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81. 发明授权

US07576223B2 Chemical amplification type resist composition 失效
标题翻译：化学放大型抗蚀剂组合物
公开(公告)号：US07576223B2
公开(公告)日：2009-08-18
申请号：US12155072
申请日：2008-05-29
申请人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
发明人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
IPC分类号： C07D333/46 , C07D335/02
CPC分类号： G03F7/0045 , C07C381/12 , C07D333/46 , G03F7/0395 , G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

82. 发明申请

US20080269506A1 Chemical amplification type resist composition 失效
标题翻译：化学放大型抗蚀剂组合物
公开(公告)号：US20080269506A1
公开(公告)日：2008-10-30
申请号：US12155072
申请日：2008-05-29
申请人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
发明人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
IPC分类号： C07C381/12 , C07D333/24 , C07D335/02
CPC分类号： G03F7/0045 , C07C381/12 , C07D333/46 , G03F7/0395 , G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

83. 发明授权

US07129014B2 Positive resist composition 失效
公开(公告)号：US07129014B2
公开(公告)日：2006-10-31
申请号：US10404671
申请日：2003-04-02
申请人： Kouji Toishi , Yoshiko Miya , Yasunori Uetani
发明人： Kouji Toishi , Yoshiko Miya , Yasunori Uetani
IPC分类号： G03C1/71
CPC分类号： G03F7/0045 , C08F8/44 , G03F7/0046 , G03F7/0395 , Y10S430/108
摘要： The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator, and multifunctional epoxy compound, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.

84. 发明授权

US06846609B2 Chemical amplification type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06846609B2
公开(公告)日：2005-01-25
申请号：US10239896
申请日：2001-03-21
申请人： Yasunori Uetani , Takakiyo Terakawa , Kaoru Araki
发明人： Yasunori Uetani , Takakiyo Terakawa , Kaoru Araki
IPC分类号： C08F2/48 , C08F212/14 , C08F220/20 , C08F220/28 , C08K5/00 , C08K5/16 , C08L25/18 , C08L33/14 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/28 , Y10S430/106 , Y10S430/111
摘要： A chemical amplification type positive resist composition is provided, comprising a resin which has at least one polymerization unit selected from a polymerization unit of 3-hydroxy-1-adamantyl acrylate and a polymerization unit of 3,5-dihydroxy-1-adamantyl (meth)acrylate, a polymerization unit of hydroxystyrene and a polymerization unit having a group uhstable to an acid, is itself insoluble or poorly soluble in an alkali but becomes alkali-soluble after said group unstable to an acid is dissociated by the action of an acid; and an acid generator, the composition being excellent in various abilities such as sensitivity, resolution, heat resistance, film retention ratio, applicability, exposure clearance, dry etching resistance and the like, particularly having further improved resolution and exposure clearance.
摘要翻译：提供化学放大型正性抗蚀剂组合物，其包含具有至少一个选自丙烯酸3-羟基-1-金刚烷基酯的聚合单元的聚合单元和3,5-二羟基-1-金刚烷基（甲基）丙烯酸酯的聚合单元的树脂，）丙烯酸酯，羟基苯乙烯的聚合单元和具有与酸成反应的基团的聚合单元本身在碱中不溶或难溶，但在酸不稳定的所述基团被酸的作用解离后，其变成碱溶性; 和酸发生剂，特别是具有进一步提高分辨率和曝光间隙的各种能力，例如灵敏度，分辨率，耐热性，保膜率，适用性，曝光间隙，耐干蚀刻性等优异的组合物。

85. 发明授权

US06627381B1 Chemical amplification type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06627381B1
公开(公告)日：2003-09-30
申请号：US09890803
申请日：2001-10-25
申请人： Yasunori Uetani , Akira Kamabuchi
发明人： Yasunori Uetani , Akira Kamabuchi
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/0397
摘要： A chemical amplification type positive resist composition comprising: a resin which has a hydroxystyrene-based polymerization unit, a 3-hydroxy-1-adamantyl methacrylate-based polymerization unit and a polymerization unit having a group unstable toward an acid, and, though insoluble or hardly soluble in an alkali in itself, becomes alkali-soluble after the acid-unstable group has been cleaved by the action of an acid; and an acid generating agent is provided. This resist composition is improved in exposure latitude and resolution. Moreover, such properties as sensitivity, heat resistance, the ratio of residual thickness, coatability, and dry etching resistance are also maintained good. Thus, through the use of this composition, a fine resist pattern can be formed with high precision.
摘要翻译：一种化学放大型正型抗蚀剂组合物，包括：具有羟基苯乙烯类聚合单元，甲基丙烯酸3-羟基-1-金刚烷基酯聚合单元和具有对酸不稳定的基团的聚合单元的树脂，以及尽管不溶或不溶本身难溶于碱，在酸不稳定基团通过酸的作用被切割后，变成碱溶性的; 并提供酸生成剂。该抗蚀剂组合物在曝光宽容度和分辨率方面得到改善。此外，还保持了诸如灵敏度，耐热性，残留厚度比，涂布性和耐干蚀刻性等特性。因此，通过使用该组合物，可以高精度地形成精细的抗蚀剂图案。

86. 发明授权

US06569596B1 Negative working chemical amplification type resist compositions 失效
标题翻译：负工作化学放大型抗蚀剂组合物
公开(公告)号：US06569596B1
公开(公告)日：2003-05-27
申请号：US09584149
申请日：2000-05-31
申请人： Yasunori Uetani , Airi Yamada , Hiroki Inoue
发明人： Yasunori Uetani , Airi Yamada , Hiroki Inoue
IPC分类号： G03F7004
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A negative working chemical amplification type resist composition, which is capable of giving more improved resolution; and comprises an alkali-soluble resin, a cross-linking agent, a N-substituted succinimide compound represented by the following formula (I): wherein R represents an unsubstituted or substituted alkyl, an alicyclic hydrocarbon residue, an aryl or a camphor group, and an acid generator other than the above N-substituted succinimide compound is provided.
摘要翻译：负性工作化学放大型抗蚀剂组合物，其能够提供更好的分辨率; 并且包含碱溶性树脂，交联剂，由下式（I）表示的N-取代琥珀酰亚胺化合物：其中R表示未取代或取代的烷基，脂环族烃残基，芳基或樟脑基，提供除了上述N-取代琥珀酰亚胺化合物之外的酸酐发生剂。

87. 发明授权

US06495307B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US06495307B2
公开(公告)日：2002-12-17
申请号：US09791756
申请日：2001-02-26
申请人： Yasunori Uetani , Hiroaki Fujishima , Yoshiyuki Takata
发明人： Yasunori Uetani , Hiroaki Fujishima , Yoshiyuki Takata
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111
摘要： A chemically amplified positive resist composition excellent in adhesion to a substrate, as well as good in dry-etching resistance; suitable for use in excimer laser lithography utilizing ArF, KrF or the like; and comprising a resin (X) which, per se, is insoluble in alkali but becomes soluble in alkali when subjected to an action of acid, and has a polymeric unit represented by the formula(I), a polymeric unit represented by the formula(II) and a polymeric unit represented by the formula(III): and an acid generating agent (Y).
摘要翻译：一种化学放大型正性抗蚀剂组合物，其与基材的密合性优异，耐干蚀刻性优异; 适用于利用ArF，KrF等的准分子激光光刻; 并且包含本身不溶于碱但在酸作用下变得可溶于碱的树脂（X），并且具有由式（I）表示的聚合单元，由式（II）表示的聚合单元）和由式（III）表示的聚合单元：和酸产生剂（Y）。

88. 发明授权

US06475699B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US06475699B2
公开(公告)日：2002-11-05
申请号：US09765671
申请日：2001-01-22
申请人： Yasunori Uetani , Seong-Hyeon Kim , Yoshiyuki Takata
发明人： Yasunori Uetani , Seong-Hyeon Kim , Yoshiyuki Takata
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A chemically amplified positive resist composition excellent in sensitivity and resolution as well as other resist performance characteristics comprising a resin (X) which has a polymeric unit represented by the following formula (I): wherein R1 represents hydrogen or methyl, R2 and R3 represent alkyl having 1 to 4 carbon atoms, and R4 and R5 represent hydrogen, hydroxyl or alkyl, polymeric unit represented by the following formula (II): and a polymeric unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride; and an acid generating agent (Y).
摘要翻译：包括具有由下式（I）表示的聚合单元的树脂（X）：其中R 1表示氢或甲基，R 2和R 3表示烷基的化合物增强正性抗蚀剂组合物，其灵敏度和分辨率以及其它抗蚀剂性能特征优异，具有1至4个碳原子，R 4和R 5表示氢，羟基或烷基，由下式（II）表示的聚合单元：和衍生自不饱和二羧酸酐的聚合单元，其选自马来酸酐和衣康酸酐; 和酸产生剂（Y）。

89. 发明授权

US06406830B2 Chemical amplification type positive resist compositions and sulfonium salts 有权
标题翻译：化学扩增型正性抗蚀剂组合物和锍盐
公开(公告)号：US06406830B2
公开(公告)日：2002-06-18
申请号：US09849523
申请日：2001-05-07
申请人： Hiroki Inoue , Yasunori Uetani
发明人： Hiroki Inoue , Yasunori Uetani
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/039 , Y10S430/122 , Y10S430/123
摘要： A chemical amplifying type positive resist composition having high transmittance, superior in sensitivity and resolution in a lithography utilizing a light having a wavelength of 220 nm or lower and confering a good profile is provided, Which comprises an aliphatic sulfonium salt represented by the following formula (I): wherein either Q1, Q2, Q3 and Q4 represent an alkyl group or a cycloalkyl group, or Q1 and Q2 and/or Q3 and Q4 form, together with the adjacent sulfur atom, a heterocyclic group, and m represents an integer of 1 to 8; at least one onium salt selected from the group consisting of a triphenylsulfonium salt and a diphenyliodonium salt; and a resin which contains a polymerization unit having a group unstable to an acid, and which is insoluble in alkali by itself but becomes soluble in alkali by the action of an acid.
摘要翻译：提供了一种具有高透射率，灵敏度和分辨率优异的化学放大型正光刻胶组合物，其利用波长为220nm或更低的光并具有良好外形的光刻技术，其包括由下式（I）表示的脂族锍盐）：其中Q1，Q2，Q3和Q4表示烷基或环烷基，或Q1和Q2和/或Q3和Q4与相邻的硫原子一起形成杂环基，m表示1的整数至8;至少一种选自三苯基锍盐和二苯基碘鎓盐的鎓盐; 和含有具有对酸不稳定的基团的聚合单元的树脂，其本身不溶于碱，但通过酸的作用变得易溶于碱。

90. 发明授权

US06383709B2 Positive resist composition comprising N-(n-octylsulfonyloxy) succinimide 有权
标题翻译：包含N-（正辛基磺酰氧基）琥珀酰亚胺的正型抗蚀剂组合物
公开(公告)号：US06383709B2
公开(公告)日：2002-05-07
申请号：US09812583
申请日：2001-03-21
申请人： Yasunori Uetani , Jun Tomioka , Sang-Ho Lee
发明人： Yasunori Uetani , Jun Tomioka , Sang-Ho Lee
IPC分类号： G03F7023
CPC分类号： G03F7/0226 , G03F7/0045
摘要： A positive resist composition which gives improved profile without lowering other properties such as sensitivity and resolution, and comprises an alkali-soluble novolak resin, a quinone diazide type radiation-sensitive agent and N-(n-octylsulfonyloxy)succinimide
摘要翻译：含有碱溶性酚醛清漆树脂，二叠氮类醌类放射线敏感剂和N-（正辛基磺酰氧基）琥珀酰亚胺

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