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81. 发明申请

US20050286050A1 Real-time through lens image measurement system and method 审中-公开
标题翻译：实时透镜图像测量系统及方法
公开(公告)号：US20050286050A1
公开(公告)日：2005-12-29
申请号：US10882131
申请日：2004-06-29
申请人： Bausan Yuan , Martin Lee , Nobutaka Magome , Hidemi Kawai
发明人： Bausan Yuan , Martin Lee , Nobutaka Magome , Hidemi Kawai
IPC分类号： G01B11/00 , G03F7/20
CPC分类号： G03F7/70591
摘要： Embodiments of the present invention are directed to an apparatus and a method for through lens measurement for a projection system. In one embodiment, an apparatus for through lens image measurement comprises a projection lens housing containing lens elements therein, and a reflective member having a center of curvature on a first plane. The reflective member is attached to the lens housing. An optical system includes a light source, a position detector, and one or more optical elements. The optical system is attached to the lens housing and configured to direct a light from the light source through the lens elements to the reflective member which reflects the light back through the lens elements and toward the position detector. The position detector is configured to detect any image shift at the first plane due to misalignment of the lens elements with respect to the lens housing.
摘要翻译：本发明的实施例涉及一种用于投影系统的透镜测量的装置和方法。在一个实施例中，用于透镜图像测量的装置包括在其中容纳透镜元件的投影透镜壳体和在第一平面上具有曲率中心的反射构件。反射构件附接到透镜壳体。光学系统包括光源，位置检测器和一个或多个光学元件。光学系统附接到透镜壳体并且被配置为将来自光源的光通过透镜元件引导到反射构件，反射构件将光反射回透镜元件并朝向位置检测器。位置检测器被配置为由于透镜元件相对于透镜壳体的未对准而检测在第一平面处的任何图像偏移。

82. 发明申请

US20050264774A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20050264774A1
公开(公告)日：2005-12-01
申请号：US11147288
申请日：2005-06-08
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G01N21/85 , G01N21/53 , G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via the projection optical system and the liquid, includes a bubble detector (20) which detects air bubble or bubbles in the liquid between the projection optical system and the substrate (P). Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译：一种曝光装置，其中通过用液体填充投影光学系统和基板（P）之间的空间的至少一部分并将图案的图像投影到基板上来进行基板（P）的曝光（ P）通过投影光学系统和液体包括气泡检测器（20），其检测投影光学系统和基板（P）之间的液体中的气泡或气泡。因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

83. 发明申请

US20050259234A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20050259234A1
公开(公告)日：2005-11-24
申请号：US11147285
申请日：2005-06-08
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： Liquid is supplied by a supply mechanism to a space between a lens and a wafer via a supply nozzle on one side of the lens, and the liquid is recovered by a recovery mechanism via a recovery pipe on the other side of the lens. When the supply and the recovery of the liquid are performed in parallel, a predetermined amount of liquid (exchanged at all times) is held between the lens and the substrate on the stage. Accordingly, when exposure (pattern transfer on the substrate) is performed in this state, an immersion method is applied and a pattern is transferred with good precision onto the substrate. In addition, in the case the liquid leaks out from under the lower edge of a peripheral wall, the liquid that could not be recovered is recovered by an auxiliary recovery mechanism via a slit. And, by such operations, the substrate is freed from the residual liquid on the substrate.
摘要翻译：通过供给机构，通过透镜一侧的供给喷嘴将供给机构供给到透镜和晶片间的空间，液体通过透镜另一侧的回收管被回收机构回收。当并行进行液体的供给和回收时，在透镜和台架上的基板之间保持预定量的液体（始终进行交换）。因此，当在该状态下进行曝光（在基板上进行图案转印）时，施加浸渍方法，并将图案以良好的精度传送到基板上。此外，在液体从周壁的下边缘下方泄漏的情况下，通过狭缝通过辅助回收机构回收无法回收的液体。并且，通过这样的操作，基板从基板上的残余液体中除去。

84. 发明授权

US06278957B1 Alignment method and apparatus therefor 有权
标题翻译：对准方法及其装置
公开(公告)号：US06278957B1
公开(公告)日：2001-08-21
申请号：US09240599
申请日：1999-02-01
申请人： Masahiko Yasuda , Osamu Furukawa , Masaharu Kawakubo , Hiroki Tateno , Nobutaka Magome
发明人： Masahiko Yasuda , Osamu Furukawa , Masaharu Kawakubo , Hiroki Tateno , Nobutaka Magome
IPC分类号： G06F1500
CPC分类号： G03F9/7003
摘要： A method of aligning each of a plurality of processing areas arranged on a substrate with a predetermined transfer position in a static coordinate system XY for defining a moving position of said substrate, a pattern of a mask being transferred to each of the plurality of processing areas, the method comprising the steps of: wherein each of the plurality of processing areas has a specific point and a plurality of marks for alignment arranged by a predetermined positional relationship with respect to said specific point; measuring coordinate positions of a predetermined number of marks selected from several processing areas of the plurality of processing areas on the static coordinate system XY; calculating a plurality of parameters in a model equation expressing the regularity of arrangement of the plurality of processing areas by performing a statistic calculation by use with the measured plurality of coordinate positions, arrangement coordinate values upon the design of the specific points of the several processing areas and relative arrangement coordinate values upon the design of the selected marks of the several processing areas with respect to corresponding the specific points on the several processing areas; and determining coordinate positions of respective said specific points of the plurality of processing areas on the static coordinate system XY by using the calculated parameters.
摘要翻译：将布置在基板上的多个处理区域中的每一个与静态坐标系XY中的预定传送位置对准的方法，用于限定所述基板的移动位置，掩模的图案被传送到多个处理区域所述方法包括以下步骤：其中所述多个处理区域中的每一个具有针对所述特定点以预定的位置关系排列的特定点和多个用于对准的标记; 测量从静态坐标系XY上的多个处理区域的多个处理区域中选择的预定数量的标记的坐标位置; 通过使用所测量的多个坐标位置进行统计计算，在设计多个处理区域的特定点的排列坐标值时，在表示多个处理区域的规则性的模型等式中计算多个参数以及相对于几个处理区域上的特定点对多个处理区域的选定标记进行设计的相对排列坐标值; 以及通过使用所计算的参数来确定所述静态坐标系XY上的所述多个处理区域中的各个所述特定点的坐标位置。

85. 发明授权

US6160619A Projection exposure apparatus having compact substrate stage 有权
标题翻译：投影曝光装置具有紧凑的基板台
公开(公告)号：US6160619A
公开(公告)日：2000-12-12
申请号：US232646
申请日：1999-01-19
申请人： Nobutaka Magome
发明人： Nobutaka Magome
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70716 , G03F7/70775 , G03F9/00 , G03F9/70 , G03F9/7015
摘要： The projection exposure apparatus is provided with a moving mirror (24X, 24Y) having a length Lm set so as to satisfy a relationship as represented by Lm Dw+2BL.
摘要翻译：投影曝光装置设置有具有长度Lm的移动镜（24X，24Y），以便满足由Lm Dw + 2BL所示的关系而具有长度的移动镜。

86. 发明授权

US6141107A Apparatus for detecting a position of an optical mark 失效
标题翻译：用于检测光学标记的位置的装置
公开(公告)号：US6141107A
公开(公告)日：2000-10-31
申请号：US561158
申请日：1995-11-21
申请人： Kenji Nishi , Nobutaka Magome , Masaharu Kawakubo
发明人： Kenji Nishi , Nobutaka Magome , Masaharu Kawakubo
IPC分类号： G03F9/00 , G01N11/00
CPC分类号： G03F9/7069 , G03F9/7088 , G03F9/7092
摘要： The relative positions of an alignment mark on a wafer and index marks on an index plate within an optical system are detected by image processing. The index marks are illuminated by an illuminating light which is independent of an illuminating light for the wafer mark. An image of the wafer mark by a return light from the wafer and images of the index marks by the independent illuminating light are simultaneously picked up by a CCD image pickup device and the position of the first mark is detected from a combined image of these images by image processing.
摘要翻译：通过图像处理来检测晶片上的对准标记和光学系统内的折射板上的折射标记的相对位置。索引标记由独立于晶片标记的照明光的照明光照射。通过独立照明光的来自晶片的返回光的晶片标记的图像和由CCD图像拾取装置同时拾取的索引标记的图像，并且从这些图像的组合图像中检测第一标记的位置通过图像处理。

87. 发明授权

US6132908A Photo mask and exposure method using the same 失效
标题翻译：照相面具和曝光方法使用相同
公开(公告)号：US6132908A
公开(公告)日：2000-10-17
申请号：US978014
申请日：1997-11-25
申请人： Naomasa Shiraishi , Nobutaka Magome , Shigeru Hirukawa
发明人： Naomasa Shiraishi , Nobutaka Magome , Shigeru Hirukawa
IPC分类号： G03F1/26 , G03F1/29 , G03F1/32 , G03F7/20 , G03F9/00
CPC分类号： G03F1/32 , G03F1/26 , G03F1/29 , G03F7/70433
摘要： A photo mask for a lithography process enables the formation of high contrast image and facilitates manufacturing. The photo mask includes a transparent portion for an illumination light and a half-transparent part having a predetermined transmittance for the illumination light. These transparent and half-transparent portions are so constructed that a phase of a transmitted light beam from the half-transparent portion has a phase difference of 2 n.pi. or (2 n+1).pi. radian relative to a light beam passed through a transparent portion. Another type of photo mask includes transparent portion for the illumination light and a light shielding portion against the illumination light. At least a part of the shielding portion has a multilayer construction. An edge at least portion of the shielding portion has a different transmittance for the illumination light then a central portion surrounded by the edge portion.
摘要翻译：用于光刻工艺的光掩模能够形成高对比度图像并且便于制造。光掩模包括用于照明光的透明部分和具有用于照明光的预定透射率的半透明部分。这些透明和半透明部分被构造成使得来自半透明部分的透射光束的相位相对于通过透明的光束具有2n pi或（2n + 1）pi弧度的相位差一部分。另一种类型的光掩模包括用于照明光的透明部分和抵抗照明光的遮光部分。屏蔽部分的至少一部分具有多层结构。屏蔽部分的至少一部分的边缘对于照明光具有不同的透射率，然后是由边缘部分包围的中心部分。

88. 发明授权

US5981117A Scanning exposure method utilizing identical scan direction across multiple mask pattern layers 失效
标题翻译：利用跨多个掩模图案层的相同扫描方向的扫描曝光方法
公开(公告)号：US5981117A
公开(公告)日：1999-11-09
申请号：US99108
申请日：1998-06-18
申请人： Nobutaka Magome
发明人： Nobutaka Magome
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70358 , G03F7/70283 , G03F7/70425 , G03F7/70433 , G03F7/70733 , G03F9/70
摘要： A mask pattern is transferred onto a wafer by exposure with a mask stage and a wafer stage being moved synchronously. In global alignment of the mask and the wafer, the scanning direction in the present (second layer) scanning exposure is made coincident with the scanning direction in the preceding (first layer) scanning exposure. When alignment is made by calculating shot array coordinates in advance, shot array coordinates are calculated for each scanning direction.
摘要翻译：掩模图案通过用掩模台曝光并且晶片台同步移动而转印到晶片上。在掩模和晶片的全局对准中，使得当前（第二层）扫描曝光中的扫描方向与先前（第一层）扫描曝光中的扫描方向一致。通过预先计算射击阵列坐标进行对准时，针对每个扫描方向计算射击阵列坐标。

89. 发明授权

US5489986A Position detecting apparatus 失效
标题翻译：位置检测装置
公开(公告)号：US5489986A
公开(公告)日：1996-02-06
申请号：US233081
申请日：1994-04-25
申请人： Nobutaka Magome , Kazuya Ota , Hideo Mizutani , Kouichiro Komatsu
发明人： Nobutaka Magome , Kazuya Ota , Hideo Mizutani , Kouichiro Komatsu
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/70
摘要： In a position detecting apparatus having an object optical system, two beams are generated for irradiating a diffraction grating formed on an object from two directions at a predetermined intersect angle for forming an interference fringe, the beams passing through a pupil plane of the object optical system spaced apart a predetermined distance from each other. An opto-electric detector receives diffracted light from the grating via the object optical system and outputs a detection signal, and the position of the object is determined on the basis of the detection signal. An adjustable optical member provided in a light path between an optical source and the object changes incident angles at which the two beams are incident on the grating while keeping the intersect angle between the two beams substantially constant.
摘要翻译：在具有物体光学系统的位置检测装置中，产生两个光束，用于以形成干涉条纹的预定相交角从两个方向照射形成在物体上的衍射光栅，通过物镜光学系统的光瞳面彼此隔开预定的距离。光电检测器经由对象光学系统从光栅接收衍射光并输出检测信号，并且基于检测信号确定物体的位置。设置在光源和物体之间的光路中的可调节光学构件改变两个光束入射到光栅上的入射角，同时保持两个光束之间的相交角基本上恒定。

90. 发明授权

US5355223A Apparatus for detecting a surface position 失效
标题翻译：用于检测表面位置的装置
公开(公告)号：US5355223A
公开(公告)日：1994-10-11
申请号：US974236
申请日：1992-11-10
申请人： Nobutaka Magome
发明人： Nobutaka Magome
IPC分类号： G01B9/02 , G01B11/06
CPC分类号： G01B9/02003 , G01B11/0675 , G01B9/02002
摘要： An apparatus for detecting a surface position of an object to be detected from the direction of a line of vision. Even if a thin film is formed on the surface of the object, the apparatus is applicable to the detection of a position of the surface to be detected and the detection of a position of a surface of the thin film and the apparatus is also applicable to the detection of only a thickness of the thin film. The apparatus is designed so that a light beam of a frequency varied continuously and steadily is divided into two parts which are respectively directed to the object and a reference reflecting mirror, and after reflected beams from the object and the reference reflecting mirror have been combined on the same optical path, frequencies of the reflected beams are measured, thereby calculating the position of the object in accordance with a result of the frequency measurement.
摘要翻译：一种用于从视线方向检测被检测物体的表面位置的装置。即使在物体的表面上形成薄膜，该装置也可应用于检测被检测表面的位置和检测薄膜表面的位置，并且该装置也可应用于仅检测薄膜的厚度。该设备被设计成使得连续且稳定地变化的频率的光束被分成分别指向物体和参考反射镜的两个部分，并且在来自物体和参考反射镜的反射光束已经组合在相同的光路，测量反射光束的频率，从而根据频率测量的结果计算对象的位置。

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