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1. 发明授权

US06548221B2 Chemical amplification type positive resist composition 失效
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06548221B2
公开(公告)日：2003-04-15
申请号：US10003441
申请日：2001-12-06
申请人： Yasunori Uetani , Hiroki Inoue
发明人： Yasunori Uetani , Hiroki Inoue
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： A positive resist composition is provided which comprises a resin having 2-alkyl-2-adamantyl (meth)acrylate polymerization unit represented by the following formula (I): wherein R1 represents hydrogen or methyl and R2 represents an alkyl, and being insoluble or barely soluble in alkali, but being converted to soluble in alkali by the action of an acid; and an acid generator represented by the following formula (V): wherein Q1, Q2 and Q3 independently represent hydrogen, a hydroxyl group, an alkyl having 1 to 6 carbon atoms or an alkoxy having 1 to 6 carbon atoms, and n is an integer of 4 to 8; and gives a good resolution upon exposure by ArF excimer laser and has little substrate dependency.
摘要翻译：提供一种正型抗蚀剂组合物，其包含具有由下式（I）表示的（甲基）丙烯酸2-烷基-2-金刚烷基酯聚合单元的树脂：其中R1表示氢或甲基，R2表示烷基，并且不溶或几乎不溶可溶于碱，但通过酸的作用转化为可溶于碱;和由下式（V）表示的酸发生剂：其中Q1，Q2和Q3独立地表示氢，羟基，具有1〜 6个碳原子或1〜6个碳原子的烷氧基，n为4〜8的整数。并且通过ArF准分子激光曝光时给出良好的分辨率，并且基板依赖性很小。

2. 发明授权

US06383713B1 Chemical amplification type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06383713B1
公开(公告)日：2002-05-07
申请号：US09482359
申请日：2000-01-14
申请人： Yasunori Uetani , Hiroki Inoue
发明人： Yasunori Uetani , Hiroki Inoue
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： A positive resist composition is provided which comprises a resin having 2-alkyl-2-adamantyl (meth)acrylate polymerization unit represented by the following formula (I): wherein R1 represents hydrogen or methyl and R2 represents an alkyl, and being insoluble or barely soluble in alkali, but being converted to soluble in alkali by the action of an acid; and an acid generator represented by the following formula (V): wherein Q1, Q2 and Q3 independently represent hydrogen, a hydroxyl group, an alkyl having 1 to 6 carbon atoms or an alkoxy having 1 to 6 carbon atoms, and n is an integer of 4 to 8. The composition exhibits good resolution upon exposure by a ArP excimer laser and has little substrate dependency.
摘要翻译：提供一种正型抗蚀剂组合物，其包含具有由下式（I）表示的（甲基）丙烯酸2-烷基-2-金刚烷基酯聚合单元的树脂：其中R1表示氢或甲基，R2表示烷基，并且不溶或几乎不溶可溶于碱，但通过酸的作用转化为可溶于碱;和由下式（V）表示的酸发生剂：其中Q1，Q2和Q3独立地表示氢，羟基，具有1〜 6个碳原子或具有1至6个碳原子的烷氧基，n是4至8的整数。该组合物在暴露于ArP准分子激光器时表现出良好的分辨率，并且基板依赖性很小。

3. 发明授权

US06348297B1 Chemical amplification type positive resist 有权
标题翻译：化学放大型正抗蚀剂
公开(公告)号：US06348297B1
公开(公告)日：2002-02-19
申请号：US09533986
申请日：2000-03-24
申请人： Yasunori Uetani , Kenji Oohashi , Hiroki Inoue
发明人： Yasunori Uetani , Kenji Oohashi , Hiroki Inoue
IPC分类号： G03F7004
CPC分类号： C07C381/12 , G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/122
摘要： A chemical amplification type positive resist composition which is good in resolution, provide a good pattern profile under exposure using light of wavelength of 220 nm or shorter even when applied on a basic substrate or a low reflectance substrate and which comprises an acid generator comprising an aliphatic sulfonium salt represented by the following formula (I): wherein Q1 represents an alkyl group, Q2 represents an alkyl or a residue of an alicyclic hydrocarbon and m represents an integer of 1 to 8; and onium salt selected from triphenylsulfonium salts represented by the following formula (IIa) and diphenyliodonium salts represented by the following formula (IIb): wherein Q3, Q4, Q5, Q6 and Q7each independently represent a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and q and p represent a integer of 4 to 8; and (2) a resin which has a polymerization unit with a group unstable to an acid, and is insoluble or barely soluble in alkali by itself but changes soluble in alkali by an action of the acid, is provided.
摘要翻译：使用分辨率好的化学放大型正光刻胶组合物即使施加在基底或低反射率基底上也能使波长为220nm以下的光即使在曝光下也能提供良好的图案形状，并且包括含有脂肪族由下式（I）表示的锍盐：其中Q1表示烷基，Q2表示脂肪族烃的烷基或残基，m表示1〜8的整数，和选自由下式（IIa）表示的三苯基锍盐和下式（IIb）表示的二苯基碘鎓盐的鎓盐：其中Q3，Q4，Q5，Q6和Q7各自独立地表示氢原子，羟基，烷基具有1至6个碳原子，具有1至6个碳原子的烷氧基，q和p表示4至8的整数; 和（2）具有聚合单元的树脂，其具有对酸不稳定的基团，并且其本身不溶或几乎不溶于碱，但是通过酸的作用变化溶于碱。

4. 发明授权

US06569596B1 Negative working chemical amplification type resist compositions 失效
标题翻译：负工作化学放大型抗蚀剂组合物
公开(公告)号：US06569596B1
公开(公告)日：2003-05-27
申请号：US09584149
申请日：2000-05-31
申请人： Yasunori Uetani , Airi Yamada , Hiroki Inoue
发明人： Yasunori Uetani , Airi Yamada , Hiroki Inoue
IPC分类号： G03F7004
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A negative working chemical amplification type resist composition, which is capable of giving more improved resolution; and comprises an alkali-soluble resin, a cross-linking agent, a N-substituted succinimide compound represented by the following formula (I): wherein R represents an unsubstituted or substituted alkyl, an alicyclic hydrocarbon residue, an aryl or a camphor group, and an acid generator other than the above N-substituted succinimide compound is provided.
摘要翻译：负性工作化学放大型抗蚀剂组合物，其能够提供更好的分辨率; 并且包含碱溶性树脂，交联剂，由下式（I）表示的N-取代琥珀酰亚胺化合物：其中R表示未取代或取代的烷基，脂环族烃残基，芳基或樟脑基，提供除了上述N-取代琥珀酰亚胺化合物之外的酸酐发生剂。

5. 发明授权

US06406830B2 Chemical amplification type positive resist compositions and sulfonium salts 有权
标题翻译：化学扩增型正性抗蚀剂组合物和锍盐
公开(公告)号：US06406830B2
公开(公告)日：2002-06-18
申请号：US09849523
申请日：2001-05-07
申请人： Hiroki Inoue , Yasunori Uetani
发明人： Hiroki Inoue , Yasunori Uetani
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/039 , Y10S430/122 , Y10S430/123
摘要： A chemical amplifying type positive resist composition having high transmittance, superior in sensitivity and resolution in a lithography utilizing a light having a wavelength of 220 nm or lower and confering a good profile is provided, Which comprises an aliphatic sulfonium salt represented by the following formula (I): wherein either Q1, Q2, Q3 and Q4 represent an alkyl group or a cycloalkyl group, or Q1 and Q2 and/or Q3 and Q4 form, together with the adjacent sulfur atom, a heterocyclic group, and m represents an integer of 1 to 8; at least one onium salt selected from the group consisting of a triphenylsulfonium salt and a diphenyliodonium salt; and a resin which contains a polymerization unit having a group unstable to an acid, and which is insoluble in alkali by itself but becomes soluble in alkali by the action of an acid.
摘要翻译：提供了一种具有高透射率，灵敏度和分辨率优异的化学放大型正光刻胶组合物，其利用波长为220nm或更低的光并具有良好外形的光刻技术，其包括由下式（I）表示的脂族锍盐）：其中Q1，Q2，Q3和Q4表示烷基或环烷基，或Q1和Q2和/或Q3和Q4与相邻的硫原子一起形成杂环基，m表示1的整数至8;至少一种选自三苯基锍盐和二苯基碘鎓盐的鎓盐; 和含有具有对酸不稳定的基团的聚合单元的树脂，其本身不溶于碱，但通过酸的作用变得易溶于碱。

6. 发明授权

US09184393B2 Composition and organic photoelectric converter 有权
标题翻译：组成和有机光电转换器
公开(公告)号：US09184393B2
公开(公告)日：2015-11-10
申请号：US12671109
申请日：2008-08-08
申请人： Yasunori Uetani
发明人： Yasunori Uetani
IPC分类号： H01L31/0256 , H01L51/00 , B82Y10/00 , C08G61/02 , C08G61/12 , C08K3/04 , C08L65/00 , H01L51/42
CPC分类号： H01L51/0043 , B82Y10/00 , C08G61/02 , C08G61/126 , C08G2261/148 , C08G2261/3142 , C08K3/04 , C08K3/045 , C08L65/00 , H01L51/0036 , H01L51/0039 , H01L51/0047 , H01L51/4253 , Y02E10/549
摘要： A composition containing a polymer having a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2), and a fullerene with a carbon number of 70 or more or a fullerene derivative having a fullerene skeleton with a carbon number of 70 or more: wherein, Q, R, R1 and R2 each independently denote a hydrogen atom, and so on.
摘要翻译：一种组合物，其含有具有下述式（1）表示的结构单元的聚合物和下述式（2）所示的结构单元和碳数为70以上的富勒烯或具有富勒烯骨架的富勒烯衍生物，碳数为70以上：其中，Q，R，R 1和R 2各自独立地表示氢原子等。

7. 发明授权

US08723163B2 Organic photoelectric converter 有权
标题翻译：有机光电转换器
公开(公告)号：US08723163B2
公开(公告)日：2014-05-13
申请号：US12922107
申请日：2009-03-05
申请人： Yasunori Uetani
发明人： Yasunori Uetani
IPC分类号： H01L51/54 , C07D333/02
CPC分类号： H01L51/0068 , H01L51/0036 , H01L51/0039 , H01L51/0043 , H01L51/0067 , H01L51/0072 , H01L51/0074 , H01L51/4253 , Y02E10/549
摘要： Disclosed is an organic photoelectric conversion device including a pair of electrodes, at least one of which is transparent or semi-transparent, and an organic layer arranged between the electrodes and containing a conjugated polymer compound and a sulfur-containing heterocyclic compound, wherein the sulfur-containing heterocyclic compound has a condensed polycyclic structure or a bithiophene structure. Examples of the sulfur-containing heterocyclic compound include a compound represented by formula (1): (wherein, a plurality of R1's may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group, an aryloxy group, an arylthio group, an arylalkyl group, an arylalkoxy group or an arylalkylthio group, and a hydrogen atom or atoms contained in these groups may be substituted by a fluorine atom or atoms; and m represents an integer of 0 to 10) or the like.
摘要翻译：公开了一种有机光电转换装置，其包括一对电极，其至少一个是透明或半透明的，并且有机层布置在电极之间并含有共轭高分子化合物和含硫杂环化合物，其中硫的杂环化合物具有缩合多环结构或双噻吩结构。含硫杂环化合物的实例包括由式（1）表示的化合物：（其中，多个R 1可以相同或不同，各自表示氢原子，卤素原子，烷基，烷氧基，烷硫基，芳基，芳氧基，芳硫基，芳烷基，芳烷氧基或芳烷硫基，这些基中所含的氢原子或原子可以被氟原子或原子取代; m 表示0〜10的整数）等。

8. 发明申请

US20140008747A1 METHOD OF PRODUCING ORGANIC PHOTOELECTRIC CONVERSION DEVICE 审中-公开
标题翻译：生产有机光电转换装置的方法
公开(公告)号：US20140008747A1
公开(公告)日：2014-01-09
申请号：US14004694
申请日：2012-03-02
申请人： Yasunori Uetani
发明人： Yasunori Uetani
IPC分类号： H01L51/42
CPC分类号： H01L51/42 , B82Y10/00 , H01L51/0003 , H01L51/0036 , H01L51/0043 , H01L51/0047 , H01L51/4253 , Y02E10/549 , Y02P70/521
摘要： An organic photoelectric conversion device can be easily produced by a method of producing an organic photoelectric conversion device, comprising forming an anode, forming an active layer on the anode, then, forming a cathode on the active layer by a coating method.
摘要翻译：有机光电转换装置可以通过制造有机光电转换装置的方法容易地制造，包括形成阳极，在阳极上形成有源层，然后通过涂布法在有源层上形成阴极。

9. 发明申请

US20110130588A1 COMPOSITION, AND ORGANIC PHOTOELECTRIC CONVERSION ELEMENT COMPRISING SAME 审中-公开
标题翻译：组成和有机光电转换元件
公开(公告)号：US20110130588A1
公开(公告)日：2011-06-02
申请号：US13054902
申请日：2009-07-23
申请人： Yasunori Uetani , Jun Fujiwara
发明人： Yasunori Uetani , Jun Fujiwara
IPC分类号： C07C69/76 , B82Y30/00
CPC分类号： C08L65/00 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C01B32/152 , C08G61/126 , C08G2261/3142 , C08G2261/3223 , C08G2261/364 , C08G2261/91 , C09B69/109 , H01L51/0047 , H01L51/4253 , Y02E10/549
摘要： Disclosed is a composition produced by reacting a fullerene derivative with a reducing agent. The composition is preferably produced by adding a reducing agent to a composition comprising a fullerene derivative and a solvent to cause the reaction of the fullerene derivative and the reducing agent. The reducing agent is preferably a trivalent phosphorus compound.
摘要翻译：公开了通过富勒烯衍生物与还原剂反应制备的组合物。该组合物优选通过将还原剂添加到包含富勒烯衍生物和溶剂的组合物中以引起富勒烯衍生物和还原剂的反应来制备。还原剂优选为三价磷化合物。

10. 发明申请

US20110114183A1 POLYMER COMPOUND AND ORGANIC PHOTOELECTRIC CONVERTER USING THE SAME 审中-公开
标题翻译：聚合物化合物和有机光电转换器
公开(公告)号：US20110114183A1
公开(公告)日：2011-05-19
申请号：US12738041
申请日：2008-10-17
申请人： Yasunori Uetani , Takanobu Noguchi
发明人： Yasunori Uetani , Takanobu Noguchi
IPC分类号： H01L51/46 , C08G75/06
CPC分类号： H01L51/0036 , C08G61/126 , C08G2261/3223 , C08G2261/3246 , C08G2261/364 , C08G2261/411 , C08G2261/91 , H01L51/0039 , H01L51/0043 , H01L51/4253 , Y02E10/549
摘要： A polymer compound comprising a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2). In the formula (1), Ar1 and Ar2 each independently represent an arylene group or a group represented by the following formula (3); R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group, an alkoxy group, or an aryl group; and a hydrogen atom contained in these groups may be substituted by a fluorine atom. In the formula (2), R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom, an alkyl group, an alkoxy group, or an aryl group; and a hydrogen atom contained in these groups may be substituted by a fluorine atom.
摘要翻译：一种包含由式（1）表示的重复单元和由式（2）表示的重复单元的聚合物化合物。式（1）中，Ar 1和Ar 2分别独立地表示亚芳基或下述式（3）表示的基团。 R1，R2，R3和R4各自独立地表示氢原子，烷基，烷氧基或芳基; 这些基团中所含的氢原子可以被氟原子取代。在式（2）中，R 5，R 6，R 7，R 8，R 9和R 10各自独立地表示氢原子，烷基，烷氧基或芳基。这些基团中所含的氢原子可以被氟原子取代。

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