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81. 发明授权

US06638683B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06638683B1
公开(公告)日：2003-10-28
申请号：US09103544
申请日：1998-06-24
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/115
摘要： A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.
摘要翻译：正型光致抗蚀剂组合物包含（a）由含有酚羟基的碱溶性树脂得到的树脂A的组合，通过用式（I）和（b）表示的基团代替10至80％的酚羟基，通过用式（II）或（III）表示的基团代替10〜80％的酚羟基或由至少一种以上的非聚合物溶解抑制化合物代替的酚醛羟基的碱溶性树脂得到的树脂B 选自叔烷基酯基和叔烷基碳酸酯基的一类基团;其中R 1，W，n和R 4如说明书中所定义。

82. 发明授权

US06630280B1 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06630280B1
公开(公告)日：2003-10-07
申请号：US09512664
申请日：2000-02-24
申请人： Toru Fujimori , Shiro Tan
发明人： Toru Fujimori , Shiro Tan
IPC分类号： G03F700
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/115
摘要： A positive photoresist composition comprising: (a) a resin having structural units represented by the following formulae (X) and being capable of decomposing by, the action of an acid to increase the solubility in an alkali developer, and (b) a compound capable of generating an acid with irradiation of actinic ray or radiation: wherein R1 and R2, which may be the same or different, each represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, R3 and R4, which may be the same or different, each represents a hydrogen atom or a linear, branched or cyclic alkyl group which may have a substituent, R5 represents a linear, branched or cyclic alkyl group which may have a substituent, an aryl group which may have a substituent or an aralkyl group which may have a substituent, m represents an integer of from 1 to 20, and n represents an integer of from 0 to 5.
摘要翻译：一种正型光致抗蚀剂组合物，其包含：（a）具有由下式（X）表示的结构单元的树脂，并且能够通过酸的作用分解以提高在碱性显影剂中的溶解度，和（b）能够通过光化射线或辐射的照射产生酸：其中可以相同或不同的R 1和R 2各自表示氢原子或具有1至4个碳原子的烷基，R 3和R 4可以是相同或不同，各自表示氢原子或可具有取代基的直链，支链或环状烷基，R5表示可具有取代基的直链，支链或环状烷基，可具有取代基的芳基或可以具有取代基的芳烷基，m表示1〜20的整数，n表示0〜5的整数。

83. 发明授权

US06537718B2 Positive photoresist composition for exposure to far ultraviolet ray 有权
标题翻译：用于暴露于远紫外线的正光致抗蚀剂组合物
公开(公告)号：US06537718B2
公开(公告)日：2003-03-25
申请号：US09742368
申请日：2000-12-22
申请人： Fumiyuki Nishiyama , Toru Fujimori
发明人： Fumiyuki Nishiyama , Toru Fujimori
IPC分类号： G03F7039
CPC分类号： G03F7/0045 , G03F7/0048 , G03F7/039 , Y10S430/106
摘要： A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.
摘要翻译：用于暴露于远紫外线的正性光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，（B）含有对应于羟基苯乙烯的重复单元的树脂，其溶解度增加（C）（1）选自丙二醇单甲醚乙酸酯和丙二醇单甲醚丙酸酯中的至少一种溶剂，和（2）至少一种溶剂，其选自：由丙二醇单甲醚和丙酸乙氧基乙酯组成的组。本发明的正型光致抗蚀剂组合物适用于暴露于远紫外线，特别是KrF准分子激光束，在线边缘粗糙度和微晶粒方面得到改善，在基材上贴合的均匀性优异，在其中较少的颗粒抗溶液。

84. 发明授权

US06379860B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06379860B1
公开(公告)日：2002-04-30
申请号：US09220682
申请日：1998-12-23
申请人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
发明人： Toru Fujimori , Yasunori Takata , Shiro Tan , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/115
摘要： A positive photosensitive composition is disclosed which comprises a compound generating an acid upon irradiation with actinic rays or a radiation and a resin having groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution, said resin being obtained by reacting an alkali-soluble resin having phenolic hydroxyl groups with at least one specific enol ether compound under acid conditions in a specific organic solvent. The positive photosensitive composition shows improved discrimination between nonimage areas and image areas, has high sensitivity, high resolving power, and high heat resistance, suffers little change in performance with the lapse of time from exposure to light to heat treatment (PED), and is free from defects, e.g., development defects.
摘要翻译：公开了一种正型感光性组合物，其包含在用光化射线照射时产生酸的化合物或辐射，以及具有通过酸作用分解的基团的树脂，以增强在碱性显影液中的溶解度，所述树脂是通过使具有酚羟基的碱溶性树脂与至少一种特定的烯醇醚化合物在酸性条件下在特定的有机溶剂中。正型感光性组合物显示出非图像区域和图像区域之间的区分改善，具有高灵敏度，高分辨率和高耐热性，随着从曝光到热处理（PED）的时间的流逝，性能几乎没有变化，并且是没有缺陷，例如发展缺陷。

85. 发明授权

US6004721A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US6004721A
公开(公告)日：1999-12-21
申请号：US18883
申请日：1998-02-05
申请人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
发明人： Shiro Tan , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition is disclosed which comprises (a) a resin obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group having a specific structure, (b) a compound which generates an acid upon irradiation with actinic rays or a radiation, and (c) a solvent. This composition is an excellent, chemically amplified photoresist composition which has high resolution and gives a resist pattern having no depressions in an upper part thereof and having satisfactory adhesion to the substrate.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含（a）通过用具有特定结构的基团代替10至80％的酚羟基，由（b）化合物其在用光化射线或辐射照射时产生酸，和（c）溶剂。该组合物是优异的化学放大型光致抗蚀剂组合物，其具有高分辨率并且在其上部具有不具有凹陷的抗蚀剂图案，并且对基材具有令人满意的粘合性。

86. 发明授权

US5939234A Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US5939234A
公开(公告)日：1999-08-17
申请号：US655233
申请日：1996-06-05
申请人： Tsukasa Yamanaka , Toshiaki Aoai , Toru Fujimori
发明人： Tsukasa Yamanaka , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/121
摘要： Disclosed is a chemically amplified positive resist composition which comprises (A) a compound which contains at least one group selected among tert-alkyl ester groups and tert-alkyl carbonate groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (B) a compound which contains at least one group selected among acetal groups and silyl ether groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (C) a compound which is capable of generating an acid by irradiation with an active ray or radiation, and (D) an organic basic compound. The resist composition has high resolving power and forms a satisfactory pattern free from undergoing sensitivity decrease, T-top formation, and change in line width which are caused from exposure to post exposure bake.
摘要翻译：公开了一种化学放大型正性抗蚀剂组合物，其包含（A）含有至少一个选自叔烷基酯基和碳酸叔烷基酯基的基团的化合物，并且能够增加化合物在碱性水溶液中的溶解度酸的作用，（B）含有至少一个选自缩醛基团和甲硅烷基醚基团的基团并且能够通过酸的作用增加化合物在碱性水溶液中的溶解度的化合物，（C）化合物其能够通过用活性射线或辐射照射产生酸，和（D）有机碱性化合物。抗蚀剂组合物具有高分辨能力，并且形成了不受曝光曝光烘烤引起的敏感性降低，T顶形成和线宽变化的令人满意的图案。

87. 发明授权

US5393655A Silver halide photographic material containing selenium or tellurium compound 失效
标题翻译：含有硒或碲化合物的卤化银照相材料
公开(公告)号：US5393655A
公开(公告)日：1995-02-28
申请号：US161275
申请日：1993-12-03
申请人： Hirotomo Sasaki , Hiroyuki Mifune , Toru Fujimori
发明人： Hirotomo Sasaki , Hiroyuki Mifune , Toru Fujimori
IPC分类号： G03C1/09
CPC分类号： G03C1/09
摘要： A silver halide photographic material comprises a silver halide emulsion layer provided on a support. The silver halide emulsion layer contains a heterocyclic selenium or tellurium compound represented by the formula (Ia), (Ib), (Ic) or (Id): ##STR1## in which each of Ch.sup.1, Ch.sup.3, Ch.sup.6 and Ch.sup.12 is Se or Te; and each of Ch.sup.2, Ch.sup.4, Ch.sup.5, Ch.sup.7, Ch.sup.8, Ch.sup.9, Ch.sup.10, Ch.sup.11, Ch.sup.13, Ch.sup.14 and Ch.sup.15 is O, S, Se or Te. Other selenium or tellurium compounds are also disclosed.
摘要翻译：卤化银照相材料包括设置在载体上的卤化银乳剂层。卤化银乳剂层含有由式（Ia），（Ib），（Ic）或（Id）表示的杂环硒或碲化合物：（Ⅰa）（Ⅰb） Ch1，Ch3，Ch6和Ch12各自为Se或Te的（Id） Ch2，Ch4，Ch5，Ch7，Ch8，Ch9，Ch10，Ch11，Ch13，Ch14和Ch15分别为O，S，Se或Te。还公开了其它硒或碲化合物。

88. 发明授权

US4073910A Method for treatment of diabetes 失效
标题翻译：治疗糖尿病的方法
公开(公告)号：US4073910A
公开(公告)日：1978-02-14
申请号：US635448
申请日：1975-11-26
申请人： Hidetoshi Kawashima , Shinzaburo Ohtake , Toru Fujimori , Isao Ohkawa , Tetsuya Tajima
发明人： Hidetoshi Kawashima , Shinzaburo Ohtake , Toru Fujimori , Isao Ohkawa , Tetsuya Tajima
IPC分类号： A61K31/455
CPC分类号： A61K31/455 , Y10S514/866
摘要： Therapeutical treatment of diabetes by oral or parenteral administration of Vitamine E nicotinate which exhibits remarkable effects for treatment of diabetes without accompanying injurious side effect.
摘要翻译：通过口服或肠胃外给药维生素E烟酸酯治疗糖尿病，其对治疗糖尿病具有显着的效果，而不伴随有害的副作用。

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