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    • 82. 发明授权
    • Solid state image pick-up apparatus
    • 固态摄像装置
    • US4456929A
    • 1984-06-26
    • US385005
    • 1982-06-04
    • Masakazu AokiHaruhisa AndoShinya OhbaIwao Takemoto
    • Masakazu AokiHaruhisa AndoShinya OhbaIwao Takemoto
    • H01L27/146H04N5/335H04N5/359H04N5/365H04N5/374H04N3/15
    • H04N3/1568
    • In a solid state image pick-up device of the type comprising a first semiconductor layer including a photoelectric conversion element array, and vertical and horizontal switching elements adapted to select the photoelectric conversion elements, a second semiconductor layer including a horizontal shift register for selecting the horizontal switching elements, a third semiconductor layer including a vertical shift register for selecting the vertical switching elements, the first, second and third semiconductor layers are insulated from each other, and gate voltage V.sub.SMOS.L impressed upon a gate electrode of a not selected horizontal switching element is made to satisfy a relation V.sub.SMOS.L .gtoreq.V.sub.WPD +F.sub.FB where V.sub.WPD represents a potential of the first semiconductor layer, and V.sub.FB a flat band voltage beneath gate electrodes of the horizontal switching elements.
    • 在包括包括光电转换元件阵列的第一半导体层和适于选择光电转换元件的垂直和水平开关元件的类型的固态图像拾取装置中,包括水平移位寄存器的第二半导体层, 水平开关元件,包括用于选择垂直开关元件的垂直移位寄存器的第三半导体层,第一,第二和第三半导体层彼此绝缘,并且栅极电压VSMOS.L施加在未选择的水平的栅电极 使开关元件满足VSMOS.L> / = VWPD + FFB的关系,其中VWPD表示第一半导体层的电位,VFB是水平开关元件的栅电极下方的平带电压。
    • 86. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US4223330A
    • 1980-09-16
    • US5567
    • 1979-01-22
    • Norio KoikeIwao TakemotoShinya OhbaMasaharu KuboShuhei Tanaka
    • Norio KoikeIwao TakemotoShinya OhbaMasaharu KuboShuhei Tanaka
    • H01L27/146H04N5/335H04N5/359H04N5/374H01L27/14H01L29/78
    • H01L27/14654
    • In a solid-state imaging device having, in one major surface region of a semiconductor substrate, photoelectric conversion elements which are disposed in a two-dimensional array, vertical switching metal-insulator-semiconductor field effect transistors and horizontal switching metal-insulator-semiconductor field effect transistors which select the photoelectric conversion elements, and vertical and horizontal scanning circuits which turn the switching transistors "on" and "off," a solid-state imaging device characterized in that the vertical switching metal-insulator-semiconductor field effect transistors which are not selected are placed into a deeper cutoff state, i.e., the major surface regions of the semiconductor substrate corresponding to gate electrodes of these vertical switching metal-insulator-semiconductor field effect transistors are placed at an accumulation level.
    • 在具有在半导体衬底的一个主表面区域中设置为二维阵列的光电转换元件的立体成像器件中,垂直开关金属 - 绝缘体 - 半导体场效应晶体管和水平开关金属 - 绝缘体半导体 选择光电转换元件的场效应晶体管以及使开关晶体管“导通”和“截止”的垂直和水平扫描电路,其特征在于垂直开关金属 - 绝缘体半导体场效应晶体管 未选择的位置被置于更深的截止状态,即,对应于这些垂直开关金属 - 绝缘体 - 半导体场效应晶体管的栅极的半导体衬底的主表面区域被放置在累积水平。