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81. 发明申请

US20130269597A1 SEED MATERIAL FOR LIQUID PHASE EPITAXIAL GROWTH OF MONOCRYSTALLINE SILICON CARBIDE, AND METHOD FOR LIQUID PHASE EPITAXIAL GROWTH OF MONOCRYSTALLINE SILICON CARBIDE 审中-公开
标题翻译：用于单相碳化硅的液相外延生长的种子材料及单晶碳化硅的液相外延生长方法
公开(公告)号：US20130269597A1
公开(公告)日：2013-10-17
申请号：US13996077
申请日：2011-06-29
申请人： Satoshi Torimi , Satoru Nogami , Tsuyoshi Matsumoto
发明人： Satoshi Torimi , Satoru Nogami , Tsuyoshi Matsumoto
IPC分类号： C30B19/12 , C30B29/36
CPC分类号： C30B19/12 , C30B28/14 , C30B29/36 , Y10T428/26
摘要： Provided is an inexpensive seed material for liquid phase epitaxial growth of silicon carbide. A seed material 12 for liquid phase epitaxial growth of a monocrystalline silicon carbide includes a surface layer containing a polycrystalline silicon carbide with a 3C crystal polymorph. Upon X-ray diffraction of the surface layer thereof, a first-order diffraction peak corresponding to a (111) crystal plane is observed as a diffraction peak corresponding to the polycrystalline silicon carbide with a 3C crystal polymorph but no other first-order diffraction peak having a diffraction intensity of 10% or more of the diffraction intensity of the first-order diffraction peak corresponding to the (111) crystal plane is observed.
摘要翻译：提供了用于碳化硅的液相外延生长的廉价种子材料。用于单晶碳化硅的液相外延生长的种子材料12包括含有具有3C晶体多晶型物的多晶碳化硅的表面层。在其表面层的X射线衍射中，观察到对应于（111）晶面的一级衍射峰，作为与具有3C晶体多晶型物的多晶碳化硅相对应的衍射峰，但没有其它一级衍射峰观察到与（111）晶面对应的一级衍射峰的衍射强度为10％以上的衍射强度。

82. 发明授权

US08520279B2 Micro movable device and interferometer 有权
标题翻译：微动移动装置和干涉仪
公开(公告)号：US08520279B2
公开(公告)日：2013-08-27
申请号：US12614903
申请日：2009-11-09
申请人： Norinao Kouma , Osamu Tsuboi , Tsuyoshi Matsumoto
发明人： Norinao Kouma , Osamu Tsuboi , Tsuyoshi Matsumoto
IPC分类号： G02B26/08
CPC分类号： G02B26/0841 , G01J3/4535 , H02N1/006
摘要： A micro movable device includes a movable member, a stationary portion, and connecting portions each connected to the movable member and the stationary portion. The movable member includes a pair of electrodes. The stationary portion includes a pair of electrodes cooperating with the electrodes of the movable member to generate a driving force for translating the movable member in its thickness direction. The connection points at which the respective connecting portions are connected to the movable member are spaced from each other. The electrodes of the movable member are positioned between two mutually spaced connection points, as viewed along the spacing direction of the two connection points.
摘要翻译：微型可移动装置包括可移动部件，固定部分和连接到可移动部件和固定部分的连接部分。可动构件包括一对电极。固定部分包括与可动构件的电极配合的一对电极，以产生用于在可移动构件的厚度方向上平移的驱动力。各连接部分连接到可移动部件的连接点彼此间隔开。当沿着两个连接点的间隔方向观察时，可动构件的电极位于两个相互间隔的连接点之间。

83. 发明授权

US08471152B2 Microstructure and microstructure manufacture method 有权
标题翻译：微结构和微结构制造方法
公开(公告)号：US08471152B2
公开(公告)日：2013-06-25
申请号：US13091728
申请日：2011-04-21
申请人： Yoshihiro Mizuno , Norinao Kouma , Hisao Okuda , Hiromitsu Soneda , Tsuyoshi Matsumoto , Osamu Tsuboi
发明人： Yoshihiro Mizuno , Norinao Kouma , Hisao Okuda , Hiromitsu Soneda , Tsuyoshi Matsumoto , Osamu Tsuboi
IPC分类号： H05K1/03
CPC分类号： B81C1/00698 , Y10T29/49117
摘要： A microstructure comprises a laminate structure having a first conductor, a second conductor, and an intervening insulator located between the first and the second conductors. The first conductor includes opposite faces in relation to the second conductor, side faces, and edge parts which form the boundaries of the aforementioned opposite faces and side faces. The second conductor includes an extended face extending beyond the edge parts exceeding the first conductor. The insulation film includes an area covering at least part of an edge part and/or at least part of a side face.
摘要翻译：微结构包括具有第一导体，第二导体和位于第一和第二导体之间的中间绝缘体的层压结构。第一导体包括相对于第二导体的相对面，侧面和形成上述相对面和侧面的边界的边缘部分。第二导体包括延伸超过超过第一导体的边缘部分的延伸面。绝缘膜包括覆盖边缘部分的至少一部分和/或侧面的至少一部分的区域。

84. 发明授权

US08390415B2 Coil component 有权
标题翻译：线圈组件
公开(公告)号：US08390415B2
公开(公告)日：2013-03-05
申请号：US13399794
申请日：2012-02-17
申请人： Hideki Ogawa , Tsuyoshi Matsumoto
发明人： Hideki Ogawa , Tsuyoshi Matsumoto
IPC分类号： H01F27/02 , H01F38/12 , H01F27/29 , H01F17/04 , H01F27/24
CPC分类号： H01F1/26 , H01F1/24 , H01F1/33 , H01F17/04 , H01F41/0246 , H01F2003/106
摘要： A coil component 10 includes: a magnetic core made of a magnetic alloy; a coil having a spiral part placed around a pillar part of the magnetic core; a magnetic sheath formed on the magnetic core in a manner covering the coil except for the bottom face of the magnetic core; and a first external terminal and second external terminal formed on the magnetic core and magnetic sheath; wherein the magnetic sheath has numerous voids inside.
摘要翻译：线圈部件10包括：由磁性合金制成的磁芯; 线圈，其具有围绕所述磁芯的柱部配置的螺旋部; 以除了磁芯的底面之外的线圈的方式形成在磁芯上的磁性护套; 以及形成在所述磁芯和磁性护套上的第一外部端子和第二外部端子; 其中磁性护套内部具有许多空隙。

85. 发明授权

US08223766B2 Communication method for system including client device and plural server devices 有权
标题翻译：包括客户端设备和多台服务器设备在内的系统通信方式
公开(公告)号：US08223766B2
公开(公告)日：2012-07-17
申请号：US12543216
申请日：2009-08-18
申请人： Tsuyoshi Matsumoto , Takeshi Yamazaki , Mako Kawaguchi , Shuichi Kitaguchi , Yuusuke Shimada , Kotaro Okazaki
发明人： Tsuyoshi Matsumoto , Takeshi Yamazaki , Mako Kawaguchi , Shuichi Kitaguchi , Yuusuke Shimada , Kotaro Okazaki
IPC分类号： H04L12/28
CPC分类号： H04L12/1868 , H04L43/0817 , H04L45/00 , H04L45/28 , H04L67/14 , H04L67/145 , H04L69/16 , H04L69/161 , H04L69/164 , H04L69/22 , H04L69/40
摘要： An objective of the present invention is to secure the continuity of the communication between a client device and a standby server device, when a failure occurs and switch to the standby device is performed. A communication processing unit of the client device establishes connection with a plurality of server devices simultaneously by transmitting a UDP packet to the plurality of server devices by multicast. After establishing the connection, data of the application is transmitted by multicast to the plurality of the server devices. In the even of a failure, a standby server device receives the data packet multicast from the client device to continue the inter-application communication.
摘要翻译：本发明的目的是确保客户端设备和备用服务器设备之间的通信的连续性，当故障发生并且切换到备用设备时。客户端设备的通信处理单元通过多播向多个服务器设备发送UDP分组，同时与多个服务器设备建立连接。建立连接后，应用程序的数据通过组播传输到多个服务器设备。即使发生故障，备用服务器设备从客户端设备接收数据包多播，继续进行应用间通信。

86. 发明授权

US08202382B2 Method for manufacturing micro movable element 有权
标题翻译：微型可动元件制造方法
公开(公告)号：US08202382B2
公开(公告)日：2012-06-19
申请号：US12509584
申请日：2009-07-27
申请人： Norinao Kouma , Osamu Tsuboi , Yoshihiro Mizuno , Hiromitsu Soneda , Hisao Okuda , Tsuyoshi Matsumoto , Ippei Sawaki
发明人： Norinao Kouma , Osamu Tsuboi , Yoshihiro Mizuno , Hiromitsu Soneda , Hisao Okuda , Tsuyoshi Matsumoto , Ippei Sawaki
IPC分类号： B32B37/12
CPC分类号： B81C1/00825 , B81B2201/042 , B81B2203/0154 , G02B6/3518 , G02B6/3556 , G02B26/0841 , H04Q2213/13003
摘要： A method for manufacturing a micro movable element includes: forming a movable section, a frame, and a connecting section connecting the movable section with the frame on a substrate; bonding a film to a surface of the substrate in forming the movable section, the frame, and the connecting section; and patterning the film to form a support structure being bridged between the movable section and the frame.
摘要翻译：微型可动元件的制造方法包括：在基板上形成可动部，框架和将可动部与框架连接的连接部，在形成可移动部分，框架和连接部分的过程中将薄膜粘合到基板的表面上; 以及图案化所述膜以形成桥接在所述可移动部分和所述框架之间的支撑结构。

87. 发明申请

US20120125900A1 FLUX-CORED WIRE FOR WELDING DIFFERENT MATERIALS, METHOD FOR LASER WELDING OF DIFFERENT MATERIALS, AND METHOD FOR MIG WELDING OF DIFFERENT MATERIALS 有权
标题翻译：用于焊接不同材料的焊丝，不同材料的激光焊接方法和用于不同材料的焊接的方法
公开(公告)号：US20120125900A1
公开(公告)日：2012-05-24
申请号：US13388177
申请日：2010-07-26
申请人： Tsuyoshi Matsumoto , Seiji Sasabe
发明人： Tsuyoshi Matsumoto , Seiji Sasabe
IPC分类号： B23K26/00 , B23K35/24 , B23K9/00
CPC分类号： B23K35/286 , B23K9/173 , B23K9/232 , B23K26/206 , B23K26/211 , B23K35/0266 , B23K35/36 , B23K35/3605 , B23K35/368 , B23K2103/20 , C22C21/02
摘要： A flux-cored wire for laser welding or MIG welding different materials, wherein the different materials are aluminum or an aluminum alloy material and a galvanized steel material. The flux-cored wire contains a cylindrical aluminum alloy sheath containing: aluminum, 0.8-1.9 mass % Si, at most 0.1 mass % Mn, 0.1 mass % Mg, and 0.1 mass % Fe; and a flux filled in a space within the sheath and containing 20-60 mass % cesium fluoride, wherein the percentage filling of the flux is 5-20 mass % with respect to the total mass of the flux-core wire.
摘要翻译：用于激光焊接或MIG焊接不同材料的药芯焊丝，其中不同的材料是铝或铝合金材料和镀锌钢材料。药芯焊丝包含圆筒形铝合金护套，其包含：铝，0.8-1.9质量％的Si，至多0.1质量％的Mn，0.1质量％的Mg和0.1质量％的Fe; 以及填充在护套内的空间内的助熔剂，含有20-60质量％的氟化铯，其中焊剂的填充百分比相对于磁芯线的总质量为5〜20质量％。

88. 发明授权

US08107810B2 Imaging device and optical device 有权
标题翻译：成像装置和光学装置
公开(公告)号：US08107810B2
公开(公告)日：2012-01-31
申请号：US12259693
申请日：2008-10-28
申请人： Tsuyoshi Matsumoto
发明人： Tsuyoshi Matsumoto
IPC分类号： G03B17/48 , B60R1/06
CPC分类号： G02B27/0006 , B08B7/02 , G03B17/00 , H04N5/2171 , H04N5/2254
摘要： An imaging device comprising a light transmissive member 18 having light transmissive character, a vibration member 20 causing bending vibration for the light transmissive member, a driving portion 56 for driving the vibration member 20, wherein the driving portion 56 causes bending vibration of the light transmissive member at a first frequency along with a first direction and causes bending vibration of the light transmissive member 18 at a second frequency along with a second direction which is different from said first frequency.
摘要翻译：一种成像装置，包括具有透光特性的透光构件18，对透光构件产生弯曲振动的振动构件20，用于驱动振动构件20的驱动部分56，其中驱动部分56引起透光构件的弯曲振动构件与第一方向一起呈第一频率，并且使得透光构件18的弯曲振动与第二频率以及与所述第一频率不同的第二方向。

89. 发明授权

US08057634B2 Method and apparatus for plasma processing 有权
标题翻译：等离子体处理方法和装置
公开(公告)号：US08057634B2
公开(公告)日：2011-11-15
申请号：US10902032
申请日：2004-07-30
申请人： Ryoji Nishio , Tadamitsu Kanekiyo , Yoshiyuki Oota , Tsuyoshi Matsumoto
发明人： Ryoji Nishio , Tadamitsu Kanekiyo , Yoshiyuki Oota , Tsuyoshi Matsumoto
IPC分类号： H01L21/205 , H01L21/302
CPC分类号： G06F17/5081 , G06F17/5086 , H01J37/32082 , H01J37/32642 , H01J37/32935 , H01L21/67069 , H01L21/6875
摘要： The invention provides a plasma processing apparatus capable of minimizing the non-uniformity of potential distribution around wafer circumference, and providing a uniform process across the wafer surface. The apparatus is equipped with a focus ring formed of a dielectric, a conductor or a semiconductor and having RF applied thereto, the design of which is optimized for processing based on a design technique clarifying physical conditions for flattening a sheath-plasma interface above a wafer and the sheath-plasma interface above the focus ring. A surface voltage of the focus ring is determined to be not less than a minimum voltage for preventing reaction products caused by wafer processing from depositing thereon. The surface height, surface voltage, material and structure of the focus ring are optimized so that the height of an ion sheath formed on the focus ring surface is either equal or has a height difference within an appropriate tolerance range to the height of the ion sheath formed on the wafer surface. Optimization of the structure is realized by setting up an appropriate tolerance range taking into consideration the variation caused by consumption of the focus ring.
摘要翻译：本发明提供一种等离子体处理装置，其能够最小化晶片周边周围的电位分布的不均匀性，并且跨晶片表面提供均匀的工艺。该装置配备有由电介质，导体或半导体形成的并且施加RF的聚焦环，其设计被优化用于基于澄清用于使晶片上的鞘等离子体界面平坦化的物理条件的设计技术进行处理以及聚焦环上方的鞘 - 等离子体界面。聚焦环的表面电压被确定为不低于用于防止由晶片加工引起的反应产物沉积在其上的最小电压。聚焦环的表面高度，表面电压，材料和结构被优化，使得形成在聚焦环表面上的离子鞘的高度相等或具有在离子鞘高度适当的公差范围内的高度差形成在晶片表面上。通过考虑由聚焦环的消耗引起的变化，建立适当的公差范围来实现结构的优化。

90. 发明授权

US08038896B2 Plasma processing method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US08038896B2
公开(公告)日：2011-10-18
申请号：US11502416
申请日：2006-08-11
申请人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
发明人： Eiji Ikegami , Shoji Ikuhara , Takeshi Shimada , Kenichi Kuwabara , Takao Arase , Tsuyoshi Matsumoto
IPC分类号： G01L21/30 , C23F1/00
CPC分类号： H01J37/32963 , H01J37/32082 , H01J37/32091 , H01J37/321 , H01J37/3211 , H01J37/32192 , H01J37/32917 , H01J37/32926 , H01J37/32935 , H01J37/32981 , H01J37/3299 , H01J2237/1825 , H01J2237/327 , H01L21/67069 , H01L21/67242 , H05H1/46
摘要： Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time.
摘要翻译：在具有等离子体处理室的等离子体处理装置中进行多个基板的等离子体处理，该等离子体处理室具有用于在等离子体处理室内依次放置和保持多个基板的天线电极和下部电极，供给处理用气体供给装置气体进入处理室，用于经由真空阀从处理室排出气体的真空泵和用于在处理室内形成磁场的螺线管线圈。多个基板中的至少一个被放置在下电极上，并且处理气体被馈送到处理室中。 RF功率经由匹配网络馈送到天线电极，以在处理室内产生等离子体，其中已经由螺线管线圈形成了磁场。然后重复这种至少一个基板的放置和该处理气体的进料，直至完成所有多个基板的等离子体处理。当包括处理室的内部压力的参数在具有等离子体处理时间的稳定值变得稳定时，确定调味品的结束。

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