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81. 发明授权

US08568956B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08568956B2
公开(公告)日：2013-10-29
申请号：US13404140
申请日：2012-02-24
申请人： Koji Ichikawa , Satoshi Yamaguchi
发明人： Koji Ichikawa , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/111
摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a compound represented by the formula (II), wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; ring W1 represents a C2 to C36 substituted heterocyclic ring; R3 represents a C1 to C30 hydrocarbon group, and one or more —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—.
摘要翻译：抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的溶解而溶于碱性水溶液，（B）酸产生剂和（D）由式（II）表示的化合物，其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基; 环W1表示C2〜C36取代的杂环; R3表示C1〜C30烃基，烃基中所含的一个或多个-CH 2可以被-O-或-CO-代替。

82. 发明授权

US08563219B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08563219B2
公开(公告)日：2013-10-22
申请号：US13404871
申请日：2012-02-24
申请人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
发明人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/108 , Y10S430/111
摘要： A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA), wherein R1, A1, R2, R1A and R2A are defined in the specification.
摘要翻译：含有抗蚀剂组合物（A1）具有由式（I）表示的结构单元的树脂，（A2）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）酸衍生物，和（D）具有由式（IA）表示的阴离子的盐，其中R1，A1，R2，R1A和R2A在说明书中定义。

83. 发明授权

US08546059B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08546059B2
公开(公告)日：2013-10-01
申请号：US12953606
申请日：2010-11-24
申请人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
发明人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and Rc6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子，可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和R c6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc4和Rc6键合彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc5和Rc7彼此键合形成烷二基。

84. 发明授权

US08481242B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08481242B2
公开(公告)日：2013-07-09
申请号：US12946886
申请日：2010-11-16
申请人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
发明人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
IPC分类号： G03F7/00 , G03C1/00 , C07D407/12 , C07D333/16 , C07C69/74 , C07C229/00
CPC分类号： C07D333/46 , C07C25/18 , C07C309/12 , C07C309/17 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2, L1 and L2, ring W1, R5, w, v, Z+ and W10 are defined in the specification.
摘要翻译：由式（X）表示的盐：其中Q1和Q2，L1和L2，环W1，R5，w，v，Z +和W10在说明书中定义。

85. 发明授权

US08460851B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08460851B2
公开(公告)日：2013-06-11
申请号：US12985838
申请日：2011-01-06
申请人： Satoshi Yamaguchi , Koji Ichikawa
发明人： Satoshi Yamaguchi , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C07D295/088 , C07D295/096 , C07D295/15 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents *—CO—O-La- or *—CH2—O-Lb-, * represents a binding position to —C(Q1)(Q2)-, La and Lb independently represent a C1-C15 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C2-C36 nitrogen-containing heterocyclic group in which one or more —CH2— can be replaced by —O—, and Z1⊕ represents an organic counter ion.
摘要翻译：由式（I）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示* -CO-O-La-或* -CH2-O-Lb-，*表示对于-C（Q1）（Q2） - 的结合位置，La和Lb独立地表示其中一个或多个-CH 2 - 可被-O-或-CO-代替的C 1 -C 15二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-代替的C 2 -C 36含氮杂环基，Z 1表示有机抗衡离子。

86. 发明授权

US08420294B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08420294B2
公开(公告)日：2013-04-16
申请号：US13304478
申请日：2011-11-25
申请人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
发明人： Koji Ichikawa , Yukako Anryu , Shingo Fujita
IPC分类号： G03F7/004 , G03F7/30 , C07C309/65 , C07C309/71 , C07D321/10 , C07D321/12
CPC分类号： C07D317/72 , C07D233/54 , C07D317/22 , C07D317/24 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a salt represented by the formula (I): wherein R1 and R2 independently each represent a C1-C6 alkyl group or R1 and R2 are bonded each other to form a C5-C20 aliphatic ring together with the carbon atom to which they are bonded, R3 and R4 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO— and which may be substituted with one or more fluorine atoms, and Z1+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中R 1和R 2各自独立地表示C 1 -C 6烷基，或者R 1和R 2彼此键合以与碳原子一起形成C 5 -C 20脂族环， R 3和R 4各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO- 并且其可以被一个或多个氟原子取代，Z 1 +表示有机抗衡离子。

87. 发明申请

US20110033804A1 PHOTORESIST COMPOSITION 审中-公开
标题翻译：光电组合物
公开(公告)号：US20110033804A1
公开(公告)日：2011-02-10
申请号：US12852072
申请日：2010-08-06
申请人： Masahiko Shimada , Koji Ichikawa
发明人： Masahiko Shimada , Koji Ichikawa
IPC分类号： G03F7/004 , C08G63/00 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and a structural unit derived from a compound represented by the formula (a): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C6 alkyl group or a C1-C6 halogenated alkyl group, k represents an integer of 1 to 6, W1 represents a C6-C18 divalent aromatic hydrocarbon group which can have one or more substituents selected from the group consisting of a halogen atom, a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C6-C14 aryl group, a C7-C15 aralkyl group, a glycidyloxy group and a C2-C4 acyl group, and R2 represents a hydrogen atom, a group represented by the formula (R2-1) or a group represented by the formula (R2-2), wherein R3, R4 and R5 independently each represent a C1-C12 hydrocarbon group, and R3 and R4 can be bonded each other to form a ring, R6 and R7 independently each represent a hydrogen atom or a C1-C12 hydrocarbon group, and R8 represents a C1-C12 hydrocarbon group, and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：本发明提供了包含树脂的光致抗蚀剂组合物，其包含衍生自具有酸不稳定基团的化合物的结构单元和由式（a）表示的化合物衍生的结构单元：其中R1表示氢原子，卤素原子，C1-C6烷基或C1-C6卤代烷基，k表示1〜6的整数，W1表示可具有一个以上取代基的C6-C18二价芳香族烃基，该取代基选自卤素原子，羟基，C1-C12烷基，C1-C12烷氧基，C6-C14芳基，C7-C15芳烷基，缩水甘油氧基和C2-C4酰基，R2表示氢原子，式（R2-1）表示的基团或式（R2-2）表示的基团，其中R3，R4和R5各自独立地表示C1-C12烃基，R3和R4可以键合彼此形成环，R6和R7各自独立地表示氢 om或C1-C12烃基，R8表示C1-C12烃基，其在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液。

88. 发明申请

US20100323296A1 RESIN AND RESIST COMPOSITION 有权
标题翻译：树脂和树脂组合物
公开(公告)号：US20100323296A1
公开(公告)日：2010-12-23
申请号：US12821008
申请日：2010-06-22
申请人： Koji Ichikawa , Yusuke Fuji , Satoshi Yamaguchi
发明人： Koji Ichikawa , Yusuke Fuji , Satoshi Yamaguchi
IPC分类号： G03F7/004 , C08F228/06 , C08F224/00 , G03F7/20
CPC分类号： C08F224/00 , C08F220/10 , C08F220/18 , C08F220/28 , C08F222/14 , C08F226/06 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/027 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： A resin comprises a structural unit derived from a compound represented by the formula (aa) wherein T represents a C4 to C36 alicyclic hydrocarbon group, the hydrogen atom contained in the alicyclic hydrocarbon group may be replaced by a halogen atom, a hydroxyl group, a C1 to C12 alkyl group optionally substituted with a halogen atom or a hydroxyl group, a C1 to C12 alkoxyl group, a C6 to C12 aryl group, a C7 to C12 aralkyl group, a glycidyloxy group, a C2 to C4 acyl group, an alkoxycarbonyl group, an alkanoyloxyalkyl group or a cyano group, and the —CH2— contained in the alicyclic hydrocarbon group is replaced by at least one —SO2— and furthermore may be replaced by —CO—, —O—, —S—, —SO2— or —N(Rc)—; Rc represents a hydrogen atom or a C1 to C6 alkyl group; R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group that may optionally has halogen atoms; and Z1 represents an optionally substituted C1 to C17 saturated hydrocarbon group, and the —CH2— contained in the saturated hydrocarbon group may be replaced by —CO—, —O—, —S— or —N(Rc)—.
摘要翻译：树脂包含衍生自由式（aa）表示的化合物的结构单元，其中T表示C4-C36脂环族烃基，脂环族烃基中所含的氢原子可以被卤素原子，羟基，任选被卤素原子或羟基取代的C1〜C12烷基，C1〜C12烷氧基，C6〜C12芳基，C7〜C12芳烷基，缩水甘油氧基，C2〜C4酰基，烷氧基羰基基团，烷酰氧基烷基或氰基，脂环族烃基中的-CH 2被至少一个-SO 2 - 代替，并且还可以被-CO - ， - O - ， - S - ， - SO 2 - 或-N（Rc） - ; Rc表示氢原子或C1〜C6烷基; R1表示氢原子，卤素原子或可任选具有卤素原子的C1-C6烷基; Z 1表示任选取代的C 1〜C 17饱和烃基，饱和烃基中的-CH 2可以被-CO - ， - O - ， - S-或-N（R c） - 代替。

89. 发明授权

US07750950B2 Image pickup apparatus and image processing method 有权
标题翻译：图像拾取装置和图像处理方法
公开(公告)号：US07750950B2
公开(公告)日：2010-07-06
申请号：US11606087
申请日：2006-11-30
申请人： Masaya Tamaru , Koichi Sakamoto , Koji Ichikawa , Masahiko Sugimoto , Manabu Hyodo , Kazuhiko Takemura , Hirokazu Kobayashi
发明人： Masaya Tamaru , Koichi Sakamoto , Koji Ichikawa , Masahiko Sugimoto , Manabu Hyodo , Kazuhiko Takemura , Hirokazu Kobayashi
IPC分类号： H04N9/73
CPC分类号： H04N5/2355 , H04N5/202 , H04N5/235 , H04N9/69 , H04N9/735
摘要： An image combined high sensitivity image and low sensitivity image is provided with well-adjusted white balance and broad dynamic range. The image is obtained by multiplying the combined data by total gain that depends on scene. A white balance is adjusted with gain value calculated from of high output image data. Lv value representing luminance is calculated and compared with a threshold to decide whether or not the high sensitivity image and the low sensitivity image should be combined. First gamma correction unit performs gamma-correction for the image signal derived from the high sensitivity signal with first gamma character, second gamma correction unit performs gamma-correction for the image signal derived from the low sensitivity signal with second gamma character that is different from the first gamma character, and addition unit combines the image signal from the first gamma correction unit and the image signal from the second gamma correction unit.
摘要翻译：组合高灵敏度图像和低灵敏度图像的图像具有良好调整的白平衡和宽动态范围。通过将组合数据乘以取决于场景的总增益来获得图像。用高输出图像数据计算的增益值调整白平衡。计算表示亮度的Lv值并将其与阈值进行比较，以决定是否应该组合高灵敏度图像和低灵敏度图像。第一伽马校正单元对于具有第一伽玛字符的高灵敏度信号导出的图像信号执行伽马校正，第二伽马校正单元对于具有与第一伽玛校正不同的第二伽马字符从低灵敏度信号导出的图像信号进行伽马校正第一伽马字符和加法单元组合来自第一伽马校正单元的图像信号和来自第二伽马校正单元的图像信号。

90. 发明申请

US20090251869A1 Multilayer ceramic substrate, electronic component, and method of manufacturing multilayer ceramic substrate 有权
标题翻译：多层陶瓷基板，电子部件以及多层陶瓷基板的制造方法
公开(公告)号：US20090251869A1
公开(公告)日：2009-10-08
申请号：US12385134
申请日：2009-03-31
申请人： Hatsuo Ikeda , Koji Ichikawa
发明人： Hatsuo Ikeda , Koji Ichikawa
IPC分类号： H05K7/00 , B32B37/02 , H05K1/11
CPC分类号： H05K1/113 , H01L2224/05568 , H01L2224/05573 , H01L2224/16225 , H01L2924/00014 , H01L2924/15192 , H01L2924/19105 , H05K1/0306 , H05K3/246 , H05K3/4061 , H05K3/4611 , H05K3/4629 , H05K2201/0347 , H05K2201/09745 , H01L2224/05599
摘要： A multilayer ceramic substrate in which an active element and a passive element are surface-equipped over the outermost surface on one side is provided. The multilayer ceramic substrate comprises a plurality of laminated ceramic substrate layers, a surface layer terminal electrode provided in a via hole of an outermost ceramic substrate layer on at least one side and having a surface layer via electrode and a metal plating layer deposited over an end surface of the surface layer via electrode, and a via conductor which connects the surface layer terminal electrode and circuit patterns over the ceramic substrate layer at the inside, wherein a via hole size of a surface layer terminal electrode for connection of the active element is smaller than a via hole size of a surface layer terminal electrode for connection of the passive element.
摘要翻译：提供一种多层陶瓷基板，其中在一侧的最外表面上表面配置有源元件和无源元件。多层陶瓷基板包括多个层叠陶瓷基板层，表面层端子电极，设置在至少一侧的最外侧陶瓷基板层的通路孔中，具有表面层通孔电极和沉积在端部的金属镀层表面层通孔电极的表面，以及将内表面层端子电极和电路图案连接在陶瓷基板层上的通孔导体，其中用于连接有源元件的表面层端子电极的通孔尺寸较小比用于连接无源元件的表面层端子电极的通孔尺寸。

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