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1. 发明授权

US07436487B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07436487B2
公开(公告)日：2008-10-14
申请号：US11345392
申请日：2006-02-02
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the liquid. The apparatus includes a bubble detector that detects air bubble or bubbles in the liquid between the projection optical system and the substrate. Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间的至少一部分并经由投影光学系统和液体将图案的图像投影到基板上来进行基板的曝光。该装置包括气泡检测器，其检测投影光学系统和基板之间的液体中的气泡或气泡。因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

2. 发明申请

US20070247640A1 Exposure Apparatus, Exposure Method and Device Manufacturing Method, and Surface Shape Detection Unit 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法以及表面形状检测装置
公开(公告)号：US20070247640A1
公开(公告)日：2007-10-25
申请号：US10594509
申请日：2005-03-30
申请人： Nobutaka Magome , Hideo Mizutani , Yasuhiro Hidaka
发明人： Nobutaka Magome , Hideo Mizutani , Yasuhiro Hidaka
IPC分类号： G01B11/30
CPC分类号： G03F9/7011 , G03F9/7003 , G03F9/7019 , H04B7/155
摘要： In subroutine 201 and step 205, a best image-forming plane of a projection optical system and an offset component of a multipoint AF system are detected as calibration information. During measurement of a wafer alignment mark by an alignment system in step 215, the multipoint AF system detects information related to a surface shape of a surface subject to exposure of a wafer (Z map). In step 219, a Z position order profile regarding position order (Z, θx, θy) related to autofocus leveling control is made, along with an XY position order profile of a wafer stage during scanning exposure, and in step 221, scanning exposure is performed while performing open control based on the position order.
摘要翻译：在子程序201和步骤205中，检测投影光学系统的最佳图像形成平面和多点AF系统的偏移分量作为校准信息。在步骤215中通过对准系统测量晶片对准标记期间，多点AF系统检测与经过晶片曝光的表面的表面形状有关的信息（Z图）。在步骤219中，与扫描曝光期间的晶片台的XY位置顺序轮廓一起进行与自动聚焦调平控制有关的位置顺序（Z，thetax，thetay）的Z位置阶轮廓，并且在步骤221中，扫描曝光是在基于位置顺序执行打开控制时执行。

3. 发明授权

US5734478A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5734478A
公开(公告)日：1998-03-31
申请号：US537982
申请日：1995-10-02
申请人： Nobutaka Magome , Hideo Mizutani , Kenji Nishi
发明人： Nobutaka Magome , Hideo Mizutani , Kenji Nishi
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7049
摘要： A projection exposure apparatus employs light in two different wavelength bands for exposure of a photosensitive substrate and for alignment of the substrate with a mask, respectively. The mask has a window through which alignment light is passed to an alignment mark on the substrate and has a shield for preventing illumination of the alignment mark by exposure light. In one embodiment the position of the shield relative to the window is determined by magnification chromatic aberration of a projection optical system with regard to the alignment light. In another embodiment the path of the alignment light through the window is inclined relative to a line perpendicular to the mask and passes through a pupil of the projection optical system at a point deviated from the center of the pupil. In another embodiment a mark on the mask and a mark on the substrate are illuminated with light beams incident on the marks from different directions and forming interference fringes to provide optical information that is utilized to align the mask and the substrate.
摘要翻译：投影曝光装置采用两个不同波段的光来分别曝光感光基片和基片与掩模的对准。掩模具有窗口，通过该窗口对准光通过基板上的对准标记，并具有用于防止曝光光照射对准标记的屏蔽。在一个实施例中，屏蔽件相对于窗口的位置由投影光学系统相对于对准光的倍率色差确定。在另一个实施例中，通过窗口的对准光的路径相对于垂直于掩模的线倾斜，并且在偏离瞳孔中心的点处穿过投影光学系统的光瞳。在另一个实施例中，掩模上的标记和衬底上的标记被从不同方向入射到标记上的光束照射并形成干涉条纹以提供用于对准掩模和衬底的光学信息。

4. 发明授权

US5689339A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US5689339A
公开(公告)日：1997-11-18
申请号：US506132
申请日：1995-07-24
申请人： Kazuya Ota , Kouichirou Komatsu , Hideo Mizutani , Nobutaka Magome
发明人： Kazuya Ota , Kouichirou Komatsu , Hideo Mizutani , Nobutaka Magome
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/70
摘要： In an alignment apparatus for aligning a mask and a photosensitive substrate (a semiconductor wafer or glass plate applied with a photoresist), and which is suitably used in a projection exposure apparatus (a stepper or aligner), a proximity exposure apparatus, or the like used in a lithography process in the manufacture of a semiconductor element or a liquid crystal display element, two first beams and two second beams differing from the first beams may be radiated on a diffraction grating-like mask mark and a diffraction grating-like substrate mark, respectively, with the two second beams passing through a transparent region adjacent to the mask mark. By detecting diffracted light components of the two first beams and detecting diffracted light components of the two second beams, a relative position shift between the mask and the substrate can be determined. The alignment apparatus advantageously can reduce mixing of alignment light from a mask and alignment light from a wafer (substrate) to a minimum degree, or can sufficiently separate signals corresponding to these light components in a signal processing stage even when mixing inevitably occurs.
摘要翻译：在用于对准掩模和感光基板（涂有光致抗蚀剂的半导体晶片或玻璃板）的对准装置中，适用于投影曝光装置（步进机或对准器）中的接近曝光装置等用于制造半导体元件或液晶显示元件的光刻工艺中，可以将不同于第一光束的两个第一光束和两个第二光束照射在衍射光栅状掩模标记和衍射光栅样基板标记分别与两个第二光束通过与掩模标记相邻的透明区域。通过检测两个第一光束的衍射光分量并检测两个第二光束的衍射光分量，可以确定掩模和基板之间的相对位置偏移。对准装置有利地可以减少来自掩模的对准光和来自晶片（衬底）的对准光到最小程度的混合，或者即使当不可避免地发生混合时，也可以在信号处理阶段中充分地分离与这些光分量对应的信号。

5. 发明授权

US5347356A Substrate aligning device using interference light generated by two beams irradiating diffraction grating 失效
$Substrate aligning device using interference light generated by two beams irradiating diffraction grating$
标题翻译：使用由两束照射衍射光栅产生的干涉光的基板对准装置
公开(公告)号：US5347356A
公开(公告)日：1994-09-13
申请号：US982129
申请日：1992-11-25
申请人： Kazuya Ota , Nobutaka Magome , Hideo Mizutani , Kouichiro Komatsu
发明人： Kazuya Ota , Nobutaka Magome , Hideo Mizutani , Kouichiro Komatsu
IPC分类号： G01B11/00 , G01B9/02 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7049 , G01B9/02002 , G01B9/02003 , G01B9/02097 , G03F7/70633 , G03F7/70691 , G01B2290/30 , G01B2290/60 , G01B2290/70
摘要： An aligning device for aligning a substrate with a predetermined point on the basis of a detection signal from a photoelectric detector uses interference light generated by light diffracted from a diffraction grating. A calculating device calculates at least one of a crossing angle of two coherent beams irradiating the grating and the rotational error of a crossing line between a plane containing principal rays of the beams and the surface of the substrate, with respect to the direction of arrangement of the grating, based on the phase difference between detection signals of the photoelectric detector corresponding to interference light generated from different portions of the crossing area. The output of the calculating device may be used to adjust the crossing angle and/or to correct the rotational error.
摘要翻译：基于来自光电检测器的检测信号将基板与预定点对准的对准装置使用由衍射光栅衍射的光产生的干涉光。计算装置计算照射光栅的两个相干光束的交叉角度与包含光束的主光线和基板表面的平面之间的交叉线的旋转误差中的至少一个相对于基于光电检测器的检测信号之间的相位差对应于由交叉区域的不同部分产生的干涉光的光栅。可以使用计算装置的输出来调整交叉角度和/或校正旋转误差。

6. 发明授权

US07460207B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07460207B2
公开(公告)日：2008-12-02
申请号：US11147288
申请日：2005-06-08
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via the projection optical system and the liquid, includes a bubble detector (20) which detects air bubble or bubbles in the liquid between the projection optical system and the substrate (P). Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译：一种曝光装置，其中通过用液体填充投影光学系统和基板（P）之间的空间的至少一部分并将图案的图像投影到基板上来进行基板（P）的曝光（ P）通过投影光学系统和液体包括气泡检测器（20），其检测投影光学系统和基板（P）之间的液体中的气泡或气泡。因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

7. 发明授权

US5587794A Surface position detection apparatus 失效
标题翻译：表面位置检测装置
公开(公告)号：US5587794A
公开(公告)日：1996-12-24
申请号：US239847
申请日：1994-05-09
申请人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
发明人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
IPC分类号： G01B11/26 , G01B11/00 , G01B11/02 , G01C3/06 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7026 , G01B11/026 , G03F7/70358
摘要： A surface position detection apparatus includes a projection optical system for projecting pattern light having a predetermined pattern on a detection surface from an oblique direction to the detection surface, an imaging optical system for forming an image of the pattern light reflected by the detection surface, a light-receiving-side light-shield arranged at a position substantially conjugate with the detection surface in the imaging optical system, and having an opening portion with a predetermined shape, a scanner for scanning the pattern image formed by the imaging optical system relative to the light-receiving-side light-shield, and a detection device for the pattern light into a plurality of portions, and selectively detecting at least one such portion of the pattern light.
摘要翻译：表面位置检测装置包括：投影光学系统，用于将检测表面上具有预定图案的图案光从倾斜方向投射到检测表面;成像光学系统，用于形成由检测表面反射的图案光的图像; 光接收侧光屏配置在与成像光学系统中的检测面基本共轭的位置，具有规定形状的开口部的扫描器，用于扫描由摄像光学系统形成的图案图像相对于光接收侧光屏蔽和用于将图案光分解为多个部分的检测装置，并且选择性地检测图案光的至少一个部分。

8. 发明授权

US07379158B2 Exposure apparatus and method for producing device 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US07379158B2
公开(公告)日：2008-05-27
申请号：US11350787
申请日：2006-02-10
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70341
摘要： A liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting disappearance of at least a portion of the liquid film in the predetermined region.
摘要翻译：液浸式曝光装置包括：投影光学系统，用于将掩模图案投射到基板上;液膜形成系统，用于在投影光学系统和基板之间的预定区域中形成液膜，以及用于检测的传感器在预定区域中液膜的至少一部分消失。

9. 发明授权

US5171999A Adjustable beam and interference fringe position 失效
标题翻译：可调光束和干涉条纹位置
公开(公告)号：US5171999A
公开(公告)日：1992-12-15
申请号：US762472
申请日：1991-09-19
申请人： Koichiro Komatsu , Hideo Mizutani , Nobutaka Magome , Kazuya Ota
发明人： Koichiro Komatsu , Hideo Mizutani , Nobutaka Magome , Kazuya Ota
IPC分类号： G03F9/00
CPC分类号： G03F9/7049
摘要： A position detection apparatus has a substrate on which a diffraction grating is formed and an alignment optical system for illuminating the diffraction grating with a pair of coherent light beams having different frequencies from each other from different directions. The intensity of interference fringes formed due to the interference of diffracted beams generated in the diffraction grating is detected photo-electrically. The alignment optical system forms the pair of coherent light by using an optical modulator, and two luminous fluxes from the optical modulator pass through independent optical paths positioned symmetrically with the optical axis of the alignment optical system therebetween and reach the diffraction grating from different directions. The alignment optical system has a stop having an opening having an inclined edge with respect to the direction of the grating components of the diffraction grating, the opening being in conjugation with the substrate.
摘要翻译：位置检测装置具有其上形成有衍射光栅的基板和用于用不同方向彼此不同频率的一对相干光束照射衍射光栅的对准光学系统。由于衍射光栅中产生的衍射光束的干涉而形成的干涉条纹的强度被光电检测。对准光学系统通过使用光学调制器形成一对相干光，并且来自光学调制器的两个光束通过独立的光学路径，与对准光学系统的光轴对称地定位并从不同的方向到达衍射光栅。对准光学系统具有具有相对于衍射光栅的光栅部件的方向具有倾斜边缘的开口的开口，该开口与基板共轭。

10. 发明授权

US6124933A Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus 失效
标题翻译：利用表面位置检测的曝光装置，其方法和使用该装置的半导体器件制造方法
公开(公告)号：US6124933A
公开(公告)日：2000-09-26
申请号：US19565
申请日：1998-02-06
申请人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
发明人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
IPC分类号： G01B11/26 , G01B11/00 , G01B11/02 , G01C3/06 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/14
CPC分类号： G03F9/7026 , G01B11/026 , G03F7/70358
摘要： In an exposure apparatus and method utilizing a projection system, a surface state relating to an exposure area of the projection system is determined by illuminating the exposure area with light, receiving light from the exposure area, designating positions of a plurality of detection points in the exposure area in accordance with a size of the exposure area, and detecting, based on information of received light corresponding to the plurality of detection points, positions related to the plurality of detection points.
摘要翻译：在利用投影系统的曝光装置和方法中，通过用光照射曝光区域来确定与投影系统的曝光区域相关的表面状态，从曝光区域接收光，指定多个检测点的位置曝光区域，并且根据与所述多个检测点对应的接收光的信息，检测与所述多个检测点相关的位置。

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