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    • 86. 发明授权
    • Reactor for generating moisture
    • 反应器产生水分
    • US07008598B2
    • 2006-03-07
    • US10884917
    • 2004-07-07
    • Tadahiro OhmiKouji KawadaNobukazu IkedaAkihiro MorimotoYukio MinamiKenji TubotaTeruo HonidenTouru HiraiKatunori KomehanaKeiji Hirao
    • Tadahiro OhmiKouji KawadaNobukazu IkedaAkihiro MorimotoYukio MinamiKenji TubotaTeruo HonidenTouru HiraiKatunori KomehanaKeiji Hirao
    • B01J8/02
    • B01J12/007B01J2219/00058B01J2219/00087B01J2219/00096C01B5/00
    • A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell. The reactor comprises: a reactor shell A with an interior space formed with a reactor structural component on the inlet side and a reactor structural component on the outlet side opposed to and united with each other by welding, the reactor structural component 1 on the inlet side provided with a gas feed port 1a and the reactor structural component 2 on the outlet side provided with a moisture gas take-out port 2a; a reflector on the inlet side facing the gas feed port in the interior space of the reactor; a reflector on the outlet side facing the moisture gas take-out port in the interior space; and a platinum coat catalyst layer 8 formed on the inside wall of the reactor structural component on the outlet side, wherein hydrogen and oxygen fed into the interior space of the reactor through the gas feed port are brought into contact with the platinum coat 8b to activate the reactivity, thereby reacting hydrogen and oxygen into water in a non-combustion state.
    • 一种用于产生水分的反应器,其中更加完全地防止了氢气的点燃,气体供应源侧的反应,内部的铂涂层催化剂层的剥离,从而进一步提高了产生水分的反应器的安全性, 减少内部空间以进一步减小反应器壳体的尺寸。 反应器包括:反应器壳体A,内部空间形成有入口侧的反应器结构部件,出口侧的反应器结构部件通过焊接彼此相对并且彼此结合,反应器结构部件1在入口侧 设置有气体供给口1a和在排气侧设置有湿气取出口2a的反应器结构部件2; 入口侧的反射器,其面对反应器内部空间中的气体供给口; 出口侧的反射器面向内部空间中的湿气取出口; 以及形成在出口侧的反应器结构部件的内壁上的铂涂层催化剂层8,其中通过气体供给口供给到反应器的内部空间中的氢和氧与铂涂层8b相接触, 激活反应性,从而使氢和氧在非燃烧状态下反应成水。
    • 89. 发明申请
    • Rotary silicon wafer cleaning apparatus
    • 旋转硅片清洗装置
    • US20050126030A1
    • 2005-06-16
    • US10498800
    • 2003-09-11
    • Tadahiro OhmiYasuyuki ShiraiTakumi FujitaYukio MinamiNobukazu IkedaAkihiro MorimotoKoji Kawada
    • Tadahiro OhmiYasuyuki ShiraiTakumi FujitaYukio MinamiNobukazu IkedaAkihiro MorimotoKoji Kawada
    • H01L21/304F26B17/24F26B17/30H01L20060101H01L21/00H01L21/02H01L21/30H01L21/302
    • H01L21/67034H01L21/02052
    • It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments. According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.
    • 本发明的目的是提供一种旋转型硅晶片清洁装置,以在化学和纯净水清洗处理完成之后通过在硅晶片上提供更好的氢终止来进一步提高硅晶片的稳定性。 根据本发明,旋转型硅晶片清洗装置在壳体内部具有硅晶片支撑/旋转驱动机构,用于在后期化学清洗时用纯水清洗硅晶片,在外表面上进行干燥和氢终止处理 通过安装硅晶片干燥装置来执行硅晶片,所述硅晶片干燥装置包括附接到壳体的气体供应板,以供应氢气和含有大于0.05%的氢气的惰性气体的混合气体,混合气体供应 一端连接上述气体供给面板的气体混合器的管道,将上述气体供给管内的混合气体加热的混合气体加热装置以及配备有铂镀膜的氢自由基形成装置, 在与上述混合气体加热装置加热的高温气体接触的气体接触部分处形成氢自由基,从而喷出混合气体 在完成清洁之后,将上述自由基形成装置形成的氢基团固定在旋转的硅晶片上。