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1. 发明授权

US06495306B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US06495306B2
公开(公告)日：2002-12-17
申请号：US09741438
申请日：2000-12-21
申请人： Yasunori Uetani , Hiroaki Fujishima , Yoshiyuki Takata
发明人： Yasunori Uetani , Hiroaki Fujishima , Yoshiyuki Takata
IPC分类号： G03F7039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111
摘要： A chemically amplified positive resist composition which is suitable for use in an exposure process utilizing an ArF excimer laser and is capable of forming a resist coat exhibiting a high hydrophillcity; is excellent in adhesion to a substrate and satisfactory in resist performance characteristics; and comprises a resin (X) which has a polymeric unit(a) derived from dihydroxy-1-adamantyl (meth)acrylate and a polymeric unit(b) derived from 2-alkyl-2-adamantyl (meth)acrylate, and which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali due to an action of acid; and an acid generating agent (Y).
摘要翻译：一种化学放大正性抗蚀剂组合物，其适用于利用ArF准分子激光的曝光工艺，并且能够形成显示出高亲水性的抗蚀涂层; 对基材的附着性优异，抗蚀剂性能特性好; 并且包含具有衍生自（甲基）丙烯酸二羟基-1-金刚烷基酯的聚合单元（a）和衍生自（甲基）丙烯酸-2-烷基-2-金刚烷基酯的聚合单元（b）的树脂（X），并且其不溶或微溶于碱，但由于酸的作用而溶于碱; 和酸产生剂（Y）。

2. 发明授权

US06495307B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US06495307B2
公开(公告)日：2002-12-17
申请号：US09791756
申请日：2001-02-26
申请人： Yasunori Uetani , Hiroaki Fujishima , Yoshiyuki Takata
发明人： Yasunori Uetani , Hiroaki Fujishima , Yoshiyuki Takata
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111
摘要： A chemically amplified positive resist composition excellent in adhesion to a substrate, as well as good in dry-etching resistance; suitable for use in excimer laser lithography utilizing ArF, KrF or the like; and comprising a resin (X) which, per se, is insoluble in alkali but becomes soluble in alkali when subjected to an action of acid, and has a polymeric unit represented by the formula(I), a polymeric unit represented by the formula(II) and a polymeric unit represented by the formula(III): and an acid generating agent (Y).
摘要翻译：一种化学放大型正性抗蚀剂组合物，其与基材的密合性优异，耐干蚀刻性优异; 适用于利用ArF，KrF等的准分子激光光刻; 并且包含本身不溶于碱但在酸作用下变得可溶于碱的树脂（X），并且具有由式（I）表示的聚合单元，由式（II）表示的聚合单元）和由式（III）表示的聚合单元：和酸产生剂（Y）。

3. 发明授权

US06239231B1 Chemical amplifying type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06239231B1
公开(公告)日：2001-05-29
申请号：US09384032
申请日：1999-08-26
申请人： Hiroaki Fujishima , Yasunori Uetani , Karou Araki
发明人： Hiroaki Fujishima , Yasunori Uetani , Karou Araki
IPC分类号： C08F800
CPC分类号： G03F7/039 , G03F7/0045
摘要： A chemical amplifying type positive resist composition, excellent in adhesion to a substrate and good in resist performances and suitable for exposure using a KrF excimer laser, ArF excimer laser, or the like, which comprises a resin having a polymerization unit of 2-alkyl-2-adamantyl (meth)acrylate and a polymerization unit of a monomer selected from 3-hydroxy-1-adamantyl (meth)acrylate and (meth)acrylonitrile, and an acid generator is provided.
摘要翻译：一种化学放大型正性抗蚀剂组合物，其具有优异的基材粘附性和良好的抗蚀性能，并且适用于使用KrF准分子激光器，ArF准分子激光器等曝光，其包含具有2-烷基 - （甲基）丙烯酸2-金刚烷基酯和选自3-（甲基）丙烯酸3-羟基-1-金刚烷酯和（甲基）丙烯腈的单体的聚合单元和酸产生剂。

4. 发明授权

US06677102B2 Chemical amplifying type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06677102B2
公开(公告)日：2004-01-13
申请号：US10093399
申请日：2002-03-11
申请人： Yoshiko Miya , Yasunori Uetani , Hiroaki Fujishima
发明人： Yoshiko Miya , Yasunori Uetani , Hiroaki Fujishima
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising; a resin having a polymerization unit derived from a monomer represented by the following formula (I): wherein R1 and R2 independently represent hydrogen or an alkyl group having 1 to 4 carbons, and R3 represents hydrogen or a methyl group, the resin being insoluble in alkali itself but becoming alkali-soluble due to the action of an acid; and an acid generating agent is provided.
摘要翻译：一种化学放大型正性抗蚀剂组合物，其分辨率和灵敏度性能的平衡优异，具有高的耐干蚀刻性，并且包括：具有源自由下式（I）表示的单体的聚合单元的树脂：其中R1和R2独立地表示氢或碳原子数1〜4的烷基，R 3表示氢或甲基，该树脂本身不溶于碱，但由于酸的作用而成为碱溶性的; 并提供酸生成剂。

5. 发明授权

US06579659B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US06579659B2
公开(公告)日：2003-06-17
申请号：US09824227
申请日：2001-04-03
申请人： Yasunori Uetani , Airi Yamada , Yoshiko Miya , Yoshiyuki Takata
发明人： Yasunori Uetani , Airi Yamada , Yoshiko Miya , Yoshiyuki Takata
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent. (A): At least one polymeric unit of an alicyclic lactcone selected from polymeric units represented by the following formulae (Ia) and (Ib): (B): At least one polymeric unit selected from a polymeric unit of 3-hydroxy-1-adamantyl (meth)acrylate represented by the following formula (II), a polymeric unit of a combination of a unit represented by the following formula (III) and a unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride and a polymeric unit of (&agr;)&bgr;-(meth)acryloyloxy-&ggr;-butyrolactone represented by the following formula (IV):
摘要翻译：包含具有以下聚合单元（A），（B）和（C）的树脂的性能如分辨率，轮廓，灵敏度，耐干蚀刻性，粘附性等的平衡优异的化学增幅型正光刻胶组合物; （A）：选自由下式（Ia）和（Ib）表示的聚合单元的脂环族内聚焦的至少一种聚合单元:( B）：至少一种选自聚合单元的聚合单元由下式（II）表示的3-羟基-1-金刚烷基（甲基）丙烯酸酯，由下式（III）表示的单元的组合的单体和来自选自马来酸酐的不饱和二羧酸酐的单元酸酐和衣康酸酐以及由下式（IV）表示的（α）β-（甲基）丙烯酰氧基-γ-丁内酯的聚合单元：

6. 发明授权

US06815140B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US06815140B2
公开(公告)日：2004-11-09
申请号：US09323230
申请日：1999-06-01
申请人： Yasunori Uetani , Hiroshi Moriuma , Yoshiyuki Takata
发明人： Yasunori Uetani , Hiroshi Moriuma , Yoshiyuki Takata
IPC分类号： G03F7023
CPC分类号： G03F7/0226
摘要： A positive resist composition, having a superior resolution as well as good resist performances such as sensitivity, depth of focus and profile, is described and includes a novolac resin, a radiation-sensitive quinonediazide compound and a thioxanthone compound represented by the following formula (I): wherein R1, R2, R3, R4, R5, R6, R7 and R8 independently represent hydrogen, halogen, alkyl, alkoxy, aryl, carboxyl or alkoxycarbonyl.

7. 发明授权

US06475699B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US06475699B2
公开(公告)日：2002-11-05
申请号：US09765671
申请日：2001-01-22
申请人： Yasunori Uetani , Seong-Hyeon Kim , Yoshiyuki Takata
发明人： Yasunori Uetani , Seong-Hyeon Kim , Yoshiyuki Takata
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A chemically amplified positive resist composition excellent in sensitivity and resolution as well as other resist performance characteristics comprising a resin (X) which has a polymeric unit represented by the following formula (I): wherein R1 represents hydrogen or methyl, R2 and R3 represent alkyl having 1 to 4 carbon atoms, and R4 and R5 represent hydrogen, hydroxyl or alkyl, polymeric unit represented by the following formula (II): and a polymeric unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride; and an acid generating agent (Y).
摘要翻译：包括具有由下式（I）表示的聚合单元的树脂（X）：其中R 1表示氢或甲基，R 2和R 3表示烷基的化合物增强正性抗蚀剂组合物，其灵敏度和分辨率以及其它抗蚀剂性能特征优异，具有1至4个碳原子，R 4和R 5表示氢，羟基或烷基，由下式（II）表示的聚合单元：和衍生自不饱和二羧酸酐的聚合单元，其选自马来酸酐和衣康酸酐; 和酸产生剂（Y）。

8. 发明授权

US5807656A Polyhydroxy compound and a positive photoresist containing the same 失效
标题翻译：多羟基化合物和含有其的正性光致抗蚀剂
公开(公告)号：US5807656A
公开(公告)日：1998-09-15
申请号：US709323
申请日：1996-09-04
申请人： Koji Ichikawa , Haruyoshi Osaki , Yasunori Uetani , Yoshiyuki Takata
发明人： Koji Ichikawa , Haruyoshi Osaki , Yasunori Uetani , Yoshiyuki Takata
IPC分类号： C07C39/15 , G03F7/022 , G03F7/023
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226
摘要： A polyhydroxy compound represented by the following formula (I): ##STR1## and a positive resist composition which comprises an alkali-soluble resin, a quinonediazide sulfonic acid ester, and a polyhydroxy compound of formula (I) or a polyhydroxy compound represented by the following formula (C): ##STR2## which is satisfactory in properties such as sensitivity, resolution, .tau.-value and peeling off resistance.
摘要翻译：由下式（I）表示的多羟基化合物：（I）和含有碱溶性树脂，醌二叠氮化物磺酸酯和式（I）的多羟基化合物或多羟基化合物的正性抗蚀剂组合物由下式（C）表示：在图像敏感度，分辨率，tau值和抗剥离性等性能方面令人满意的。

9. 发明授权

US09184393B2 Composition and organic photoelectric converter 有权
标题翻译：组成和有机光电转换器
公开(公告)号：US09184393B2
公开(公告)日：2015-11-10
申请号：US12671109
申请日：2008-08-08
申请人： Yasunori Uetani
发明人： Yasunori Uetani
IPC分类号： H01L31/0256 , H01L51/00 , B82Y10/00 , C08G61/02 , C08G61/12 , C08K3/04 , C08L65/00 , H01L51/42
CPC分类号： H01L51/0043 , B82Y10/00 , C08G61/02 , C08G61/126 , C08G2261/148 , C08G2261/3142 , C08K3/04 , C08K3/045 , C08L65/00 , H01L51/0036 , H01L51/0039 , H01L51/0047 , H01L51/4253 , Y02E10/549
摘要： A composition containing a polymer having a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2), and a fullerene with a carbon number of 70 or more or a fullerene derivative having a fullerene skeleton with a carbon number of 70 or more: wherein, Q, R, R1 and R2 each independently denote a hydrogen atom, and so on.
摘要翻译：一种组合物，其含有具有下述式（1）表示的结构单元的聚合物和下述式（2）所示的结构单元和碳数为70以上的富勒烯或具有富勒烯骨架的富勒烯衍生物，碳数为70以上：其中，Q，R，R 1和R 2各自独立地表示氢原子等。

10. 发明授权

US08723163B2 Organic photoelectric converter 有权
标题翻译：有机光电转换器
公开(公告)号：US08723163B2
公开(公告)日：2014-05-13
申请号：US12922107
申请日：2009-03-05
申请人： Yasunori Uetani
发明人： Yasunori Uetani
IPC分类号： H01L51/54 , C07D333/02
CPC分类号： H01L51/0068 , H01L51/0036 , H01L51/0039 , H01L51/0043 , H01L51/0067 , H01L51/0072 , H01L51/0074 , H01L51/4253 , Y02E10/549
摘要： Disclosed is an organic photoelectric conversion device including a pair of electrodes, at least one of which is transparent or semi-transparent, and an organic layer arranged between the electrodes and containing a conjugated polymer compound and a sulfur-containing heterocyclic compound, wherein the sulfur-containing heterocyclic compound has a condensed polycyclic structure or a bithiophene structure. Examples of the sulfur-containing heterocyclic compound include a compound represented by formula (1): (wherein, a plurality of R1's may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group, an aryloxy group, an arylthio group, an arylalkyl group, an arylalkoxy group or an arylalkylthio group, and a hydrogen atom or atoms contained in these groups may be substituted by a fluorine atom or atoms; and m represents an integer of 0 to 10) or the like.
摘要翻译：公开了一种有机光电转换装置，其包括一对电极，其至少一个是透明或半透明的，并且有机层布置在电极之间并含有共轭高分子化合物和含硫杂环化合物，其中硫的杂环化合物具有缩合多环结构或双噻吩结构。含硫杂环化合物的实例包括由式（1）表示的化合物：（其中，多个R 1可以相同或不同，各自表示氢原子，卤素原子，烷基，烷氧基，烷硫基，芳基，芳氧基，芳硫基，芳烷基，芳烷氧基或芳烷硫基，这些基中所含的氢原子或原子可以被氟原子或原子取代; m 表示0〜10的整数）等。

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