 , G03F7/2057
摘要： A projection exposure apparatus comprises a light source for emitting a light beam for exposure; an illumination optical system comprising optical fiber bundle portion including a plurality of bundled optical fibers having an entrance plane to which a light beam exiting from the exposing light source is incident, and a little optical fiber bundle portion including a plurality of little optical fiber bundles respectively having an outgoing plane; and an projection exposure system for projecting a light beam passing through the illumination optical system and transmitting a mask or a reticle onto an object to be exposed as a pattern image of the mask or the reticle.
摘要翻译：投影曝光装置包括用于发射用于曝光的光束的光源; 一种照明光学系统，包括光纤束部分，该光纤束部分包括具有入射面的多个束状光纤，从该曝光光源射出的光束入射到该入射面，以及分别包括多个小光纤束的小光纤束部分有一个出局的飞机; 以及投影曝光系统，用于投影通过照明光学系统的光束，并将掩模或掩模版传送到待曝光的物体上作为掩模或掩模版的图案图像。

83. 发明授权

US09182592B2 Optical filtering device, defect inspection method and apparatus therefor 有权
标题翻译：光学滤波装置，缺陷检查方法及其装置
公开(公告)号：US09182592B2
公开(公告)日：2015-11-10
申请号：US13983310
申请日：2012-02-03
申请人： Taketo Ueno , Toshihiko Nakata , Yukihiro Shibata , Shun'ichi Matsumoto , Atsushi Taniguchi , Hiroshi Toshiyoshi , Takuya Takahashi , Kentaro Motohara
发明人： Taketo Ueno , Toshihiko Nakata , Yukihiro Shibata , Shun'ichi Matsumoto , Atsushi Taniguchi , Hiroshi Toshiyoshi , Takuya Takahashi , Kentaro Motohara
IPC分类号： G01N21/00 , G02B26/02 , G01N21/956 , G01N21/95
CPC分类号： G02B26/02 , G01N21/9501 , G01N21/956
摘要： An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.
摘要翻译：使用光学滤波装置来检测高灵敏度的缺陷的光学滤波装置和光学检查装置，该光学滤波装置包括在SOI晶片和SOI晶片上制造的光学不透明薄膜上二维地形成的快门阵列在闸板图案的下侧的部分处形成穿孔部分，同时在SOI晶片的剩余部分处形成工作电极，在其表面上形成有安装有快门阵列的电极图案的玻璃基板，以及电源部分，用于向形成在玻璃基板上的电极图案和SOI晶片的工作电极提供电力。并且控制工作电极以使快门图案相对于穿孔部分进行打开和关闭运动以进行光学过滤。

84. 发明授权

US08885037B2 Defect inspection method and apparatus therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US08885037B2
公开(公告)日：2014-11-11
申请号：US13375239
申请日：2010-07-01
申请人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
发明人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
IPC分类号： H04N9/47 , G01J4/00 , G01N21/00 , G06K9/00 , G01N37/00 , G01N21/95 , G01N21/956
CPC分类号： G01N21/956 , G01N21/9501
摘要： To effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. According to conventional techniques, a plurality of measurements by changing polarizations is required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. In this invention, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.
摘要翻译：为了有效地利用检查对象的偏振特性以获得更高的检测灵敏度，对于照明的偏振，需要观察来自检查对象的反射，衍射和散射光的差异，因为通过施加具有相同的光的偏振仰角和波长相同但偏振不同。根据常规技术，需要通过改变极化的多个测量来引起作为检查设备的重要规格的延长的检查时间段。在本发明中，在照明光束横截面的微小区域中调制多个偏振状态，通过分别并且同时形成来自各个像素中的各个微区域的散射光，共同地获得多个偏振光照条件下的图像传感器，从而在不降低生产能力的情况下提高检测灵敏度和分选和尺寸精度。

85. 发明授权

US08804112B2 Method of defect inspection and device of defect inspection 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US08804112B2
公开(公告)日：2014-08-12
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

86. 发明申请

US20130293880A1 DEFECT TESTING METHOD AND DEVICE FOR DEFECT TESTING 审中-公开
标题翻译：缺陷测试方法和缺陷测试装置
公开(公告)号：US20130293880A1
公开(公告)日：2013-11-07
申请号：US13882547
申请日：2011-11-01
申请人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata
发明人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata
IPC分类号： G01N21/95
CPC分类号： G01N21/9501
摘要： In a defect inspection method and an apparatus of the same, for enabling to conduct an inspection of fine defects without applying thermal damages on a sample, the following steps are conducted: mounting a sample on a rotatable table to rotate; irradiating a pulse laser emitting from a laser light source upon the sample rotating; detecting a reflected light from the sample, upon which the pulse laser is irradiated; detecting the reflected light from the sample detected; and detecting a defect on the sample through processing of a signal obtained through the detection, wherein irradiation of the pulse laser emitting from the laser light source upon the sample rotating is conducted by dividing the one pulse emitted from the laser light source into plural numbers of pulses, and irradiating each of the divided pulse lasers upon each of separate positions on the sample, respectively.
摘要翻译：在缺陷检查方法及其装置中，为了能够在对样品施加热损伤的情况下进行细小缺陷的检查，进行以下步骤：将样品安装在旋转台上旋转; 照射从激光光源发射的脉冲激光器对样品旋转; 检测来自所述脉冲激光器的样品的反射光; 检测检测到的样品的反射光; 并且通过处理通过检测获得的信号来检测样本上的缺陷，其中通过将从激光光源发射的一个脉冲除以多个数量来进行从样品旋转时从激光源发射的脉冲激光的照射脉冲，并且分别在样品上的每个分离位置上照射每个分割的脉冲激光器。

87. 发明授权

US08236161B2 Apparatus for electrolyzing sulfuric acid, method of performing electrolysis, and apparatus for processing a substrate 有权
标题翻译：硫酸电解装置，电解方法以及基板处理装置
公开(公告)号：US08236161B2
公开(公告)日：2012-08-07
申请号：US12274681
申请日：2008-11-20
申请人： Nobuo Kobayashi , Yukihiro Shibata , Naoya Hayamizu , Masaaki Kato
发明人： Nobuo Kobayashi , Yukihiro Shibata , Naoya Hayamizu , Masaaki Kato
IPC分类号： C25B1/28 , C23G1/00
CPC分类号： C25B1/285 , H01L21/67051
摘要： An apparatus for electrolyzing sulfuric acid, the apparatus comprising an electrolytic cell comprising a cathode chamber having a cathode and an anode chamber having an anode, the cathode chamber and the anode chamber being separated by a diaphragm, a sulfuric acid tank configured to store the sulfuric acid, a supply pipe connecting the sulfuric acid tank to an inlet port of the anode chamber, a connection pipe connecting an outlet port of the cathode chamber to the inlet port of the anode chamber, a first supply pump provided on the supply pipe and configured to supply the sulfuric acid from the sulfuric acid tank to the cathode chamber through the supply pipe, and a drain pipe connected to an outlet port of the anode chamber and configured to supply to a solution tank a solution containing an oxidizing agent generated by electrolysis in the anode chamber.
摘要翻译：一种用于电解硫酸的设备，该设备包括电解池，该电解池包括具有阴极的阴极室和具有阳极的阳极室，阴极室和阳极室由隔膜隔开;硫酸罐，其构造成储存硫酸酸，将硫酸罐连接到阳极室的入口的供给管，将阴极室的出口与阳极室的入口连接的连接管，设置在供给管上的第一供给泵，通过供给管将硫酸从硫酸罐供给到阴极室，以及排水管，其连接到阳极室的出口，并配置成向溶液罐供给含有通过电解产生的氧化剂的溶液阳极室。

88. 发明申请

US20090279079A1 METHOD AND APPARATUS FOR INSPECTING DEFECTS 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20090279079A1
公开(公告)日：2009-11-12
申请号：US12423902
申请日：2009-04-15
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N2021/9563 , G03F7/7065
摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
摘要翻译：提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽二维数组。

89. 发明申请

US20090257647A1 Method and Apparatus for Inspecting Defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20090257647A1
公开(公告)日：2009-10-15
申请号：US12420932
申请日：2009-04-09
申请人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
发明人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
IPC分类号： G06K9/00 , H04N5/335
CPC分类号： G06K9/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148 , H04N5/341 , H04N5/3743 , H04N5/378
摘要： A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.
摘要翻译：将二维传感器安装成倾斜预定角度，使其与安装被检查物体的平台的移动方向倾斜，并且与舞台的移动同步，拾取图像被重新排列，使得可以以相对于晶片的二维传感器的像素大小或更小的高密度采样获得图像。因此，位置对准中的插补计算变得不必要，可以高精度地执行缺陷的尺寸计算和分类。

90. 发明申请

US20080053478A1 SUBSTRATE-PROCESSING METHOD AND METHOD OF MANUFACTURING ELECTRONIC DEVICE 审中-公开
标题翻译：基板处理方法及制造电子器件的方法
公开(公告)号：US20080053478A1
公开(公告)日：2008-03-06
申请号：US11681368
申请日：2007-03-02
申请人： Yukihiro Shibata , Naoya Hayamizu
发明人： Yukihiro Shibata , Naoya Hayamizu
IPC分类号： C23G1/02
CPC分类号： H01L21/67086 , G03F7/423
摘要： A method of manufacturing an electronic device includes dipping a substrate in a solution containing sulfuric acid, which is accommodated in a processing vessel. An aqueous solution of hydrogen peroxide supplies the sulfuric acid accommodated in the processing vessel for generating peroxomonosulfuric acid (Caro's acid). Therefore, an organic material present on the surface of the substrate is removed by the action of Caro's acid within the processing vessel. The time for supplying the aqueous solution of hydrogen peroxide into the processing vessel is set on the basis of the change with time in the concentration of Caro's acid measured in advance so as to permit the peak in the concentration of Caro's acid to appear while the substrate is kept dipped in the processing solution.
摘要翻译：制造电子器件的方法包括将基底浸入容纳在处理容器中的含有硫酸的溶液中。过氧化氢水溶液为容纳在处理容器中的硫酸提供产生过氧硫酸（卡罗酸）。因此，通过Caro酸在处理容器内的作用去除存在于基板表面上的有机材料。将过氧化氢水溶液供给到处理容器中的时间是基于事先测定的Caro酸浓度随时间的变化而设定的，以使Caro酸的浓度峰值出现，同时衬底保持浸在处理液中。

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